摘要:
An electronic component includes a III-N transistor and a III-N rectifying device both encased in a single package. A gate electrode of the III-N transistor is electrically connected to a first lead of the single package or to a conductive structural portion of the single package, a drain electrode of the III-N transistor is electrically connected to a second lead of the single package and to a first electrode of the III-N rectifying device, and a second electrode of the III-N rectifying device is electrically connected to a third lead of the single package.
摘要:
A wafer (W) comprises i) at least one independent die (D1, D2) having internal integrated components (IC), a multiplicity of internal pads (IP1-IP3) connected to some of the internal integrated components (IC), ii) scribe lanes (SL) defined between and around each independent die (Di), and in part of which are defined, for each die (D1, D2), at least a first group (G11, G12) of external pads (EP1-EP3) and/or a second group of external test integrated components (EC). The external pads (EP1-EP3) of each first group (G11, G12) are connected, through conductive tracks, to a chosen one of the internal pads (IP1-IP3) and/or internal integrated components (IC) of the associated die (D1, D2), and arranged to be fed with chosen test signals or to collect test result signals. Each external test integrated components of each second group is connected, through conductive tracks, to a chosen one of the die internal pads and/or die internal integrated components (IC) and/or to external pads of a first group.
摘要:
A semiconductor integrated circuit device (10) comprising an LSI function section (11), and a shield wiring layer (22) formed thereon. The LSI function section (11) comprises a semiconductor substrate (12) and a first insulation film (13) wherein a circuit element including an MOS transistor (14), for example, is formed on the semiconductor substrate (12). The shield wiring layer (22) comprises a lower shield wiring (23), a third insulation film (24), an upper shield wiring (25), and a fourth insulation film (26) formed sequentially on a second insulation film (17). Arranging directions of the lower shield wiring (23) and the upper shield wiring (25) intersect perpendicularly.
摘要:
A post-mold plated semiconductor device has an aluminum leadframe (105) with a structure including a chip mount pad and a plurality of lead segments without cantilevered lead portions. A semiconductor chip (210) is attached to the chip mount pad, and conductive connections (212) span from the chip to the aluminum of the lead segments. Polymeric encapsulation material (220), such as a molding compound, covers the chip, the connections, and portions of the aluminum lead segments without leaving cantilevered segment portions. Preferably by electroless plating, a zinc layer (301) and a nickel layer (302) are on those portions of the lead segments, which are not covered by the encapsulation material including the aluminum segment surfaces (at 203b) formed by the device singulation step, and a layer (303) of noble metal, preferably palladium, is on the nickel layer.
摘要:
An integrated circuit includes a substrate; a sealing element spanning a periphery of the substrate that forms a protective boundary for the substrate; a plurality of copper lines spanning the substrate in at least two distinct layers contained within the protective boundary; a first conducting element disposed outside the sealing element; and one or more second conducting elements connecting at least two of the copper lines and that spans the sealing element; wherein the conducting elements are substantially non-oxidizing metals that are resistant to oxidization and that connect the copper line to the first conducting element.
摘要:
A method to provide at least one protective, especially a light-shielding, layer (2) on an integrated circuit (10) applies the protective metal layer (2) as an additional layer to the integrated circuit (10) after completion of the integrated circuit manufacturing step. This allows for an at least partly shielded integrated circuit comprising a protective layer (2,4), wherein the metallic shielding layer (2) and the overlying polyimide layer (4) are patterned with a different, coarser resolution than the other IC metal interconnection layers.