公开(公告)号：WO2016134328A1

公开(公告)日：2016-08-25

申请号：PCT/US2016/018799

申请日：2016-02-19

申请人： STRESHINSKY, Matthew, Akio ,  DING, Ran ,  LIU, Yang ,  NOVACK, Ari ,  HOCHBERG, Michael, J. ,  RYLYAKOV, Alex

发明人： STRESHINSKY, Matthew, Akio ,  DING, Ran ,  LIU, Yang ,  NOVACK, Ari ,  HOCHBERG, Michael, J. ,  RYLYAKOV, Alex

IPC分类号： H04B10/04

CPC分类号： H04B10/616 ,  G02B6/2861 ,  G02B6/4213 ,  G02B6/4266 ,  G02B6/4274 ,  G02B6/4284 ,  G02B6/4292 ,  G02F1/313 ,  H04B10/2507 ,  H04B10/40 ,  H04B10/50 ,  H04B10/614 ,  H04B10/615

摘要： A skew compensation apparatus and method. In an optical system that uses optical signals, skew may be generated as the optical signals are processed from an input optical signal to at least two electrical signals representative of the phase-differentiated optical signals. A compensation of the skew is provided by including an optical delay line in the path of the optical signal that does not suffer the skew (e.g., that serves as the time base for the skew measurement). The optical delay line introduces a delay T skew equal to the delay suffered by the optical signal that is not taken as the time base. The two signals are thereby corrected for skew.

摘要翻译： 偏斜补偿装置及方法。 在使用光信号的光学系统中，当光信号从输入光信号处理成至少两个表示相位微分光信号的电信号时，可能产生偏斜。 通过在不受歪斜的光信号的路径中包括光延迟线（例如，用作歪斜测量的时基）来提供偏斜的补偿。 光延迟线引入的延迟Tskew等于不被视为时基的光信号所遭受的延迟。 因此，两个信号被纠正为偏斜。

公开(公告)号：WO2012109434A8

公开(公告)日：2012-11-01

申请号：PCT/US2012024464

申请日：2012-02-09

申请人： DIALOGIC CORP ,  WANG BEIBEI ,  ZOU DEKUN ,  DING RAN ,  LIU TAO ,  BHAGAVATHY SITARAM ,  NARVEKAR NIRANJAN ,  BLOOM JEFFREY A ,  CASH GLENN L

发明人： WANG BEIBEI ,  ZOU DEKUN ,  DING RAN ,  LIU TAO ,  BHAGAVATHY SITARAM ,  NARVEKAR NIRANJAN ,  BLOOM JEFFREY A ,  CASH GLENN L

IPC分类号： H04N7/12

CPC分类号： H04N17/004

摘要： Systems and methods of perceptual quality monitoring of video information, communications, and entertainment that can estimate the perceptual quality of video with high accuracy, and can be used to produce quality scores that better correlate with subjective quality scores of an end user. The systems and methods of perceptual quality monitoring of video can generate, from an encoded input video bitstream, estimates of one or more quality parameters relating to the video, such as the coding bit rate parameter, the video frame rate parameter, and the packet loss rate parameter, and provide these video quality parameter estimates to a predetermined video quality estimation model. Because the estimates of the video quality parameters are generated from the encoded input video bitstream as it is being received, the systems and methods are suitable for use as QoE monitoring tools.

摘要翻译： 对视频信息，通信和娱乐进行感知质量监测的系统和方法，可以高准确度地估计视频的感知质量，并可用于产生与最终用户的主观质量分数更好相关的质量分数。 视频的感知质量监测系统和方法可以从编码输入视频比特流生成与视频有关的一个或多个质量参数的估计，诸如编码比特率参数，视频帧率参数和分组丢失 速率参数，并将这些视频质量参数估计提供给预定的视频质量估计模型。 由于视频质量参数的估计是在编码输入视频比特流被接收时从其生成的，所以这些系统和方法适合用作QoE监视工具。

公开(公告)号：WO2012087613A3

公开(公告)日：2012-08-16

申请号：PCT/US2011064179

申请日：2011-12-09

申请人： APPLIED MATERIALS INC ,  RAJAGOPALAN NAGARAJAN ,  PARK JI AE ,  YAMASE RYAN ,  PATEL SHAMIK ,  NOWAK THOMAS ,  XIA LI-QUN ,  KIM BOK HOEN ,  DING RAN ,  BALDINO JIM ,  NAIK MEHUL ,  RAMASWAMI SESH

发明人： RAJAGOPALAN NAGARAJAN ,  PARK JI AE ,  YAMASE RYAN ,  PATEL SHAMIK ,  NOWAK THOMAS ,  XIA LI-QUN ,  KIM BOK HOEN ,  DING RAN ,  BALDINO JIM ,  NAIK MEHUL ,  RAMASWAMI SESH

IPC分类号： H01L21/60 ,  H01L23/045 ,  H01L23/055 ,  H01L23/48

CPC分类号： H01L24/13 ,  H01L21/02074 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02274 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/6835 ,  H01L21/68792 ,  H01L21/76829 ,  H01L21/76831 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76898 ,  H01L24/11 ,  H01L24/742 ,  H01L2221/68372 ,  H01L2221/68381 ,  H01L2224/11002 ,  H01L2224/11452 ,  H01L2224/1182 ,  H01L2224/13562 ,  H01L2224/1357 ,  H01L2224/13687 ,  H01L2224/742 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01047 ,  H01L2924/01068 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/351 ,  H01L2924/05042 ,  H01L2924/00

摘要： A through-silicon via fabrication method includes etching a plurality of through holes in a silicon plate. An oxide liner is deposited on the surface of the silicon plate and on the sidewalls and bottom wall of the through holes. A metallic conductor is then deposited in the through holes. In another version, which may be used concurrently with the oxide liner, a silicon nitride passivation layer is deposited on the exposed back surface of the silicon plate of the substrate.

摘要翻译： 硅通孔制造方法包括蚀刻硅板中的多个通孔。 氧化物衬垫沉积在硅板的表面上以及通孔的侧壁和底壁上。 然后将金属导体沉积在通孔中。 在可以与氧化物衬垫同时使用的另一种形式中，氮化硅钝化层被沉积在衬底的硅板的暴露的背表面上。

公开(公告)号：WO2011115997A3

公开(公告)日：2012-04-12

申请号：PCT/US2011028531

申请日：2011-03-15

申请人： APPLIED MATERIALS INC ,  RAJAGOPALAN NAGARAJAN ,  HAN XINHAI ,  YAMASE RYAN ,  PARK JI AE ,  PATEL SHAMIK ,  NOWAK THOMAS ,  CUI ZHENGJIANG ,  NAIK MEHUL ,  PARK HEUNG LAK ,  DING RAN ,  KIM BOK HOEN

发明人： RAJAGOPALAN NAGARAJAN ,  HAN XINHAI ,  YAMASE RYAN ,  PARK JI AE ,  PATEL SHAMIK ,  NOWAK THOMAS ,  CUI ZHENGJIANG ,  NAIK MEHUL ,  PARK HEUNG LAK ,  DING RAN ,  KIM BOK HOEN

IPC分类号： H01L21/318 ,  H01L21/60

CPC分类号： H01L21/02068 ,  C23C16/345 ,  C23C16/45523 ,  H01L21/0217 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0234 ,  H01L21/56 ,  H01L21/76832 ,  H01L21/76834 ,  H01L23/291 ,  H01L23/3171 ,  H01L24/11 ,  H01L24/13 ,  H01L24/742 ,  H01L2224/1181 ,  H01L2224/1182 ,  H01L2224/11827 ,  H01L2224/11831 ,  H01L2224/119 ,  H01L2224/11901 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/13562 ,  H01L2224/1358 ,  H01L2224/13583 ,  H01L2224/13687 ,  H01L2224/742 ,  H01L2924/0001 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/351 ,  H01L2924/05042 ,  H01L2924/00014 ,  H01L2224/13099 ,  H01L2924/00

摘要： A method of forming a passivation layer comprising silicon nitride on features of a substrate is described. In a first stage of the deposition method, a dielectric deposition gas, comprising a silicon-containing gas and a nitrogen-containing gas, is introduced into the process zone and energized to deposit a silicon nitride layer. In a second stage, a treatment gas, having a different composition than that of the dielectric deposition gas, is introduced into the process zone and energized to treat the silicon nitride layer. The first and second stages can be performed a plurality of times.

摘要翻译： 描述了在衬底的特征上形成包含氮化硅的钝化层的方法。 在沉积方法的第一阶段中，将包含含硅气体和含氮气体的介电沉积气体引入工艺区域并通电以沉积氮化硅层。 在第二阶段中，将具有与介电沉积气体成分不同的组成的处理气体引入处理区并通电以处理氮化硅层。 第一和第二阶段可以进行多次。

公开(公告)号：WO2011115997A2

公开(公告)日：2011-09-22

申请号：PCT/US2011/028531

申请日：2011-03-15

申请人： APPLIED MATERIALS, INC. ,  RAJAGOPALAN, Nagarajan ,  HAN, Xinhai ,  YAMASE, Ryan ,  PARK, Ji Ae ,  PATEL, Shamik ,  NOWAK, Thomas ,  CUI, Zhengjiang ,  NAIK, Mehul ,  PARK, Heung Lak ,  DING, Ran ,  KIM, Bok Hoen

发明人： RAJAGOPALAN, Nagarajan ,  HAN, Xinhai ,  YAMASE, Ryan ,  PARK, Ji Ae ,  PATEL, Shamik ,  NOWAK, Thomas ,  CUI, Zhengjiang ,  NAIK, Mehul ,  PARK, Heung Lak ,  DING, Ran ,  KIM, Bok Hoen

IPC分类号： H01L21/318 ,  H01L21/60

CPC分类号： H01L21/02068 ,  C23C16/345 ,  C23C16/45523 ,  H01L21/0217 ,  H01L21/02271 ,  H01L21/02274 ,  H01L21/0234 ,  H01L21/56 ,  H01L21/76832 ,  H01L21/76834 ,  H01L23/291 ,  H01L23/3171 ,  H01L24/11 ,  H01L24/13 ,  H01L24/742 ,  H01L2224/1181 ,  H01L2224/1182 ,  H01L2224/11827 ,  H01L2224/11831 ,  H01L2224/119 ,  H01L2224/11901 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/13562 ,  H01L2224/1358 ,  H01L2224/13583 ,  H01L2224/13687 ,  H01L2224/742 ,  H01L2924/0001 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01032 ,  H01L2924/01033 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/351 ,  H01L2924/05042 ,  H01L2924/00014 ,  H01L2224/13099 ,  H01L2924/00

摘要： A method of forming a passivation layer comprising silicon nitride on features of a substrate is described. In a first stage of the deposition method, a dielectric deposition gas, comprising a silicon-containing gas and a nitrogen-containing gas, is introduced into the process zone and energized to deposit a silicon nitride layer. In a second stage, a treatment gas, having a different composition than that of the dielectric deposition gas, is introduced into the process zone and energized to treat the silicon nitride layer. The first and second stages can be performed a plurality of times.

摘要翻译： 描述了在衬底的特征上形成包括氮化硅的钝化层的方法。 在沉积方法的第一阶段中，将包含含硅气体和含氮气体的介电沉积气体引入工艺区域并通电以沉积氮化硅层。 在第二阶段中，将具有不同于介电沉积气体的组成不同的处理气体引入处理区并通电以处理氮化硅层。 第一和第二阶段可以执行多次。

公开(公告)号：WO2011071847A2

公开(公告)日：2011-06-16

申请号：PCT/US2010/059178

申请日：2010-12-07

申请人： SAINT-GOBAIN PERFORMANCE PLASTICS CORPORATION ,  LI, Rongfu ,  DING, Ran ,  KWON, Oh-hun

发明人： LI, Rongfu ,  DING, Ran ,  KWON, Oh-hun

IPC分类号： C08J5/18 ,  C08L27/12 ,  C08F14/18 ,  C08K5/3492 ,  C08K5/3475

CPC分类号： B32B27/40 ,  B32B5/02 ,  B32B5/16 ,  B32B7/12 ,  B32B27/08 ,  B32B27/12 ,  B32B27/14 ,  B32B27/18 ,  B32B27/28 ,  B32B27/30 ,  B32B27/304 ,  B32B27/306 ,  B32B27/308 ,  B32B27/32 ,  B32B27/322 ,  B32B27/36 ,  B32B27/38 ,  B32B2262/02 ,  B32B2264/02 ,  B32B2274/00 ,  B32B2307/20 ,  B32B2307/308 ,  B32B2307/412 ,  B32B2307/71 ,  B32B2307/712 ,  B32B2457/00 ,  B32B2457/12 ,  B32B2457/202 ,  B32B2457/206 ,  B32B2571/00 ,  C08K5/005 ,  C08K5/3475 ,  C09D5/32 ,  C09D7/63 ,  H01L31/0481 ,  H01L31/049 ,  Y02E10/50 ,  C08L27/12

摘要： The invention describes a polymer that is composed of a fluoropolymer modified with a UV absorber. The UV absorber is grafted to the polymeric backbone of the fluoropolymer. Optionally, a HALS can also be grated to the polymeric backbone of the fluoropolymer. Incorporation or the absorber or stabilizer helps to reduce degradation of underlying layers such as an encapsulant while still allowing useful light energy to pass through the layers to a device, such as a photovoltaic device.

摘要翻译： 本发明描述了由用UV吸收剂改性的含氟聚合物组成的聚合物。 UV吸收剂被接枝到含氟聚合物的聚合物骨架上。 任选地，还可以将HALS磨碎成含氟聚合物的聚合物骨架。 掺入或吸收剂或稳定剂有助于减少诸如密封剂之类的下层的降解，同时仍允许有用的光能穿过层到达诸如光伏器件的器件。

公开(公告)号：WO2012087613A2

公开(公告)日：2012-06-28

申请号：PCT/US2011/064179

申请日：2011-12-09

申请人： APPLIED MATERIALS, INC. ,  RAJAGOPALAN, Nagarajan ,  PARK, Ji Ae ,  YAMASE, Ryan ,  PATEL, Shamik ,  NOWAK, Thomas ,  XIA, Li-Qun ,  KIM, Bok Hoen ,  DING, Ran ,  BALDINO, Jim ,  NAIK, Mehul ,  RAMASWAMI, Sesh

发明人： RAJAGOPALAN, Nagarajan ,  PARK, Ji Ae ,  YAMASE, Ryan ,  PATEL, Shamik ,  NOWAK, Thomas ,  XIA, Li-Qun ,  KIM, Bok Hoen ,  DING, Ran ,  BALDINO, Jim ,  NAIK, Mehul ,  RAMASWAMI, Sesh

IPC分类号： H01L21/60 ,  H01L23/48 ,  H01L23/045 ,  H01L23/055

CPC分类号： H01L24/13 ,  H01L21/02074 ,  H01L21/0214 ,  H01L21/02164 ,  H01L21/0217 ,  H01L21/02274 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6719 ,  H01L21/6835 ,  H01L21/68792 ,  H01L21/76829 ,  H01L21/76831 ,  H01L21/76832 ,  H01L21/76834 ,  H01L21/76898 ,  H01L24/11 ,  H01L24/742 ,  H01L2221/68372 ,  H01L2221/68381 ,  H01L2224/11002 ,  H01L2224/11452 ,  H01L2224/1182 ,  H01L2224/13562 ,  H01L2224/1357 ,  H01L2224/13687 ,  H01L2224/742 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01047 ,  H01L2924/01068 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/14 ,  H01L2924/351 ,  H01L2924/05042 ,  H01L2924/00

摘要： A through-silicon via fabrication method includes etching a plurality of through holes in a silicon plate. An oxide liner is deposited on the surface of the silicon plate and on the sidewalls and bottom wall of the through holes. A metallic conductor is then deposited in the through holes. In another version, which may be used concurrently with the oxide liner, a silicon nitride passivation layer is deposited on the exposed back surface of the silicon plate of the substrate.

摘要翻译： 一种硅通孔制造方法包括蚀刻硅板中的多个通孔。 在硅板的表面和通孔的侧壁和底壁上沉积氧化物衬垫。 然后将金属导体沉积在通孔中。 在可与氧化物衬垫同时使用的另一种方案中，氮化硅钝化层沉积在衬底的硅板的暴露后表面上。

公开(公告)号：WO2011071847A3

公开(公告)日：2011-10-20

申请号：PCT/US2010059178

申请日：2010-12-07

申请人： SAINT GOBAIN PERFORMANCE PLAST ,  LI RONGFU ,  DING RAN ,  KWON OH-HUN

发明人： LI RONGFU ,  DING RAN ,  KWON OH-HUN

IPC分类号： C08J5/18 ,  C08F14/18 ,  C08K5/3475 ,  C08K5/3492 ,  C08L27/12

CPC分类号： B32B27/40 ,  B32B5/02 ,  B32B5/16 ,  B32B7/12 ,  B32B27/08 ,  B32B27/12 ,  B32B27/14 ,  B32B27/18 ,  B32B27/28 ,  B32B27/30 ,  B32B27/304 ,  B32B27/306 ,  B32B27/308 ,  B32B27/32 ,  B32B27/322 ,  B32B27/36 ,  B32B27/38 ,  B32B2262/02 ,  B32B2264/02 ,  B32B2274/00 ,  B32B2307/20 ,  B32B2307/308 ,  B32B2307/412 ,  B32B2307/71 ,  B32B2307/712 ,  B32B2457/00 ,  B32B2457/12 ,  B32B2457/202 ,  B32B2457/206 ,  B32B2571/00 ,  C08K5/005 ,  C08K5/3475 ,  C09D5/32 ,  C09D7/63 ,  H01L31/0481 ,  H01L31/049 ,  Y02E10/50 ,  C08L27/12

摘要： The invention describes a polymer that is composed of a fluoropolymer modified with a UV absorber. The UV absorber is grafted to the polymeric backbone of the fluoropolymer. Optionally, a HALS can also be grated to the polymeric backbone of the fluoropolymer. Incorporation or the absorber or stabilizer helps to reduce degradation of underlying layers such as an encapsulant while still allowing useful light energy to pass through the layers to a device, such as a photovoltaic device.

摘要翻译： 本发明描述了由用UV吸收剂改性的含氟聚合物组成的聚合物。 UV吸收剂接枝到含氟聚合物的聚合物主链上。 任选地，HALS也可以被磨碎到含氟聚合物的聚合物主链上。 掺入或吸收剂或稳定剂有助于减少诸如密封剂之类的下层的降解，同时仍然允许有用的光能通过层到诸如光伏器件的器件。

公开(公告)号：WO2012109434A1

公开(公告)日：2012-08-16

申请号：PCT/US2012/024464

申请日：2012-02-09

申请人： DIALOGIC CORPORATION ,  DING, Ran ,  LIU, Tao ,  ZOU, Dekun ,  WANG, Beibei ,  BHAGAVATHY, Sitaram ,  NARVEKAR, Niranjan ,  BLOOM, Jeffrey, A. ,  CASH, Glenn, L.

发明人： DING, Ran ,  LIU, Tao ,  ZOU, Dekun ,  WANG, Beibei ,  BHAGAVATHY, Sitaram ,  NARVEKAR, Niranjan ,  BLOOM, Jeffrey, A. ,  CASH, Glenn, L.

IPC分类号： H04N7/12

CPC分类号： H04N17/004

摘要： Systems and methods of perceptual quality monitoring of video information, communications, and entertainment that can estimate the perceptual quality of video with high accuracy, and can be used to produce quality scores that better correlate with subjective quality scores of an end user. The systems and methods of perceptual quality monitoring of video can generate, from an encoded input video bitstream, estimates of one or more quality parameters relating to the video, such as the coding bit rate parameter, the video frame rate parameter, and the packet loss rate parameter, and provide these video quality parameter estimates to a predetermined video quality estimation model. Because the estimates of the video quality parameters are generated from the encoded input video bitstream as it is being received, the systems and methods are suitable for use as QoE monitoring tools.

摘要翻译： 视频信息，通信和娱乐的感知质量监控的系统和方法可以高精度地估计视频的感知质量，并且可以用于产生与最终用户的主观质量得分更好相关的质量分数。 视频的感知质量监视的系统和方法可以从编码的输入视频比特流中产生与视频相关的一个或多个质量参数的估计，例如编码比特率参数，视频帧速率参数和分组丢失 速率参数，并将这些视频质量参数估计提供给预定的视频质量估计模型。 因为视频质量参数的估计在编码的输入视频比特流被接收时产生，所以系统和方法适合用作QoE监视工具。