Pattern inspection apparatus and pattern inspection method
    91.
    发明授权
    Pattern inspection apparatus and pattern inspection method 有权
    图案检验装置和图案检验方法

    公开(公告)号:US08649591B2

    公开(公告)日:2014-02-11

    申请号:US13308719

    申请日:2011-12-01

    IPC分类号: G06K9/36

    CPC分类号: G01N21/95607 G01N21/9501

    摘要: In accordance with an embodiment, a pattern inspection method includes: applying a light generated from a light source to the same region of a substrate in which an inspection target pattern is formed; guiding, imaging and then detecting a reflected light from the substrate, and acquiring a detection signal for each of a plurality of different wavelengths; and adding the detection signals of the different wavelengths in association with an incident position of an imaging surface to generate added image data including information on a wavelength and signal intensity, judging, by the added image data, whether the inspection target pattern has any defect, and when judging that the inspection target pattern has a defect, detecting the position of the defect in a direction perpendicular to the substrate.

    摘要翻译: 根据实施例,图案检查方法包括:将从光源产生的光施加到形成有检查对象图案的基板的相同区域; 引导,成像,然后检测来自基板的反射光,并获取多个不同波长中的每一个的检测信号; 并且与成像面的入射位置相关联地添加不同波长的检测信号,以生成包括关于波长和信号强度的信息的附加图像数据,通过添加的图像数据判断检查对象图案是否具有任何缺陷, 并且当判断为检查对象图案有缺陷时,检测出与基板垂直的方向上的缺陷的位置。

    Storage device, processor or storage device, and computer program product for providing parameter adjustment during read/write operations
    92.
    发明授权
    Storage device, processor or storage device, and computer program product for providing parameter adjustment during read/write operations 有权
    存储设备,处理器或存储设备以及用于在读/写操作期间提供参数调整的计算机程序产品

    公开(公告)号:US08000046B2

    公开(公告)日:2011-08-16

    申请号:US12631697

    申请日:2009-12-04

    申请人: Yuichiro Yamazaki

    发明人: Yuichiro Yamazaki

    IPC分类号: G11B27/36

    摘要: According to one embodiment, a storage device includes: ahead actuator configured to move a head to an arbitrary position on a disk medium; a write/read module configured to write data to or read data from the disk medium using the head; an adjustment region selector configured to divide the disk medium into a plurality of regions in a circumferential direction, write test data to each of the regions, read the test data to measure signal quality of the each of the regions, compare the signal quality of the each of the regions, and select a parameter adjustment region; and a parameter adjustment module configured to adjust a parameter used for the write/read module to write data to and read data from the disk medium to an optimal value using the selected parameter adjustment region.

    摘要翻译: 根据一个实施例,一种存储装置包括:前端致动器,被配置为将磁头移动到盘介质上的任意位置; 写/读模块,被配置为使用所述头将数据写入或从所述盘介质读取数据; 调整区域选择器,被配置为将盘介质沿周向划分成多个区域,将测试数据写入每个区域,读取测试数据以测量每个区域的信号质量,比较 每个区域,并选择参数调整区域; 以及参数调整模块,被配置为使用所选择的参数调整区域调整用于写入/读取模块的参数以将数据写入和从盘介质读取数据到最佳值。

    Magnetic disk device testing method and testing device
    93.
    发明授权
    Magnetic disk device testing method and testing device 有权
    磁盘设备测试方法和测试设备

    公开(公告)号:US07777979B2

    公开(公告)日:2010-08-17

    申请号:US12256202

    申请日:2008-10-22

    IPC分类号: G11B27/36

    摘要: A magnetic disk device testing method includes obtaining index values indicating the signal quality of an adjacent track at different positions scattered in the width direction in the adjacent track located in the vicinity of a target track on a magnetic disk after repeatedly writing data onto the target track, and determining a representative value of the index values indicating the signal quality of the adjacent track based on the obtained results, while incrementing the number of data write times; and estimating an index value indicating the signal quality of the adjacent track to be obtained where data is written onto the target track a larger number of times than the total number of data write times the data has been actually written in obtaining the index values, the index value being estimated with the use of the representative values decided in the representative value deciding.

    摘要翻译: 磁盘装置测试方法包括:在将数据重复写入目标轨道之后,获得指示位于磁盘上的目标轨道附近的相邻轨道中在宽度方向上散射的不同位置处的相邻轨道的信号质量的指标值 并且在增加数据写入次数的同时,基于所获得的结果来确定指示相邻轨道的信号质量的索引值的代表值; 并且在获得索引值时,估计指示将数据写入到目标轨道上的要获得的相邻轨道的信号质量的指标值比已经实际写入的数据写入时间的总数更多的次数, 利用代表值决定的代表值估计指标值。

    FLAVOR COMPOSITION OR FRAGRANCE COMPOSITION, PRODUCT CONTAINING THE FLAVOR COMPOSITION OR FRAGRANCE COMPOSITION, AND NOVEL ESTER COMPOUND
    94.
    发明申请
    FLAVOR COMPOSITION OR FRAGRANCE COMPOSITION, PRODUCT CONTAINING THE FLAVOR COMPOSITION OR FRAGRANCE COMPOSITION, AND NOVEL ESTER COMPOUND 失效
    挥发性组合物或香料组合物,含有挥发性组合物或香料组合物的产品和新型酯化合物

    公开(公告)号:US20100081725A1

    公开(公告)日:2010-04-01

    申请号:US12516454

    申请日:2007-11-02

    摘要: Disclosed is a 2-methyl-2-pentenyl ester represented by the general formula (1) [wherein R represents a hydrogen atom or a hydrocarbon group having 1 to 9 carbon atoms which may have a substituent]. The compound has a new-type, unprecedented aroma and/or flavor, particularly a fruity, greenish or floral aroma and/or flavor. The compound can be added to a flavor or fragrance composition in an amount of 0.001 to 30 wt %. The flavor or fragrance composition can be added to a cosmetic product, a toiletry product, a bath agent, a food, a beverage or a pharmaceutical product in an amount of 0.0001 to 30 wt %. All of the compounds of the general formula (1) are novel, except for those compounds of the general formula (1) wherein R represents a methyl group, an isopropyl group, a phenyl group or a mesityl group.

    摘要翻译: 公开了由通式(1)表示的2-甲基-2-戊烯基酯[其中R表示氢原子或可具有取代基的碳原子数1〜9的烃基]。 该化合物具有新型,前所未有的香气和/或风味,特别是水果,绿色或花香的香气和/或风味。 该化合物可以以0.001至30重量%的量加入香料或香料组合物中。 风味剂或香料组合物可以以0.0001〜30重量%的量添加到化妆品,化妆品,浴剂,食品,饮料或药品中。 所有通式(1)的化合物都是新的,除了通式(1)的那些化合物,其中R代表甲基,异丙基,苯基或均三甲苯基。

    Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device
    95.
    发明授权
    Mask pattern inspection method, exposure condition verification method, and manufacturing method of semiconductor device 有权
    掩模图案检查方法,曝光条件验证方法和半导体器件的制造方法

    公开(公告)号:US07674570B2

    公开(公告)日:2010-03-09

    申请号:US11480382

    申请日:2006-07-05

    IPC分类号: G03F7/20

    CPC分类号: G03F1/84

    摘要: A mask pattern inspection method includes: transferring a mask pattern onto a conductor substrate or a semiconductor substrate; preparing a sample including a substrate surface pattern in an electrically conductive state to the substrate, the substrate surface pattern being constituted of a convex pattern or a concave pattern each having a shape in accordance with the transferred mask pattern, or a surface layer obtained by filling the concave pattern with a material; irradiating the sample with an electron beam to detect at least one of a secondary electron, a reflected electron and a backscattered electron generated from the surface of the sample, thereby acquiring an image of the sample surface; and inspecting the mask pattern on the basis of the image.

    摘要翻译: 掩模图案检查方法包括:将掩模图案转印到导体基板或半导体基板上; 将具有导电状态的基板表面图案的样品制备到基板,所述基板表面图案由根据所转印的掩模图案的形状的凸形图案或凹形图案构成,或者通过填充获得的表面层 具有材料的凹形图案; 用电子束照射样品以检测从样品表面产生的二次电子,反射电子和背散射电子中的至少一个,从而获取样品表面的图像; 并基于图像检查掩模图案。

    Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method
    97.
    发明授权
    Substrate inspection apparatus, substrate inspection method and semiconductor device manufacturing method 失效
    基板检查装置,基板检查方法及半导体装置的制造方法

    公开(公告)号:US07608821B2

    公开(公告)日:2009-10-27

    申请号:US11698132

    申请日:2007-01-26

    IPC分类号: H01J37/26 G01N23/04

    摘要: A substrate inspection apparatus includes: an electron gun which generates an electron beam to irradiate the electron beam to a substrate; an electron detection unit which detects at least one of a secondary electron, a reflection electron and a back scattering electron generated from a surface of the substrate by the irradiation of the electron beam to output signals constituting an image showing a state of the substrate surface; and a surface potential uniformizing unit which generates ions, and irradiates the ions to the substrate before the irradiation of the electron beam to uniformize a surface potential of the substrate.

    摘要翻译: 基板检查装置包括:电子枪,其产生电子束以将电子束照射到基板; 电子检测单元,其通过电子束的照射检测从基板的表面产生的二次电子,反射电子和背散射电子中的至少一个,以输出构成表示基板表面的状态的图像的信号; 以及产生离子的表面电位均匀化单元,并且在照射电子束之前将离子照射到衬底上以使衬底的表面电位均匀化。

    Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus
    98.
    发明授权
    Substrate inspection method, manufacturing method of semiconductor device and substrate inspection apparatus 有权
    基板检查方法,半导体装置及基板检查装置的制造方法

    公开(公告)号:US07504625B2

    公开(公告)日:2009-03-17

    申请号:US11385706

    申请日:2006-03-22

    申请人: Yuichiro Yamazaki

    发明人: Yuichiro Yamazaki

    IPC分类号: G21K7/00 G21G5/00

    摘要: A substrate inspection method includes: generating primary charged particle beams; applying the generated primary charged particle beams to an inspection target of a substrate; condensing first secondary charged particle beams including at least one of secondary charged particles, reflected charged particles, and back scattering charged particles which have been generated from the substrate, or first transmitted charged particle beams which have transmitted the inspection target, a phase difference being generated between the secondary charged particle beams or between the transmitted charged particle beams in accordance with a structure of the inspection target; imaging the secondary charged particle beams or the transmitted charged particle beams; detecting the imaged secondary charged particle beams or transmitted charged particle beams and outputting a signal of a secondary charged particle beam image or a transmitted charged particle beam image including information on the phase difference; and detecting a defect in the inspection target by use of the information on the phase difference included in the secondary charged particle beam image or the transmitted charged particle beam image.

    摘要翻译: 基板检查方法包括:产生初级带电粒子束; 将生成的初级带电粒子束施加到基板的检查对象物; 冷凝第一次级带电粒子束,其包括从基板产生的二次带电粒子,反射带电粒子和背散射带电粒子中的至少一种,或已经传送检查对象物的第一透射带电粒子束,产生相位差 在所述二次带电粒子束之间或所述透射的带电粒子束之间,根据所述检查对象的结构; 对二次带电粒子束或透射的带电粒子束进行成像; 检测成像的二次带电粒子束或透射带电粒子束,并输出二次带电粒子束图像的信号或包括关于相位差的信息的透射带电粒子束图像; 以及通过使用关于包含在二次带电粒子束图像或透射带电粒子束图像中的相位差的信息来检测检查对象中的缺陷。

    STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS CONDITION DETERMINATION METHOD AND RESIST PATTERN EVALUATION APPARATUS
    99.
    发明申请
    STRUCTURE INSPECTION METHOD, PATTERN FORMATION METHOD, PROCESS CONDITION DETERMINATION METHOD AND RESIST PATTERN EVALUATION APPARATUS 失效
    结构检验方法,图案形成方法,工艺条件决定方法和电阻图案评估装置

    公开(公告)号:US20090002722A1

    公开(公告)日:2009-01-01

    申请号:US12198821

    申请日:2008-08-26

    IPC分类号: G01B11/14 G01B11/28

    CPC分类号: G03F7/70625 G01N21/956

    摘要: Wavelength dispersion of intensity of light reflected from an evaluation object is measured. A complex refractive index of a substance forming the evaluation object and the environment are prepared. Virtual component ratios comprising a mixture ratio of the substances forming the evaluation object and the environment are prepared. Reflectance wavelength dispersions to the virtual component ratios are calculated. Similar reflectance wavelength dispersions having a small difference with the measured wavelength dispersion are extracted from the reflectance wavelength dispersions. Weighted average to the virtual component ratios used for calculating the similar reflectance wavelength dispersions are calculated to obtain a component ratio of the substance forming the evaluation object and the environment so that weighting is larger when the difference is smaller. A structure of the evaluation object is determined from the calculated component ratio.

    摘要翻译: 测量从评价对象反射的光的强度的波长色散。 制备形成评价对象的物质和环境的复合折射率。 制备包含形成评价对象的物质与环境的混合比的虚拟成分比例。 计算出虚拟分量比的反射波长色散。 从反射波长分散体中提取与测量的波长色散具有小差异的类似反射率波长色散。 计算用于计算相似反射率波长色散的虚拟分量比的加权平均值,以获得形成评估对象物质和环境的物质的分量比,使得当差值较小时加权较大。 评估对象的结构根据计算的分量比确定。