摘要:
An electron beam type pattern transfer apparatus has a photoelectric mask and a sample in a vacuum container made of non-magnetic material. The photoelectric mask is adapted to receive an ultraviolet ray from a light source and emit photoelectrons corresponding to a predetermined transfer pattern and the sample is disposed in parallel with the photoelectric mask with a predetermined distance left therebetween and illuminated with the photoelectrons to form a resist image thereon which corresponds to the transfer pattern. A power source for applying a voltage for accelerating the photoelectrons emitted is connected between the photoelectric mask and the sample. A pair of focusing magnets are disposed around the axis of the vacuum container such that they are located one at one outer side and one in an opposite outer side of the vacuum container to permit a vertical magnetic field to be created between the photoelectric mask and the sample. The focusing magnets have superconductive coils and are driven in a persistent mode.
摘要:
The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要:
An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.
摘要:
Sub-micron pattern delineation, importantly in the fabrication of large scale integrated devices, is based on a patterned photocathode. Functionally, the photocathode plays the role of the mask in competing systems, either in proximity printing or in projection. In operation, the photocathode is illuminated by ultraviolet radiation to release electrons which are brought to focus on a resist-coated wafer with assistance of a uniform magnetic field together with an accelerating applied voltage.
摘要:
The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes, having at least one particle emitter (3) arranged in or pointing into a vacuum space (2) with at least one field emitter tip (4) for the emission of the particles, and having a magnetic field generator (6) attributed to the particle emitter (3) for focussing of the emitted particle beam (5), with the particle emitter (3) with its field emitter tip (4) is built by emitter structures (9) positioned on the surface (7) of a substrate (8) which is turned away from the magnetic field generator (6), and the substrate (8) formed as separating wall between vacuum space (2) and the atmospheric space (10) situated outside the vacuum space (2) at the side (14) of the substrate (8) which is turned away from the emitter structures (9).
摘要:
An electromagnet and related ion implanter system including active field containment are disclosed. The electromagnet provides a dipole magnetic field within a tall, large gap with minimum distortion and degradation of strength. In one embodiment, an electromagnet for modifying an ion beam includes: a ferromagnetic box structure including six sides; an opening in each of a first side and a second opposing side of the ferromagnetic box structure for passage of the ion beam therethrough; and a plurality of current-carrying wires having a path along an inner surface of the ferromagnetic box structure, the inner surface including the first side and the second opposing side and a third side and a fourth opposing side, wherein the plurality of current-carrying wires are positioned to pass around each of the openings of the first and second opposing sides.
摘要:
In an electron optical system a monopole shaped magnetic field is introduced enabling an aberration free imaging writing or detection in the system. Apparatus based on this field distribution result in improved secondary electron detection such as for chip inspection, in improved resolution in Auger electron detection for analysis, in a higher exactness in chip production in an electron beam pattern generator and in an electron beam image projector in which now also size reduction can aberration free be introduced.
摘要:
A corpuscular beam microscope for ring segment focusing is provided with aondenser and an objective magnetic lens system which is disposed substantially axially symmetrically about the microscope axis for the purpose of generating two field maxima separated by a distance not exceeding five times the arithmetic means of half the half height widths of the component magnetic fields forming the maxima. The provision of such a magnetic lens system facilitates the elimination of aperture aberrations of the first and second order and the elimination of chromatic aberrations of zero order and partly of the first order as well as certain extra-axial defects.
摘要:
The present invention relates to an orbit correction method for a charged particle beam, and aims to solve problems inherent in conventional aberration correction systems and to provide a low-cost, high-precision, high-resolution optical converging system for a charged particle beam. To this end, employed is a configuration in which a beam orbit is limited in ring zone form to form a distribution of electromagnetic field converging toward the center of a beam orbit axis. Consequently, a nonlinear action outwardly augmented, typified by spherical aberration of an electron lens, can be cancelled out. Specifically, this effect can be achieved by an electron disposed on the axis and subjected to a voltage to facilitate the occurrence of electrostatic focusing. For a magnetic field, this effect can be achieved by forming a coil radially distributed-wound on a surface equiangularly divided in the direction of rotation to control convergence of a magnetic flux density.
摘要:
The invention relates to an apparatus and a method for production of a device for thermally induced field emission of particles for particle optical devices such as in particular electron or ion microscopes,having at least one particle emitter (3) arranged in or pointing into a vacuum space (2) with at least one field emitter tip (4) for the emission of the particles,and having a magnetic field generator (6) attributed to the particle emitter (3) for focussing of the emitted particle beam (5),with the particle emitter (3) with its field emitter tip (4) is built by emitter structures (9) positioned on the surface (7) of a substrate (8) which is turned away from the magnetic field generator (6),and the substrate (8) formed as separating wall between vacuum space (2) and the atmospheric space (10) situated outside the vacuum space (2) at the side (14) of the substrate (8) which is turned away from the emitter structures (9).