LITHOGRAPHY CONTAMINATION CONTROL
    1.
    发明公开

    公开(公告)号:US20240361708A1

    公开(公告)日:2024-10-31

    申请号:US18766165

    申请日:2024-07-08

    IPC分类号: G03F7/00 G02B17/06 H05G2/00

    摘要: A lithography system is provided capable of deterring contaminants, such as tin debris from entering into the scanner. The lithography system in accordance with various embodiments of the present disclosure includes a processor, an extreme ultraviolet light source, a scanner, and a hollow connection member. The light source includes a droplet generator for generating a droplet, a collector for reflecting extreme ultraviolet light into an intermediate focus point, and a light generator for generating pre-pulse light and main pulse light. The droplet generates the extreme ultraviolet light in response to the droplet being illuminated with the pre-pulse light and the main pulse light. The scanner includes a wafer stage. The hollow connection member includes an inlet that is in fluid communication with an exhaust pump. The hollow connection member provides a hollow space in which the intermediate focus point is disposed. The hollow connection member is disposed between the extreme ultraviolet light source and the scanner.

    Multiple effective focal length (EFL) optical system

    公开(公告)号:US12066609B2

    公开(公告)日:2024-08-20

    申请号:US16454988

    申请日:2019-06-27

    IPC分类号: G02B17/08 G02B17/06 G02B27/14

    摘要: A multi-band/multi-polarization reflective or catadioptric optical system yields differing effective focal lengths (EFLs) per band/polarization. This approach could be used to create an imaging system, for example. In such case, a sensor (imager, spectrometer, diode, etc.) is located at the one or more focal planes. On the other hand, it could also be used to create a projecting system or hybrid projecting and imaging system by locating an emitter such as an LED, laser, etc.) at the image or focal plane. The system employs polarizers and/or dichroic coatings nano patterns to create different focal lengths and/or fields of view using the same mirrors and/or lenses by, for example, including at least one dichroic coating optically in front of at least one additional mirror to separately reflect the different bands or polarizations.

    Multi-directional short-wave methods and systems

    公开(公告)号:US12035453B1

    公开(公告)日:2024-07-09

    申请号:US18382646

    申请日:2023-10-23

    申请人: L2X-LABS LTD

    IPC分类号: H05G2/00 G02B17/06

    CPC分类号: H05G2/008 G02B17/061

    摘要: A Short-Wave Radiation (SWR) system comprising: (i) a light assembly, comprising at least one light source and being configured to: (a) illuminate a front side of an ionization target with first illumination; and (b) illuminate a back side of the ionization target with second illumination; (ii) a controller, configured to control the light assembly for illuminating the ionization target from the front side of the ionization target using the first illumination and at least partly concurrently illuminating the ionization target from the back side of the ionization target using the second illumination; and (iii) an optical assembly configured to collect SWR emitted from the front side of the ionization target and to direct the collected SWR toward a designated beam direction of the SWR system, wherein the SWR emitted from the front side results from a target illumination scheme that comprises at least the first illumination and the second illumination.

    HEAD-UP DISPLAY DEVICE AND VEHICLE
    6.
    发明公开

    公开(公告)号:US20240210681A1

    公开(公告)日:2024-06-27

    申请号:US18393384

    申请日:2023-12-21

    发明人: Takeru Kawai

    IPC分类号: G02B27/01 G02B17/06

    CPC分类号: G02B27/0101 G02B17/06

    摘要: A head-up display device includes: a light emission surface that displays an image and emits display light corresponding to the displayed image; and a concave mirror that reflects the display light toward the windshield, and has an index S, represented in expression S=10.7×Mh+(−8.32)×Mv+(−0.0187)×Wh+(−0.000995)×Wv+0.345×Wi+(−3.52)×Ci+3.90×Dv, which is set to 90 or greater, where Mh and Mv respectively are magnifications in the horizontal and vertical directions of the virtual image with respect to the image in the optical axis position, Wh and Wv respectively are curvature radiuses in the horizontal and vertical direction of the position in which the optical axis reaches in the windshield, Wi is an incident angle of the optical axis into the windshield, Ci is an incident angle of the optical axis into the concave mirror, and Dv is an angle formed between a normal line of the light emission surface and the optical axis of the display light.

    IMAGE PROJECTION DEVICE
    10.
    发明公开

    公开(公告)号:US20240151955A1

    公开(公告)日:2024-05-09

    申请号:US18279507

    申请日:2022-03-25

    IPC分类号: G02B17/06 B60K35/23 G02B27/01

    摘要: An image projection device that can effectively use a space to achieve space saving even when projection light from an image projecting unit is reflected by a plurality of freeform curved mirrors to reach a viewpoint is provided. The image projection device includes: an image projecting unit emitting projection light including an image; a first freeform curved mirror reflecting the projection light incident from the image projecting unit; and a second freeform curved mirror reflecting the projection light incident from the first freeform curved mirror and causing the projection light to reach a viewpoint. Only one of an x-axis component and a y-axis component of the projection light reflected by the first freeform curved mirror forms an image between the first freeform curved mirror and the second freeform curved mirror.