Abstract:
When a conductive layer occupying a large area is provided in a coiled antenna portion, it has been difficult to supply power stably. A memory circuit portion and a coiled antenna portion are disposed by being stacked together; therefore, it is possible to prevent a current from flowing through a conductive layer occupying a large area included in the memory circuit portion, and thus, power saving can be achieved. In addition, the memory circuit portion and the coiled antenna portion are disposed by being stacked together, and thus, it is possible to use a space efficiently. Therefore, downsizing can be realized.
Abstract:
A semiconductor device includes an oxide layer, a source electrode layer in contact with the oxide layer, a first drain electrode layer in contact with the oxide layer, a second drain electrode layer in contact with the oxide layer, a gate insulating film in contact with the oxide layer, a first gate electrode layer overlapping with the source electrode layer and the first drain electrode layer and overlapping with a top surface of the oxide layer with the gate insulating film interposed therebetween, a second gate electrode layer overlapping with the source electrode layer and the second drain electrode layer and overlapping with the top surface of the oxide layer with the gate insulating film interposed therebetween, and a third gate electrode layer overlapping with a side surface of the oxide layer with the gate insulating film interposed therebetween.
Abstract:
In a configuration including a first circuit for retaining a plurality of analog voltages and a second circuit capable of reading one of the analog voltages as a digital signal, correct data can be read even when characteristics of transistors in the first and second circuits vary with the temperature change. A reference voltage is applied to a gate of a transistor in the second circuit whose threshold voltage varies with the temperature change, and a corrected reference voltage is generated by adding a threshold voltage variation of the transistor in the second circuit to the reference voltage. An analog voltage is read out as a digital signal with the use of the corrected reference voltage, resulting in readout of correct data obtained by canceling out variations in characteristics due to the temperature change of the transistor in the first circuit.
Abstract:
The invention provides a processor obtained by forming a high functional integrated circuit using a polycrystalline semiconductor over a substrate which is sensitive to heat, such as a plastic substrate or a plastic film substrate. Moreover, the invention provides a wireless processor, a wireless memory, and an information processing system thereof which transmit and receive power or signals wirelessly. According to the invention, an information processing system includes an element forming region including a transistor which has at least a channel forming region formed of a semiconductor film separated into islands with a thickness of 10 to 200 nm, and an antenna. The transistor is fixed on a flexible substrate. The wireless processor in which a high functional integrated circuit including the element forming region is formed and the semiconductor device transmit and receive data through the antenna.
Abstract:
A semiconductor device capable of wireless communication, which has high reliability in terms of resistance to external force, in particular, pressing force and can prevent electrostatic discharge in an integrated circuit without preventing reception of an electric wave. The semiconductor device includes an on-chip antenna connected to the integrated circuit and a booster antenna which transmits a signal or power included in a received electric wave to the on-chip antenna without contact. In the semiconductor device, the integrated circuit and the on-chip antenna are interposed between a pair of structure bodies formed by impregnating a fiber body with a resin. One of the structure bodies is provided between the on-chip antenna and the booster antenna. A conductive film having a surface resistance value of approximately 106 to 1014 Ω/cm2 is formed on at least one surface of each structure body.
Abstract translation:一种能够进行无线通信的半导体装置,其在外力方面具有高的可靠性,特别是按压力,并且能够防止集成电路中的静电放电,而不会妨碍电波的接收。 半导体器件包括连接到集成电路的片上天线和将接收到的电波中包含的信号或功率发送到片上天线而不接触的增强天线。 在半导体器件中,集成电路和片上天线插入通过用树脂浸渍纤维体而形成的一对结构体之间。 其中一个结构体设置在片上天线和增强天线之间。 在每个结构体的至少一个表面上形成表面电阻值为大约106至1014Ω·cm 2 / cm 2的导电膜。
Abstract:
With a combination of a transistor including an oxide semiconductor material and a transistor including a semiconductor material other than an oxide semiconductor, a semiconductor device with a novel structure in which data can be retained for a long time and does not have a limitation on the number of writing can be obtained. When a connection electrode for connecting the transistor including a semiconductor material other than an oxide semiconductor to the transistor including an oxide semiconductor material is smaller than an electrode of the transistor including a semiconductor material other than an oxide semiconductor that is connected to the connection electrode, the semiconductor device with a novel structure can be highly integrated and the storage capacity per unit area can be increased.
Abstract:
One object of the present invention is to provide a regulator circuit with an improved noise margin. In a regulator circuit including a bias circuit generating a reference voltage on the basis of the potential difference between a first power supply terminal and a second power supply terminal, and a voltage regulator outputting a potential to an output terminal on the basis of a reference potential input from the bias circuit, a bypass capacitor is provided between a power supply terminal and a node to which a gate of a transistor included in the bias circuit is connected.
Abstract:
It is an object to provide a semiconductor having a novel structure. In the semiconductor device, a plurality of memory elements are connected in series and each of the plurality of memory elements includes first to third transistors thus forming a memory circuit. A source or a drain of a first transistor which includes an oxide semiconductor layer is in electrical contact with a gate of one of a second and a third transistor. The extremely low off current of a first transistor containing the oxide semiconductor layer allows storing, for long periods of time, electrical charges in the gate electrode of one of the second and the third transistor, whereby a substantially permanent memory effect can be obtained. The second and the third transistors which do not contain an oxide semiconductor layer allow high-speed operations when using the memory circuit.
Abstract:
A semiconductor device that can be scaled down or highly integrated is provided. The semiconductor device includes a memory cell including first to third transistors and a capacitor. In each of the first to third transistors, the side surfaces of a metal oxide are covered with a source electrode and a drain electrode. The second and third transistors share the metal oxide. The capacitor is provided above the first to third transistors. A conductor including a region functioning as a write bit line is provided to include a region in contact with the top surface and the side surface of one of the source electrode and the drain electrode of the first transistor. A conductor including a region functioning as a read bit line is provided to include a region in contact with the top surface and the side surface of one of the source electrode and the drain electrode of the third transistor. The other of the source electrode and the drain electrode of the first transistor and a gate of the second transistor are electrically connected to one electrode of the capacitor.
Abstract:
An electronic device including a first conductor, a second conductor, a first insulator, a second insulator, and a connection electrode is provided. The first insulator is provided over the first conductor and has a first opening overlapping with the first conductor. The second conductor is provided over the first insulator and has a second opening overlapping with the first conductor. The second insulator is provided over the second conductor and has a third opening overlapping with the first conductor. The second opening has a portion having a width smaller than a width of the third opening. The connection electrode is positioned inside the first opening, the second opening, and the third opening and is in contact with the top surface of the first conductor. The connection electrode includes a region in contact with part of the top surface and part of the side surface of the second conductor.