公开(公告)号：US11768442B2

公开(公告)日：2023-09-26

申请号：US17973221

申请日：2022-10-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Wim Tjibbo Tel ,  Mark John Maslow ,  Koenraad Van Ingen Schenau ,  Patrick Warnaar ,  Abraham Slachter ,  Roy Anunciado ,  Simon Hendrik Celine Van Gorp ,  Frank Staals ,  Marinus Jochemsen

IPC: G06F30/20 ,  G06F30/33 ,  G06F30/398 ,  G03F7/00 ,  G03F1/00 ,  G06T7/00 ,  G21K5/00 ,  H01L21/00 ,  H01L21/66 ,  G06F119/18

CPC classification number: G03F7/70625 ,  G06F30/20 ,  G06T7/0004 ,  H01L22/20 ,  G03F1/00 ,  G06F30/33 ,  G06F30/398 ,  G06F2119/18 ,  G21K5/00 ,  H01L21/00

Abstract: A method including: obtaining an image of at least part of a substrate, wherein the image includes at least one feature of a device being manufactured in a layer on the substrate; obtaining a layout of features associated with a previous layer adjacent to the layer on the substrate; calculating one or more image-related metrics in dependence on: 1) a contour determined from the image including the at least one feature and 2) the layout; and determining one or more control parameters of a lithographic apparatus and/or one or more further processes in a manufacturing process of the device in dependence on the one or more image-related metrics, wherein at least one of the control parameters is determined to modify the geometry of the contour in order to improve the one or more image-related metrics.

公开(公告)号：US11768440B2

公开(公告)日：2023-09-26

申请号：US18089007

申请日：2022-12-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yen-Wen Lu ,  Ya Luo

IPC: G03F7/20 ,  G03F7/00 ,  G06N20/00 ,  G06N5/047

CPC classification number: G03F7/70441 ,  G03F7/705 ,  G06N5/047 ,  G06N20/00

Abstract: A method including: obtaining data based an optical proximity correction for a spatially shifted version of a training design pattern; and training a machine learning model configured to predict optical proximity corrections for design patterns using data regarding the training design pattern and the data based on the optical proximity correction for the spatially shifted version of the training design pattern.

公开(公告)号：US20230300965A1

公开(公告)日：2023-09-21

申请号：US18016553

申请日：2021-07-23

Applicant: ASML Netherlands B.V.

Inventor： Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target’s shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.

公开(公告)号：US20230298852A1

公开(公告)日：2023-09-21

申请号：US18120278

申请日：2023-03-10

Applicant: ASML Netherlands B.V.

Inventor： Benoit Herve GAURY ,  Jasper Frans Mathijs VAN RENS

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28

Abstract: A method of measuring a delay time of a propagation of a signal in a line in a circuit structure, the method comprises irradiating the line by pulses of a charged particle beam, wherein a pulse repetition frequency of the pulses of the charged particle beam is varied. The method further comprises measuring, for each of the pulse repetition frequencies, a secondary charged particle emission responsive to the irradiating the line by the pulses of the charged particle beam at the respective pulse repetition frequency, and deriving the delay time of the line based on the secondary charged particle emission responsive to the varying of the pulse repetition frequency.

公开(公告)号：US11764030B2

公开(公告)日：2023-09-19

申请号：US16714549

申请日：2019-12-13

Applicant: ASML Netherlands B.V.

Inventor： Johannes Hubertus Antonius Van De Rijdt ,  Peter Paul Hempenius ,  Allard Eelco Kooiker ,  Jef Goossens ,  Petrus Wilhelmus Vleeshouwers

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/2007

Abstract: Disclosed is a stage apparatus comprising: an object support configured to support an object; a positioning device configured to position the object support; a first connection arrangement configured to connect the object support to the positioning device, the first connection arrangement comprising at least one damped connection; and a second connection arrangement configured to connect the object support to the positioning device, the second connection arrangement comprising at least one substantially rigid connection.

公开(公告)号：US11754918B2

公开(公告)日：2023-09-12

申请号：US17548944

申请日：2021-12-13

Applicant: ASML NETHERLANDS B.V.

Inventor： David Ferdinand Vles ,  Chaitanya Krishna Ande ,  Antonius Franciscus Johannes De Groot ,  Adrianus Johannes Maria Giesbers ,  Johannes Joseph Janssen ,  Paul Janssen ,  Johan Hendrik Klootwijk ,  Peter Simon Antonius Knapen ,  Evgenia Kurganova ,  Marcel Peter Meijer ,  Wouter Rogier Meijerink ,  Maxim Aleksandrovich Nasalevich ,  Arnoud Willem Notenboom ,  Raymond Olsman ,  Hrishikesh Patel ,  Mária Péter ,  Gerrit Van Den Bosch ,  Wilhelmus Theodorus Anthonius Johannes Van Den Einden ,  Willem Joan Van Der Zande ,  Pieter-Jan Van Zwol ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Willem-Pieter Voorthuijzen ,  Hendrikus Jan Wondergem ,  Aleksandar Nikolov Zdravkov

IPC: G03F1/64

CPC classification number: G03F1/64

Abstract: The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

公开(公告)号：US20230280662A1

公开(公告)日：2023-09-07

申请号：US18023708

申请日：2021-08-17

Applicant: ASML NETHERLANDS B.V.

Inventor： Evgenia KURGANOVA ,  Marijke SCOTUZZI ,  Vina FARAMARZI ,  Bastiaan Maurice VAN DEN BROEK

IPC: G03F7/00 ,  G03F7/20

CPC classification number: G03F7/706841 ,  G03F7/70133

Abstract: Methods of performing metrology. In one arrangement a substrate has a layer. The layer comprises a two-dimensional material. A target portion of the layer is illuminated with a beam of radiation and a distribution of radiation in a pupil plane is detected to obtain measurement data. The measurement data is processed to obtain metrology information about the target portion of the layer. The illuminating, detecting and processing are performed for plural different target portions of the layer to obtain metrology information for the plural target portions of the layer.

公开(公告)号：US20230279919A1

公开(公告)日：2023-09-07

申请号：US18178088

申请日：2023-03-03

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Alexander Petrus Josephus VAN LANKVELT ,  Michiel VERVOORDELDONK ,  Pavel KAGAN ,  Marc Wilhelmus Maria VAN DER WIJST ,  Galip Tuna TURKBEY ,  Marco HUISKAMP ,  Ulrich SCHOENHOFF

IPC: F16F9/04 ,  F16F15/027

CPC classification number: F16F9/049 ,  F16F15/027 ,  F16F2224/046 ,  F16F2222/126 ,  F16F2230/42

Abstract: A vibration isolator (10; 210) for supporting a payload and isolating the payload from vibrations has a contact member (12) configured for supporting the payload, at least two pressurized gas compartments (24) arranged offset from each other to support the contact member at different locations, which pressurized gas compartments are connected to each other via a tubing system (54). The tubing system contains at least one restriction (66) at which a cross section of the tubing system is reduced by at least 50%.

公开(公告)号：US11747738B2

公开(公告)日：2023-09-05

申请号：US16314805

申请日：2017-06-27

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Adrianus Verschuren ,  Erwin Paul Smakman

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70291 ,  G03F7/70383 ,  G03F7/70433 ,  G03F7/70508

Abstract: A direct write exposure apparatus configured to process a plurality of substrates, the apparatus including: a substrate holder configured to hold a substrate having a usable patterning area; a patterning system configured to project different patterns onto the substrate; a processing system configured to: determine a first combination of one or more patterns that are to be applied on a first substrate of the plurality of substrates; and determine a second, different combination of one or more patterns that are to be applied on a second, subsequent, substrate of the plurality of substrates.

公开(公告)号：US20230273533A1

公开(公告)日：2023-08-31

申请号：US18300094

申请日：2023-04-13

Applicant: ASML NETHERLANDS B.V.

Inventor： NICOLAAS TEN KATE ,  Joost Jeroen Ottens ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Robbert Jan Voogd ,  Giovanni Francisco Nino ,  Marinus Jan Remie ,  Johannes Henricus Wilhelmus Jacobs ,  Thibault Simon Mathieu Laurent ,  Johan Gertrudis Cornelis Kunnen

IPC: G03F7/00

CPC classification number: G03F7/70875 ,  G03F7/7085

Abstract: A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.