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公开(公告)号:US20230063656A1
公开(公告)日:2023-03-02
申请号:US17591510
申请日:2022-02-02
Applicant: Micron Technology, Inc.
Inventor: Chulbum Kim , Brian Kwon , Erwin E. Yu , Kitae Park , Taehyun Kim
Abstract: A memory device includes a memory array of memory cells and control logic operatively coupled with the memory array. The control logic is to perform operations including: initiating a true erase sub-operation by causing an erase pulse to be applied to one or more sub-blocks of the memory array; tracking, a number of suspend commands received from a processing device during time periods that a memory line of the memory array is caused to ramp towards an erase voltage of the erase pulse; causing, in response to receiving each suspend command, the true erase sub-operation to be suspended to enable performing a non-erase memory operation; and in response to the number of suspend commands satisfying a threshold criterion, alerting the processing device to terminate sending suspend commands until after completion of the true erase sub-operation.
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公开(公告)号:US20240203508A1
公开(公告)日:2024-06-20
申请号:US18589730
申请日:2024-02-28
Applicant: Micron Technology, Inc.
Inventor: Chulbum Kim , Brian Kwon , Erwin E. Yu , Kitae Park , Taehyun Kim
CPC classification number: G11C16/14 , G06F3/0604 , G06F3/0659 , G06F3/0679 , G11C16/0483 , G11C16/225 , G11C16/32
Abstract: A memory device includes a memory array comprising memory cells and control logic operatively coupled with the memory array. The control logic causes, as part of a true erase sub-operation, an erase pulse to be applied to one or more sub-blocks of the memory array. The control logic tracks a number of suspend commands received from a processing device, including suspend commands received while memory cells of the one or more sub-blocks are being erased. The control logic causes, in response to receiving each suspend command, the true erase sub-operation to be suspended to enable performing a non-erase memory operation. The control logic, in response to the number of suspend commands satisfying a threshold criterion, alerts the processing device to terminate sending suspend commands.
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公开(公告)号:US11903201B2
公开(公告)日:2024-02-13
申请号:US17391319
申请日:2021-08-02
Applicant: Micron Technology, Inc.
Inventor: Gordon A. Haller , William R. Kueber , Zachary D. Beaman , Christopher G. Shea , Taehyun Kim
IPC: H01L21/768 , H10B43/27 , H01L23/532 , H01L23/535 , H10B41/27 , H10B41/35 , H10B43/35
CPC classification number: H10B43/27 , H01L21/76805 , H01L21/76831 , H01L21/76843 , H01L21/76895 , H01L23/535 , H01L23/53266 , H10B41/27 , H10B41/35 , H10B43/35
Abstract: Some embodiments include a method in which a first stack is formed to include a metal-containing first layer, a second layer over the first layer, and a metal-containing third layer over the second layer. A first opening is formed to extend through the second and third layers. A sacrificial material is formed within the first opening. A second stack is formed over the first stack. A second opening is formed through the second stack, and is extended through the sacrificial material. First semiconductor material is formed within the second opening. A third opening is formed through the second stack and to the second layer. The second layer is removed to form a conduit. Conductively-doped second semiconductor material is formed within the conduit. Dopant is out-diffused from the conductively-doped second semiconductor material into the first semiconductor material. Some embodiments include integrated assemblies.
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公开(公告)号:US20230057289A1
公开(公告)日:2023-02-23
申请号:US17669073
申请日:2022-02-10
Applicant: Micron Technology, Inc.
Inventor: Vivek Venkata Kalluru , Michele Piccardi , Taehyun Kim , Theodore T. Pekny
IPC: G11C11/4099 , G11C11/4096 , G11C11/4074 , G11C11/408
Abstract: Control logic in a memory device initiates a read operation on a memory array of the memory device and performs a calibration operation to detect a change in string resistance in the memory array. The control logic determines whether the change in string resistance is attributable to charge loss in the memory array, and responsive to determining that the change in string resistance is attributable to charge loss in the memory array, preforms the read operation using calibrated read voltage levels to read data from the memory array.
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公开(公告)号:US20240428862A1
公开(公告)日:2024-12-26
申请号:US18748679
申请日:2024-06-20
Applicant: Micron Technology, Inc.
Inventor: Taehyun Kim , Brian Kwon , Dong Kyo Shim , Kwang Ho Kim , Erwin E. Yu , Fulvio Rori
Abstract: Control logic in a memory device initiates a program operation to program one or more memory cells of a first sub-block of a memory array, the program operation including a seeding phase. During the seeding phase, a first wordline voltage is caused to be applied to a first wordline segment associated with a first portion of the memory array. During the seeding phase, a second wordline voltage is caused to be applied to a second wordline segment associated with a second portion of the memory array, where the first wordline voltage and the second wordline voltage cause a seeding bias voltage to be applied to the first sub-block group and inhibit application of the seeding bias voltage to the second sub-block group.
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公开(公告)号:US20240355397A1
公开(公告)日:2024-10-24
申请号:US18762228
申请日:2024-07-02
Applicant: Micron Technology, Inc.
Inventor: Vivek Venkata Kalluru , Michele Piccardi , Taehyun Kim , Theodore T. Pekny
CPC classification number: G11C16/26 , G11C16/0483 , G11C16/28 , G11C16/3418 , G11C16/3422 , G11C16/3431 , G11C16/3459
Abstract: Control logic in a memory device initiates a read operation on a memory array of the memory device and performs a calibration operation to detect a change in string resistance in the memory array. The control logic determines whether the change in string resistance is attributable to charge loss in the memory array, and responsive to determining that the change in string resistance is attributable to charge loss in the memory array, preforms the read operation using calibrated read voltage levels to read data from the memory array.
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公开(公告)号:US12057174B2
公开(公告)日:2024-08-06
申请号:US17669073
申请日:2022-02-10
Applicant: Micron Technology, Inc.
Inventor: Vivek Venkata Kalluru , Michele Piccardi , Taehyun Kim , Theodore T. Pekny
CPC classification number: G11C16/26 , G11C16/0483 , G11C16/28 , G11C16/3418 , G11C16/3422 , G11C16/3431 , G11C16/3459
Abstract: Control logic in a memory device initiates a read operation on a memory array of the memory device and performs a calibration operation to detect a change in string resistance in the memory array. The control logic determines whether the change in string resistance is attributable to charge loss in the memory array, and responsive to determining that the change in string resistance is attributable to charge loss in the memory array, preforms the read operation using calibrated read voltage levels to read data from the memory array.
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公开(公告)号:US20240088044A1
公开(公告)日:2024-03-14
申请号:US17940715
申请日:2022-09-08
Applicant: Micron Technology, Inc.
Inventor: Collin Howder , Taehyun Kim
IPC: H01L23/535 , H01L23/528 , H01L27/11556 , H01L27/11582
CPC classification number: H01L23/535 , H01L23/5283 , H01L27/11556 , H01L27/11582
Abstract: Methods, systems, and devices for access circuitry structures for three-dimensional (3D) memory arrays are described. A memory device may include levels of memory cells over a substrate. To support accessing memory cells at respective levels, the memory device may include a conductive pillar extending through the levels of memory cells and coupled with one or more memory cells at respective levels of memory cells. The memory device may include a bit line and a contact that is configured to couple the bit line with the conductive pillar. The conductive pillar may be formed such that it extends into a portion of the contact, and a contact resistance between the conductive pillar and the bit line may be based on the conductive pillar extending into the portion of the contact.
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公开(公告)号:US20240074201A1
公开(公告)日:2024-02-29
申请号:US17893436
申请日:2022-08-23
Applicant: Micron Technology, Inc.
Inventor: Matthew J. King , Albert Fayrushin , Sidhartha Gupta , Jun Fujiki , Masashi Yoshida , Yiping Wang , Taehyun Kim , Arun Kumar Dhayalan
IPC: H01L27/1157 , H01L27/11524 , H01L27/11556 , H01L27/11582
CPC classification number: H01L27/1157 , H01L27/11524 , H01L27/11556 , H01L27/11582
Abstract: A method used in forming a memory array comprising strings of memory cells comprises forming a stack comprising vertically-alternating different-composition first tiers and second tiers. The stack comprises lower channel-material strings extending through the first tiers and the second tiers. Conductive masses are formed that comprise at least one of conductively-doped semiconductive material or conductive metal material. Individual of the conductive masses are atop and directly electrically coupled to individual of the lower channel-material strings. Upper channel-material strings of select-gate transistors are formed directly above the stack. Individual of the upper channel-material strings are directly above and directly electrically coupled to individual of the conductive masses. Other embodiments, including structure, are disclosed.
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公开(公告)号:US20230413561A1
公开(公告)日:2023-12-21
申请号:US18241402
申请日:2023-09-01
Applicant: Micron Technology, Inc.
Inventor: Gordon A. Haller , William R. Kueber , Zachary D. Beaman , Christopher G. Shea , Taehyun Kim
IPC: H10B43/27 , H01L21/768 , H01L23/532 , H01L23/535 , H10B41/27 , H10B41/35 , H10B43/35
CPC classification number: H10B43/27 , H01L21/76895 , H01L23/53266 , H01L21/76805 , H01L21/76831 , H01L21/76843 , H01L23/535 , H10B41/27 , H10B41/35 , H10B43/35
Abstract: Some embodiments include a method in which a first stack is formed to include a metal-containing first layer, a second layer over the first layer, and a metal-containing third layer over the second layer. A first opening is formed to extend through the second and third layers. A sacrificial material is formed within the first opening. A second stack is formed over the first stack. A second opening is formed through the second stack, and is extended through the sacrificial material. First semiconductor material is formed within the second opening. A third opening is formed through the second stack and to the second layer. The second layer is removed to form a conduit. Conductively-doped second semiconductor material is formed within the conduit. Dopant is out-diffused from the conductively-doped second semiconductor material into the first semiconductor material. Some embodiments include integrated assemblies.
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