Lithographic apparatus and method for calibrating the same
    1.
    发明申请
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号:US20060023194A1

    公开(公告)日:2006-02-02

    申请号:US10899295

    申请日:2004-07-27

    IPC分类号: G03B27/58

    摘要: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

    摘要翻译: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向,每个位置检测器包括一维或多维类型的光学编码器,光学编码器被布置为一起提供至少6个位置值,为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置,并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外,描述了用于校准位置检测器的方法。

    Lithographic apparatus and method for calibrating the same
    2.
    发明申请
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号:US20080074681A1

    公开(公告)日:2008-03-27

    申请号:US11902786

    申请日:2007-09-25

    IPC分类号: G01B11/14 G01B11/00

    摘要: A measurement system configured to measure a position of an object in a lithographic apparatus, includes at least three position detectors configured to detect the position of the object, the at least three position detectors each including a single or multi-dimensional optical encoder to provide at least six position values, the optical encoders being coupled to the object at different locations within a three dimensional coordinate system, wherein at least one position value is provided for each dimension of the three dimensional coordinate system, and wherein the measurement system is configured to calculate the position of the object within the three dimensional coordinate system from a subset of at least three of the six position values and to calculate an orientation of the object with respect to the three dimensional coordinate system from another subset of at least three of the six position values.

    摘要翻译: 被配置为测量光刻设备中的物体的位置的测量系统包括配置成检测物体的位置的至少三个位置检测器,所述至少三个位置检测器包括单个或多维光学编码器以提供在 至少六个位置值,所述光学编码器在三维坐标系内的不同位置处耦合到所述对象,其中为所述三维坐标系的每个维度提供至少一个位置值,并且其中所述测量系统被配置为计算 从六个位置值中的至少三个的子集的三维坐标系中的对象的位置,并且从六个位置中的至少三个的另一子集计算相对于三维坐标系的对象的取向 价值观。

    Lithographic apparatus and method for calibrating the same
    3.
    发明申请
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号:US20070256471A1

    公开(公告)日:2007-11-08

    申请号:US11822633

    申请日:2007-07-09

    IPC分类号: G01B21/00 G01P21/00

    摘要: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

    摘要翻译: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向,每个位置检测器包括一维或多维类型的光学编码器,光学编码器被布置为一起提供至少6个位置值,为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置,并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外,描述了用于校准位置检测器的方法。

    Lithographic apparatus and method for calibrating the same
    4.
    发明申请
    Lithographic apparatus and method for calibrating the same 有权
    平版印刷设备及其校准方法

    公开(公告)号:US20060023178A1

    公开(公告)日:2006-02-02

    申请号:US11179665

    申请日:2005-07-13

    IPC分类号: G03B27/42

    摘要: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. Some of the optical encoders may be connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is presented.

    摘要翻译: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向,每个位置检测器包括一维或多维类型的光学编码器,光学编码器被布置为一起提供至少6个位置值,为每个位置值提供至少一个位置值 的三维。 一些光学编码器可以在三维坐标系中的不同位置处连接到基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置,并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外,提出了一种用于校准位置检测器的方法。

    Lithographic apparatus and device manufacturing method
    6.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20070263201A1

    公开(公告)日:2007-11-15

    申请号:US11433767

    申请日:2006-05-15

    IPC分类号: G03B27/58

    摘要: An article support constructed to support an article for lithographic processing purposes is disclosed. The article support includes a channel configuration arranged to guide thermally stabilizing media in the article support to provide thermal stabilization to the article, wherein the channel configuration comprises an input channel structure and an output channel structure, the input and output channel structures arranged in a nested configuration and connected to each other by a fine grid structure provided at or near a surface of the article support. A lithographic apparatus and device manufacturing incorporating the article support is also disclosed.

    摘要翻译: 公开了一种用于支撑用于光刻处理目的的物品的物品支撑。 物品支撑件包括布置成引导物品支撑件中的热稳定剂介质以向物品提供热稳定性的通道配置,其中通道配置包括输入通道结构和输出通道结构,输入和输出通道结构布置成嵌套 配置并且通过设置在物品支撑件的表面处或附近的细格栅结构彼此连接。 还公开了并入物品支撑件的光刻设备和设备制造。

    Optical element for correction of aberration, and a lithographic apparatus comprising same
    7.
    发明申请
    Optical element for correction of aberration, and a lithographic apparatus comprising same 有权
    用于校正像差的光学元件,以及包括其的光刻设备

    公开(公告)号:US20070247605A1

    公开(公告)日:2007-10-25

    申请号:US11410282

    申请日:2006-04-25

    IPC分类号: G03B27/52

    摘要: An optical element for correcting aberrations in an optical apparatus has a casing. The casing is filled with liquid and has a support layer and a cover layer designed to pass light of a predetermined wavelength range. The casing accommodates several actuators. Each actuator has a first end supporting the cover layer and a second end supporting the support layer. Each actuator is able to locally change a local distance between the support layer and the cover layer to correct for local aberrations in a light beam directed to the optical element by providing local phase shifts. The optical element may be used in a lithographic apparatus.

    摘要翻译: 用于校正光学装置中的像差的光学元件具有壳体。 壳体充满液体并具有支撑层和设计成使预定波长范围的光通过的覆盖层。 外壳容纳几个执行器。 每个致动器具有支撑覆盖层的第一端和支撑支撑层的第二端。 每个致动器能够局部地改变支撑层和覆盖层之间的局部距离,以通过提供局部相移来校正指向光学元件的光束中的局部像差。 光学元件可以用在光刻设备中。

    Lithographic apparatus and device manufacturing method
    8.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20070216881A1

    公开(公告)日:2007-09-20

    申请号:US11377636

    申请日:2006-03-17

    IPC分类号: G03B27/42

    摘要: A moveable member is provided which extends the top surface of a substrate table, in plan, beyond a bumper which protects the substrate table during collision. The moveable member may be retracted to a retracted position in which it no longer extends beyond the bumper. In this way it is possible to move two substrate tables together and to allow the retractable member to pass under a liquid supply system which normally provides liquid between the projection system and a substrate without turning off of the liquid supply system.

    摘要翻译: 提供了可移动构件,其以平面方式延伸衬底台的顶表面超过在碰撞期间保护衬底台的保险杠。 可移动构件可以缩回到缩回位置,在缩回位置,其不再延伸超过保险杠。 以这种方式,可以将两个基板台移动到一起,并允许可伸缩构件在液体供应系统之下通过,该液体供应系统通常在投影系统和基板之间提供液体而不关闭液体供应系统。