公开(公告)号：US20150197663A1

公开(公告)日：2015-07-16

申请号：US14669327

申请日：2015-03-26

Applicant: FUJIFILM Corporation

Inventor： Kazuyoshi MIZUTANI ,  Tsukasa YAMANAKA

IPC: C09D153/00 ,  B05D3/02 ,  B05D3/10 ,  B05D1/00

CPC classification number: C09D153/00 ,  B05D1/005 ,  B05D3/0254 ,  B05D3/107 ,  B82Y40/00 ,  C08F293/00 ,  C08L53/00 ,  G03F7/0002 ,  Y10T428/24479

Abstract: There is provided a pattern forming method through self-organization of a block copolymer, containing an annealing step after application of a self-organizing composition for forming pattern that contains a block copolymer containing a block having a repeating unit represented by the specific general formula, and contains an organic solvent, to a substrate, and wherein after a microphase-separated structure is formed in the annealing step, one domain thereof is selectively removed to form a pattern.

Abstract translation: 通过嵌段共聚物的自组织提供图形形成方法，该嵌段共聚物在施加含有含有具有由具体通式表示的重复单元的嵌段的嵌段共聚物的形成图案的自组织组合物之后的退火步骤， 并含有有机溶剂，并且其中在退火步骤中形成微相分离结构之后，选择性地除去其一个区域以形成图案。

公开(公告)号：US20170184973A1

公开(公告)日：2017-06-29

申请号：US15458432

申请日：2017-03-14

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA

IPC: G03F7/32 ,  G03F7/004 ,  G03F7/09 ,  G03F7/16 ,  B65D85/00 ,  G03F7/38 ,  H01L21/027 ,  C07C69/14 ,  C07C67/54 ,  B65D25/34 ,  G03F7/40 ,  G03F7/20

CPC classification number: G03F7/325 ,  B65D25/34 ,  B65D85/70 ,  C07C67/54 ,  C07C69/14 ,  G03F7/0012 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/11 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/38 ,  G03F7/40 ,  H01L21/0275 ,  H01L21/0276

Abstract: An organic treatment liquid for patterning a resist film, in which a metal element concentration of each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni, and Zn is 3 ppm or less and which can reduce generation of particles, in a negative tone pattern forming method for forming a miniaturized (for example, 30 nm node or less) pattern by particularly using an organic developer, a method of producing the organic treatment liquid for patterning a resist film, a storage container of the organic treatment liquid for patterning a resist film, a pattern forming method using the same, and a method of producing an electronic device can be provided.

公开(公告)号：US20150227049A1

公开(公告)日：2015-08-13

申请号：US14697942

申请日：2015-04-28

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Takashi KAWAMOTO

IPC: G03F7/32 ,  B65D25/14 ,  B65D85/00 ,  G03F7/20

Abstract: According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.

Abstract translation: 根据本发明的示例性实施方案，提供了一种用于构图化学放大抗蚀剂膜的有机处理溶液，含有1ppm或更少的碳数为22以下的具有金属元素的烷基烯烃的有机处理溶液 Na，K，Ca，Fe，Cu，Mg，Mn，Li，Al，Cr，Ni和Zn中的每一种的浓度为5ppm以下，图案形成方法，电子器件制造方法和电子器件使用 相同。

公开(公告)号：US20150160555A1

公开(公告)日：2015-06-11

申请号：US14606189

申请日：2015-01-27

Applicant: FUJIFILM Corporation

Inventor： Shinichi SUGIYAMA ,  Tsukasa YAMANAKA ,  Ryosuke UEBA ,  Makoto MOMOTA

IPC: G03F7/16 ,  G03F7/30

CPC classification number: G03F7/167 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.

Abstract translation: 本发明的图案形成方法包括：（i）使用光化射线敏感性或辐射敏感性树脂组合物在基材上形成第一膜的步骤，所述光敏感或辐射敏感性树脂组合物包含能够通过酸的作用而提高极性的树脂（A） 以降低在包含有机溶剂的显影剂中的溶解度; （ii）暴露第一膜的步骤; （iii）使用包含有机溶剂的显影剂显影所述曝光的第一膜以形成负色调图案的步骤; 以及（iv）在第二基板上形成第二膜以覆盖负色调图案的周边的步骤。

公开(公告)号：US20190011827A1

公开(公告)日：2019-01-10

申请号：US16129826

申请日：2018-09-13

Applicant: FUJIFILM Corporation

Inventor： Tetsuya SHIMIZU ,  Tsukasa YAMANAKA ,  Yukihisa KAWADA

IPC: G03F1/00 ,  G03F1/86 ,  G03F7/32 ,  G03F7/38 ,  H01J49/10

Abstract: In a method of manufacturing a chemical fluid for manufacturing an electronic material, a method of reducing particulate metal in the chemical fluid is selected according to a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by SP ICP-MS in the chemical fluid, and at least one of the concentration of particulate metal including an iron atom, the concentration of particulate metal including a copper atom, or the concentration of particulate metal including a zinc atom is reduced by using the selected reducing method.

公开(公告)号：US20160342083A1

公开(公告)日：2016-11-24

申请号：US15229247

申请日：2016-08-05

Applicant: FUJIFILM Corporation

Inventor： Ryosuke UEBA ,  Naoya IGUCHI ,  Tsukasa YAMANAKA ,  Naohiro TANGO ,  Michihiro SHIRAKAWA ,  Keita KATO

IPC: G03F7/00 ,  H01L21/027 ,  G03F7/40 ,  H01L21/311 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0035 ,  G03F7/0397 ,  G03F7/2053 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0271 ,  H01L21/31144

Abstract: A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.

Abstract translation: 图案形成方法包括通过使用光化射线敏感性或辐射敏感性树脂组合物在基板上形成第一膜的步骤（i-1）来在基板上形成第一负型图案的步骤（i），步骤 i-2），使第一膜和第（i-3）步曝光; 使用光化射线敏感或辐射敏感性树脂组合物（2）至少在第一负型图案上形成第二膜的步骤（iii）。 步骤（v）使第二膜曝光; 以及步骤（vi），使至少在第一负型图案上显影出曝光的第二膜并形成第二负型图案。

公开(公告)号：US20160033870A1

公开(公告)日：2016-02-04

申请号：US14884345

申请日：2015-10-15

Applicant: FUJIFILM CORPORATION

Inventor： Takashi NAKAMURA ,  Tsukasa YAMANAKA

IPC: G03F7/38 ,  G03F7/20 ,  G03F7/32 ,  G03F7/16

CPC classification number: G03F7/38 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/325

Abstract: A pattern formation method which includes a process of forming an actinic ray sensitive or radiation sensitive film by coating a substrate with an actinic ray sensitive or radiation sensitive resin composition which contains a resin where the degree of solubility with respect to a developer which includes one or more types of organic solvents decreases due to an effect of an acid, a compound which generates an acid by irradiation with actinic rays or radiation, and a solvent, a process of exposing the actinic ray sensitive or radiation sensitive film via an immersion liquid, a process of heating the actinic ray sensitive or radiation sensitive film, and a process of developing the actinic ray sensitive or radiation sensitive film using the developer which includes an organic solvent in this order, in which a process of cleaning the actinic ray sensitive or radiation sensitive film is included after the film forming process and before the exposing process and/or after the exposing process and before the heating process.

Abstract translation: 一种图形形成方法，其包括通过用包含树脂的光化射线敏感或辐射敏感性树脂组合物涂布基材来形成光化射线敏感或辐射敏感膜的方法，其中相对于显影剂的溶解度包括一种或 更多类型的有机溶剂由于酸，通过用光化射线或辐射照射而产生酸的化合物和溶剂的作用而降低，溶剂，通过浸渍液曝露光化学敏感或辐射敏感膜的方法， 加热光化射线敏感或辐射敏感膜的方法，以及使用包括有机溶剂的显影剂依次显影光化射线敏感或辐射敏感膜的过程，其中清洁光化学射线敏感或辐射敏感膜的过程 在成膜过程之后和曝光过程之前和/或曝光过程之后包括胶片 ss和加热过程之前。

公开(公告)号：US20160026088A1

公开(公告)日：2016-01-28

申请号：US14872726

申请日：2015-10-01

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Takashi KAWAMOTO ,  Naoya IGUCHI

IPC: G03F7/32 ,  C07C29/76 ,  C07C45/78 ,  C07C67/48

CPC classification number: G03F7/32 ,  C07C29/76 ,  C07C45/786 ,  C07C67/48 ,  C07C67/56 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/325 ,  C07C69/24 ,  C07C31/125 ,  C07C49/04

Abstract: There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI−To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.

Abstract translation: 公开了一种制造用于图案化化学放大型抗蚀剂膜的有机处理流体的方法，包括使含有有机溶剂的流体通过具有流体输入部分的过滤装置，流体输出部分和 设置在将流体输入部和流体输出部彼此连接的流路中的过滤膜，其中流体中的流体的温度（TI）之间的差的绝对值（| TI-To |） 流体输出部的流体的输入部和温度（To）为3℃以下，过滤装置的流体的过滤速度为0.5L / min / m 2以上，过滤压力 过滤装置中的流体为0.10MPa以下。

公开(公告)号：US20220317563A1

公开(公告)日：2022-10-06

申请号：US17839432

申请日：2022-06-13

Applicant: FUJIFILM Corporation

Inventor： Tetsuya SHIMIZU ,  Tsukasa YAMANAKA ,  Yukihisa KAWADA

IPC: G03F1/68 ,  G03F7/40 ,  G03F7/32 ,  G03F7/11 ,  G03F7/039 ,  G03F7/16 ,  G03F7/00 ,  G03F1/86 ,  G03F7/38 ,  H01J49/10

Abstract: A container for storing a chemical fluid for manufacturing an electronic material, in which after an inspection solution charges the container and stored at 25° C. for 30 days, a sum of a concentration of particulate metal including an iron atom, a concentration of particulate metal including a copper atom, and a concentration of particulate metal including a zinc atom which are measured by a Single Particle ICP-MASS method in the inspection solution is 100 ppt or less.

公开(公告)号：US20160077440A1

公开(公告)日：2016-03-17

申请号：US14946206

申请日：2015-11-19

Applicant: FUJIFILM CORPORATION

Inventor： Tsukasa YAMANAKA ,  Toru FUJIMORI

IPC: G03F7/42

CPC classification number: G03F7/426 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/423 ,  G03F7/425

Abstract: The present invention has an object to provide a pattern peeling method which is excellent in peelability and causes less damage to a substrate, a method for manufacturing an electronic device, including the pattern peeling method, and an electronic device manufactured by the method for manufacturing an electronic device. The present invention includes a resist film forming step of applying an actinic ray-sensitive or radiation-sensitive resin composition onto a substrate to form a resist film; an exposing step of exposing the resist film; a developing step of developing the exposed resist film using a developing liquid containing an organic solvent to form a negative-type pattern; and a peeling step of peeling the negative-type pattern using the following liquid A or B: A: a liquid containing a sulfoxide compound and/or an amide compound; or B: a liquid containing sulfuric acid and hydrogen peroxide.

Abstract translation: 本发明的目的是提供一种图案剥离方法，该剥离方法具有优异的剥离性和对基材的损害较小，包括图案剥离方法的电子装置的制造方法，以及通过该方法制造的电子装置 电子设备。 本发明包括在基板上涂布光化射线敏感性或辐射敏感性树脂组合物以形成抗蚀剂膜的抗蚀剂膜形成步骤; 暴露所述抗蚀剂膜的曝光步骤; 使用含有有机溶剂的显影液显影曝光的抗蚀剂膜以形成负型图案的显影步骤; 以及使用以下液体A或B剥离负型图案的剥离步骤：A：含有亚砜化合物和/或酰胺化合物的液体; 或B：含硫酸和过氧化氢的液体。