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    Post-etch removal of fluorocarbon-based residues from a hybrid dielectric structure
    7.
    发明申请
    Post-etch removal of fluorocarbon-based residues from a hybrid dielectric structure 审中-公开
    从混合电介质结构中去除基于碳氟化合物的残留物

    公开(公告)号：US20070059922A1

    公开(公告)日：2007-03-15

    申请号：US11162511

    申请日：2005-09-13

    申请人： Lawrence Clevenger ,  Andrew Cowley ,  Timothy Dalton ,  Mark Hoinkis ,  Kaushik Kumar ,  Douglas La Tulipe ,  David Rath ,  Chih-Chao Yang

    发明人： Lawrence Clevenger ,  Andrew Cowley ,  Timothy Dalton ,  Mark Hoinkis ,  Kaushik Kumar ,  Douglas La Tulipe ,  David Rath ,  Chih-Chao Yang

    IPC分类号： H01L21/4763

    CPC分类号： H01L21/76811 ,  H01L21/02063 ,  H01L21/76814 ,  H01L21/76835

    摘要： The present invention relates to methods for post-etch, particularly post-RIE, removal of fluorocarbon-based residues from a hybrid dielectric structure. The hybrid dielectric structure contains a first dielectric material, and a line-level dielectric layer containing a second, different dielectric material, and wherein said second, different dielectric material comprises a polymeric thermoset dielectric material having a dielectric constant less than 4. Low energy electron beam or low temperature annealing is utilized by the present invention for removal of the fluorocarbon-based residues from such a hybrid dielectric structure, without damaging the low-k polymeric thermoset dielectric material contained in such a hybrid dielectric structure.

    摘要翻译： 本发明涉及用于从混合电介质结构去除基于碳氟化合物的残留物的后蚀刻，特别是后RIE的方法。 混合电介质结构包含第一电介质材料和含有第二不同介电材料的线路级介电层，并且其中所述第二不同介电材料包含介电常数小于4的聚合物热固性介电材料。低能电子 本发明使用光束或低温退火来从这种混合电介质结构中除去基于碳氟化合物的残留物，而不会损坏这种混合电介质结构中所含的低k聚合物热固性介电材料。

    Modified via bottom structure for reliability enhancement
    8.
    发明申请
    Modified via bottom structure for reliability enhancement 有权
    通过底部结构改进可靠性增强

    公开(公告)号：US20060081986A1

    公开(公告)日：2006-04-20

    申请号：US10964882

    申请日：2004-10-14

    申请人： Lawrence Clevenger ,  Timothy Dalton ,  Louis Hsu ,  Conal Murray ,  Carl Radens ,  Kwong-Hon Wong ,  Chih-Chao Yang

    发明人： Lawrence Clevenger ,  Timothy Dalton ,  Louis Hsu ,  Conal Murray ,  Carl Radens ,  Kwong-Hon Wong ,  Chih-Chao Yang

    IPC分类号： H01L23/52

    CPC分类号： H01L21/76802 ,  H01L21/76805 ,  H01L21/76843 ,  H01L21/76844 ,  H01L21/76847 ,  H01L21/76865 ,  H01L23/5226 ,  H01L23/53238 ,  H01L23/53295 ,  H01L2924/0002 ,  H01L2924/3011 ,  H01L2924/00

    摘要： The present invention provides an interconnect structure that can be made in the BEOL which exhibits good mechanical contact during normal chip operations and does not fail during various reliability tests as compared with the conventional interconnect structures described above. The inventive interconnect structure has a kinked interface at the bottom of a via that is located within an interlayer dielectric layer. Specifically, the inventive interconnect structure includes a first dielectric layer having at least one metallic interconnect embedded within a surface thereof; a second dielectric layer located atop the first dielectric layer, wherein said second dielectric layer has at least one aperture having an upper line region and a lower via region, wherein the lower via region includes a kinked interface; at least one pair of liners located on at least vertical walls of the at least one aperture; and a conductive material filling the at least one aperture.

    摘要翻译： 本发明提供一种可以在BEOL中制造的互连结构，其在正常的芯片操作期间表现出良好的机械接触，并且在与上述的常规互连结构相比在各种可靠性测试期间不会失败。 本发明的互连结构在通孔的底部具有位于层间介质层内的扭结界面。 具体地，本发明的互连结构包括：第一介电层，其具有嵌入在其表面内的至少一个金属互连; 位于所述第一介电层顶部的第二电介质层，其中所述第二电介质层具有至少一个具有上线区域和下通孔区域的孔，其中所述下通孔区域包括扭结界面; 位于所述至少一个孔的至少垂直壁上的至少一对衬垫; 以及填充所述至少一个孔的导电材料。

    Method of fabricating a microelectromechanical system (MEMS) switch
    10.
    发明授权
    Method of fabricating a microelectromechanical system (MEMS) switch 失效
    制造微机电系统（MEMS）开关的方法

    公开(公告)号：US07657995B2

    公开(公告)日：2010-02-09

    申请号：US11776835

    申请日：2007-07-12

    申请人： Louis Hsu ,  Timothy Dalton ,  Lawrence Clevenger ,  Carl Radens ,  Kwong Hon Wong ,  Chih-Chao Yang

    发明人： Louis Hsu ,  Timothy Dalton ,  Lawrence Clevenger ,  Carl Radens ,  Kwong Hon Wong ,  Chih-Chao Yang

    IPC分类号： H01H11/00 ,  H01H65/00

    CPC分类号： H01H59/0009 ,  H01H1/20 ,  H01H2001/0084 ,  H01H2001/0089 ,  Y10T29/49105 ,  Y10T29/49128 ,  Y10T29/49155 ,  Y10T29/49204 ,  Y10T29/49208

    摘要： A method of fabricating a MEMS switch that is fully integratable in a semiconductor fabrication line. The method consists of forming two posts, each end thereof terminating in a cap; a rigid movable conductive plate having a surface terminating in a ring in each of two opposing edges, the rings being loosely connected to guiding posts; forming upper and lower electrode pairs and upper and lower interconnect wiring lines connected and disconnected by the rigid movable conductive plate. The conductive plate moves up, shorting two upper interconnect wirings lines. Conversely, the conductive plate moves down when the voltage is applied to the lower electrode pair, while the upper electrode pair is grounded, shorting the two lower interconnect wiring lines and opening the upper wiring lines.

    摘要翻译： 一种制造可在半导体制造生产线中完全集成的MEMS开关的方法。 该方法包括形成两个柱，其每端终止于盖中; 刚性可移动导电板，其表面终止于两个相对边缘中的每一个中的环中，所述环松散地连接到引导柱; 形成上下电极对以及由刚性可移动导电板连接和断开的上下互连布线。 导电板向上移动，使两条上部互连线路短路。 相反，当电压施加到下电极对时，导电板向下移动，而上电极对接地，使两个下互连布线短路并打开上布线。