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    LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS
    1.
    发明申请
    LINKAGE CONDUIT FOR VACUUM CHAMBER APPLICATIONS 有权
    用于真空室应用的连接管

    公开(公告)号：US20160071686A1

    公开(公告)日：2016-03-10

    申请号：US14482761

    申请日：2014-09-10

    申请人： Varian Semiconductor Equipment Associates, Inc.

    发明人： Eric D. Hermanson ,  Robert J. Mitchell ,  Steven Anella ,  Jeffrey Charles Blahnik ,  William T. Weaver ,  Michael Rohrer ,  James P. Buonodono

    IPC分类号： H01J37/18 ,  H01J37/20 ,  H01J37/317

    CPC分类号： H01J37/20 ,  H01J21/18 ,  H01J37/3171 ,  H01J2237/2005 ,  H01J2237/202 ,  H01L21/18

    摘要： An ion implantation apparatus including an enclosure defining a process chamber, a carriage slidably mounted on a shaft within the process chamber and coupled to a drive mechanism adapted to selectively move the carriage along the shaft. A platen assembly can be coupled to the carriage, and a linkage conduit can extend between a side wall of the enclosure and the carriage. The linkage conduit can include a plurality of pivotably interconnected linkage members that define a contiguous internal volume that is sealed from the process chamber. The contiguous volume can be held at a desired vacuum pressure separate from the vacuum environment of the process chamber.

    摘要翻译： 一种离子注入装置，其包括限定处理室的外壳，可滑动地安装在处理室内的轴上并联接到适于沿着轴选择性地移动托架的驱动机构的托架。 压板组件可以联接到滑架，并且连接导管可以在外壳的侧壁和滑架之间延伸。 连接导管可以包括多个可枢转地互连的连接构件，其限定了与处理室密封的连续内部容积。 连续体积可以保持在与处理室的真空环境分开的期望的真空压力下。

    System and method for 2D workpiece alignment
    2.
    发明授权
    System and method for 2D workpiece alignment 有权
    2D工件对齐的系统和方法

    公开(公告)号：US09082799B2

    公开(公告)日：2015-07-14

    申请号：US13623428

    申请日：2012-09-20

    申请人： Varian Semiconductor Equipment Associates, Inc.

    发明人： William T. Weaver ,  Charles T. Carlson ,  Scott A. Smith ,  Michael A. Beck ,  Aaron P. Webb ,  James D. Strassner ,  Lawrence R. Gravell ,  Michael C. Simmons

    IPC分类号： H01L21/673 ,  H01L21/68 ,  H01L21/687 ,  C23C14/04 ,  C23C14/48 ,  C23C14/50

    CPC分类号： H01L21/67333 ,  C23C14/042 ,  C23C14/48 ,  C23C14/50 ,  H01L21/68728 ,  H01L21/68735 ,  H01L21/68778 ,  Y10T29/49899

    摘要： A carrier capable of holding one or more workpieces is disclosed. The carrier includes movable projections located along the sides of each cell in the carrier. This carrier, in conjunction with a separate alignment apparatus, aligns each workpiece within its respective cell against several alignment pins, using a multiple step alignment process to guarantee proper positioning of the workpiece in the cell. First, the workpieces are moved toward one side of the cell. Once the workpieces have been aligned against this side, the workpieces are then moved toward an adjacent orthogonal side such that the workpieces are aligned to two sides of the cell. Once aligned, the workpiece is held in place by the projections located along each side of each cell. In addition, the alignment pins are also used to align the associated mask, thereby guaranteeing that the mask is properly aligned to the workpiece.

    摘要翻译： 公开了能够容纳一个或多个工件的承载件。 载体包括沿着载体中的每个单元的侧面定位的可移动凸起。 该载体与单独的对准装置一起使用多步对准工艺将其各自的电池内的每个工件对准几个对准销，以保证工件在电池中的正确定位。 首先，将工件朝向电池的一侧移动。 一旦工件已经对准该侧面，工件就移动到相邻的正交侧，使得工件与单元的两侧对齐。 一旦对准，工件通过位于每个单元的每一侧的凸起保持就位。 此外，对准销还用于对准相关联的掩模，从而保证掩模适当地对准工件。

    SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING
    5.
    发明申请
    SYSTEM AND METHOD FOR HANDLING MULTIPLE WORKPIECES FOR MATRIX CONFIGURATION PROCESSING 审中-公开
    用于处理矩阵配置处理的多个工件的系统和方法

    公开(公告)号：US20140225007A1

    公开(公告)日：2014-08-14

    申请号：US14253016

    申请日：2014-04-15

    申请人： VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

    发明人： William T. Weaver ,  Jamie A. Carrera ,  Robert B. Vopat ,  Aaron Webb ,  Charles T. Carlson

    IPC分类号： H01L21/677 ,  G21K5/10

    CPC分类号： H01L21/67739 ,  G21K5/10 ,  H01L21/67742 ,  H01L21/67766 ,  H01L21/68707

    摘要： A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

    摘要翻译： 用于将工件加载到用于以矩阵构造处理的处理室中的系统包括被构造成以线性方式输送多个工件的传送器。 工件酒店被配置为从输送机接收多个工件。 工件酒店包括排列在N列和M层的单元矩阵。 拾取刀片被配置成插入酒店并从酒店退回，以便将多个基板从第一层卸载到单行拾取刀片中，并且重复卸载操作以形成矩阵，其包括多个 设置在拾取刀片上的一排衬底。 在一个例子中，工件酒店具有交错的配置，可以提供每个酒店单元的个人可访问性。

    MASK ALIGNMENT SYSTEM FOR SEMICONDUCTOR PROCESSING
    6.
    发明申请
    MASK ALIGNMENT SYSTEM FOR SEMICONDUCTOR PROCESSING 有权
    用于半导体处理的掩模对准系统

    公开(公告)号：US20140170783A1

    公开(公告)日：2014-06-19

    申请号：US14101974

    申请日：2013-12-10

    申请人： Varian Semiconductor Equipment Associates, Inc.

    发明人： Aaron P. Webb ,  Charles T. Carlson ,  William T. Weaver ,  Christopher N. Grant

    IPC分类号： H01L21/266

    CPC分类号： H01L21/266 ,  H01L21/682

    摘要： A mask alignment system for providing precise and repeatable alignment between ion implantation masks and workpieces. The system includes a mask frame having a plurality of ion implantation masks loosely connected thereto. The mask frame is provided with a plurality of frame alignment cavities, and each mask is provided with a plurality of mask alignment cavities. The system further includes a platen for holding workpieces. The platen may be provided with a plurality of mask alignment pins and frame alignment pins configured to engage the mask alignment cavities and frame alignment cavities, respectively. The mask frame can be lowered onto the platen, with the frame alignment cavities moving into registration with the frame alignment pins to provide rough alignment between the masks and workpieces. The mask alignment cavities are then moved into registration with the mask alignment pins, thereby shifting each individual mask into precise alignment with a respective workpiece.

    摘要翻译： 掩模对准系统，用于在离子注入掩模和工件之间提供精确和可重复的对准。 该系统包括具有松散地连接到其上的多个离子注入掩模的掩模框架。 掩模框架设置有多个框架对准空腔，并且每个掩模设置有多个掩模对准空腔。 该系统还包括用于保持工件的压板。 压板可以设置有多个掩模对准销和框架对准销，其被配置为分别接合掩模对准空腔和框架对准空腔。 面罩框架可以下降到台板上，框架对准空腔与框架定位销对齐，以在面罩和工件之间提供粗略对准。 然后将掩模对准空腔移动到与掩模对准销对准，从而将每个单独的掩模移动到与相应的工件精确对准。

    TRANSFER CHAMBER AND METHOD OF USING A TRANSFER CHAMBER
    7.
    发明申请
    TRANSFER CHAMBER AND METHOD OF USING A TRANSFER CHAMBER 审中-公开
    传送室和使用传送室的方法

    公开(公告)号：US20140165908A1

    公开(公告)日：2014-06-19

    申请号：US14101945

    申请日：2013-12-10

    申请人： Varian Semiconductor Equipment Associates, Inc.

    发明人： Aaron P. Webb ,  Charles T. Carlson ,  Paul Forderhase ,  William T. Weaver ,  Robert Brent Vopat

    IPC分类号： H01L31/18

    CPC分类号： H01L31/18 ,  H01J37/185 ,  H01J37/3171 ,  H01J37/32412 ,  H01L21/67155 ,  H01L21/67173 ,  H01L21/67184 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521 ,  Y10T29/49718

    摘要： An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate configured to controllably seal the transfer chamber from the process chamber, and a second isolation gate configured to controllably seal the transfer chamber from an atmospheric environment, wherein a component of the ion implanter can be transferred between the process chamber and the transfer chamber for performing maintenance on the component outside of the process chamber. Performing maintenance on a component of the ion implanter includes the steps of transferring the component from the process chamber to the transfer chamber, sealing the transfer chamber, venting the transfer chamber to atmospheric pressure, an opening the transfer chamber to an atmospheric environment.

    摘要翻译： 一种离子注入机和方法，用于以减少停机时间同时提高离子注入机的产量的方式促进对离子注入机部件的维护的快速性能。 离子注入机包括处理室，连接到处理室的传送室，构造成可以将传送室从处理室可控地密封的第一隔离栅和被配置为可控制地将传送室与大气环境密封的第二隔离栅， 其中所述离子注入机的部件可以在所述处理室和所述传送室之间传送，以对所述处理室外的部件执行维护。 对离子注入机的部件执行维护包括将部件从处理室传送到传送室，密封传送室，将传送室排出到大气压力，将传送室打开到大气环境的步骤。

    Transfer chamber and method of using a transfer chamber
    8.
    发明授权
    Transfer chamber and method of using a transfer chamber 有权

    公开(公告)号：US10446710B2

    公开(公告)日：2019-10-15

    申请号：US14101945

    申请日：2013-12-10

    申请人： Varian Semiconductor Equipment Associates, Inc.

    发明人： Aaron P. Webb ,  Charles T. Carlson ,  Paul Forderhase ,  William T. Weaver ,  Robert Brent Vopat

    IPC分类号： H01L31/18 ,  H01J37/317 ,  H01L21/67 ,  H01J37/18 ,  H01J37/32

    摘要： An ion implanter and method for facilitating expeditious performance of maintenance on a component of the ion implanter in a manner that reduces downtime while increasing throughput of the ion implanter. The ion implanter includes a process chamber, a transfer chamber connected to the process chamber, a first isolation gate configured to controllably seal the transfer chamber from the process chamber, and a second isolation gate configured to controllably seal the transfer chamber from an atmospheric environment, wherein a component of the ion implanter can be transferred between the process chamber and the transfer chamber for performing maintenance on the component outside of the process chamber. Performing maintenance on a component of the ion implanter includes the steps of transferring the component from the process chamber to the transfer chamber, sealing the transfer chamber, venting the transfer chamber to atmospheric pressure, an opening the transfer chamber to an atmospheric environment.