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公开(公告)号：US07119944B2
公开(公告)日：2006-10-10
申请号：US11056727
申请日：2005-02-11
申请人： Satyadev Patel , Andrew Huibers , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
发明人： Satyadev Patel , Andrew Huibers , Jonathan Doan , James Dunphy , Dmitri Simonian , Hongqin Shi , Jianglong Zhang
IPC分类号： G02B26/00
CPC分类号： G02B26/0841 , G02B27/1026 , Y10S359/904
摘要： Disclosed herein is a micromirror device having in-plane deformable hinge to which a deflectable and reflective mirror plate is attached. The mirror plate rotates to different angles in response to an electrostatic field established between the mirror plate and an addressing electrode associated with the mirror plate.
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公开(公告)号：US07075702B2
公开(公告)日：2006-07-11
申请号：US11216594
申请日：2005-08-30
申请人： Andrew Huibers , Satyadev Patel
发明人： Andrew Huibers , Satyadev Patel
CPC分类号： G02B26/0841
摘要： A micromirror of a micromirror array of a spatial light modulator used in display systems comprises a mirror plate attached to a hinge that is supported by two posts formed on a substrate. Also the mirror plate is operable to rotate along a rotation axis that is parallel to but offset from a diagonal of the mirror plate when viewed from the top. An imaginary line connecting the two posts is not parallel to either diagonal of the mirror plate.
摘要翻译： 在显示系统中使用的空间光调制器的微镜阵列的微镜包括附接到由在基板上形成的两个支柱支撑的铰链的镜板。 此外，当从顶部观察时，镜板可操作以沿着平行于但偏离镜板的对角线的旋转轴线旋转。 连接两个柱的假想线不平行于镜板的任一对角线。
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公开(公告)号：US07041224B2
公开(公告)日：2006-05-09
申请号：US10104109
申请日：2002-03-22
申请人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi , Andrew G. Huibers , Peter Heureux
发明人： Satyadev R. Patel , Gregory P. Schaadt , Douglas B. MacDonald , Hongqin Shi , Andrew G. Huibers , Peter Heureux
IPC分类号： B81C1/00
CPC分类号： B81C1/00 , B81B2201/045 , B81C1/00476 , B81C1/00531 , B81C1/00595 , B81C99/0025 , B81C2201/0138 , B82Y30/00 , H01L21/3065 , H01L21/3081 , H01L21/32135
摘要： The etching of a material in a vapor phase etchant is disclosed where a vapor phase etchant is provided to an etching chamber at a total gas pressure of 10 Torr or more, preferably 20 Torr or even 200 Torr or more. The vapor phase etchant can be gaseous acid etchant, a noble gas halide or an interhalogen. The sample/workpiece that is etched can be, for example, a semiconductor device or MEMS device, etc. The material that is etched/removed by the vapor phase etchant is preferably silicon and the vapor phase etchant is preferably provided along with one or more diluents. Another feature of the etching system includes the ability to accurately determine the end point of the etch step, such as by creating an impedance at the exit of the etching chamber (or downstream thereof) so that when the vapor phase etchant passes from the etching chamber, a gaseous product of the etching reaction is monitored, and the end point of the removal process can be determined. The vapor phase etching process can be flow through, a combination of flow through and pulse, or recirculated back to the etching chamber. A first plasma or wet chemical etch (or both) can be performed prior to the vapor phase etch.
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公开(公告)号：US06979893B2
公开(公告)日：2005-12-27
申请号：US10811449
申请日：2004-03-26
申请人： Jim Dunphy , Dmitri Simonian , John Porter
发明人： Jim Dunphy , Dmitri Simonian , John Porter
CPC分类号： B81B3/0005 , B81C1/0096
摘要： The present invention provides a lubricant container inside a microelectromechanical device package. The lubricant container contains selected lubricant that evaporates from the container and contact to a surface of the microelectromechanical device for lubricating the surface.
摘要翻译： 本发明提供了一种在微机电装置封装内的润滑剂容器。 润滑剂容器包含从容器蒸发的选定的润滑剂，并与微机电装置的表面接触以润滑表面。
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5.发明授权Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates 有权在晶片衬底上沉积，释放和封装微机电器件的方法公开(公告)号：US06969635B2
公开(公告)日：2005-11-29
申请号：US10005308
申请日：2001-12-03
CPC分类号： B81C1/00214 , B81B7/0077 , B81B2201/042 , B81C1/00333 , B81C1/00896 , B81C1/00904 , B81C2203/0118 , B82Y30/00 , G02B26/0833 , H01L24/97 , H01L2224/48091 , H01L2224/97 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01018 , H01L2924/01019 , H01L2924/0102 , H01L2924/01023 , H01L2924/01027 , H01L2924/01033 , H01L2924/01039 , H01L2924/01049 , H01L2924/01054 , H01L2924/01058 , H01L2924/01072 , H01L2924/01074 , H01L2924/01077 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/04953 , H01L2924/09701 , H01L2924/10253 , H01L2924/10329 , H01L2924/12036 , H01L2924/12042 , H01L2924/12044 , H01L2924/14 , H01L2924/1433 , H01L2924/15787 , H01L2924/19041 , H01L2924/19042 , H01L2924/3025 , H01L2924/00014 , H01L2224/85 , H01L2924/00
摘要： A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.
摘要翻译： 公开了一种用于形成MEMS器件的方法，其中在晶片接合步骤之前执行最终释放步骤以保护MEMS器件免受污染，物理接触或其它有害的外部事件。 除了可选的静态处理之外，在释放和晶片接合和分离之间的MEMS结构没有额外的变化的情况下，MEMS器件是最佳保护的并且整个工艺流程得到改善。 该方法适用于任何MEMS器件的生产，并且特别有利于制造易碎的微镜。
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6.发明授权公开(公告)号：US06962419B2
公开(公告)日：2005-11-08
申请号：US10343307
申请日：2001-03-08
申请人： Andrew G. Huibers
发明人： Andrew G. Huibers
CPC分类号： H04N5/7458 , G03B21/28 , H01L2224/48091 , H01L2224/48472 , H01L2924/16195 , H01L2924/00014
摘要： In order to minimize light diffraction along the direction of switching and more particularly light diffraction into the acceptance cone of the collection optics, in the present invention, micromirrors are provided which are not rectangular. Also, in order to minimize the cost of the illumination optics and the size of the display unit of the present invention, the light source is placed orthogonal to the rows (or columns) of the array, and/or the light source is placed orthogonal to a side of the frame defining the active area of the array. The incident light beam, though orthogonal to the sides of the active area, is not however, orthogonal to any substantial portion of sides of the individual micromirrors in the array. Orthogonal sides cause incident light to diffract along the direction of micromirror switching, and result in light ‘leakage’ into the ‘on’ state even if the micromirror is in the ‘off’ state. This light diffraction decreases the contrast ratio of the micromirror. The micromirrors of the present invention result in an improved contrast ratio, and the arrangement of the light source to micromirror array in the present invention results in a more compact system. Another feature of the invention is the ability of the micromirrors to pivot in opposite direction to on and off positions (the on position directing light to collection optics), where the movement to the on position is greater than movement to the off position. A further feature of the invention is a package for the micromirror array, the package having a window that is not parallel to the substrate upon which the micromirrors are formed. One example of the invention includes all the above features.
摘要翻译： 为了最小化沿着切换方向的光衍射，并且更特别地，将光衍射最小化到收集光学器件的接收锥体中，在本发明中，提供了不是矩形的微镜。 此外，为了最小化本发明的照明光学器件的成本和显示单元的尺寸，将光源与阵列的行（或列）正交放置，和/或将光源正交 到帧的定义阵列的有效区域的一侧。 然而，入射光束虽然正交于有源区域的侧面，但是不是与阵列中的各个微镜的任何相当大部分的侧面正交。 正交侧使得入射光沿着微镜切换的方向衍射，并且即使微镜处于“关闭”状态，也导致光“泄漏”进入“打开”状态。 该光衍射降低了微镜的对比度。 本发明的微反射镜导致对比度提高，并且在本发明中光源到微镜阵列的布置导致更紧凑的系统。 本发明的另一个特征是微镜能够相对于打开和关闭位置（将光引导到收集光学器件）的相对方向枢转，其中到打开位置的移动大于移动到关闭位置。 本发明的另一个特征是用于微镜阵列的封装，该封装具有不与形成微反射镜的基板平行的窗口。 本发明的一个实例包括所有上述特征。
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公开(公告)号：US06960305B2
公开(公告)日：2005-11-01
申请号：US10402777
申请日：2003-03-28
CPC分类号： C23F4/00 , B81B2201/045 , B81C1/00476 , C03C17/36 , C03C17/3663 , G02B26/0841 , H01L21/32135
摘要： A method for making a spatial light modulator is disclosed, that comprises forming an array of micromirrors each having a hinge and a micromirror plate held via the hinge on a substrate, the micromirror plate being disposed in a plane separate from the hinge and having a hinge made of a transition metal nitride, followed by releasing the micromirrors in a spontaneous gas phase chemical etchant. Also disclosed is a projection system that comprises such a spatial light modulator, as well as a light source, condensing optics, wherein light from the light source is focused onto the array of micromirrors, projection optics for projecting light selectively reflected from the array of micromirrors onto a target, and a controller for selectively actuating the micromirrors in the array.
摘要翻译： 公开了一种用于制造空间光调制器的方法，其包括形成各自具有铰链的微镜阵列和通过所述铰链保持在基板上的微镜板，所述微镜板设置在与所述铰链分离的平面中并且具有铰链 由过渡金属氮化物制成，然后在自发气相化学蚀刻剂中释放微反射镜。 还公开了一种投影系统，其包括这样的空间光调制器以及光源，聚光光学器件，其中来自光源的光聚焦到微镜阵列上，用于投射从微镜阵列反射的光的投影光学器件 以及用于选择性地致动阵列中的微镜的控制器。
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公开(公告)号：US06958123B2
公开(公告)日：2005-10-25
申请号：US10167272
申请日：2002-06-10
CPC分类号： B81C1/00476 , B81B2201/045 , B81C2201/0108 , B81C2201/112 , B81C2201/117 , B82Y30/00
摘要： A method comprises depositing an organic material on a substrate; depositing additional material different from the organic material after depositing the organic material; and removing the organic material with a compressed fluid. Also disclosed is a method comprising: providing an organic layer on a substrate; after providing the organic layer, providing one or more layers of a material different than the organic material of the organic layer; removing the organic layer with a compressed fluid; and providing an anti-stiction agent with a compressed fluid to material remaining after removal of the organic layer.
摘要翻译： 一种方法包括在衬底上沉积有机材料; 在沉积有机材料之后沉积与有机材料不同的附加材料; 并用压缩流体除去有机材料。 还公开了一种方法，包括：在衬底上提供有机层; 在提供有机层之后，提供与有机层的有机材料不同的一层或多层材料; 用压缩流体去除有机层; 并且在去除有机层之后向剩余的材料提供具有压缩流体的抗静电剂。
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公开(公告)号：US06950223B2
公开(公告)日：2005-09-27
申请号：US10346506
申请日：2003-01-15
CPC分类号： G02B26/0841
摘要： A MEMS device is disclosed comprising: a substrate; a movable micromechanical element movable relative to the substrate; a connector and a hinge for allowing movement of the micromechanical element, wherein the connector is made of a material different than the hinge. In another embodiment of the invention, the connector has a conductivity greater than the hinge. In a further embodiment of the invention, the hinge provides at least 90% of the restoring force to the MEMS device, and the connector provides 10% or less of the restoring force. In a further embodiment of the invention, the connector and the hinge have different spring constants. In a still further embodiment of the invention, the connector experiences a lower strain at maximum deflection of the micromechanical element than the hinge.
摘要翻译： 公开了一种MEMS器件，包括：衬底; 可移动微机械元件，其相对于所述基板移动; 用于允许微机械元件移动的连接器和铰链，其中连接器由不同于铰链的材料制成。 在本发明的另一个实施例中，连接器的导电率大于铰链。 在本发明的另一实施例中，铰链提供至少90％的恢复力到MEMS装置，并且连接器提供10％或更小的恢复力。 在本发明的另一实施例中，连接器和铰链具有不同的弹簧常数。 在本发明的另一个实施例中，连接器在微型机械元件的最大偏转方面比铰链经历较低的应变。
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10.发明授权公开(公告)号：US06949202B1
公开(公告)日：2005-09-27
申请号：US09649569
申请日：2000-08-28
CPC分类号： C23F1/08 , B81C1/00587 , B81C99/0025 , B81C2201/0138 , B82Y30/00 , H01L21/67017
摘要： Processes for the addition or removal of a layer or region from a workpiece material by contact with a process gas in the manufacture of a microstructure are enhanced by the use of recirculation of the process gas. Recirculation is effected by a pump that has no sliding or abrading parts that contact the process gas, nor any wet (such as oil) seals or purge gas in the pump. Improved processing can be achieved by a process chamber that contains a baffle, a perforated plate, or both, appropriately situated in the chamber to deflect the incoming process gas and distribute it over the workpiece surface. In certain embodiments, a diluent gas is added to the recirculation loop and continuously circulated therein, followed by the bleeding of the process gas (such as an etchant gas) into the recirculation loop. Also, cooling of the process gas, etching chamber and/or sample platen can aid the etching process. The method is particularly useful for adding to or removing material from a sample of microscopic dimensions.
摘要翻译： 通过使用工艺气体的再循环来增强在制造微结构时通过与工艺气体接触而从工件材料中添加或除去层或区域的工艺。 循环由不具有接触工艺气体的滑动或研磨部件的泵以及泵中的任何湿的（例如油）密封件或吹扫气体来实现。 改进的处理可以通过包含挡板，多孔板或两者的处理室来实现，该处理室适当地位于室中以偏转进入的工艺气体并将其分布在工件表面上。 在某些实施方案中，将稀释气体加入再循环回路并在其中连续循环，随后将工艺气体（例如蚀刻剂气体）渗入再循环回路中。 此外，工艺气体，蚀刻室和/或样品台的冷却可以帮助蚀刻工艺。 该方法对于从微观尺寸的样品中添加或除去材料特别有用。
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