복합체막, 이를 포함하는 플렉시블 기판 및 이를 채용한 유기 발광장치
    1.
    发明公开
    복합체막, 이를 포함하는 플렉시블 기판 및 이를 채용한 유기 발광장치 有权
    复合膜,柔性基材,包括复合膜和有机发光装置使用柔性基板

    公开(公告)号:KR1020110093078A

    公开(公告)日:2011-08-18

    申请号:KR1020100012895

    申请日:2010-02-11

    Inventor: 임진오 남기현

    Abstract: PURPOSE: A composite film is provided to ensure an excellent barrier property to oxygen or moisture and to improve the lifetime of a flexible substrate and an organic light-emitting device. CONSTITUTION: A composite film comprises a composite in which a sulfonic acid group-containing moiety is connected to an inorganic material having a nano-size interlayer distance through an ether bond(-O-). The sulfonic acid group-containing moiety is -(CH2)nSO3M(wherein M is Na, K, Ca, or Ba and n is the integer of 1-13) or -C(R2)(X)CF2SO3M(wherein M is Na, K, Ca, or Ba; R2 is -F, -CF3, -SF5, =SF4, -SF4Cl, -CF2CF3, or -H(CF2)4); and X is -F, -H, -Cl or -CF3.

    Abstract translation: 目的:提供复合膜,以确保对氧气或水分具有优异的阻隔性能,并提高柔性基材和有机发光装置的使用寿命。 构成:复合膜包括其中含磺酸基的部分通过醚键(-O-)与具有纳米尺寸层间距离的无机材料连接的复合体。 含有磺酸基的部分为 - (CH 2)n SO 3 M(其中M为Na,K,Ca或Ba,n为1-13的整数)或-C(R 2)(X)CF 2 SO 3 M(其中M为Na ,K,Ca或Ba; R 2是-F,-CF 3,-SF 5,= SF 4,-SF 4 Cl,-CF 2 CF 3或-H(CF 2)4); X为-F,-H,-Cl或-CF 3。

    광산발생제, 이의 제조방법 및 이를 포함하는 레지스트 조성물
    10.
    发明公开
    광산발생제, 이의 제조방법 및 이를 포함하는 레지스트 조성물 无效
    光电发生器,用于制造该光电发生器的组合物及其组合物

    公开(公告)号:KR1020110131904A

    公开(公告)日:2011-12-07

    申请号:KR1020100051591

    申请日:2010-06-01

    Abstract: PURPOSE: A photoacid generator has the slow diffusion velocity of acid generated in the photo exposure time, short diffusion distance, moderate acidity, and is provided to improve line width roughness. CONSTITUTION: A photoacid generator is in the chemical formula 1. In the chemical formula 1, Y is selected from the group consisting of C3-30 cycloalkyl group and C3-30 cycloalkenyl group. Q1 and Q2 is halogen atom respectively. X is selected from the group consisting of alkanediyl, alkanediyl, NR', S, O CO or the combination thereof. R is selected from the group consisting of hydrogen and alkyl group. n is integer of 0-5. A+ is an organic counter ion.

    Abstract translation: 目的:光致酸发生器在曝光时间内产生的酸缓慢扩散速度,扩散距离短,酸度适中,并提供线宽粗糙度。 构成:光致酸发生剂为化学式1.在化学式1中,Y选自C3-30环烷基和C3-30环烯基。 Q1和Q2分别是卤素原子。 X选自烷二基,烷二基,NR',S,OCO或其组合。 R选自氢和烷基。 n为0-5的整数。 A +是有机抗衡离子。

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