Gas supply device
    5.
    发明授权
    Gas supply device 有权
    供气装置

    公开(公告)号:US09157578B2

    公开(公告)日:2015-10-13

    申请号:US13254826

    申请日:2010-02-26

    申请人: Tatsuya Hayashi

    发明人: Tatsuya Hayashi

    IPC分类号: F17C9/02 F17C13/04

    摘要: The present invention relates to a gas supply device having a compact configuration that enables prevention of vaporized gas by requisite minimum heating means from being liquefied again and an installation area to be considerably reduced. The gas supply device is provided with: a tank configured to retain material liquid; and a mass flow controller that is connected to an inside of the tank through a first valve unit, and controls a flow rate of gas resulting from vaporizing the material liquid, in which inside an outer wall of the tank, an internal flow path is formed, and the internal flow path is provided with a generated gas lead-out line provided with: a first valve flow-in flow path connecting the inside of the tank and a first inlet port; and a first valve flow-out flow path connecting a first outlet port and an introduction port of the mass flow controller.

    摘要翻译: 本发明涉及一种气体供给装置,其具有紧凑的结构,能够通过必要的最小加热装置再次液化而防止气化气体,并且安装面积显着减小。 气体供给装置设置有:保持材料液体的罐; 以及质量流量控制器,其通过第一阀单元连接到所述罐的内部,并且控制由所述液体的外壁内形成内部流路的材料液体蒸发产生的气体的流量 并且内部流路设置有产生的气体引出线,其具有:连接罐内部的第一阀流入流路和第一入口; 以及连接质量流量控制器的第一出口和引入口的第一阀流出流路。