Packaged semiconductor device and method of forming thereof

    公开(公告)号:US11581281B2

    公开(公告)日:2023-02-14

    申请号:US17232528

    申请日:2021-04-16

    Abstract: A semiconductor device includes a first die, a second die on the first die, and a third die on the second die, the second die being interposed between the first die and the third die. The first die includes a first substrate and a first interconnect structure on an active side of the first substrate. The second die includes a second substrate, a second interconnect structure on a backside of the second substrate, and a power distribution network (PDN) structure on the second interconnect structure such that the second interconnect structure is interposed between the PDN structure and the second substrate.

    Chiplets 3D SoIC System Integration and Fabrication Methods

    公开(公告)号:US20220384374A1

    公开(公告)日:2022-12-01

    申请号:US17815738

    申请日:2022-07-28

    Abstract: A method includes forming integrated circuits on a front side of a first chip, performing a backside grinding on the first chip to reveal a plurality of through-vias in the first chip, and forming a first bridge structure on a backside of the first chip using a damascene process. The bridge structure has a first bond pad, a second bond pad, and a conductive trace electrically connecting the first bond pad to the second bond pad. The method further includes bonding a second chip and a third chip to the first chip through face-to-back bonding. A third bond pad of the second chip is bonded to the first bond pad of the first chip. A fourth bond pad of the third chip is bonded to the second bond pad of the first chip.

    Semiconductor structure comprising at least one system-on-integrated-circuit component

    公开(公告)号:US11380645B2

    公开(公告)日:2022-07-05

    申请号:US16935175

    申请日:2020-07-21

    Abstract: A structure including a first semiconductor die and a second semiconductor die is provided. The first semiconductor die includes a first bonding structure. The first bonding structure includes a first dielectric layer and first conductors embedded in the first dielectric layer. The second semiconductor die includes a second bonding structure. The second bonding structure includes a second dielectric layer and second conductors embedded in the second dielectric layer. The first dielectric layer is in contact with the second dielectric layer, and the first conductors are in contact with the second conductors. Thermal conductivity of the first dielectric layer and the second dielectric layer is greater than thermal conductivity of silicon dioxide.

    Package structure and method of forming the same

    公开(公告)号:US11069636B2

    公开(公告)日:2021-07-20

    申请号:US16714814

    申请日:2019-12-16

    Abstract: A package structure and a method of forming the same are provided. The package structure includes a die, an encapsulant, a first polymer material layer, a second polymer material layer and a first redistribution layer. The encapsulant encapsulates sidewalls of the die. The first polymer material layer is on the encapsulant and the die. The second polymer material layer is on the first polymer material layer. The first redistribution layer is embedded in the first polymer material layer and the second polymer material layer and electrically connected to the die. The first redistribution layer has a top surface substantially coplanar with a top surface of the second polymer material layer, and a portion of a top surface of the first polymer material layer is in contact with the first redistribution layer.

    PACKAGE STRUCTURE AND MANUFACTURING METHOD THEREOF

    公开(公告)号:US20210098335A1

    公开(公告)日:2021-04-01

    申请号:US16921916

    申请日:2020-07-06

    Abstract: A package structure includes a wafer-form semiconductor package and a thermal dissipating system. The wafer-form semiconductor package includes semiconductor dies electrically connected with each other. The thermal dissipating system is located on and thermally coupled to the wafer-form semiconductor package, where the thermal dissipating system has a hollow structure with a fluidic space, and the fluidic space includes a ceiling and a floor. The thermal dissipating system includes at least one inlet opening, at least one outlet opening and a plurality of first microstructures. The at least one inlet opening and the at least one outlet opening are spatially communicated with the fluidic space. The first microstructures are located on the floor, and at least one of the first microstructures is corresponding to the at least one outlet opening.

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