公开(公告)号：US20230213876A1

公开(公告)日：2023-07-06

申请号：US18148127

申请日：2022-12-29

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Young Ho Park ,  Tae Hee Kim ,  In Ki Jung ,  Kwang Sup Kim

IPC: G03F7/20 ,  G03F7/30 ,  G03F7/40

CPC classification number: G03F7/70683 ,  G03F7/2053 ,  G03F7/30 ,  G03F7/40 ,  G03F7/70025 ,  G03F7/7085 ,  G03F7/70825 ,  G03F1/72

Abstract: The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to rotate and support a substrate; a liquid supply unit configured to supply a liquid to the substrate supported on the support unit; and an optical module for heating the substrate supported on the support unit, and wherein the support unit includes a teaching member having a grid displaying a reference point which matches a center of the support unit.

公开(公告)号：US20230211436A1

公开(公告)日：2023-07-06

申请号：US18145245

申请日：2022-12-22

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Ji Hoon Jeong ,  Ki Hoon Choi ,  In Ki Jung ,  Won Sik Son ,  Tae Hee Kim

IPC: B23K26/03 ,  G03F1/84 ,  G03F1/42 ,  G03F1/60 ,  B23K26/122 ,  B23K26/06 ,  B23K26/04 ,  B23K26/362

CPC classification number: B23K26/032 ,  G03F1/84 ,  G03F1/42 ,  G03F1/60 ,  B23K26/122 ,  B23K26/0648 ,  B23K26/043 ,  B23K26/362

Abstract: The inventive concept provides a mask treating method. The mask treating method includes treating a mask by supplying a liquid to the mask, and irradiating a laser to a region of the mask on which a specific pattern is formed while the liquid remains on the mask; moving an optical module including a laser unit configured to irradiate the laser between a process position for treating the substrate and a standby position deviating from the process position; and adjusting a state of the optical module at an inspection port provided at the standby position to a set condition before the optical module is moved to the process position.

公开(公告)号：US20230229074A1

公开(公告)日：2023-07-20

申请号：US17899616

申请日：2022-08-31

Applicant: SEMES CO., LTD.

Inventor： Hyo Won YANG ,  Hyun Yoon ,  Ji Hoon Jeong ,  In Ki Jung ,  Ki Hoon Choi ,  Tae Hee Kim ,  Se Hoon Oh

IPC: G03F1/72

CPC classification number: G03F1/72

Abstract: A photomask correction method capable of increasing the photomask precision is provided. The photomask correction method comprises measuring an intensity profile of a laser, acquiring etching amount data corresponding to the measured intensity profile using a library, determining a process parameter of the laser based on the etching amount data, and correcting a photomask with the laser according to the determined process parameter.

公开(公告)号：US12055857B2

公开(公告)日：2024-08-06

申请号：US18147469

申请日：2022-12-28

Applicant: SEMES CO., LTD.

Inventor： Tae Hee Kim ,  Ji Hoon Jeong ,  Tae Shin Kim ,  Young Dae Chung ,  Young Eun Jeon

IPC: G03F7/00

CPC classification number: G03F7/70191 ,  G03F7/70025

Abstract: The inventive concept provides a mask treatment apparatus. The mask treatment may include a support unit that supports the mask, and a light irradiation unit that irradiate the mask with a light to adjust a critical dimension of a pattern formed in the mask, wherein the light irradiation unit includes a light source that generates the light, and a light modulation element that modulates the light generated by the light source and forms an irradiation pattern.