Test Structure and Test Method for Online Detection of Metal Via Open Circuit

    公开(公告)号:US20230069433A1

    公开(公告)日:2023-03-02

    申请号:US17861974

    申请日:2022-07-11

    IPC分类号: G01R31/265

    摘要: The present application provides a structure and method for online detection of a metal via open circuit, a contact layer is on the substrate, a first metal layer is on the contact layer, a first metal via layer is on the first metal layer, a second metal via layer is on the first metal via layer metal layer, the contact layer comprises a plurality of contacts, the plurality of contacts are connected to the first metal layer, the first metal via layer comprises a plurality of first vias, the plurality of first vias are filled with metal; detecting by means of an E-beam technology. A problem in the process can be found in advance, so as to solve the problem in time and thus stop losses as soon as possible.

    Detection Method for Sensitive Parts of Ionization Damage in Bipolar Transistor

    公开(公告)号:US20220349934A1

    公开(公告)日:2022-11-03

    申请号:US17626820

    申请日:2021-07-27

    IPC分类号: G01R31/265 G01R31/26

    摘要: The present invention provides a detection method for sensitive parts of ionization damage in a bipolar transistor, which includes the following steps: selecting an irradiation source, and carrying out irradiation test on the bipolar transistor to be tested; installing the irradiated bipolar transistor on a test bench of a deep level transient spectroscopy system, and setting test parameters; selecting at least two different bias voltages, and testing the bipolar transistor to obtain a deep level transient spectrum; determining whether a defect is an ionization defect according to a peak position of the defect signal in the deep level transient spectrum; determining the defect type as oxidation trapped charges or an interface state according to the level of the defect signal in the deep level transient spectrum; and determining the sensitive area of ionization damage in the bipolar transistor according to the determination result of the defect signal type.

    Combined transmitted and reflected light imaging of internal cracks in semiconductor devices

    公开(公告)号:US11340284B2

    公开(公告)日:2022-05-24

    申请号:US16926757

    申请日:2020-07-12

    申请人: KLA Corporation

    摘要: A first light source is directed at an outer surface of a workpiece in an inspection module. The light from the first light source that is reflected from the outer surface of the workpiece is directed to the camera via a first pathway. The light from the first light source transmitted through the workpiece is directed to the camera via a second pathway. A second light source is directed at the outer surface of the workpiece 180° from that of the first light source. The light from the second light source that is reflected from the outer surface of the workpiece is directed to the camera via the second pathway. The light from the second light source transmitted through the workpiece is directed to the camera via the first pathway.

    Device for measuring a thermal degradation of the cooling path of power electronic components using luminescence

    公开(公告)号:US11269005B2

    公开(公告)日:2022-03-08

    申请号:US16626608

    申请日:2018-05-17

    申请人: Robert Bosch GmbH

    IPC分类号: G01R31/28 G01K7/01 G01R31/265

    摘要: A device for converting electrical energy, including at least one switching-type semiconductor component, a cooling path for cooling the semiconductor component, and a device for determining a degradation of the cooling path based on a current having a predetermined current intensity that flows through the component. The device provides that the semiconductor component includes an optically active semiconductor material, which generates light having a brightness that is dependent on a temperature of the semiconductor component when the semiconductor component is traversed by current having a predetermined current intensity, and the device for determining the degradation includes a brightness sensor for recording the brightness of the generated light. The device has the advantage that the device for determining the degradation and the component are inherently galvanically isolated, and the degradation can be determined at a high resolution.

    SEMICONDUCTOR SAMPLE INSPECTION DEVICE AND INSPECTION METHOD

    公开(公告)号:US20210325435A1

    公开(公告)日:2021-10-21

    申请号:US17271042

    申请日:2019-06-05

    摘要: An inspection device includes a reference signal output section, a noise removal section, and an electrical characteristic measurement section. The reference signal output section is connected to an external power supply device in electrical parallel with a semiconductor sample, and outputs a reference signal according to the output of the external power supply device. The noise removal section outputs a noise removal signal obtained by removing a noise component of the output of the external power supply device from the current signal output from the semiconductor sample based on the reference signal. The electrical characteristic measurement section measures the electrical characteristic of the semiconductor sample based on the noise removal signal. The inspection device measures the electrical characteristic of the semiconductor sample to which a voltage is being applied by the external power supply device and which is being irradiated and scanned with light. The inspection device outputs a defective portion of the semiconductor sample based on the electrical characteristic.