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公开(公告)号：US20080291424A1
公开(公告)日：2008-11-27
申请号：US11753736
申请日：2007-05-25
Applicant: Ming Lei
Inventor： Ming Lei
CPC classification number: G01N21/77 , B01L3/508 , B01L2300/0654 , B01L2300/069 , B01L2300/168 , G01B11/0625 , G01N19/10 , G01N2021/7773 , G02B26/0833
Abstract: A thin, deformable member may be fixed at one end, while another portion of the member rests on a hydrogel substance whose thickness changes depending on a characteristic of a liquid that permeates the hydrogel. When the hydrogel changes thickness and causes part of the member to tilt, a reflective surface on the member may reflect light in a different direction. Appropriate sensors may detect the change in the direction of the reflected light, allowing determination of the change in thickness, which in turn permits determination of the relevant characteristic of the liquid.
Abstract translation: 薄的可变形构件可以固定在一端，而另一部分构件则依赖于水凝胶物质，其水合物物质的厚度根据透过水凝胶的液体的特性而变化。 当水凝胶改变厚度并使构件的一部分倾斜时，构件上的反射表面可以反射不同方向的光。 合适的传感器可以检测反射光的方向的变化，从而允许确定厚度的变化，这又允许确定液体的相关特性。
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公开(公告)号：US20080285007A1
公开(公告)日：2008-11-20
申请号：US12181101
申请日：2008-07-28
Applicant: Michael K. Hughes
Inventor： Michael K. Hughes
IPC: G01C3/08
CPC classification number: G01B11/0625
Abstract: A measurement system that uses a laser triangulation device to measure the thickness of transparent and/or opaque layers of a multilayer film. The triangulation device has a laser device that projects a beam perpendicularly to a surface of the multilayer film and first and second detectors that image first and second reflected rays of the beam at first and second distances offset from first and second optical axes to produce first and second measurement signals. A controller processes the measurement signals using a triangulation procedure and a simultaneous equation procedure to provide a thickness of an outer transparent layer. For a multilayer film having an opaque layer sandwiched between outer transparent layers, first and second triangulation devices are disposed on opposed sides of the film to measure the thickness of each outer film. Knowing the distance between the two devices, the thickness of the opaque layer can be derived.
Abstract translation: 一种测量系统，其使用激光三角测量装置来测量多层膜的透明和/或不透明层的厚度。 三角测量装置具有激光装置，该激光装置垂直于多层膜的表面投影光束，第一和第二检测器使第一和第二距离的第一和第二反射光线从第一和第二光轴偏离，以产生第一和第二光轴， 第二测量信号。 控制器使用三角测量程序和联立方程程序来处理测量信号以提供外部透明层的厚度。 对于具有夹在外透明层之间的不透明层的多层膜，第一和第二三角测量装置设置在膜的相对侧上以测量每个外膜的厚度。 知道两个装置之间的距离，可以得出不透明层的厚度。
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公开(公告)号：US07444198B2
公开(公告)日：2008-10-28
申请号：US11611640
申请日：2006-12-15
Applicant: Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
Inventor： Abraham Ravid , Boguslaw A. Swedek , Jeffrey Drue David , Jun Qian , Ingemar Carlsson , Dominic J. Benvegnu , Harry Q. Lee , Lakshmanan Karuppiah
CPC classification number: G01B11/0683 , G01B11/0625 , Y10S707/99936
Abstract: A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
Abstract translation: 确定基板的物理性质的方法包括记录从基板获得的第一光谱，第一光谱是在改变基板的物理性质的抛光工艺期间获得的第一光谱。 该方法包括在数据库中识别与记录的第一光谱相似的几个先前记录的光谱中的至少一个。 数据库中的每个光谱具有与之相关联的物理属性值。 该方法包括产生指示物理属性的第一值与第一频谱相关联的信号，第一值使用与数据库中所识别的先前记录的频谱相关联的物理属性值来确定。 用于确定基板的物理性质的系统包括抛光机，端点确定模块和数据库。
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94.发明授权Method and apparatus for protecting an optical transmission measurement when sensing transparent materials 有权检测透明材料时用于保护光学传输测量的方法和装置公开(公告)号：US07417749B1
公开(公告)日：2008-08-26
申请号：US11217508
申请日：2005-09-01
Applicant: Jeffrey A. Simpson , Mark A. Imbrock
Inventor： Jeffrey A. Simpson , Mark A. Imbrock
IPC: G01B11/06
CPC classification number: G01B11/06 , G01B11/0625 , G01N21/15 , G01N21/55 , G01N21/896 , G01N2021/151 , G01N2021/158
Abstract: A method and apparatus for protecting an optical transmission measurement when sensing transparent materials. Sensing apparatus located in a housing directs a light beam at an upward angle to a sheet of transparent material and detects downward surface reflections of the beam from the transparent material. The light beam and the reflections pass through a transparent protective layer on the housing. A flow of clean air is passed between the protective layer and the transparent material to remove particles and liquid from the protective layer and from the space between the protective layer and the transparent material. Preferably, the protective layer is either made from a hydrophobic material or has a hydrophobic surface coating to facilitate blowing liquid and particles from the surface.
Abstract translation: 一种用于在检测透明材料时保护光学传输测量的方法和装置。 位于壳体内的传感装置将一束光束向一个透明材料片向上倾斜，并检测来自透明材料的光束的向下表面反射。 光束和反射通过壳体上的透明保护层。 清洁空气流在保护层和透明材料之间通过，以从保护层和保护层和透明材料之间的空间去除颗粒和液体。 优选地，保护层由疏水材料制成或具有疏水表面涂层以便于从表面吹出液体和颗粒。
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公开(公告)号：US07411685B2
公开(公告)日：2008-08-12
申请号：US11288447
申请日：2005-11-29
Applicant: Jun Takashima , Koichi Ekawa , Hideyuki Murai
Inventor： Jun Takashima , Koichi Ekawa , Hideyuki Murai
IPC: G01B11/02
CPC classification number: G01B11/0641 , G01B11/0625 , G01N21/211 , G01N2021/213
Abstract: Providing a spectrometric measuring instrument suitable for in-line measurement for example in a semiconductor manufacturing process, an FPD manufacturing process, or the like, by realizing size reduction and imparting resistance to distance fluttering, angle fluttering in a horizontal direction, and angle fluttering in a perpendicular direction. A light interference type spectral element for gradually changing a wavelength of transmitted light by means of a transmitted position is provided immediately before the photoelectric transfer part array device, and based upon a light-receiving side optical system having the function of detecting a change in state of polarization of a reflected light from a sample, and a series of light-receiving amount data obtained from each of photoelectric transfer parts of the photoelectric transfer part array device, polarized light is analyzed. By fitting of a measured waveform to a theoretical waveform, a film thickness or film quality is obtained.
Abstract translation: 提供适用于在线测量的光谱测量仪器，例如在半导体制造工艺，FPD制造工艺等中，通过实现尺寸减小和赋予距离振动的阻力，在水平方向上的角度抖动以及角度抖动 垂直方向。 在光电转移体阵列装置的正前方设置用于通过透射位置逐渐变化透射光的波长的光干涉型光谱元件，并且基于具有检测状态变化的功能的受光侧光学系统 分析来自样品的反射光的偏振光和从光电转移体阵列器件的各光电转移部分获得的一系列光接收量数据，分析偏振光。 通过将测量波形拟合到理论波形，获得膜厚度或膜质量。
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Patent Agency Ranking
公开(公告)号：US07411667B2
公开(公告)日：2008-08-12
申请号：US11252254
申请日：2005-10-18
Applicant: Nicolaas Antonius Allegondus Johannes Van Asten , Oana Cristina Balan , Luberthus Ouwehand , Machiel Jacobus Johannes Viguurs , Alexander Charles Franciscus Anna Van Well , Lun Kai Cheng , Huibert Blokland , Elke Van Loenhout , Hans Baltus Bakker
Inventor： Nicolaas Antonius Allegondus Johannes Van Asten , Oana Cristina Balan , Luberthus Ouwehand , Machiel Jacobus Johannes Viguurs , Alexander Charles Franciscus Anna Van Well , Lun Kai Cheng , Huibert Blokland , Elke Van Loenhout , Hans Baltus Bakker
CPC classification number: G03F9/7049 , G01B11/0625 , G03F9/7034 , G03F9/7088
Abstract: The invention relates to a level sensor for determining a height of a substrate. The level sensor generates one or more measurement beam and directs the measurement beam to a measurement spot on the substrate and produces a reflected measurement beam. The level sensor also generates one or more reference beams. A detector detects both the reflected measurement beam and the reference beam, respectively, and produces a measurement signal and a reference signal, respectively, the measurement signal being indicative for the height at the measurement spot. A processor that receives these signals and corrects the measurement signal based on the reference signal. The level sensor has an optical arrangement in a predetermined area close to where the substrate is to be located. The measurement beam and the reference beam propagate along substantially equal optical paths of propagation in the predetermined area. The optical arrangement deviates the reference beam from the substantially equal optical paths of propagation in the predetermined area such that the at least one reference beam does not hit the substrate.
Abstract translation: 本发明涉及一种用于确定基板高度的液位传感器。 液位传感器产生一个或多个测量光束，并将测量光束引导到衬底上的测量点，并产生反射的测量光束。 液位传感器还产生一个或多个参考光束。 检测器分别检测反射的测量光束和参考光束，分别产生测量信号和参考信号，测量信号指示测量点处的高度。 接收这些信号并根据参考信号校正测量信号的处理器。 液位传感器在靠近基板的位置的预定区域具有光学布置。 测量光束和参考光束沿预定区域中基本相等的传播光路传播。 光学布置将参考光束从预定区域中的基本上相等的传播光路径偏离，使得至少一个参考光束不会撞击基板。
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97.发明申请PURGE GAS FLOW CONTROL FOR HIGH-PRECISION FILM MEASUREMENTS USING ELLIPSOMETRY AND REFLECTOMETRY 有权用于高精度电泳测量的气体流量控制使用ELLIPSOMETRY和REFLECTOMETRY公开(公告)号：US20080180698A1
公开(公告)日：2008-07-31
申请号：US12019592
申请日：2008-01-24
Applicant: Hidong Kwak , Shankar Krishnan
Inventor： Hidong Kwak , Shankar Krishnan
CPC classification number: G01B11/0625 , G01B11/0633 , G01B11/0641 , G01J3/02 , G01J3/0224 , G01J3/0294 , G01J3/447 , G01N21/211 , G01N21/33 , G01N2021/213 , G01N2201/0233
Abstract: An optical method and system for measuring characteristics of a sample using a broadband metrology tool in a purge gas flow environment are disclosed. In the method a beam path for the metrology tool is purged with purge gas at a first flow rate. A surface of the sample is illuminated by a beam of source radiation having at least one wavelength component in a vacuum ultraviolet (VUV) range and/or at least one wavelength component in an ultraviolet-visible (UV-Vis) range. A flow rate of a purge gas is adjusted between the first flow rate for metrology measurements made when the source radiation is in the VUV spectral region and a second flow rate for metrology measurements made when the source radiation is in the UV-Vis spectral region. The system includes a light source, illumination optics, collection optics, detector, a purge gas source and a controller. The purge gas source is configured to supply a flow of purge gas to a beam path in the light source and/or illumination optics and/or sample and/or collection optics and/or detector. The controller is configured to control a flow rate of the purged gas flow in response to an output signal from the detector.
Abstract translation: 公开了一种用于在吹扫气体流动环境中使用宽带测量工具测量样品的特性的光学方法和系统。 在该方法中，用第一流量的吹扫气体吹扫计量工具的光束路径。 通过在紫外 - 可见（UV-Vis）范围内具有真空紫外（VUV）范围和/或至少一个波长分量的至少一个波长分量的源辐射束照射样品的表面。 当源辐射处于VUV光谱区域时进行的度量测量的第一流量和当源辐射处于UV-Vis光谱区域时进行度量测量的第二流量时，净化气体的流量被调节。 该系统包括光源，照明光学器件，收集光学器件，检测器，吹扫气体源和控制器。 吹扫气体源被配置为向光源和/或照明光学器件和/或样品和/或收集光学元件和/或检测器中的光束路径提供净化气体流。 控制器被配置为响应于来自检测器的输出信号来控制净化气体流量的流量。
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公开(公告)号：US20080180697A1
公开(公告)日：2008-07-31
申请号：US12002038
申请日：2007-12-14
Applicant: Taiki Sawabe , Keiji Nomaru
Inventor： Taiki Sawabe , Keiji Nomaru
IPC: G01B11/06
CPC classification number: G01B11/0625 , B23K26/048 , B23K26/0861 , B23K2101/40
Abstract: A measuring instrument for a wafer for measuring the thickness of a wafer held on a chuck table using a laser beam includes a condenser for condensing and irradiating the laser beam on the wafer held on the chuck table, a light reception unit for receiving reflected light of the laser beam irradiated upon the wafer, a convergence light point changing unit for changing the convergence light point of the laser beam, and a control unit for measuring the thickness of the wafer based on a change signal from the convergence light point changing unit and a light reception signal from the light reception unit. The control unit stores a thickness control map. The control unit controls an angle adjustment actuator, provided for adjusting the installation angle of a pair of mirrors, to change the installation angle and detects two peaks of the light amount based on the reception signal from the light reception unit.
Abstract translation: 用于测量使用激光束保持在卡盘台上的晶片的厚度的晶片测量仪器包括用于在保持在卡盘台上的晶片上聚集和照射激光束的聚光器，用于接收反射光的反射光的光接收单元 照射在晶片上的激光束，用于改变激光束的会聚光点的会聚光点改变单元和用于根据来自会聚光点改变单元的变化信号测量晶片的厚度的控制单元，以及 来自光接收单元的光接收信号。 控制单元存储厚度控制图。 控制单元控制角度调节致动器，用于调节一对反射镜的安装角度，以改变安装角度，并根据来自光接收单元的接收信号检测光量的两个峰值。
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公开(公告)号：US20080158572A1
公开(公告)日：2008-07-03
申请号：US11646221
申请日：2006-12-27
Applicant: Michael K. Hughes
Inventor： Michael K. Hughes
IPC: G01B11/06
CPC classification number: G01B11/0625
Abstract: A measurement system that uses a laser triangulation device to measure the thickness of transparent and/or opaque layers of a multilayer film. The triangulation device has a laser device that projects a beam perpendicularly to a surface of the multilayer film and first and second detectors that image first and second reflected rays of the beam at first and second distances offset from first and second optical axes to produce first and second measurement signals. A controller processes the measurement signals using a triangulation procedure and a simultaneous equation procedure to provide a thickness of an outer transparent layer. For a multilayer film having an opaque layer sandwiched between outer transparent layers, first and second triangulation devices are disposed on opposed sides of the film to measure the thickness of each outer film. Knowing the distance between the two devices, the thickness of the opaque layer can be derived.
Abstract translation: 一种测量系统，其使用激光三角测量装置来测量多层膜的透明和/或不透明层的厚度。 三角测量装置具有激光装置，该激光装置垂直于多层膜的表面投影光束，第一和第二检测器使第一和第二距离的第一和第二反射光线从第一和第二光轴偏离，以产生第一和第二光轴， 第二测量信号。 控制器使用三角测量程序和联立方程程序来处理测量信号以提供外部透明层的厚度。 对于具有夹在外透明层之间的不透明层的多层膜，第一和第二三角测量装置设置在膜的相对侧上以测量每个外膜的厚度。 知道两个装置之间的距离，可以得出不透明层的厚度。
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100.发明申请公开(公告)号：US20080137083A1
公开(公告)日：2008-06-12
申请号：US12010938
申请日：2008-01-31
Applicant: Takayuki Sakai , Masanobu Kibe , Tokuhisa Ohiwa
Inventor： Takayuki Sakai , Masanobu Kibe , Tokuhisa Ohiwa
IPC: G01J4/00
CPC classification number: H01L21/76802 , G01B11/0625 , G01B11/0683 , G01B11/22 , H01J37/32935 , H01J37/32972 , H01L22/26 , H01L2924/0002 , H01L2924/00
Abstract: A process monitoring system has a process chamber configured to hold an object to be processed, an illumination source configured to emit a light to the object, a polarizer configured to polarize the light, a monitor window having a birefringent material and provided on the process chamber to propagate the light, direction adjusting equipment configured to adjust a relationship between a polarization plane of the light and a direction of an optic axis of the monitor window, and a monitoring information processor configured to detect the light reflected from the object.
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