公开(公告)号：US20160027517A1

公开(公告)日：2016-01-28

申请号：US14486687

申请日：2014-09-15

Applicant: Silicon Storage Technology, Inc.

Inventor： Jinho Kim ,  Nhan Do ,  Yuri Tkachev ,  Kai Man Yue ,  Xiaozhou Qian ,  Ning Bai

IPC: G11C16/14

CPC classification number: G11C16/14 ,  G11C16/0425 ,  G11C16/12 ,  G11C16/16 ,  G11C29/021 ,  G11C29/028

Abstract: A system and method to inhibit the erasing of a portion of a sector of split gate flash memory cells while allowing the remainder of the sector to be erased is disclosed. The inhibiting is controlled by control logic that applies one or more bias voltages to the portion of the sector whose erasure is to be inhibited.

Abstract translation: 公开了一种抑制扇区的分割门闪存单元的一部分擦除同时允许扇区的其余部分被擦除的系统和方法。 禁止由控制逻辑控制，该控制逻辑将一个或多个偏置电压施加到要擦除擦除的扇区的该部分。

公开(公告)号：US12249368B2

公开(公告)日：2025-03-11

申请号：US18645184

申请日：2024-04-24

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Steven Lemke ,  Vipin Tiwari ,  Nhan Do ,  Mark Reiten

IPC: G11C11/54 ,  G06N3/045 ,  G11C16/04 ,  G11C16/10 ,  G11C16/14 ,  H01L29/423 ,  H01L29/788 ,  H10B41/30

Abstract: A neural network device with synapses having memory cells each having a floating gate and a first gate over first and second portions of a channel region disposed between source and drain regions, and a second gate over the floating gate or the source region. First lines each electrically connect the first gates in one of the memory cell rows, second lines each electrically connect the second gates in one of the memory cell rows, third lines each electrically connect the source regions in one of the memory cell rows, and fourth lines each electrically connect the drain regions in one of the memory cell columns. The synapses receive a first plurality of inputs as electrical voltages on the fourth lines, and provide a first plurality of outputs as electrical currents on the third lines.

公开(公告)号：US20240389319A1

公开(公告)日：2024-11-21

申请号：US18228414

申请日：2023-07-31

Applicant: Silicon Storage Technology, Inc.

Inventor： Serguei Jourba ,  Catherine Decobert ,  Nhan Do

IPC: H10B41/30 ,  H01L21/28 ,  H01L29/423 ,  H01L29/66 ,  H01L29/788 ,  H10B41/40

Abstract: A memory device includes a SOI substrate comprising bulk silicon, an insulation layer vertically over the bulk silicon, and a silicon layer vertically over the insulation layer. A memory cell includes source and drain regions formed in the bulk silicon with a channel region of the bulk silicon extending therebetween, and a floating gate which includes a first portion of the silicon layer disposed vertically over and insulated from a first portion of the channel region by the insulation layer. The first portion of the silicon layer is epitaxially thickened or a layer of polysilicon is formed on the first portion of the silicon layer. A select gate is disposed vertically over and insulated from a second portion of the channel region. A control gate is disposed vertically over and insulated from the floating gate. An erase gate is disposed vertically over and insulated from the source region.

公开(公告)号：US20240257880A1

公开(公告)日：2024-08-01

申请号：US18104228

申请日：2023-01-31

Applicant: Silicon Storage Technology, Inc.

Inventor： Louisa Schneider ,  Xian Liu ,  Steven Lemke ,  Parviz Ghazavi ,  Jinho Kim ,  Henry A. Om'Mani ,  Hieu Van Tran ,  Nhan Do

IPC: G11C16/16 ,  H01L23/48 ,  H01L29/423 ,  H10B41/10 ,  H10B41/27

CPC classification number: G11C16/16 ,  H01L23/481 ,  H01L29/42328 ,  H10B41/10 ,  H10B41/27

Abstract: A memory cell array having rows and columns of memory cells with respective ones of the memory cells including spaced apart source and drain regions formed in a semiconductor substrate with a channel region extending there between, a floating gate over a first portion of the channel region, a select gate over a second portion of the channel region, and an erase gate over the source region. A strap region is disposed between first and second pluralities of the columns. For one memory cell row, a dummy floating gate is disposed in the strap region, an erase gate line electrically connects together the erase gates of the memory cells in the one row and in the first plurality of columns, wherein the erase gate line is aligned with the dummy floating gate with a row direction gap between the erase gate line and the dummy floating gate.

公开(公告)号：US12020762B2

公开(公告)日：2024-06-25

申请号：US17576754

申请日：2022-01-14

Applicant: Silicon Storage Technology, Inc.

Inventor： Yuri Tkachev ,  Jinho Kim ,  Cynthia Fung ,  Gilles Festes ,  Bernard Bertello ,  Parviz Ghazavi ,  Bruno Villard ,  Jean Francois Thiery ,  Catherine Decobert ,  Serguei Jourba ,  Fan Luo ,  Latt Tee ,  Nhan Do

IPC: G11C29/50

CPC classification number: G11C29/50004 ,  G11C2029/5006

Abstract: A method of testing non-volatile memory cells formed on a die includes erasing the memory cells and performing a first read operation to determine a lowest read current RC1 for the memory cells and a first number N1 of the memory cells having the lowest read current RC1. A second read operation is performed to determine a second number N2 of the memory cells having a read current not exceeding a target read current RC2. The target read current RC2 is equal to the lowest read current RC1 plus a predetermined current value. The die is determined to be acceptable if the second number N2 is determined to exceed the first number N1 plus a predetermined number. The die is determined to be defective if the second number N2 is determined not to exceed the first number N1 plus the predetermined number.

公开(公告)号：US11875852B2

公开(公告)日：2024-01-16

申请号：US17140924

申请日：2021-01-04

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stanley Hong ,  Stephen Trinh ,  Anh Ly ,  Nhan Do ,  Mark Reiten

IPC: G11C7/12 ,  G11C16/08 ,  G11C11/54 ,  G11C16/24

CPC classification number: G11C16/08 ,  G11C11/54 ,  G11C16/24 ,  G11C2216/04

Abstract: Numerous embodiments of analog neural memory arrays are disclosed. Certain embodiments comprise an adaptive bias decoder for providing additional bias to array input lines to compensate for instances where ground floats above 0V. This is useful, for example, to minimize the voltage drop for a read, program, or erase operation while maintaining accuracy in the operation.

公开(公告)号：US11798619B2

公开(公告)日：2023-10-24

申请号：US17857113

申请日：2022-07-04

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stephen Trinh ,  Stanley Hong ,  Anh Ly ,  Steven Lemke ,  Vipin Tiwari ,  Nhan Do

IPC: G11C11/54 ,  G11C16/04 ,  G11C16/08 ,  G11C16/16 ,  G11C16/34 ,  G11C16/10 ,  G06N3/065

CPC classification number: G11C11/54 ,  G06N3/065 ,  G11C16/0483 ,  G11C16/08 ,  G11C16/10 ,  G11C16/16 ,  G11C16/3418 ,  G11C2216/04

Abstract: Numerous examples for performing tuning of a page or a word of non-volatile memory cells in an analog neural memory are disclosed. In one example, a method comprises programming a word or page of non-volatile memory cells in an analog neural memory system; and identifying any fast bits in the word or page of non-volatile memory cells.

公开(公告)号：US11783904B2

公开(公告)日：2023-10-10

申请号：US17839294

申请日：2022-06-13

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Thuan Vu ,  Stephen Trinh ,  Stanley Hong ,  Anh Ly ,  Steven Lemke ,  Nha Nguyen ,  Vipin Tiwari ,  Nhan Do

IPC: G11C16/34 ,  G11C16/10 ,  G06N3/063 ,  G06F3/06 ,  G06N3/08 ,  G11C16/26 ,  G11C29/10

CPC classification number: G11C16/3459 ,  G06F3/0688 ,  G06N3/063 ,  G06N3/08 ,  G11C16/10 ,  G11C16/26 ,  G11C16/3436 ,  G11C29/10

Abstract: In one example, a method is disclosed of compensating for leakage in an array of analog neural non-volatile memory cells, wherein the array is arranged in rows and columns, wherein each row is coupled to a word line and each column is coupled to a bitline, the method comprising measuring leakage for a column of analog neural non-volatile memory cells coupled to a bitline; storing the measured leakage value; and applying the measured leakage value during a read operation of the column of analog neural non-volatile memory cells to compensate for the leakage.

公开(公告)号：US11683933B2

公开(公告)日：2023-06-20

申请号：US17121555

申请日：2020-12-14

Applicant: Silicon Storage Technology, Inc.

Inventor： Hieu Van Tran ,  Steven Lemke ,  Vipin Tiwari ,  Nhan Do ,  Mark Reiten

IPC: H01L27/11531 ,  G06N3/08 ,  G11C16/04 ,  H01L29/788

CPC classification number: H01L27/11531 ,  G06N3/08 ,  G11C16/0425 ,  H01L29/7883

Abstract: Numerous embodiments for reading a value stored in a selected memory cell in a vector-by-matrix multiplication (VMM) array in an artificial neural network are disclosed. In one embodiment, an input comprises a set of input bits that result in a series of input pulses applied to a terminal of the selected memory cell, further resulting in a series of output signals that are summed to determine the value stored in the selected memory cell. In another embodiment, an input comprises a set of input bits, where each input bit results in a single pulse or no pulse being applied to a terminal of the selected memory cell, further resulting in a series of output signals which are then weighted according to the binary bit location of the input bit, and where the weighted signals are then summed to determine the value stored in the selected memory cell.

公开(公告)号：US11594453B2

公开(公告)日：2023-02-28

申请号：US17716950

申请日：2022-04-08

Applicant: Silicon Storage Technology, Inc.

Inventor： Serguei Jourba ,  Catherine Decobert ,  Feng Zhou ,  Jinho Kim ,  Xian Liu ,  Nhan Do

IPC: H01L21/77 ,  H01L27/11517 ,  H01L29/423 ,  H01L29/66 ,  H01L29/78 ,  H01L29/788

Abstract: A method of forming a device on a substrate with recessed first/third areas relative to a second area by forming a fin in the second area, forming first source/drain regions (with first channel region therebetween) by first/second implantations, forming second source/drain regions in the third area (defining second channel region therebetween) by the second implantation, forming third source/drain regions in the fin (defining third channel region therebetween) by third implantation, forming a floating gate over a first portion of the first channel region by first polysilicon deposition, forming a control gate over the floating gate by second polysilicon deposition, forming an erase gate over the first source region and a device gate over the second channel region by third polysilicon deposition, and forming a word line gate over a second portion of the first channel region and a logic gate over the third channel region by metal deposition.