-
公开(公告)号：US20240310744A1
公开(公告)日：2024-09-19
申请号：US18671174
申请日：2024-05-22
发明人： Chung-Hsuan LIU , Chen-Yang LIN , Ku-Hsiang SUNG , Da-Wei YU , Kuan-Wen LIN , Chia-Jen CHEN , Hsin-Chang LEE
CPC分类号： G03F7/70925 , B08B7/0035 , B08B13/00 , H01L21/02057 , H01L22/12 , H05H1/01
摘要： In a method of manufacturing a semiconductor device a semiconductor wafer is retrieved from a load port. The semiconductor wafer is transferred to a treatment device. In the treatment device, the surface of the semiconductor wafer is exposed to a directional stream of plasma wind to clean a particle from the surface of the semiconductor wafer. The stream of plasma wind is generated by an ambient plasma generator and is directed at an oblique angle with respect to a perpendicular plane to the surface of the semiconductor wafer for a predetermined plasma exposure time. After the cleaning, a photo resist layer is disposed on the semiconductor wafer.
-
公开(公告)号：US12094740B2
公开(公告)日：2024-09-17
申请号：US17212862
申请日：2021-03-25
IPC分类号： H01L21/67 , B08B3/02 , B08B5/02 , B08B13/00 , B24B37/013 , B24B37/34 , H01L21/02 , H01L21/306 , H01L21/66 , H01L21/687
CPC分类号： H01L21/67253 , B08B3/022 , B08B5/02 , B08B13/00 , B24B37/013 , B24B37/345 , H01L21/02057 , H01L21/30625 , H01L21/68707 , H01L22/12
摘要： A method and apparatus for polishing a substrate is disclosed herein. More specifically, the apparatus relates to an integrated CMP system for polishing substrates. The CMP system has a polishing station configured to polish substrates. A spin rinse dry (SRD) station configured to clean and dry the substrates. A metrology station configured to measure parameters of the substrates. A robot configured to move the substrate in to and out of the SRD station. And an effector rinse and dry (EERD) station configured to clean and dry an end effector of the robot.
-
公开(公告)号：US12077855B2
公开(公告)日：2024-09-03
申请号：US18053880
申请日：2022-11-09
IPC分类号： C23C16/44 , B08B7/00 , B08B13/00 , C23C16/455 , C23C16/458 , H01L21/02 , H01L21/687
CPC分类号： C23C16/4405 , B08B7/0035 , B08B13/00 , C23C16/45544 , C23C16/4584 , H01L21/0217 , H01L21/0228 , H01L21/68764
摘要： With respect to a cleaning method of cleaning an inside of a processing chamber in a film deposition apparatus including a rotary table rotatably provided in the processing chamber, multiple mounting areas being provided on the rotary table in a circumferential direction, the cleaning method includes (a) discharging a carrier gas and a cleaning gas with rotating the rotary table, a flow rate of the carrier gas being adjusted to a first flow rate, (b) discharging the carrier gas and the cleaning gas with rotating the rotary table, the flow rate of the carrier gas being adjusted to a second flow rate less than the first flow rate, and (c) performing switching from (a) to (b) and switching from (b) to (a) a predetermined number of times while the rotary table rotates by one revolution, the predetermined number being equal to a number of the multiple mounting areas.
-
4.发明公开公开(公告)号：US20240278317A1
公开(公告)日：2024-08-22
申请号：US18626129
申请日：2024-04-03
发明人： Bo Kyeong Han , Yong-Ho Choa , Saemee Yun , Jimin Lee , Byungkwon Jang
CPC分类号： B22F1/142 , B08B3/08 , B08B3/102 , B08B13/00 , B22F9/04 , C01G49/009 , H01F1/057 , H01F1/0573 , B22F2201/20
摘要： Provided is a cleaning device for cleaning a magnet powder including: a flask provided to contain the magnet powder and a cleaning material used to clean the magnet powder; and a vacuum manifold provided to maintain the magnet powder and the cleaning material contained in the flask in an inert state during cleaning.
Provided is a method for cleaning a magnet powder including a loading operation for loading a magnet powder, a cleaning solution, and zeolite into a flask; a gas injecting operation for injecting an inert gas into the flask; and a vacuum drying operation for drying the magnet powder and the zeolite in a vacuum.
Provided is a method for manufacturing a magnet powder including: preparing a primary mixture by mixing neodymium (III) nitrate, boric acid, and iron (III) nitrate nonahydrate; preparing an oxide by heat-treating the primary mixture; removing a residual organic material of the oxide by heat-treating the oxide; preparing a hydrogen-reduced oxide by reacting the oxide, from which the residual organic material is removed, with hydrogen by heat treatment; preparing a secondary mixture by mixing the hydrogen-reduced oxide with calcium; obtaining a product by subjecting the secondary mixture to reduction-diffusion reaction by heat treatment; and obtaining Nd2Fe14B powder by pulverizing the product.-
公开(公告)号：US12064794B2
公开(公告)日：2024-08-20
申请号：US17145165
申请日：2021-01-08
发明人： Yong Qiao , Qibin Wang , Haohua Dong
CPC分类号： B08B3/026 , B05B9/01 , B05B9/0413 , B08B13/00 , F04B17/03 , F04B53/16 , B08B2203/0223 , B08B2203/027
摘要： The present invention relates to a handheld high-pressure cleaning machine, including: a main machine housing, allowing detachable attachment of a battery pack, where the main machine housing includes a main body portion; a liquid outlet; a first handle; a motor; and a pump, where a battery pack mounting portion includes a first battery pack mounting portion and a second battery pack mounting portion, and the battery pack includes a first battery pack and a second battery pack; and the first battery pack mounting portion and the second battery pack mounting portion are respectively disposed on left and right sides of a middle plane in a manner that a distance W2 between a leftmost edge of the first battery pack mounting portion and a rightmost edge of the second battery pack mounting portion is not greater than a width W1 of the main body portion.
-
公开(公告)号：US20240254902A1
公开(公告)日：2024-08-01
申请号：US18629179
申请日：2024-04-08
申请人： LOMBARDINI S.R.L.
CPC分类号： F01M11/12 , B08B1/165 , B08B1/20 , B08B13/00 , G01F23/045
摘要： A dipstick assembly includes a first handle attached to an end of the rod, a second handle including a second handle opening configured to receive the first handle and the rod, and a cleaning pad disposed at the bottom end of the second handle. The cleaning pad is configured to receive the rod and contact the rod to clean the rod when the first handle and rod are moved vertically relative to the second handle and the cleaning pad.
-
公开(公告)号：US20240253088A1
公开(公告)日：2024-08-01
申请号：US18103976
申请日：2023-01-31
发明人： Tadashi Iriyama , Addi Rene Pump , Kerry S. Moniz
摘要： A die cavity cleaning element includes a plurality of air discharge openings spaced apart along the cleaning element. A shape of at least a portion of the cleaning element including the air discharge openings is structured to conform to a shape of a predetermined portion of a lower die cavity of a stamping die. The cleaning element is operable to direct a flow of pressurized air through each of the air discharge openings onto an associated part of the predetermined portion of a lower die cavity. Collectively, the pressurized airflows expel debris from the predetermined portion of a lower die cavity.
-
公开(公告)号：US12048952B2
公开(公告)日：2024-07-30
申请号：US17336691
申请日：2021-06-02
申请人： Terex GB Limited
发明人： Neil Rooney , Paul McWilliams , Johnston Patterson
摘要： A washing apparatus comprises a tank in which rotatable, bladed shafts are located. The tank has a closable lower outlet located at a first end of the tank, and an upper outlet located at the first end of the tank, the upper outlet being higher than the lower outlet. A further outlet is located at a second end or between the first and second ends. The tank is disposed at an inclined angle such that the first end of the tank is lower than the second end of the tank, and is movable between a first inclined state in which the inclined angle is relatively shallow, and a second inclined state in which the inclined angle is relatively steep. The apparatus is able to perform the tasks of either a log washer or coarse material washer depending on the angle of inclination.
-
公开(公告)号：US12043223B2
公开(公告)日：2024-07-23
申请号：US17279944
申请日：2019-09-25
发明人： Marcel Trebouet
CPC分类号： B60S1/566 , B08B1/165 , B08B1/30 , B08B13/00 , B60S1/3404 , B60S1/50 , B60S1/524 , G02B27/0006
摘要： The invention relates to a motor vehicle driver assistance system (100) comprising at least one detection module (101) and a cleaning device (120), the detection module (101) comprising at least one driver assistance sensor (110, 130) and at least a protective window (140) closing the detection module (101) and protecting the at least one driver assistance sensor (110, 130), the cleaning device (120) being configured to clean the protective window (140) and the cleaning device (120) comprising at least one wiper (121) in contact with the protective window (140) and able to move in a rectilinear main direction (D).
-
公开(公告)号：US20240226967A1
公开(公告)日：2024-07-11
申请号：US18400393
申请日：2023-12-29
CPC分类号： B08B3/041 , B08B13/00 , B65G54/02 , B65G2201/0297
摘要： A substrate cleaning system to remove particulates from multiple substrates includes a cleaning tank for applying a cleaning liquid to substrates, a rinse tank for applying a rinsing liquid to substrates, and a robot system. The cleaning tank includes a stationary lid, an input lid, and an output lid. The input and output lids allow a substrate carrier designed to carry an individual substrate to access an inner volume of the cleaning tank for processing. A transport system moves the substrate in the substrate carrier through the inner volume of the cleaning tank by creating a series of gaps between substrates to allow proper processing. The robot system transports substrates through the input and output lids of the cleaning tank, and transports substrates into the rinse tank.
-
-
-
-
-
-
-
-
-
搜索结果
1995 条记录 (耗时 0.029 秒)
