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公开(公告)号：US11050213B2
公开(公告)日：2021-06-29
申请号：US16910846
申请日：2020-06-24
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
IPC: G03F7/20 , H01S3/13 , H01S3/036 , H01S3/23 , H01S3/097 , H01S3/038 , H01S3/137 , G01J1/02 , H01S3/225 , H01S3/1055 , G01J1/42
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US09933709B2
公开(公告)日：2018-04-03
申请号：US15507237
申请日：2015-08-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Arij Jonathan Rijke , Wilhelmus Patrick Elisabeth Maria Op 'T Root
IPC: G03F7/20
CPC classification number: G03F7/70558 , G03F7/20 , G03F7/70008 , G03F7/70058 , G03F7/70358 , G03F7/709
Abstract: A lithographic apparatus including: a radiation system; a frame; a substrate table for holding a substrate; and a scanning mechanism. The radiation system is operable to produce a radiation beam. The substrate table is moveably mounted to the frame and arranged such that a target portion of the substrate is arranged to receive the radiation beam. The scanning mechanism is operable to move the substrate table relative to the frame so that different portions of the substrate may receive the radiation beam. A mechanism is operable to determine a quantity indicative of a velocity of the radiation system relative to the frame. An adjustment mechanism is operable to control a power or irradiance of the radiation beam so as to reduce a variation in a dose of radiation received by the substrate as a result of relative motion of the radiation system and the frame.
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公开(公告)号：US10082424B2
公开(公告)日：2018-09-25
申请号：US15308670
申请日：2015-04-21
Applicant: ASML Netherlands B.V.
Inventor： Herman Philip Godfried
CPC classification number: G01J1/58 , G01J1/4257 , G01J1/429 , G03F7/70558 , G03F7/70616 , G03F7/7085
Abstract: A lithographic apparatus including a monitoring apparatus and an associated monitoring apparatus. The monitoring apparatus is configured for monitoring first radiation of a first wavelength. The monitoring apparatus has a first sensor apparatus including a diamond fluorescent material configured to absorb the first radiation and to emit second radiation being representative of the first radiation, the second radiation being of a second wavelength; and a second sensor apparatus configured to sense the second radiation.
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4.发明授权公开(公告)号：US09645510B2
公开(公告)日：2017-05-09
申请号：US14787738
申请日：2014-04-16
Applicant: ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Adrianus Leonardus Gertrudus Bommer , Robert De Jong , Frank Everts , Herman Philip Godfried , Roland Pieter Stolk , Paul Van Der Veen
IPC: G03B27/42 , G03F7/20 , H01S3/104 , H01S3/0975 , H01S3/225
CPC classification number: G03F7/70558 , G03F7/70025 , G03F7/70516 , H01S3/0975 , H01S3/104 , H01S3/225
Abstract: A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria.
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公开(公告)号：US09599510B2
公开(公告)日：2017-03-21
申请号：US14488684
申请日：2014-09-17
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Thomas P. Duffey , Herman Philip Godfried
IPC: G03B27/32 , G03B27/54 , G03B27/74 , H01S3/10 , H01S3/13 , G01J3/28 , G03F7/20 , G01J11/00 , G01J9/00 , G01J3/14 , G01J3/26 , G01J3/02
CPC classification number: G01J3/28 , G01J3/027 , G01J3/14 , G01J3/26 , G01J9/00 , G01J11/00 , G01J2003/2853 , G03F7/70041 , G03F7/70058 , G03F7/70575
Abstract: A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.
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Patent Agency Ranking
公开(公告)号：US20150355025A1
公开(公告)日：2015-12-10
申请号：US14488684
申请日：2014-09-17
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Thomas P. Duffey , Herman Philip Godfried
CPC classification number: G01J3/28 , G01J3/027 , G01J3/14 , G01J3/26 , G01J9/00 , G01J11/00 , G01J2003/2853 , G03F7/70041 , G03F7/70058 , G03F7/70575
Abstract: A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum.
Abstract translation: 描述了一种用于估计由光源产生并指向光刻设备的晶片的脉冲光束的光谱特征的方法。 该方法包括接收光束脉冲的一组N个光谱; 将接收到的N光谱保存到保存的集合; 转换保存集中的光谱，形成一组变换光谱; 对变换的光谱进行平均以形成平均光谱; 以及基于所述平均光谱估计所述脉冲光束的光谱特征。
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公开(公告)号：US20200321746A1
公开(公告)日：2020-10-08
申请号：US16910846
申请日：2020-06-24
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Joshua Jon Thornes , Tanuj Aggarwal , Kevin Michael O'Brien , Frank Everts , Herman Philip Godfried , Russell Allen Burdt
Abstract: Online calibration of laser performance as a function of the repetition rate at which the laser is operated is disclosed. The calibration can be periodic and carried out during a scheduled during a non-exposure period. Various criteria can be used to automatically select the repetition rates that result in reliable in-spec performance. The reliable values of repetition rates are then made available to the scanner as allowed values and the laser/scanner system is then permitted to use those allowed repetition rates.
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公开(公告)号：US20190324286A1
公开(公告)日：2019-10-24
申请号：US16503073
申请日：2019-07-03
Applicant: Cymer, LLC , ASML Netherlands B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria op 't Root , Thomas Patrick Duffey , Herman Philip Godfried , Frank Everts , Joshua Jon Thornes , Brian Edward King
IPC: G02B27/48 , G01J3/02 , H01S3/225 , H01S3/00 , G03F7/20 , H01S4/00 , G01J11/00 , G01J9/02 , G01J3/26 , G02F1/01
Abstract: A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.
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公开(公告)号：US10146133B2
公开(公告)日：2018-12-04
申请号：US15743273
申请日：2016-06-03
Applicant: ASML NETHERLANDS B.V.
Inventor： Wilhelmus Patrick Elisabeth Maria Op 'T Root , Herman Philip Godfried , Hubertus Petrus Leonardus Henrica Van Bussel , Arij Jonathan Rijke , Marc Wilhelmus Maria Van Der Wijst , Mathijs Leonardus Johan Verhees
IPC: G03F7/20
Abstract: A technique involving projecting a pulsed radiation beam using an illumination system onto a region of a plane in a reference frame; using a scanning mechanism to move a calibration sensor relative to the reference frame such that the calibration sensor moves through the beam of radiation in the plane along a scan trajectory; determining a quantity indicative of a velocity of the illumination system relative to the reference frame; and determining information related to a spatial intensity distribution of the radiation beam in the plane in dependence on: (a) an output of the calibration sensor; (b) the scan trajectory of the calibration sensor; and (c) the quantity indicative of a velocity of the illumination system relative to the reference frame.
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公开(公告)号：US11774867B2
公开(公告)日：2023-10-03
申请号：US17433494
申请日：2020-01-27
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/7085 , G01J3/45 , G03F7/70558 , G03F7/70575 , G03F7/7085 , G01J3/45
Abstract: A radiation measurement system (200) comprising an optical apparatus (205) configured to receive a radiation beam (210) and change an intensity distribution of the radiation beam to output a conditioned radiation beam (215), and a spectrometer (220) operable to receive the conditioned radiation beam and determine spectral content of the conditioned radiation beam. The radiation measurement system may form part of a lithographic apparatus.
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