Large-scale wide area network system having location information management function
    121.
    发明申请
    Large-scale wide area network system having location information management function 审中-公开
    具有位置信息管理功能的大型广域网系统

    公开(公告)号:US20070177530A1

    公开(公告)日:2007-08-02

    申请号:US11439210

    申请日:2006-05-24

    IPC分类号: H04B7/00

    摘要: A large-scale wide area network system includes wireless communication base devices respectively configuring access points covering wireless zones subordinate thereto; wireless communication base control devices performing integrated control of the corresponding wireless communication base devices, and managing IP addresses of the wireless communication base control devices of a home location and a visited location as location information of a mobile terminal; in-area location information management devices respectively connected to the corresponding wireless communication base control devices via respective area IP networks corresponding to areas administered by the same common carrier, and managing the IP address of the wireless communication base control device of the home location as the location information of the mobile terminal; and a wide area location information management device hierarchically connected to the in-area location information management devices via a wide area IP network corresponding to a wide area administered by the common carrier, and managing the IP address of the corresponding in-area location information management device as the location information of the mobile terminal.

    摘要翻译: 大型广域网系统包括分别配置覆盖从属于其的无线区域的接入点的无线通信基站设备; 无线通信基站控制设备执行对应的无线通信基站设备的集成控制,以及管理归属位置和访问位置的无线通信基站控制设备的IP地址作为移动终端的位置信息; 分别通过对应于由相同公共载体管理的区域的相应区域IP网络分别连接到相应的无线通信基站控制设备的区域内位置信息管理设备,以及归属位置的无线通信基站控制设备的IP地址作为 移动终端的位置信息; 以及广域位置信息管理装置,经由与所述共同载体管理的广域对应的广域IP网络分层连接到所述区域内信息管理装置,并管理对应的区域内位置信息管理的IP地址 设备作为移动终端的位置信息。

    Catalyst composition for the isomerization of n-paraffin and a process for isomerizing n-paraffin
    122.
    发明授权
    Catalyst composition for the isomerization of n-paraffin and a process for isomerizing n-paraffin 失效
    用于异构化正链烷烃的催化剂组合物和异构化正链烷烃的方法

    公开(公告)号:US07119042B2

    公开(公告)日:2006-10-10

    申请号:US10800395

    申请日:2004-03-10

    IPC分类号: B01J29/06 C07C5/22

    摘要: Provided is a catalyst composition for the isomerization of n-paraffin which comprises a β-zeolite having been synthesized according to a dry gel process and contains cerium, the β-zeolite being characterized in that it has an average particle diameter of 0.01˜0.1 μm and the proportion of the cerium in the β-zeolite is within the range of 0.001˜0.2 in terms of the atomic ratio of the silicon atom in the β-zeolite to the cerium atom, i.e. [Ce]/[Si] as well as a process for isomerizing n-paraffin which comprises bringing n-paraffin into contact with the catalyst composition as set forth above.

    摘要翻译: 本发明提供了一种正链烷烃异构化的催化剂组合物,它包括根据干凝胶法合成并含有铈的β-沸石,β-沸石的特征在于其平均粒径为0.01〜0.1μm 并且β-沸石中铈的比例以β-沸石中的硅原子与铈原子的原子比(即[Ce] / [Si])的比例在0.001〜0.2的范围内,以及 一种异构化正链烷烃的方法,其包括使正链烷烃与上述催化剂组合物接触。

    Surface acoustic wave device
    124.
    发明申请
    Surface acoustic wave device 有权
    表面声波装置

    公开(公告)号:US20050001512A1

    公开(公告)日:2005-01-06

    申请号:US10836201

    申请日:2004-05-03

    CPC分类号: H03H9/02582 H03H3/08

    摘要: There is disclosed a surface acoustic wave device having at least a diamond film, a piezoelectric-material film, and an electrode on a base material wherein all or some part of the diamond film consists of an electroconductive diamond in which a dopant is doped. Thereby, there can be provided a surface acoustic wave device wherein breakage of the substrate due to generation of static electricity can be prevented in a device manufacturing process so that the device manufacture yield can be increased, and electrification can be prevented at the time of real use so that high performance can be maintained for a long time, even if it is a surface acoustic wave device using diamond.

    摘要翻译: 公开了一种表面声波装置,其至少具有金刚石膜,压电材料膜和基材上的电极,其中金刚石膜的全部或部分由掺杂掺杂剂的导电金刚石构成。 因此,可以提供一种表面声波装置,其中在器件制造过程中可以防止由于静电产生导致的基板的断裂,从而可以提高器件的制造成品率,并且可以在实际的时候防止通电 使用这样的高性能可以长时间保持,即使它是使用金刚石的表面声波装置。

    Hybrid exchange, an exchange, and a re-arrangement method for STM data in an exchange
    125.
    发明授权
    Hybrid exchange, an exchange, and a re-arrangement method for STM data in an exchange 失效
    交换中的STM数据的混合交换,交换和重新排列方法

    公开(公告)号:US06560219B1

    公开(公告)日:2003-05-06

    申请号:US08951883

    申请日:1997-10-16

    IPC分类号: H04L1264

    摘要: A hybrid exchange which exchanges the STM data to be transmitted periodically to realize an exchange in unit of the ATM data to be transmitted asynchronously includes asynchronous transmission terminal interface as the interface with an STM terminal, an synchronous transmission terminal interface as the interface with an ATM terminal, an ATM exchange interface as the interface with an ATM exchange, a transmitting unit for transmitting the STM time slot and ATM time slot, and a control unit for controlling the interfaces. The synchronous transmission terminal interface assigns the STM data to be transmitted periodically to the STM time slot, while the asynchronous transmission terminal interface assigns the ATM data to be transmitted asynchronously to the ATM time slot. The STM time slot and ATM time slot are identified by the STM/ATM identifier. The STM time slot is stored by multiplexing a plurality of STM data.

    摘要翻译: 交换周期性发送的STM数据的混合交换机以实现异步发送的ATM数据的单元交换,包括作为与STM终端的接口的异步传输终端接口,作为与ATM的接口的同步传输终端接口 终端,作为与ATM交换机的接口的ATM交换接口,用于发送STM时隙和ATM时隙的发送单元,以及用于控制接口的控制单元。 同步传输终端接口将要周期性发送的STM数据分配给STM时隙,而异步传输终端接口分配要与ATM时隙异步发送的ATM数据。 STM时隙和ATM时隙由STM / ATM标识符标识。 通过复用多个STM数据来存储STM时隙。

    Electrostatic holding apparatus
    126.
    发明授权
    Electrostatic holding apparatus 有权
    静电保持装置

    公开(公告)号:US6122159A

    公开(公告)日:2000-09-19

    申请号:US209703

    申请日:1998-12-10

    CPC分类号: H01L21/6833 Y10T279/23

    摘要: An electrostatic holding apparatus in which a voltage is applied to an conductive electrode covered with an insulating dielectric layer, in order to cause the insulating dielectric layer to electrostatically attract an object. The insulating dielectric layer is substantially formed of a sintered body produced by addition of 2.5-5 wt. % titania (TiO.sub.2) and 5 wt. % or less titanium nitride (TiN) powder to powder of a high resistivity ceramic having a volume resistivity of 1.times.10.sup.14 .OMEGA..multidot.cm or higher at 25.degree. C., followed by kneading, forming, and sintering. The sintered body has a volume resistivity of 1.times.10.sup.8 -8.times.10.sup.13 .OMEGA..multidot.cm at 25.degree. C. The volume resistivity of the insulating dielectric layer is decreased so as to increase an electrostatic attraction force, and an object can be removed at the time of stopping application of voltage. Further, the electrostatic holding apparatus does not generate impurities that would otherwise contaminate semiconductor devices. In addition, neither fine cracks nor pores remain, so that the electrostatic holding apparatus excellent in terms of withstand voltage.

    摘要翻译: 一种静电保持装置,其中电压施加到被绝缘电介质层覆盖的导电电极,以使绝缘介电层静电吸引物体。 绝缘介电层基本上由通过加入2.5-5wt。 二氧化钛(TiO 2)和5重量% 在25℃下体积电阻率为1×10 14欧米茄×厘米或更高的高电阻率陶瓷粉末,至少10%或更少的氮化钛(TiN)粉末,然后进行捏合,成形和烧结。 该烧结体在25℃下体积电阻率为1×108-8×1013欧米伽xcm。绝缘介电层的体积电阻率降低,从而增加静电吸引力,并且可以在停止应用时去除物体 电压。 此外,静电保持装置不产生否则将污染半导体器件的杂质。 此外,不存在细小的裂纹和毛孔,使得静电保持装置在耐电压方面优异。

    Frame-supported pellicle for dustproof protection of photomask in
photolithography
    127.
    发明授权
    Frame-supported pellicle for dustproof protection of photomask in photolithography 失效
    用于光刻中光掩模防尘保护的框架支撑防护薄膜

    公开(公告)号:US5693382A

    公开(公告)日:1997-12-02

    申请号:US647140

    申请日:1996-05-09

    摘要: Disclosed is a frame-supported pellicle, which is an integral body consisting of a rigid frame and a transparent plastic film adhesively bonded to one end surface of the frame in a slack-free fashion, for dustproof protection of a photomask used in a photolithographic patterning work in the manufacture of fine electronic devices such as LSIs and liquid crystal display panels. The frame-supported pellicle is prepared by bonding the frame and plastic film with an adhesive having a glass transition temperature substantially lower than that of the polymeric resin forming the film and the adhesive bonding work is performed at a temperature higher than the glass transition temperature of the adhesive but lower than that of the polymeric resin of the film so that excellent adhesive bonding strength can be obtained between the frame and the resin film still without causing any adverse influences on the resin film such as distortion and crease formation.

    摘要翻译: 公开了一种框架支撑的防护薄膜,其是由刚性框架和透明塑料薄膜组成的整体,所述刚性框架和透明塑料薄膜以无松弛的方式粘合到所述框架的一个端面上,以防止光刻图案中使用的光掩模的防尘保护 在制造诸如LSI和液晶显示面板的精细电子器件中工作。 框架支撑的防护薄膜组件是用玻璃化转变温度基本上低于形成薄膜的聚合物树脂的玻璃化转变温度的粘合剂将框架和塑料薄膜粘合而制成的,并且粘合剂在高于玻璃化转变温度 粘合剂但低于膜的聚合物树脂的粘合剂,从而在框架和树脂膜之间仍然可以获得优异的粘合强度,而不会对树脂膜造成任何不利影响,例如变形和折痕形成。

    Frame-supported pellicle for dustproof protection of photomask
    128.
    发明授权
    Frame-supported pellicle for dustproof protection of photomask 失效
    镜框防护薄膜,用于光掩模的防尘保护

    公开(公告)号:US5419972A

    公开(公告)日:1995-05-30

    申请号:US287778

    申请日:1994-08-09

    摘要: An improvement is proposed for a frame-supported pellicle for dustproof protection of a photomask, which consists of a rigid frame and a transparent plastic membrane adhesively bonded to one end surface of the frame in a slack-free fashion, used in the photolithographic patterning work for the manufacture of fine electronic parts and devices. The improvement is obtained by providing the whole surface of the pellicle frame made from an alluminum alloy with a metallic plating layer of nickel or chromium so as to completely solve the heretofore unavoidable problem by the dust particle deposition on the pellicle membrane during transportation and handling as a consequence of dust particle formation by contacting with the inner surface of the holder case by virtue of the extremely high smoothness of the metal-plated frame surface.

    摘要翻译: 提出了一种用于光掩模防尘保护的框架式防护薄膜组件的改进,该光掩模由刚性框架和透明塑料膜组成,该透明塑料膜以无松弛的方式粘合到框架的一个端面上,用于光刻图案工作 用于制造精密电子零件和装置。 通过提供由铝合金制成的防护薄膜组件的整个表面由镍或铬的金属镀层提供,从而完全解决了在运输和处理过程中防尘薄膜上的灰尘颗粒沉积在防尘薄膜上的不可避免的问题 由于金属镀层的框架表面的平滑度极高,因此与保持器壳体的内表面接触而形成粉尘颗粒的结果。

    Frame-supported pellicle for protection of photolithographic mask
    129.
    发明授权
    Frame-supported pellicle for protection of photolithographic mask 失效
    框架支撑防护薄膜,用于保护光刻掩模

    公开(公告)号:US5370951A

    公开(公告)日:1994-12-06

    申请号:US7525

    申请日:1993-01-22

    摘要: An improvement is proposed in a frame-supported pellicle, i.e. a thin transparent film of a polymeric resin adhesively bonded to a frame member, used for dust-proof protection of a photomask in a photolithographic patterning work for the manufacture of electronic devices. The improvement comprises using, as the adhesive, an organopolysiloxane-based composition which comprises (a) a perfluoroalkyl-containing diorganopolysiloxane having at least two vinyl groups per molecule, (b) an organohydrogenpolysiloxane having at least one epoxy group and (c) a platinum catalyst for promoting the hydrosilation reaction between (a) and (b). As compared with conventional adhesives, a quite good adhesive bonding strength can be obtained with this adhesive even when the membrane is made from a fluorocarbon group-containing polymeric resin and the adhesive layer obtained therefrom is highly resistant against ultraviolet irradiation to ensure a long serviceable life of the pellicle.

    摘要翻译: 在用于电子设备的制造的光刻图案化工作中,在框架支撑的防护薄膜中提出了一种改进的粘合方式粘合到框架构件上的聚合物树脂透明薄膜,用于光掩模的防尘保护。 该改进包括使用基于有机聚硅氧烷的组合物作为粘合剂,其包含(a)每分子具有至少两个乙烯基的含全氟烷基的二有机聚硅氧烷,(b)具有至少一个环氧基的有机氢聚硅氧烷和(c)铂 促进(a)和(b)之间硅氢化反应的催化剂。 与常规粘合剂相比,即使膜由含碳氟化合物基团的聚合物树脂制成并且由其获得的粘合剂层也能够高度耐紫外线照射,从而可以获得相当好的粘合强度,以确保长的使用寿命 的防护薄膜。

    Method for the preparation of a frame-supported pellicle for
photolithography
    130.
    发明授权
    Method for the preparation of a frame-supported pellicle for photolithography 失效
    用于制备用于光刻的框架支撑的防护薄膜的方法

    公开(公告)号:US5327808A

    公开(公告)日:1994-07-12

    申请号:US63853

    申请日:1993-05-18

    摘要: A process for the preparation of a frame-supported pellicle membrane used for dust-proof protection of a photomask in the photolithographic patterning work of, for example, semiconductor devices. An improvement is proposed for trimming of a pellicle membrane formed on a base plate and adhesively bonded to a pellicle frame to remove the extraneous portion of the membrane protruded out of the pellicle frame. Instead of the mechanical punching method for trimming, the trimming work according to the invention is performed by using a cutting device having a cutter element heated at a temperature higher than the melting point of the thermoplastic resin forming the membrane so that the membrane is trimmed by melting of the resin. Different from the conventional mechanical punching method, the trimming process of the invention is free from the problem of occurrence of dust particles deposited on the membrane to adversely affect the quality of the pattern reproduction.

    摘要翻译: 一种制备用于例如半导体器件的光刻图形工作中用于光掩模的防尘保护的框架支撑的防护薄膜的方法。 针对形成在基板上的防护薄膜组件的修整进行了改进,并将其粘接到防护薄膜组件框架上以除去从防护薄膜组件框架突出的膜的外部部分。 代替用于修剪的机械冲压方法,根据本发明的修剪工作是通过使用切割装置进行的,该切割装置具有在比形成膜的热塑性树脂的熔点高的温度下加热的切割元件,使得膜被修剪 熔化树脂。 与传统的机械冲压方法不同,本发明的修整过程没有沉积在膜上的灰尘颗粒的发生的问题,从而不利地影响图案再现的质量。