公开(公告)号：US08891574B2

公开(公告)日：2014-11-18

申请号：US13425825

申请日：2012-03-21

申请人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/22 ,  H01S3/10 ,  H01S3/23 ,  H01S3/225 ,  H01S3/00

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US08503499B2

公开(公告)日：2013-08-06

申请号：US12899886

申请日：2010-10-07

申请人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/22 ,  H01S3/10 ,  H01S3/08

CPC分类号： H01S3/034 ,  G02B1/02 ,  G02B5/3091 ,  H01S3/0346 ,  H01S3/08054 ,  H01S3/0816 ,  H01S3/225 ,  H01S3/2251

摘要： A gas discharge chamber that uses a calcium fluoride crystal which reduces a breakage due to mechanical stress (window holder and laser gas pressure), thermal stress from light absorption, and the like, increases the degree of linear polarization of output laser, and suppresses degradation due to strong ultraviolet (ArF, in particular) laser light irradiation. A first window (2) and a second window (3) of the gas discharge chamber have an incident plane and an emitting plane in parallel with a (111) crystal plane of their calcium fluoride crystal. With respect to an arrangement where laser light entering the calcium fluoride crystal passes through a plane including a axis and a axis of each of the first window (2) and the second window (3) as seen from inside the chamber (1), the first window (2) and the second window (3) are arranged in positions rotated in the same direction by the same angle about their axis.

摘要翻译： 使用减少由于机械应力（窗口保持器和激光气体压力）的破裂的氟化钙晶体，来自光吸收等的热应力的气体放电室增加了输出激光器的线性极化的程度，并抑制了劣化 由于强紫外线（特别是ArF）激光照射。 气体放电室的第一窗口（2）和第二窗口（3）具有与其氟化钙晶体的（111）晶面平行的入射面和发射平面。 关于进入氟化钙晶体的激光通过包括第一窗口（2）和第二窗口（3）中的每一个的<111>轴和<001>轴的平面的布置，从内侧看 室（1），第一窗口（2）和第二窗口（3）被布置在围绕其<111>轴线沿相同方向旋转相同角度的位置。

公开(公告)号：US08165181B2

公开(公告)日：2012-04-24

申请号：US12545474

申请日：2009-08-21

申请人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji Nagai ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US20100128747A1

公开(公告)日：2010-05-27

申请号：US12545474

申请日：2009-08-21

申请人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/104 ,  G02B26/00

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US20120177072A1

公开(公告)日：2012-07-12

申请号：US13425825

申请日：2012-03-21

申请人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Shinji NAGAI ,  Fumika Yoshida ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/10061 ,  H01S3/005 ,  H01S3/2251 ,  H01S3/2316

摘要： A degree of polarization control device includes: a calcium fluoride crystal substrate for transmitting a laser beam; a polarization monitor for measuring the degree of polarization of a laser beam transmitted through the calcium fluoride crystal substrate; and a controller for controlling the rotation angle of the calcium fluoride crystal substrate according to the degree of polarization measured by the polarization monitor; the calcium fluoride crystal substrate being formed by a flat plate having a laser beam entering surface and a laser beam exiting surface running in parallel with the (111) crystal face, the Brewster angle being selected for the incident angle, the rotation angle around the [111] axis operating as a central axis being controlled by the controller.

摘要翻译： 一种偏光控制装置包括：用于透射激光束的氟化钙晶体基板; 用于测量透射穿过氟化钙晶体衬底的激光束的偏振度的偏振监视器; 以及控制器，用于根据由偏振监视器测量的偏振度来控制氟化钙晶体基板的旋转角度; 所述氟化钙晶体基板由具有激光入射面的平板和与（111）晶面平行地行进的激光束离开表面形成，所述布鲁斯特角为入射角选择，围绕[ 111]轴作为中心轴由控制器控制。

公开(公告)号：US07965756B2

公开(公告)日：2011-06-21

申请号：US12545495

申请日：2009-08-21

申请人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

发明人： Osamu Wakabayashi ,  Shinji Nagai ,  Kouji Kakizaki ,  Satoshi Tanaka

IPC分类号： H01S3/22

CPC分类号： H01S3/005 ,  G02B1/02 ,  H01S3/0057 ,  H01S3/08009 ,  H01S3/08054 ,  H01S3/10061 ,  H01S3/2251

摘要： At least either of the light entering plane or the light exiting plane is parallel to the (111) crystal face of the CaF2 crystal and the laser beam entering from the entering plane passes through the plane located between the [111] axis and the first azimuth axis in the locus of rotation of the [001] axis around the [111] axis and including the [111] axis and the first azimuth axis, the plane located between the [111] axis and the second azimuth axis in the locus of rotation of the [010] axis around the [111] axis and including the [111] axis and the second azimuth axis or the plane located between the [111] axis and the third azimuth axis in the locus of rotation of the [100] axis around the [111] axis and including the [111] axis and the third azimuth axis and exits from the exiting plane.

摘要翻译： 进入平面或出射平面的光中的至少任一个平行于CaF 2晶体的（111）晶面，并且从入射平面入射的激光束穿过位于[111]轴和第一方位角 [001]轴围绕[111]轴的旋转轨迹的轴线，包括[111]轴和第一方位轴，位于旋转轨迹中的[111]轴和第二方位角轴之间的平面 围绕[111]轴的[010]轴线，并且包括[111]轴和第二方位角轴或位于[111]轴和第三方位角之间的平面 围绕[111]轴并且包括[111]轴和第三方位角轴并从出射平面离开。

公开(公告)号：US08507883B2

公开(公告)日：2013-08-13

申请号：US12559977

申请日：2009-09-15

申请人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira Endo ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21G4/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100090132A1

公开(公告)日：2010-04-15

申请号：US12559977

申请日：2009-09-15

申请人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Akira ENDO ,  Hideo Hoshino ,  Kouji Kakizaki ,  Tamotsu Abe ,  Akira Sumitani ,  Takanobu Ishihara ,  Shinji Nagai ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/008

摘要： An extreme ultraviolet light source apparatus provided with a magnetic field forming unit having sufficient capability of protection against ions radiated from plasma while using a relatively small magnetic source. The apparatus includes: a target nozzle for injecting a target material; a driver laser for applying a laser beam to the target material to generate plasma; a collector mirror for collecting extreme ultraviolet light radiated from the plasma; and a magnetic field forming unit including at least one magnetic source and at least one magnetic material having two leading end parts projecting from the at least one magnetic source to face each other with a plasma emission point in between, and forming a magnetic field between a trajectory of the target material and the collector mirror.

摘要翻译： 一种极紫外光源装置，其具有磁场形成单元，该磁场形成单元在使用相对较小的磁源时具有足够的抵抗从等离子体辐射的离子的能力。 该装置包括：用于注射目标材料的目标喷嘴; 用于将激光束施加到目标材料以产生等离子体的驱动器激光器; 用于收集从等离子体辐射的极紫外光的收集镜; 以及磁场形成单元，其包括至少一个磁源和至少一个磁性材料，所述至少一个磁性材料具有从所述至少一个磁源突出的两个前端部分，其间具有等离子体发射点，并在其之间形成磁场 目标材料和收集镜的轨迹。

公开(公告)号：US20100078579A1

公开(公告)日：2010-04-01

申请号：US12566170

申请日：2009-09-24

申请人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

发明人： Akira Endo ,  Shinji Nagai ,  Kouji Kakizaki ,  Osamu Wakabayashi ,  Yoshifumi Ueno

IPC分类号： G21K5/00

CPC分类号： H05G2/003 ,  H05G2/001 ,  H05G2/008

摘要： An EUV light source apparatus in which contamination or damage of optical elements and other component elements by debris can be suppressed to realize longer lives of them. The EUV light source apparatus is an apparatus for radiating extreme ultraviolet light by generating plasma of a target material within a chamber, and includes: a first laser unit for applying a first laser beam to the target material to generate pre-plasma; a second laser unit for applying a second laser beam to the pre-plasma to generate a main plasma for radiating the extreme ultraviolet light; and a magnetic field generating unit for generating a magnetic field within the chamber to control a state of at least one of the pre-plasma and the main plasma.

摘要翻译： EUV光源装置，可以抑制光学元件和其他元件被碎屑污染或损坏，从而实现更长寿命。 EUV光源装置是通过在室内产生目标材料的等离子体来辐射极紫外光的装置，包括：第一激光单元，用于向目标材料施加第一激光束以产生预等离子体; 用于将第二激光束施加到所述预等离子体以产生用于辐射所述极紫外光的主等离子体的第二激光单元; 以及用于在所述室内产生磁场以控制所述预等离子体和所述主等离子体中的至少一个的状态的磁场产生单元。

公开(公告)号：US20080095209A1

公开(公告)日：2008-04-24

申请号：US11903111

申请日：2007-09-19

申请人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

发明人： Osamu Wakabayashi ,  Tsukasa Hori ,  Takanobu Ishihara ,  Shinji Nagai ,  Hakaru Mizoguchi ,  Kouji Kakizaki

IPC分类号： H01S3/22

CPC分类号： H01S3/2333 ,  H01S3/005 ,  H01S3/036 ,  H01S3/0384 ,  H01S3/0385 ,  H01S3/073 ,  H01S3/08009 ,  H01S3/08045 ,  H01S3/09702 ,  H01S3/0971 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2316 ,  H01S3/2366

摘要： A high efficiency injection device 4, which injects oscillation stage laser light into an optical stable resonator of an amplification stage laser 20, is provided. A discharge electrode 1a is disposed in an oscillation stage laser 10, and is connected to a 12 kHz power supply 15 for discharging the discharge electrode 1a, and also a plurality of pairs of discharge electrodes 2a, 2b are disposed within the optical stable resonator of the amplification stage laser 20, and are connected to 6 kHz power supplies 25a, 25b for discharging the respective electrode pairs 2a, 2b. Discharge voltages are applied alternately to the two pairs of electrodes 2a, 2b in synchronization with the injected light to cause discharge.

摘要翻译： 提供了将振荡级激光注入到放大级激光器20的光稳定谐振器中的高效率注入装置4。 放电电极1a设置在振荡级激光器10中，并且连接到用于放电放电电极1a的12kHz电源15，并且多对放电电极2a，2b布置在 放大级激光器20的光稳定谐振器，并且连接到用于对各个电极对2a，2b进行放电的6kHz电源25a，25b。 与注入的光同步地将放电电压交替地施加到两对电极2a，2b，以引起放电。