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    CMP polishing liquid and polishing method
    2.
    发明授权
    CMP polishing liquid and polishing method 有权
    CMP抛光液和抛光方法

    公开(公告)号：US08883031B2

    公开(公告)日：2014-11-11

    申请号：US13376431

    申请日：2010-08-16

    申请人： Mamiko Kanamaru ,  Tomokazu Shimada ,  Takashi Shinoda

    发明人： Mamiko Kanamaru ,  Tomokazu Shimada ,  Takashi Shinoda

    IPC分类号： B44C1/22 ,  H01L21/302 ,  C09G1/02 ,  C09K3/14 ,  H01L21/321

    CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1463 ,  C09K3/1472

    摘要： The CMP polishing liquid containing a medium and silica particles as an abrasive grain dispersed into the medium. The silica particles have a silanol group density of 5.0/nm2 or less and the biaxial average primary particle diameter when arbitrary 20 silica particles are selected from an image obtained by scanning electron microscope observation is 25 to 55 nm. The association degree of the silica particles is 1.1 or more. The CMP polishing liquid has the high barrier film polishing speed, the favorable abrasive grain dispersion stability, and the high interlayer dielectric polishing speed. The CMP polishing liquid can provide a method of producing semiconductor substrates or the like, that have excellent microfabrication, thin film formation, dimension accuracy, electric property and high reliability with low cost.

    摘要翻译： 含有介质的CMP抛光液和分散在介质中的磨粒的二氧化硅颗粒。 二氧化硅粒子的硅烷醇基密度为5.0nm / nm 2以下，当通过扫描电子显微镜观察得到的图像中任意选择20个二氧化硅粒子时的双轴平均一次粒径为25〜55nm。 二氧化硅粒子的结合度为1.1以上。 CMP抛光液具有高阻隔膜抛光速度，良好的磨料颗粒分散稳定性和高层间电介质抛光速度。 CMP抛光液可以提供具有优异的微细加工，薄膜形成，尺寸精度，电性能和高可靠性的低成本的半导体衬底等的制造方法。

    Polishing solution for copper polishing, and polishing method using same
    3.
    发明授权
    Polishing solution for copper polishing, and polishing method using same 有权
    抛光抛光溶液，抛光方法使用相同

    公开(公告)号：US08877644B2

    公开(公告)日：2014-11-04

    申请号：US13639512

    申请日：2011-06-06

    申请人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

    发明人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

    IPC分类号： H01L21/302

    CPC分类号： C09K3/1463 ,  B24B37/044 ,  C09G1/02 ,  H01L21/3212 ,  H01L21/7684 ,  H01L21/76898

    摘要： The polishing solution for copper polishing of the invention comprises a first organic acid component which is at least one type selected from among an organic acid containing a hydroxyl group, an organic acid salt and an organic acid anhydride, an inorganic acid component which is at least one type selected from among a dibasic or greater inorganic acid and an inorganic acid salt, an amino acid, a protective film-forming agent, an abrasive grain, an oxidizing agent and water, wherein the inorganic acid component content in terms of inorganic acid is 0.15 mass % or greater, the amino acid content is 0.30 mass % or greater, the protective film-forming agent content is 0.10 mass % or greater, based on the entire polishing solution for copper polishing, and the ratio of the first organic acid component content in terms of organic acid with respect to the protective film-forming agent content is at least 1.5.

    摘要翻译： 本发明的铜研磨用抛光液包含：含有羟基的有机酸，有机酸盐和有机酸酐中的至少一种以上的第一有机酸成分，至少为无机酸成分 一种选自二价以上的无机酸和无机酸盐，氨基酸，保护膜形成剂，磨粒，氧化剂和水，其中无机酸成分的无机酸含量为 0.15质量％以上，氨基酸含量为0.30质量％以上，保护膜形成剂含量为0.10质量％以上，基于用于铜研磨的全部研磨液，第一有机酸成分 有机酸相对于保护膜形成剂含量的含量为至少1.5。

    POLISHING AGENT FOR COPPER POLISHING AND POLISHING METHOD USING SAME
    5.
    发明申请
    POLISHING AGENT FOR COPPER POLISHING AND POLISHING METHOD USING SAME 有权
    用于铜抛光和抛光方法的抛光剂

    公开(公告)号：US20120024818A1

    公开(公告)日：2012-02-02

    申请号：US13201529

    申请日：2010-02-12

    申请人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

    发明人： Hiroshi Ono ,  Takashi Shinoda ,  Yuuhei Okada

    IPC分类号： C23F3/00 ,  C09K13/06

    CPC分类号： H01L21/3212 ,  B24B37/044 ,  C09G1/02 ,  C09K3/1463 ,  H01L21/7684 ,  H01L21/76898

    摘要： A polishing agent for copper polishing, comprising (A) an inorganic acid with divalent or greater valence, (B) an amino acid, (C) a protective film-forming agent, (D) an abrasive, (E) an oxidizing agent and (F) water, wherein the content of the component (A) is at least 0.08 mol/kg, the content of the component (B) is at least 0.20 mol/kg, the content of the component (C) is at least 0.02 mol/kg, and either or both of the following conditions (i) and (ii) are satisfied. (i): The proportion of the content of the component (A) with respect to the content of the component (C) is 2.00 or greater. (ii): It further comprises (G) at least one kind selected from among organic acids and their acid anhydrides.

    摘要翻译： 一种用于铜抛光的抛光剂，包括（A）二价或更高价的无机酸，（B）氨基酸，（C）保护性成膜剂，（D）研磨剂，（E）氧化剂和 （F）水，其中组分（A）的含量为至少0.08mol / kg，组分（B）的含量至少为0.20mol / kg，组分（C）的含量至少为0.02 mol / kg，满足以下条件（i）和（ii）中的任一个或两者。 （i）：成分（A）的含量相对于成分（C）的含量的比例为2.00以上。 （ii）：其还包含（G）选自有机酸及其酸酐中的至少一种。

    Server including an encoded data converter apparatus
    7.
    发明申请
    Server including an encoded data converter apparatus 审中-公开
    服务器包括编码数据转换装置

    公开(公告)号：US20050080659A1

    公开(公告)日：2005-04-14

    申请号：US10951597

    申请日：2004-09-29

    申请人： Shun Takeda ,  Takashi Shinoda ,  Takashi Kai

    发明人： Shun Takeda ,  Takashi Shinoda ,  Takashi Kai

    IPC分类号： G06Q10/00 ,  G06F15/00 ,  G06F21/00 ,  G06Q50/00 ,  G06Q50/26 ,  H04L9/14 ,  G06F17/60

    CPC分类号： G06F21/606 ,  G06F21/6245 ,  G06Q10/0637 ,  G06Q10/10

    摘要： An electronic application system comprises a local-government-shared server, a plurality of resident terminals and a plurality of local-government terminals. The local-government-shared server includes a first network connection unit, an encoded data converter apparatus, a reference table generation unit, a reference table storage unit, an encoded data storage unit, a second network connection unit, a reference table search unit and a data access control unit. The encoded data converter apparatus converts encoded data (generated by encoding application data to be transmitted from a resident terminal to a local-government terminal) of an external protocol into encoded data of an internal protocol while securing the confidentiality of plain text data which is obtained when the encoded data is temporarily decoded. For each application data, the encoded data converter apparatus generates a reference record so that the record can be referred to before the local-government terminal obtains the application data.

    摘要翻译： 电子应用系统包括地方政府共享服务器，多个驻地终端和多个地方政府终端。 本地政府共享服务器包括第一网络连接单元，编码数据转换装置，参考表生成单元，参考表存储单元，编码数据存储单元，第二网络连接单元，参考表搜索单元和 数据访问控制单元。 编码数据转换装置将得到的外部协议的编码数据（通过编码将从常驻终端发送到本地政府终端的应用数据进行编码）转换为内部协议的编码数据，同时确保获得的明文数据的机密性 当编码数据被临时解码时。 对于每个应用数据，编码数据转换器装置生成参考记录，使得可以在本地政府终端获得应用数据之前参考该记录。

    Exchange servicing development support system with a function of automatic replacement of edited contents
    8.
    发明授权
    Exchange servicing development support system with a function of automatic replacement of edited contents 失效
    交换服务开发支持系统具有自动替换编辑内容的功能

    公开(公告)号：US06631376B1

    公开(公告)日：2003-10-07

    申请号：US09471197

    申请日：1999-12-23

    申请人： Hirohisa Yamamoto ,  Takashi Shinoda

    发明人： Hirohisa Yamamoto ,  Takashi Shinoda

    IPC分类号： G06F1730

    CPC分类号： G06F8/10 ,  Y10S707/99933 ,  Y10S707/99945

    摘要： An exchange servicing development support system automatically replaces definition contents and creates generation codes to new specifications, even if interfacing is changed, by reading servicing definition result files stored in accordance with old specifications. By providing a unit for re-constructing service tree structure data in a format in accordance with information about compatibility description in a menu describing file, the service tree structure data is automatically created. Since information about compatibility is allocated to the menu describing a file stored in the storage device, each unit in the data processing device is adapted to be used for a general purpose. The description of replacement of various patterns can be made by descriptions of information about compatibility in the menu describing file.

    摘要翻译： 交换服务开发支持系统通过读取根据旧规范存储的服务定义结果文件，自动替换定义内容并将生成代码创建为新规范，即使接口更改。 通过提供用于根据关于菜单描述文件中的兼容性描述的信息的格式重新构建服务树结构数据的单元，自动创建服务树结构数据。 由于关于兼容性的信息被分配给描述存储在存储设备中的文件的菜单，所以数据处理设备中的每个单元适于用于通用目的。 可以通过描述关于菜单描述文件中的兼容性的信息来进行各种模式的替换的描述。

    Memory including address registers
    10.
    发明授权
    Memory including address registers 失效
    存储器包括地址寄存器

    公开(公告)号：US4912679A

    公开(公告)日：1990-03-27

    申请号：US144066

    申请日：1988-01-15

    申请人： Takashi Shinoda ,  Masamichi Ishihara

    发明人： Takashi Shinoda ,  Masamichi Ishihara

    IPC分类号： G11C11/41 ,  G11C8/06

    CPC分类号： G11C8/06

    摘要： A microprocessor or the like supplies a plurality of address signals for memory access according to its own operation speed irrespective of the operation speed of a memory. A plurality of registers receives and stores the plurality of address signals which are inputted in an asynchronous state. The memory access is performed according to a sequence signals of the address signals stored in the plurality of registers.

    摘要翻译： 无论存储器的操作速度如何，微处理器等都根据其自身的操作速度提供用于存储器访问的多个地址信号。 多个寄存器接收并存储以异步状态输入的多个地址信号。 存储器访问根据存储在多个寄存器中的地址信号的序列信号进行。