公开(公告)号：US20220055951A1

公开(公告)日：2022-02-24

申请号：US17415267

申请日：2019-12-05

申请人： FUJIMI INCORPORATED

发明人： Souma Taguchi ,  Keigo KAMOSHIDA ,  Tomoaki NAKAMURA ,  Naoya MIWA ,  Keiji ASHITAKA

IPC分类号： C04B35/565 ,  C04B35/628

摘要： The present invention provides means capable of satisfactorily exhibit the properties inherent in the inorganic particle and the constituent material of the coating layer, such as obtaining high dispersibility and high mechanical properties in the coated particle that contains the inorganic particle having at least the inorganic substance capable of forming an inorganic oxide on a surface, and the coating layer with which the inorganic particle is coated. The present invention relates to a coated particle that contains an inorganic particle having at least an inorganic substance capable of forming an inorganic oxide on a surface, and a coating layer with which the inorganic particle is coated, in which the amount of the inorganic oxide per unit surface area of the inorganic particle does not exceed 0.150 mg/m2.

公开(公告)号：US20220055180A1

公开(公告)日：2022-02-24

申请号：US17434904

申请日：2020-03-24

申请人： FUJIMI INCORPORATED

发明人： I-Chun CHANG

IPC分类号： B24B37/04 ,  H01L21/3105 ,  H01L21/321 ,  H01L21/768

摘要： An object of the present invention is to provide a polishing composition which can make the removal rate of a metal material and the removal rate of a resin material the same or close to each other in a chemical mechanical polishing process, which can accordingly avoid or suppress the occurrence of a step difference. The polishing composition contains: abrasive grains containing silica, with at least a part of hydrogen atoms constituting a silanol group located on a surface of the silica being substituted with a cation of at least one metal atom M selected from the group consisting of aluminum, chromium, titanium, zirconium, iron, zinc, tin, scandium, and gallium; and a dispersing medium. The pH of the polishing composition is more than 2 and 7 or less.

公开(公告)号：US11225590B2

公开(公告)日：2022-01-18

申请号：US16649407

申请日：2018-09-28

申请人： FUJIMI INCORPORATED

发明人： Hiroki Kon ,  Naoto Noguchi

IPC分类号： C09G1/02 ,  H01L21/321 ,  H01L21/304 ,  H01L21/306

摘要： An object of the present invention is to provide a polishing composition that can achieve both a high polishing removal rate and high surface quality. According to the present invention, provided is a polishing composition for polishing a material to be polished. The polishing composition contains sodium metavanadate, hydrogen peroxide, and silica abrasive. The content C1 of sodium metavanadate is 0.7% to 3.5% by weight, the content C2 of hydrogen peroxide is 0.3% to 3% by weight, and the content C3 of the silica abrasive is 12% to 50% by weight.

公开(公告)号：US11203731B2

公开(公告)日：2021-12-21

申请号：US16491845

申请日：2018-01-19

申请人： FUJIMI INCORPORATED

发明人： Yasuto Ishida

IPC分类号： C11D7/34 ,  C11D1/14 ,  C11D1/22 ,  C11D1/28 ,  C11D1/29 ,  C11D1/34 ,  C11D3/37 ,  C11D11/00 ,  H01L21/02

摘要： The purpose of the present invention is to provide means for sufficiently removing residues on a surface of an object which has been polished including silicon nitride, silicon oxide, or polysilicon.
Provided is a composition for surface treatment including an anionic surfactant having a molecular weight of 1,000 or less and water, the composition having a pH of less than 7, wherein a ratio of a molecular weight of a hydrophilic moiety to a molecular weight of a hydrophobic moiety (the molecular weight of the hydrophilic moiety/the molecular weight of the hydrophobic moiety) of the anionic surfactant is 0.4 or more (in which the hydrophobic moiety is a hydrocarbon group having 4 or more carbon atoms and the hydrophilic moiety is a part excluding the hydrophobic moiety and a counterion), and the composition for surface treatment is used for surface treatment of an object which has been polished including at least one selected from the group consisting of silicon nitride, silicon oxide, and polysilicon.

公开(公告)号：US20210348028A1

公开(公告)日：2021-11-11

申请号：US17277886

申请日：2019-09-24

申请人： FUJIMI INCORPORATED

发明人： Sachiko HIRAKO ,  Naoto NOGUCHI

IPC分类号： C09G1/02 ,  C09K13/04 ,  H01L21/465

摘要： Provided are a polishing composition capable of achieving both a high polishing removal rate and high surface quality in polishing a gallium oxide substrate, and a method for polishing and a method for manufacturing a gallium oxide substrate using the polishing composition. According to the art disclosed herein, provided is a polishing composition used for polishing a gallium oxide substrate. This polishing composition contains abrasive and water. By polishing with such a polishing composition, it is possible to improve the polishing removal rate for the gallium oxide substrate and realize a gallium oxide substrate having good surface quality.

公开(公告)号：US20210347007A1

公开(公告)日：2021-11-11

申请号：US17280607

申请日：2019-09-12

申请人： FUJIMI INCORPORATED

发明人： Kyosuke TENKO ,  Shota HISHIDA ,  Daisuke YASUI ,  Hideharu HASE ,  Toru KAMADA

IPC分类号： B24B37/24 ,  B24B37/22 ,  B24B37/26

摘要： There are provided a polishing pad and a polishing method using the same that are useful for removing the surface waviness of a curved resin-painted surface at a high polishing removal rate. A polishing pad (10) according to one aspect of the present invention includes a layer having a polishing surface (30). The layer having the polishing surface (30) has a sparse and dense structure in which a proportion of a sparse portion of the polishing surface (30) is 52% or more and 96% or less, and is composed of a sheet material having an A hardness of 70 or more measured according to JIS K 6253.

公开(公告)号：US11130883B2

公开(公告)日：2021-09-28

申请号：US16462729

申请日：2017-11-15

申请人： FUJIMI INCORPORATED

发明人： Kohsuke Tsuchiya ,  Maki Asada

IPC分类号： C09G1/02 ,  C08K3/36 ,  C08L1/08 ,  C08L29/04 ,  H01L21/304 ,  C09K3/14 ,  B24B37/00 ,  H01L21/321

摘要： Provided is a polishing composition that includes a cellulose derivative and is effective for reducing surface defects after polishing. According to the present application, a polishing composition comprising an abrasive, a basic compound and a surface protective agent is provided. The surface protective agent contains a cellulose derivative and a vinyl alcohol-based dispersant. The surface protective agent has a dispersibility parameter α of less than 100.

公开(公告)号：US11111412B2

公开(公告)日：2021-09-07

申请号：US16316970

申请日：2017-06-12

申请人： FUJIMI INCORPORATED

发明人： Shota Suzuki ,  Yoshihiro Izawa

IPC分类号： C09G1/02 ,  C09K3/14 ,  B24B37/00 ,  H01L21/3105

摘要： The present invention provides a polishing composition which can polish an object to be polished at a high polishing speed and with fewer scratches (defects). The present invention is a polishing composition containing silica of which a maximum peak height in a weight change rate distribution curve obtained by thermogravimetric measurement in a range of 25° C. or higher and 250° C. or lower is −0.011 or more and less than 0, a pH at 25° C. of the polishing composition being less than 6.0.

公开(公告)号：US20210246334A1

公开(公告)日：2021-08-12

申请号：US17240666

申请日：2021-04-26

申请人： FUJIMI INCORPORATED

发明人： Tzu-Chun TSENG

IPC分类号： C09G1/02 ,  H01L21/321 ,  H01L21/3105 ,  C09G1/00 ,  C09K3/14 ,  G01G1/06 ,  G09G1/04 ,  B24B1/00 ,  C09K13/06 ,  B24B37/04 ,  H01L21/306

摘要： A polishing composition according to the present invention includes: silica; an anionic water-soluble polymer; at least one compound selected from the group consisting of a phosphonate group-containing compound, a phosphate group-containing compound, and an amino group-containing compound; and a dispersing medium.

公开(公告)号：US11059996B2

公开(公告)日：2021-07-13

申请号：US16133186

申请日：2018-09-17

申请人： FUJIMI INCORPORATED

发明人： Yoshihiro Izawa

IPC分类号： C09G1/02 ,  C09G1/04 ,  C09K3/14 ,  H01L21/304 ,  H01L21/306

摘要： A method for producing a polishing composition including: preparing a first dispersion liquid by mixing a dispersing element containing abrasive grains and a dispersing medium with a pH adjusting agent, and changing the pH of the dispersing element so as to pass an isoelectric point of the abrasive grains; and preparing a second dispersion liquid by mixing the first dispersion liquid with an electrical conductivity adjusting agent.