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    LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER
    1.
    发明申请
    LITHOGRAPHY SYSTEM AND METHOD FOR PROCESSING A TARGET, SUCH AS A WAFER 有权
    用于处理目标，如WAF的算法系统和方法

    公开(公告)号：US20150109598A1

    公开(公告)日：2015-04-23

    申请号：US14383570

    申请日：2013-03-08

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Niels Vergeer

    IPC: G03F9/00

    CPC classification number: G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7088 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/30438

    Abstract: A method for operating a target processing system for processing a target (23) on a chuck (13), the method comprising providing at least a first chuck position mark (27) and a second chuck position mark (28) on the chuck (13); providing an alignment sensing system (17) arranged for detecting the first and second chuck position marks (27, 28), the alignment sensing system (17) comprising at least a first alignment sensor (61) and a second alignment sensor (62); moving the chuck (13) to a first position based on at least one measurement of the alignment sensing system (17); and measuring at least one value related to the first position of the chuck.

    Abstract translation: 一种用于操作用于在卡盘（13）上处理目标（23）的目标处理系统的方法，所述方法包括在卡盘（13）上至少提供第一卡盘位置标记（27）和第二卡盘位置标记（28） ）; 提供布置成用于检测第一和第二卡盘位置标记（27,28）的对准检测系统（17），所述对准检测系统（17）至少包括第一对准传感器（61）和第二对准传感器（62）; 基于对准检测系统（17）的至少一个测量将卡盘（13）移动到第一位置; 并且测量与卡盘的第一位置相关的至少一个值。

    Multi-axis differential interferometer
    2.
    发明授权
    Multi-axis differential interferometer 有权
    多轴差分干涉仪

    公开(公告)号：US09551563B2

    公开(公告)日：2017-01-24

    申请号：US14431765

    申请日：2013-09-26

    Applicant: Mapper Lithography IP B.V.

    Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

    IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14 ,  H01J37/317

    CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

    Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

    Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR
    5.
    发明申请
    CHARGED PARTICLE LITHOGRAPHY SYSTEM WITH ALIGNMENT SENSOR AND BEAM MEASUREMENT SENSOR 有权
    带有对准传感器和光束测量传感器的带电粒子光刻系统

    公开(公告)号：US20150109601A1

    公开(公告)日：2015-04-23

    申请号：US14383569

    申请日：2013-03-08

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

    IPC: G03F7/20

    CPC classification number: G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/3045

    Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

    Abstract translation: 一种用于将图案转印到基板表面的多子束带电粒子光束光刻系统。 该系统包括用于将多个带电粒子子束（7）投影到衬底的表面上的投影系统（311） 相对于投影系统可移动的卡盘（313）; 用于确定一个或多个带电粒子子束的一个或多个特征的小波束测量传感器（即505,511），所述小束测量传感器具有用于接收一个或多个带电粒子子束的表面（501） 以及用于测量位置标记（610,620,635）的位置的位置标记测量系统，所述位置标记测量系统包括对准传感器（361,362）。 卡盘包括用于支撑基板的基板支撑部分，用于容纳小梁测量传感器的表面的小梁测量传感器部分（460）和用于容纳位置标记的位置标记部分（470）。

    Capacitive sensing system
    6.
    发明授权
    Capacitive sensing system 有权
    电容式感应系统

    公开(公告)号：US08841920B2

    公开(公告)日：2014-09-23

    申请号：US14064255

    申请日：2013-10-28

    Applicant: Mapper Lithography IP B.V.

    Inventor： Guido De Boer ,  Johnny Joannes Jacobus Van Baar ,  Kaustubh Prabodh Padhye ,  Robert Mossel ,  Niels Vergeer ,  Stijn Willem Herman Karel Steenbrink

    IPC: G01R27/26 ,  G01D5/241 ,  G01D3/036 ,  G01B7/02 ,  G03F9/00

    CPC classification number: G01B7/023 ,  G01D3/036 ,  G01D5/2417 ,  G03F9/7026 ,  G03F9/7053

    Abstract: The invention relates to a lithography system. The lithography system has a projection lens system and a capacitive sensing system. The projection lens system is provided with a final projection lens. The capacitive sensing system is arranged for making a measurement related to a distance between the final projection lens and a target. The capacitive sensing system includes at least one capacitive sensor. Additional, the capacitive sensing system is provided with a flexible printed circuit structure and at least one integrated flex print connector. The at least one sensor is located in the flexible printed circuit structure. The flexible printed circuit structure has a flexible base provided with conductive electrodes for the at least one sensor and conductive tracks. The conductive tracks extend from the electrodes along the at least one integrated flex print connector.

    Abstract translation: 本发明涉及一种光刻系统。 光刻系统具有投影透镜系统和电容感测系统。 投影透镜系统设置有最终投影透镜。 电容感测系统被布置用于进行与最终投影透镜和目标之间的距离相关的测量。 电容感测系统包括至少一个电容式传感器。 此外，电容感测系统设置有柔性印刷电路结构和至少一个集成的柔性印刷连接器。 至少一个传感器位于柔性印刷电路结构中。 柔性印刷电路结构具有柔性基底，该基底设置有用于至少一个传感器和导电轨道的导电电极。 导电轨迹沿着至少一个集成的柔性印刷连接器从电极延伸。

    MULTI-AXIS DIFFERENTIAL INTERFEROMETER
    9.
    发明申请
    MULTI-AXIS DIFFERENTIAL INTERFEROMETER 有权
    多轴差分干涉仪

    公开(公告)号：US20150241200A1

    公开(公告)日：2015-08-27

    申请号：US14431765

    申请日：2013-09-26

    Applicant: MAPPER LITHOGRAPHY IP B.V.

    Inventor： Godefridus Cornelius Antonius Couweleers ,  Thomas Adriaan Ooms ,  Niels Vergeer

    IPC: G01B9/02 ,  G01B11/26 ,  G03F7/20 ,  G01B11/14

    CPC classification number: G01B9/02015 ,  G01B9/02021 ,  G01B9/02027 ,  G01B9/02051 ,  G01B11/14 ,  G01B11/26 ,  G03F7/70775 ,  G03F7/70833 ,  G03F7/7085 ,  H01J37/3174 ,  Y10T156/10

    Abstract: The invention relates to a multi-axis differential interferometer (1) for measuring a displacement and/or rotation between a first reflective surface (21, 321) and a second reflective surface (81, 381), wherein said measuring is carried out using at least two pairs of beams, wherein each pair is formed by a measurement beam (Mb) to be emitted onto a first one (21, 321) of said reflective surfaces, and a reference beam (Rb) to be emitted onto another one (81, 381) of said reflective surfaces, said interferometer (1) comprising: a first optical module (20) and a second optical module (40), wherein each optical module (20, 40) is configured for receiving a respective coherent beam and for creating one of said pairs therefrom. The invention further relates to a lithography system comprising such an interferometer and to a method for assembling such a multi-axis differential interferometer.

    Abstract translation: 本发明涉及一种用于测量第一反射表面（21,321）和第二反射表面（81,381）之间的位移和/或旋转的多轴差分干涉仪（1），其中所述测量使用 至少两对光束，其中每对由测量光束（Mb）形成以被发射到所述反射表面的第一个（21,321）上，以及将要发射到另一个的参考光束（Rb） ，381），所述干涉仪（1）包括：第一光学模块（20）和第二光学模块（40），其中每个光学模块（20,40）构造成用于接收相应的相干光束 从中产生一对所述的对。 本发明还涉及包括这种干涉仪的光刻系统和用于组装这种多轴差分干涉仪的方法。

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