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    Deposition of uniform layer of desired material
    91.
    发明申请
    Deposition of uniform layer of desired material 审中-公开
    沉积所需材料的均匀层

    公开(公告)号：US20060275542A1

    公开(公告)日：2006-12-07

    申请号：US11143180

    申请日：2005-06-02

    Applicant: Rajesh Mehta ,  Ramesh Jagannathan ,  Bradley Houghtaling ,  Robert Link ,  Kelly Robinson ,  Ross Sprout ,  Kenneth Reed ,  Alok Verma ,  Scott Mahon ,  Robledo Gutierrez ,  Thomas Blanton ,  Jill Fornalik

    Inventor： Rajesh Mehta ,  Ramesh Jagannathan ,  Bradley Houghtaling ,  Robert Link ,  Kelly Robinson ,  Ross Sprout ,  Kenneth Reed ,  Alok Verma ,  Scott Mahon ,  Robledo Gutierrez ,  Thomas Blanton ,  Jill Fornalik

    IPC: B05D1/12

    CPC classification number: B05D1/025 ,  H01L51/0008 ,  H01L51/56

    Abstract: A process for the deposition of a thin film of a desired material on a surface comprising: (i) providing a continuous stream of amorphous solid particles of desired material suspended in at least one carrier gas, the solid particles having a volume-weighted mean particle diameter of less than 500 nm, at an average stream temperature below the glass transition temperature of the solid particles of desired material, (ii) passing the stream provided in (i) into a heating zone, and heating the stream in the heating zone to elevate the average stream temperature to above the glass transition temperature of the solid particles of desired material, wherein no substantial chemical transformation of the desired material occurs due to heating of the desired material, (iii) exhausting the heated stream from the heating zone through at least one distributing passage, at a rate substantially equal to its rate of addition to the heating zone in step (ii), wherein the carrier gas does not undergo a thermodynamic phase change upon passage through heating zone and distribution passage, and (iv) exposing a receiver surface that is at a temperature below the temperature of the heated stream to the exhausted flow of the heated stream, and depositing particles of the desired material to form a thin uniform layer of the desired material on the receiver surface.

    Abstract translation: 一种用于在表面上沉积所需材料的薄膜的方法，包括：（i）提供悬浮在至少一种载气中的所需材料的无定形固体颗粒的连续流，所述固体颗粒具有体积加权平均颗粒 直径小于500nm，平均流温度低于所需材料的固体颗粒的玻璃化转变温度，（ii）使（i）中提供的流进入加热区，并将加热区中的流加热至 将平均流温度提高到所需材料的固体颗粒的玻璃化转变温度以上，其中由于所需材料的加热而不会发生所需材料的实质化学转化，（iii）将加热的流从加热区排出通过 至少一个分配通道，其速率基本上等于其在步骤（ii）中加热区的加入速率，其中载气不经历 在通过加热区和分配通道的过程中，流体动力学相位变化，和（iv）使处于低于加热流的温度的温度的接收器表面暴露于经加热的流的排出的流中，并沉积所需材料的颗粒以形成 接收器表面上所需材料的薄均匀层。

    Apparatus and method for forming thin-film
    92.
    发明授权
    Apparatus and method for forming thin-film 有权
    用于形成薄膜的设备和方法

    公开(公告)号：US07074548B2

    公开(公告)日：2006-07-11

    申请号：US10376253

    申请日：2003-03-03

    Applicant: Takeshi Kijima ,  Eiji Natori ,  Mitsuhiro Suzuki

    Inventor： Takeshi Kijima ,  Eiji Natori ,  Mitsuhiro Suzuki

    IPC: B05D3/00 ,  B05D3/06

    CPC classification number: C23C18/1216 ,  B01J3/008 ,  B01J19/0013 ,  B01J19/123 ,  B01J19/125 ,  B01J19/1887 ,  B01J2219/00058 ,  B05D1/025 ,  B05D2401/90 ,  C23C18/12 ,  C23C18/1283 ,  C23C18/1287 ,  C23C18/14 ,  Y02P20/544

    Abstract: A method of forming a thin-film including a capability to remove contaminants from the formed thin-film and/or a substrate on which the thin-film is formed using alcohol. The method includes allowing a substrate holder to support a substract. A first mixture is produced by mixing a condensation polymer containing an element of metal oxide compound and alcohol. Then second mixture is produced by mixing supercritical fluid or liquid carbon dioxide and the first mixture. A thin film is formed by applying the second mixture on a surface of the substrate. After forming the thin-film, the substrate is cleaned by applying alcohol to upper and lower surfaces, preferably the whole upper and lower surfaces, of the substract. The thin-film is crystallized by heating, and the crystallizing may include applying oxygen in a crystallizing chamber. Soft X-rays may be applied to the substrate, during the forming of the thin-film on the surface of the substrate.

    Abstract translation: 一种形成薄膜的方法，该薄膜包括从形成的薄膜和/或使用酒精形成薄膜的基板去除污染物的能力。 该方法包括允许衬底保持器支撑减法。 通过混合含有金属氧化物和醇的元素的缩聚物来制备第一混合物。 然后通过混合超临界流体或液体二氧化碳和第一混合物产生第二混合物。 通过将第二混合物施加到基板的表面上来形成薄膜。 在形成薄膜之后，通过将酒精施加到底部的上表面和下表面，优选整个上表面和下表面来清洁基底。 薄膜通过加热结晶，结晶可以包括在结晶室中施加氧气。 在衬底表面形成薄膜期间，可以将软X射线施加到衬底上。

    System configured for applying multiple modifying agents to a substrate
    93.
    发明申请
    System configured for applying multiple modifying agents to a substrate 失效
    配置用于将多种改性剂施加到基底的系统

    公开(公告)号：US20040058085A1

    公开(公告)日：2004-03-25

    申请号：US10669662

    申请日：2003-09-23

    Inventor： W. Alan Propp ,  Mark D. Argyle ,  Stuart K. Janikowski ,  Robert V. Fox ,  William J. Toth ,  Daniel M. Ginosar ,  Charles A. Allen ,  David L. Miller

    IPC: B05D001/18

    CPC classification number: D06B3/045 ,  B05D1/025 ,  B05D7/52 ,  B05D2256/00 ,  B05D2401/90 ,  C03C25/12 ,  D06B23/16

    Abstract: The present invention is related to the modifying of substrates with multiple modifying agents in a single continuous system. At least two processing chambers are configured for modifying the substrate in a continuous feed system. The processing chambers can be substantially isolated from one another by interstitial seals. Additionally, the two processing chambers can be substantially isolated from the surrounding atmosphere by end seals. Optionally, expansion chambers can be used to separate the seals from the processing chambers.

    Abstract translation: 本发明涉及在单一连续系统中用多种改性剂改性底物。 至少两个处理室被配置用于在连续进料系统中修改基材。 处理室可以通过间隙密封基本上彼此隔离。 此外，两个处理室可以通过端部密封基本上与周围的大气隔离。 可选地，膨胀室可用于将密封件与处理室分离。

    Method and apparatus for forming thin film of organic material
    96.
    发明申请
    Method and apparatus for forming thin film of organic material 审中-公开
    用于形成有机材料薄膜的方法和装置

    公开(公告)号：US20020187272A1

    公开(公告)日：2002-12-12

    申请号：US10153742

    申请日：2002-05-24

    Applicant: ASAHI GLASS COMPANY LIMITED

    Inventor： Gen Kojima ,  Kunio Masumo ,  Akira Takahashi ,  Goro Asari

    IPC: B05D001/02 ,  B05B001/28

    CPC classification number: H01L51/0003 ,  B05D1/025 ,  B05D2401/90

    Abstract: Coating of a substrate with an organic material, which is characterized in that it comprises liquefying by pressurization a medium which is gaseous at ordinary temperature under 1 atom and liquefies at ordinary temperature under a pressure of 100 atom or less, dissolving or dispersing an organic material in the liquefied medium, and spraying the resulting material mixture onto a substrate in an inert gas atmosphere or comprises bringing a medium having a critical temperature of ordinary temperature or lower and a critical pressure of 100 atm or less into a supercritical state, dissolving or dispersing an organic material in the medium, and spraying the resulting material mixture onto a substrate in an inert gas atmosphere.

    Abstract translation: 用有机材料涂覆基材，其特征在于，其包括通过在常温下在1个原子下加压将介质气化并在常压下在100个或更小的压力下液化，将有机材料溶解或分散 在液化介质中，并将所得到的材料混合物在惰性气体气氛中喷涂到基材上，或包括将具有常温或更低临界温度和临界压力为100atm以下的介质进入超临界状态，溶解或分散 介质中的有机材料，并将所得到的材料混合物在惰性气体气氛中喷涂到基材上。

    APPARATUS AND METHOD OF DELIVERING A FOCUSED BEAM OF A THERMODYNAMICALLY STABLE/METASTABLE MIXTURE OF A FUNCTIONAL MATERIAL IN A DENSE FLUID ONTO A RECEIVER
    99.
    发明申请
    APPARATUS AND METHOD OF DELIVERING A FOCUSED BEAM OF A THERMODYNAMICALLY STABLE/METASTABLE MIXTURE OF A FUNCTIONAL MATERIAL IN A DENSE FLUID ONTO A RECEIVER 有权
    将透明液体中的功能材料的热稳定/可转移混合物的聚焦光束传递到接收器的装置和方法

    公开(公告)号：US20020118245A1

    公开(公告)日：2002-08-29

    申请号：US09794671

    申请日：2001-02-27

    Applicant: Eastman Kodak company

    Inventor： Rameh Jagannathan ,  Glen C. Irvin JR. ,  Seshadri Jagannathan ,  Sridhar Sadasivan ,  Suresh Sunderrajan ,  John E. Rueping ,  Gary E. Merz

    IPC: B41J002/015 ,  B41J029/38

    CPC classification number: B05D1/025 ,  B05B7/32 ,  B05D2401/90 ,  C23C4/123 ,  Y10S977/773

    Abstract: An apparatus and method of focusing a functional material is provided. The apparatus includes a pressurized source of fluid in a thermodynamically stable mixture with a functional material. A discharge device having an inlet and an outlet is connected to the pressurized source at the inlet. The discharge device is shaped to produce a collimated beam of functional material, where the fluid is in a gaseous state at a location before or beyond the outlet of the discharge device. The fluid can be one of a compressed liquid and a supercritical fluid. The thermodynamically stable mixture includes one of the functional material being dispersed in the fluid and the functional material being dissolved in the fluid.

    Abstract translation: 提供了一种聚焦功能材料的设备和方法。 该装置包括在具有功能材料的热力学稳定的混合物中的加压流体源。 具有入口和出口的排出装置在入口处连接到加压源。 排出装置成形为产生准直的功能材料束，其中流体在排放装置的出口之前或之后的位置处于气态。 流体可以是压缩液体和超临界流体之一。 热力学稳定的混合物包括分散在流体中的功能材料之一和功能材料溶解在流体中。

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