High resolution etalon-grating monochromator
    91.
    发明授权
    High resolution etalon-grating monochromator 有权
    高分辨率标准光栅单色仪

    公开(公告)号:US06480275B2

    公开(公告)日:2002-11-12

    申请号:US09772293

    申请日:2001-01-29

    IPC分类号: G01J318

    摘要: A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.

    摘要翻译: 高分辨率标准光栅单色仪。 优选的实施例在紫外范围内呈现非常狭窄的狭缝功能,并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。 来自激光的光被聚焦成漫射器,并且离开扩散器的漫射光照射标准具。 将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。 通过狭缝的光线被准直,并且准直光照射位于大约Littrow配置中的光栅,其根据波长散发光。 表示对应于所选择的标准具条纹的波长的调度光​​的一部分通过第二狭缝并由光检测器监视。 当标准具和光栅调谐到相同的精确波长时,定义狭缝功能,其极窄,例如约0.034μm(FWHM)和约0.091μm(95%积分)。 激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

    Laser having improved beam quality and reduced operating cost
    92.
    发明授权
    Laser having improved beam quality and reduced operating cost 失效
    激光器具有改善的光束质量和降低的操作成本

    公开(公告)号:US5748656A

    公开(公告)日:1998-05-05

    申请号:US583302

    申请日:1996-01-05

    摘要: Disclosed is a laser useful in, e.g., photolithography or medical surgery. In one embodiment, the laser comprises a discharge chamber and heat-generating electronics that are enclosed in a baffled enclosure that requires less cooling air to reliably cool the components in the enclosure than previous unbaffled enclosures. A method of reducing the amount of conditioned air is also provided. In a further embodiment, the laser has a heat-exchange system that acts quickly in response to changes in laser gas temperature by adjusting a flow-proportioning valve regulating water flow through a heat exchanger, thereby providing a continuously variable rate of heat exchange through the heat exchanger to maintain the lasing gas temperature constant. Methods of providing a laser beam and of improving the uniformity of a laser beam are disclosed, as are photolithography methods utilizing a laser and method of this invention.

    摘要翻译: 公开了一种可用于例如光刻或医疗手术中的激光。 在一个实施例中,激光器包括放电室和发热电子器件,其封闭在挡板外壳中,其需要较少的冷却空气以可靠地冷却外壳中的部件比先前的未封闭的外壳。 还提供了减少调节空气量的方法。 在另一个实施例中,激光器具有热交换系统,其响应于激光气体温度的变化而快速作用,通过调节调节通过热交换器的水流的流量比例阀,由此通过所述热交换系统提供连续可变的热交换速率 热交换器保持激光温度恒定。 公开了提供激光束并提高激光束的均匀性的方法,以及利用激光的光刻方法和本发明的方法。

    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods
    94.
    发明授权
    EUV light source with subsystem(s) for maintaining LPP drive laser output during EUV non-output periods 有权
    具有子系统的EUV光源,用于在EUV非输出期间维持LPP驱动激光输出

    公开(公告)号:US08653437B2

    公开(公告)日:2014-02-18

    申请号:US13157233

    申请日:2011-06-09

    IPC分类号: H05G2/00

    摘要: A device is disclosed herein which may comprise a droplet generator producing droplets of target material; a sensor providing an intercept time signal when a droplet reaches a preselected location; a delay circuit coupled with said sensor, the delay circuit generating a trigger signal delayed from the intercept time signal; a laser source responsive to a trigger signal to produce a laser pulse; and a system controlling said delay circuit to provide a trigger signal delayed from the intercept time by a first delay time to generate a light pulse that is focused on a droplet and a trigger signal delayed from the intercept time by a second delay time to generate a light pulse which is not focused on a droplet.

    摘要翻译: 本文公开的装置可包括产生目标材料的液滴的液滴发生器; 当液滴到达预选位置时提供拦截时间信号的传感器; 与所述传感器耦合的延迟电路,所述延迟电路产生从截取时间信号延迟的触发信号; 响应于触发信号产生激光脉冲的激光源; 以及控制所述延迟电路的系统,以提供从截取时间延迟第一延迟时间的触发信号,以产生聚焦在液滴上的光脉冲和从截取时间延迟第二延迟时间的触发信号,以产生 不聚焦在液滴上的光脉冲。

    EUV light producing system and method utilizing an alignment laser
    95.
    发明授权
    EUV light producing system and method utilizing an alignment laser 有权
    EUV光产生系统和利用对准激光的方法

    公开(公告)号:US08304752B2

    公开(公告)日:2012-11-06

    申请号:US12638413

    申请日:2009-12-15

    IPC分类号: G01J1/04 G01J1/18

    摘要: A method for producing extreme ultraviolet light includes producing a target material at a target location; supplying pump energy to a gain medium of at least one optical amplifier that has an amplification band to produce an amplified light beam; propagating the amplified light beam through the gain medium using one or more optical components of a set of optical components; delivering the amplified light beam to the target location using one or more optical components of the optical component set; producing with a guide laser a guide laser beam that has a wavelength outside of the amplification band of the gain medium and inside the wavelength range of the optical components; and directing the guide laser beam through the optical component set to thereby align one or more optical components of the optical component set.

    摘要翻译: 用于生产极紫外光的方法包括在目标位置产生目标材料; 向具有放大频带的至少一个光放大器的增益介质提供泵浦能量以产生放大的光束; 使用一组光学部件的一个或多个光学部件将放大的光束传播通过增益介质; 使用所述光学部件组的一个或多个光学部件将放大的光束传送到目标位置; 用导向激光器产生具有波长在增益介质的放大频带之外且在光学部件的波长范围内的引导激光束; 并且引导所述引导激光束通过所述光学部件组,从而对准所述光学部件组的一个或多个光学部件。

    Systems and methods for drive laser beam delivery in an EUV light source
    96.
    发明授权
    Systems and methods for drive laser beam delivery in an EUV light source 失效
    用于在EUV光源中驱动激光束传输的系统和方法

    公开(公告)号:US08283643B2

    公开(公告)日:2012-10-09

    申请号:US12592107

    申请日:2009-11-18

    IPC分类号: A61N5/00 A61N5/06

    摘要: An EUV light source device is described herein which may comprise a laser beam travelling along a beam path, at least a portion of the beam path aligned along a linear axis; a material for interaction with the laser beam at an irradiation site to create an EUV light emitting plasma; a first reflector having a focal point, the first reflector positioned with the focal point on the linear axis, the first reflector receiving laser light along the beam path; and a second reflector receiving laser light reflected by the first reflector and directing the laser light toward the irradiation site.

    摘要翻译: 本文描述了EUV光源装置,其可以包括沿着光束路径传播的激光束,所述光束路径的至少一部分沿线性轴线对准; 用于在照射部位与激光束相互作用以产生EUV发光等离子体的材料; 具有焦点的第一反射器,所述第一反射器的焦点位于所述线性轴线上,所述第一反射器沿着所述光束路径接收激光; 以及第二反射器,其接收由所述第一反射器反射并且将所述激光引向所述照射部位的激光。

    Beam transport system for extreme ultraviolet light source
    97.
    发明授权
    Beam transport system for extreme ultraviolet light source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号:US08173985B2

    公开(公告)日:2012-05-08

    申请号:US12638092

    申请日:2009-12-15

    IPC分类号: H05G2/00 H01L21/027 G03F7/20

    CPC分类号: H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间,其容纳极紫外光收集器和目标位置; 以及光束传送系统,其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    Beam Transport System for Extreme Ultraviolet Light Source
    99.
    发明申请
    Beam Transport System for Extreme Ultraviolet Light Source 有权
    用于极紫外光源的光束传输系统

    公开(公告)号:US20110140008A1

    公开(公告)日:2011-06-16

    申请号:US12638092

    申请日:2009-12-15

    IPC分类号: G21K5/04

    CPC分类号: H05G2/008

    摘要: An extreme ultraviolet light system includes a drive laser system that produces an amplified light beam; a target material delivery system configured to produce a target material at a target location; an extreme ultraviolet light vacuum chamber defining an interior vacuum space that houses an extreme ultraviolet light collector and the target location; and a beam delivery system that is configured to receive the amplified light beam emitted from the drive laser system and to direct the amplified light beam toward the target location. The beam delivery system includes a beam expansion system that expands a size of the amplified light beam and a focusing element that is configured and arranged to focus the amplified light beam at the target location.

    摘要翻译: 极紫外光系统包括产生放大光束的驱动激光系统; 配置成在目标位置产生目标材料的目标材料输送系统; 极紫外光真空室限定内部真空空间,其容纳极紫外光收集器和目标位置; 以及光束传送系统,其被配置为接收从驱动激光系统发射的放大的光束并将放大的光束引向目标位置。 光束传送系统包括扩大放大光束的尺寸的光束扩展系统和配置和布置成将放大的光束聚焦在目标位置处的聚焦元件。

    SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT
    100.
    发明申请
    SYSTEM, METHOD AND APPARATUS FOR ALIGNING AND SYNCHRONIZING TARGET MATERIAL FOR OPTIMUM EXTREME ULTRAVIOLET LIGHT OUTPUT 有权
    用于最佳超极紫外光输出的对准和同步目标材料的系统,方法和装置

    公开(公告)号:US20100258750A1

    公开(公告)日:2010-10-14

    申请号:US12725178

    申请日:2010-03-16

    IPC分类号: G21K5/02 G21K5/10

    摘要: An extreme ultraviolet light system includes a drive laser system, an extreme ultraviolet light chamber including an extreme ultraviolet light collector and a target material dispenser including a target material outlet capable of outputting a plurality of portions of target material along a target material path, wherein the target material outlet is adjustable. The extreme ultraviolet light system further includes a drive laser steering device, a detection system including at least one detector directed to detect a reflection of the drive laser reflected from the first one of the plurality of portions of target material and a controller coupled to the target material dispenser, the detector system and the drive laser steering device. The controller includes logic for detecting a location of a first one of the plurality of portions of target material from a first light reflected from the first target material and logic for adjusting the target material dispenser outlet to output a subsequent one of the plurality of portions of target material to a waist of the focused drive laser. A method for generating an extreme ultraviolet light is also disclosed. A system and a method for optimizing an extreme ultraviolet light output is also disclosed.

    摘要翻译: 一种极紫外光系统包括驱动激光系统,包括极紫外光收集器的极紫外光室和包括能够沿目标材料路径输出多个目标材料部分的靶材料出口的目标材料分配器,其中, 目标材料出口可调。 所述极紫外光系统还包括驱动激光转向装置,所述检测系统包括至少一个检测器,所述检测器被引导以检测从所述目标材料的所述多个部分中的第一部分反射的所述驱动激光的反射;以及耦合到所述目标的控制器 材料分配器,检测器系统和驱动激光转向装置。 所述控制器包括用于从第一目标材料反射的第一光检测多个目标材料部分中的第一部分的位置的逻辑,以及用于调整目标材料分配器出口的逻辑,以输出多个部分中的后续部分 目标材料到聚焦驱动激光的腰部。 还公开了一种用于产生极紫外光的方法。 还公开了一种用于优化极紫外光输出的系统和方法。