Abstract:
A thin film transistors (TFTs) substrate is structured to maintain as constant across the area of the substrate a kickback voltage due to Miller capacitance between the drain and gate of each TFT even in the presence of manufacturing induced misalignments between the drain electrodes and corresponding gate lines. Each thin film transistor includes a gate electrode, an active layer formed on the gate electrode so as to overlap the gate electrode, first and second source electrodes respectively connected to first and second data lines each of which crosses the gate line while being insulated from the gate line, and an elongated drain electrode located between the first and second source electrodes and disposed over the gate electrode so as to a crossing length of the drain electrode is larger than an underlying width of the gate electrode such that misalignment induced shifts of the position of the gate electrode relative to the drain electrode does not substantially change overlap area between the two.
Abstract:
A display substrate includes a switching transistor electrically connected to a gate line and a data line, the data line extending in a first direction substantially perpendicular to the gate line extending in a second direction, the switching transistor including a switching active pattern comprising amorphous silicon, a driving transistor electrically connected to a driving voltage line and the switching transistor, the driving voltage line extended in the first direction, the driving transistor including a driving active pattern comprising a metal oxide; and a light-emitting element electrically connected to the driving transistor.
Abstract:
A TFT array panel-including a substrate, a gate line having a gate electrode, a gate insulating layer formed on the gate line, a data line having a source electrode and a drain electrode spaced apart from the source electrode, a passivation layer formed on the data line and the drain electrode, and a pixel electrode connected to the drain electrode is provided. The TFT array panel further includes a protection layer including Si under at least one of the gate insulating layer and the passivation layer to enhance reliability.
Abstract:
A fanout line structure and a liquid crystal display panel and a liquid crystal display including the fanout line structure are presented. The fanout line structure connects a signal line to a bonding pad, and includes a plurality of fanout lines that are positioned apart from each other. The plurality of fanout lines are formed to have different lengths, and a hole pattern is formed in at least one of the plurality of fanout lines to reduce the difference in resistance levels between the fanout lines. The fanout structure significantly reduces any deterioration in image quality stemming from different resistance levels among the fanout lines.
Abstract:
A liquid crystal display device includes a first substrate where a pixel thin film transistor is formed, a second substrate which is positioned opposite to the first substrate and a liquid crystal layer interposed between the first substrate and the second substrate. A light source is positioned beneath the first substrate, and joins the first substrate with the second substrate, the first substrate comprising: a first insulating substrate which has a display area where the pixel thin film transistor is formed and a non-display area which surrounds the display area; a gate line in the display area and the gate line being electrically connected to the pixel thin film transistor. A gate driving portion is formed in the non-display area to drive the gate line and comprises a driving thin film transistor; and a light blocking member which covers the gate driving part.
Abstract:
The present invention relates to a process for vapor depositing a low dielectric insulating film, a thin film transistor using the same, and a preparation method thereof, and more particularly to a process for vapor deposition of low dielectric insulating film that can significantly improve a vapor deposition speed while maintaining properties of the low dielectric insulating film, thereby solving parasitic capacitance problems to realize a high aperture ratio structure, and can reduce a process time by using silane gas when vapor depositing an insulating film by a CVD or PECVD method to form a protection film for a semiconductor device. The present invention also relates to a thin film transistor using the process and preparation method thereof.
Abstract:
A panel assembly includes a gate wire, a data wire, a plurality of pixel electrodes, a liquid crystal layer, and a common electrode. The gate wire includes a plurality of gate lines and the data wire includes a plurality of data lines crossing and insulated from the gate lines. The pixel electrodes are insulated from each other and disposed on the data wire. The liquid crystal layer is disposed on the pixel electrodes and includes liquid crystal molecules, and a common electrode is disposed on the liquid crystal layer. The gate lines cross a center of the pixel electrodes, and the common electrode includes a plurality of cutting patterns that overlap the gate lines.
Abstract:
A TFT includes a gate electrode, an active layer, a source electrode, a drain electrode, and a buffer layer. The gate electrode is formed on the substrate; the active layer is formed on the gate electrode. The source and drain electrodes, formed on the active layer, are separated by a predetermined distance. The buffer layer is formed between the active layer and the source and drain electrodes. The buffer layer has a substantially continuously varying content ratio corresponding to a buffer layer thickness. The buffer layer is formed to suppress oxidation of the active layer, and reduce contact resistance.
Abstract:
A liquid crystal display device having fingerprint identification device for enhancing aperture ratio and transmissivity of a TFT-LCD panel is disclosed. A fingerprint identification substrate (400) is attached to a TFT substrate (300). The TFI substrate has color-filter-on-array structure in which the color filters (336) and the thin film transistors can be eliminated, the aperture ratio is increased, and the quality of image display is enhanced. In addition, the transmissivity is increased according to the decrease of the number of glass substrate used in the liquid crystal display device, so that the sensitivity of fingerprint identification is enhanced.
Abstract:
The present invention discloses a thin film transistor (TFT), a method for manufacturing the TFT, and a display substrate using the TFT that may prevent degradation of the characteristics of an oxide semiconductor contained in the TFT by blocking external light from entering a channel region of the oxide semiconductor. The TFT includes an oxide semiconductor layer; a protective layer overlapping a channel region of the oxide semiconductor layer; an opaque layer disposed between the oxide semiconductor layer and the protective layer; a source electrode contacting a first side of the oxide semiconductor layer; a drain electrode contacting a second side of the oxide semiconductor layer and facing the source electrode across the channel region; a gate electrode to apply an electric field to the oxide semiconductor layer; and a gate insulating layer disposed between the gate electrode and the oxide semiconductor layer.