公开(公告)号：US20230273502A1

公开(公告)日：2023-08-31

申请号：US18014724

申请日：2021-07-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Yongfeng NI

IPC: G02F1/365 ,  G02F1/355 ,  G03F7/00

CPC classification number: G02F1/365 ,  G02F1/3551 ,  G03F7/706847 ,  G02F1/3528 ,  G02F2202/32

Abstract: A method of generating broadband output radiation and associated broadband radiation source. The method includes generating pulses of input radiation having a duration between 50fs and 400fs and having a rise time of less than 60fs; and exciting a working medium within a hollow core fiber with the pulses of input radiation.

公开(公告)号：US11740560B2

公开(公告)日：2023-08-29

申请号：US17910454

申请日：2021-03-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios Koulierakis ,  Carlo Lancia ,  Juan Manuel Gonzalez Huesca ,  Alexander Ypma ,  Dimitra Gkorou ,  Reza Sahraeian

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70525

Abstract: A method for determining an inspection strategy for at least one substrate, the method including: quantifying, using a prediction model, a compliance metric value for a compliance metric relating to a prediction of compliance with a quality requirement based on one or both of pre-processing data associated with the substrate and any available post-processing data associated with the at least one substrate; and deciding on an inspection strategy for the at least one substrate, based on the compliance metric value, an expected cost associated with the inspection strategy and at least one objective value describing an expected value of the inspection strategy in terms of at least one objective relating to the prediction model.

公开(公告)号：US20230267711A1

公开(公告)日：2023-08-24

申请号：US18015313

申请日：2021-07-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Scott Anderson MIDDLEBROOKS ,  Maxim PISARENCO ,  Markus Gerardus Martinus Maria VAN KRAAIJ ,  Coen Adrianus VERSCHUREN

IPC: G06V10/774 ,  G06N3/0464 ,  G06V10/50

CPC classification number: G06V10/774 ,  G06N3/0464 ,  G06V10/50

Abstract: A method and apparatus for selecting patterns from an image such as a design layout. The method includes obtaining an image (e.g., of a target layout) having a plurality of patterns; determining, based on pixel intensities within the image, a metric (e.g., entropy) indicative of an amount of information contained in one or more portions of the image; and selecting, based on the metric, a sub-set of the plurality of patterns from the one or more portions of the image having values of the metric within a specified range. The sub-set of patterns can be provided as training data for training a model associated with a patterning process.

公开(公告)号：US11733617B2

公开(公告)日：2023-08-22

申请号：US17572864

申请日：2022-01-11

Applicant: ASML Netherlands B.V.

Inventor： Patrick Sebastian Uebel ,  Sebastian Thomas Bauerschmidt ,  Paul William Scholtes-Van Eijk

IPC: G03F7/20 ,  G03B27/42 ,  G03F9/00 ,  G03F7/00 ,  G02B6/02 ,  G02F1/365

CPC classification number: G03F9/7065 ,  G02B6/02328 ,  G02F1/365 ,  G03F7/7015 ,  G03F7/70133 ,  G03F7/70316 ,  G03F7/70325 ,  G03F7/70575 ,  G03F7/70616

Abstract: An apparatus for receiving input radiation and broadening a frequency range of the input radiation to provide broadband output radiation. The apparatus includes a chamber, a fiber, a gas generating apparatus, and a radical generating apparatus. The fiber includes a hollow core configured to guide radiation propagating through the fiber, the hollow core in fluid communication with the chamber. The gas generating apparatus is configured to provide a gas within the chamber. The radical generating apparatus is configured to provide free radicals within the chamber to reduce contaminants in the gas. The apparatus may be included in a radiation source.

公开(公告)号：US20230260820A1

公开(公告)日：2023-08-17

申请号：US18305925

申请日：2023-04-24

Applicant: ASML NETHERLANDS B.V.

Inventor： Andre Bernardus JEUNINK ,  Robby Franciscus Josephus MARTENS ,  Youssef Karel Maria DE VOS ,  Ringo Petrus Cornelis VAN DORST ,  Gerhard Albert TEN BRINKE ,  Dirk Jerome Andre SENDEN ,  Coen Hubertus Matheus BALTIS ,  Justin Johannes Hermanus GERRITZEN ,  Jelmer Mattheüs KAMMINGA ,  Evelyn Wallis PACITTI ,  Thomas POIESZ ,  Arie Cornelis SCHEIBERLICH ,  Bert Dirk SCHOLTEN ,  André SCHREUDER ,  Abraham Alexander SOETHOUDT ,  Siegfried Alexander TROMP ,  Yuri Johannes Gabriël VAN DE VIJVER

IPC: H01L21/683 ,  G03F7/00 ,  H01L21/687 ,  B25B11/00

CPC classification number: H01L21/6838 ,  G03F7/707 ,  G03F7/70733 ,  H01L21/68742 ,  B25B11/005

Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.

公开(公告)号：US20230259042A1

公开(公告)日：2023-08-17

申请号：US18012398

申请日：2021-05-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Sarathi ROY

IPC: G03F7/00 ,  G03F7/20 ,  G03F9/00 ,  G01B11/27

CPC classification number: G03F7/706851 ,  G03F7/70633 ,  G03F7/70666 ,  G03F7/706839 ,  G03F9/7092 ,  G03F9/7046 ,  G03F9/7011 ,  G01B11/27

Abstract: A method to determine a performance indicator indicative of alignment performance of a processed substrate. The method includes obtaining measurement data including a plurality of measured position values of alignment marks on the substrate and calculating a positional deviation between each measured position value and a respective expected position value. These positional deviations are used to determine a directional derivative between the alignment marks, and the directional derivatives are used to determine at least one directional derivative performance indicator.

公开(公告)号：US11728131B2

公开(公告)日：2023-08-15

申请号：US17553357

申请日：2021-12-16

Applicant: ASML Netherlands B.V.

Inventor： Ning Ye ,  Jun Jiang ,  Jian Zhang ,  Yixiang Wang

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US11726411B2

公开(公告)日：2023-08-15

申请号：US17625467

申请日：2020-06-08

Applicant: ASML NETHERLANDS B.V.

Inventor： Gijs Kramer ,  Ringo Petrus Cornelis Van Dorst

IPC: G03F7/20 ,  H01L21/67 ,  G03F7/00

CPC classification number: G03F7/7085 ,  H01L21/67288

Abstract: A substrate shape measuring device, including: a substrate support to support a substrate having a main surface, the main surface of the substrate when supported by the substrate support substantially extending in a first plane; one or more sensor assemblies, each including a light emitter to emit light along a light axis substantially parallel to the first plane and a light sensor arranged to receive the light; and a processing device arranged to determine a shape of the substrate, wherein the substrate shape measuring device is constructed to measure with the one or more sensor assemblies in at least a first measurement direction with respect to the substrate substantially parallel to the first plane and a second measurement direction with respect to the substrate substantially parallel to the first plane.

公开(公告)号：US20230252347A1

公开(公告)日：2023-08-10

申请号：US18015162

申请日：2021-07-07

Applicant: ASML NETHERLANDS B.V.

Inventor： Eleftherios KOULIERAKIS ,  Carlo LANCIA ,  Juan Manuel GONZALEZ HUESCA ,  Alexander YPMA

IPC: G06N20/00 ,  G03F7/00 ,  G03F7/20

CPC classification number: G06N20/00 ,  G03F7/706841 ,  G03F7/70516 ,  G03F7/705

Abstract: Method and apparatus for adapting a distribution model of a machine learning fabric. The distribution model is for mitigating the effect of concept drift, and is configured to provide an output as input to a functional model of the machine learning fabric. The functional model is for performing a machine learning task. The method may include obtaining a first data point, and providing the first data point as input to one or more distribution monitoring components of the distribution model. The one or more distribution monitoring components have been trained on a plurality of further data points. A metric representing a correspondence between the first data point and the plurality of further data points is determined, by at least one of the one or more distribution monitoring components. Based on the error metric, the output of the distribution model is adapted.

公开(公告)号：US20230251583A1

公开(公告)日：2023-08-10

申请号：US18015155

申请日：2021-05-31

Applicant: ASML Netherlands B.V.

Inventor： Oleg Viacheslavovich VOZNYI ,  Bearrach MOEST

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/7085 ,  G03F7/70716 ,  G03F7/70558

Abstract: The present invention relates to a stage system (130), which comprises a pre-exposure element (134), and to a method employing the pre-exposure element for conditioning an optical system (100). The pre-exposure element comprises a radiation receiving area at a surface of the stage system, wherein the radiation receiving area comprises at least one pre-exposure plate configured to receive radiation. The stage system comprises further a controller (140), wherein the controller is capable to control an optical parameter of the pre-exposure element, herewith controlling a portion of received radiation reflected by the pre-exposure element.