PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME
    4.
    发明申请
    PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME 失效
    光敏化合物和包括其的光电组合物

    公开(公告)号:US20080305430A1

    公开(公告)日:2008-12-11

    申请号:US12134840

    申请日:2008-06-06

    摘要: Disclosed are a photo-sensitive compound and a photoresist composition containing the same, for forming ultra-fine photoresist patterns. The photo-sensitive compound is resented by following Formula 1, wherein x is an integer of 1 to 5, y is an integer of 2 to 6, R is a C2˜C20 hydrocarbon group. The photoresist composition comprises 1˜85 weight % of a photo-sensitive compound represented by following Formula 1, 1˜55 weight % of a compound which reacts with a hydroxyl group (—OH) of the compound represented by Formula 1 to combine with the photo-sensitive compound represented by Formula 1; 1˜15 weight % of a photo-acid generator; and 12˜97 weight % of an organic solvent.

    摘要翻译: 公开了用于形成超细光致抗蚀剂图案的光敏化合物和含有该光敏化合物的光致抗蚀剂组合物。 光敏化合物按下式1,其中x为1〜5的整数,y为2〜6的整数,R为C2〜C20的烃基。 光致抗蚀剂组合物包含1〜85重量%的由下式1表示的感光性化合物,1〜55重量%的与式1表示的化合物的羟基(-OH)反应的化合物,与 由式1表示的光敏化合物; 1〜15重量%的光酸发生剂; 和12〜97重量%的有机溶剂。

    Cycloaliphatic acids
    7.
    发明授权
    Cycloaliphatic acids 失效
    环磷酰胺

    公开(公告)号:US3880916A

    公开(公告)日:1975-04-29

    申请号:US35044773

    申请日:1973-04-12

    申请人: CIBA GEIGY CORP

    IPC分类号: C07C57/46 C07C63/50 C07C63/60

    CPC分类号: C07C57/46

    摘要: R1 H or alk(en)yl R2 cycloalk(en)yl or cycloalk(en)yl-alkyl R3 aliphatic, cycloaliphatic, araliphatic or aromatic radical, CF3, NO2, acyl, free or functionally converted OH, SH, carboxy or sulfo AND FUNCTIONAL ACID DERIVATIVES THEREOF, ARE ANTI-INFLAMMATORY AGENTS.

    New Alpha -aryl-cycloaliphatic acids, e.g., those of the formula

    摘要翻译: 新的α-芳基 - 脂环族酸,例如式R1 = H或烷(烯)基R2 =环烷基(烯)基或环烷基(烯)基 - 烷基R3 =脂族,脂环族,芳脂族或芳族基团,CF3 ,NO 2,酰基,游离或功能转化的OH,SH,羧基或磺基及其功能性酸衍生物,为抗炎剂。