公开(公告)号：US08749876B2

公开(公告)日：2014-06-10

申请号：US13121319

申请日：2011-03-07

申请人： Krzysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

发明人： Krzysztof Nowak ,  Takashi Suganuma ,  Osamu Wakabayashi

IPC分类号： H01S3/05

CPC分类号： H01S3/05 ,  B82Y20/00 ,  H01S3/0315 ,  H01S3/08031 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2232 ,  H01S3/2325 ,  H01S3/235 ,  H01S3/2366 ,  H01S3/2375 ,  H01S5/042 ,  H01S5/06 ,  H01S5/14 ,  H01S5/3401

摘要： A regenerative amplifier according to one aspect of this disclosure is used in combination with a laser device, and the regenerative amplifier may include: a pair of resonator mirrors constituting an optical resonator; a slab amplifier provided between the pair of the resonator mirrors for amplifying a laser beam with a predetermined wavelength outputted from the laser device; and an optical system disposed to configure a multipass optical path along which the laser beam is reciprocated inside the slab amplifier, the optical system transferring an optical image of the laser beam at a first position as an optical image of the laser beam at a second position.

摘要翻译： 根据本公开的一个方面的再生放大器与激光装置组合使用，再生放大器可以包括：构成光谐振器的一对谐振器镜; 设置在所述一对所述谐振器镜之间用于放大从所述激光装置输出的预定波长的激光束的平板放大器; 以及光学系统，被配置为配置多个光路，激光束沿着该光路在所述平板放大器内部往复运动，所述光学系统将所述激光束的光学图像在第一位置处作为所述激光束的光学图像在第二位置 。

公开(公告)号：US08698111B2

公开(公告)日：2014-04-15

申请号：US13283922

申请日：2011-10-28

申请人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Osamu Wakabayashi ,  Hideo Hoshino

发明人： Toshihiro Nishisaka ,  Yukio Watanabe ,  Osamu Wakabayashi ,  Hideo Hoshino

IPC分类号： G21G4/00

CPC分类号： H05G2/008 ,  H05G2/006

摘要： An apparatus for generating extreme ultraviolet light by exciting a target material to turn the target material into plasma may include: a frame; a chamber in which the extreme ultraviolet light is generated; a target supply unit for supplying the target material into the chamber; a first connection member for connecting the frame and the chamber flexibly; a mechanism for fixing the target supply unit to the frame; and a second connection member for connecting the target supply unit to the chamber flexibly.

摘要翻译： 通过激发目标材料以将目标材料转化成等离子体来产生极紫外光的装置可以包括：框架; 产生极紫外光的室; 目标供应单元，用于将目标材料供应到所述室中; 用于柔性地连接所述框架和所述室的第一连接构件; 用于将目标供给单元固定到框架的机构; 以及用于灵活地将目标供应单元连接到室的第二连接构件。

公开(公告)号：US20140084183A1

公开(公告)日：2014-03-27

申请号：US14114902

申请日：2012-06-12

申请人： Osamu Wakabayashi ,  Tatsuya Yanagida

发明人： Osamu Wakabayashi ,  Tatsuya Yanagida

IPC分类号： G21K5/08 ,  G21K5/00

CPC分类号： G21K5/08 ,  G21K5/00 ,  H05G2/008

摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.

摘要翻译： 与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统 用于控制激光束的光束强度分布。

公开(公告)号：US08669542B2

公开(公告)日：2014-03-11

申请号：US12764517

申请日：2010-04-21

申请人： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

发明人： Yukio Watanabe ,  Osamu Wakabayashi ,  Miwa Igarashi

IPC分类号： G01J3/10

CPC分类号： H05G2/008 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/04 ,  H05G2/003 ,  H05G2/005

摘要： An extreme ultraviolet light source apparatus for supplying extreme ultraviolet light to a processing unit for performing processing by using the extreme ultraviolet light. The extreme ultraviolet light source apparatus includes: a chamber in which the extreme ultraviolet light to be supplied to the processing unit is generated; a collector mirror for collecting the extreme ultraviolet light generated in the chamber to output the extreme ultraviolet light to the processing unit; and an optical path connection module for defining a route of the extreme ultraviolet light between the chamber and the processing unit and isolating the route of the extreme ultraviolet light from outside.

摘要翻译： 一种用于向处理单元提供极紫外光的极紫外光源装置，用于通过使用极紫外光进行处理。 所述极紫外光源装置具有：向所述处理单元供给所述极紫外光的室， 收集器反射镜，用于收集在室中产生的极紫外光，以将极紫外光输出到处理单元; 以及光路连接模块，其用于限定所述室与所述处理单元之间的所述极紫外光的路线，并将所述极紫外光的路径与外部隔离。

公开(公告)号：US08592787B2

公开(公告)日：2013-11-26

申请号：US13437678

申请日：2012-04-02

申请人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

发明人： Masato Moriya ,  Osamu Wakabayashi ,  Georg Soumagne

IPC分类号： G21K5/04

CPC分类号： G02B5/1838 ,  G02B5/0891 ,  G02B5/1857 ,  G03F7/70575 ,  G21K1/065 ,  G21K2201/064

摘要： An EUV light source is configured for generating an EUV light for an exposure device. The EUV light source includes a chamber, a target supply device configured for supplying a target into the chamber, an optical system for introducing laser light from a driver laser into the chamber and irradiating the target with the laser light to turn the target into plasma from which EUV light is emitted, and an EUV collector mirror in the chamber. The EUV collector mirror may include a multilayered reflecting surface with grooves and collect the EUV light from the plasma to a focal spot. The grooves can be arranged in a concentric fashion, and be configured for diffracting at least light at a wavelength which is the same as that of the laser light from the driver laser.

摘要翻译： EUV光源被配置为产生用于曝光装置的EUV光。 所述EUV光源包括室，被配置为将靶供给到所述室中的目标供给装置，用于将来自驱动器激光器的激光引入所述室并且用所述激光照射所述靶的光学系统，以将所述靶转换成等离子体 哪个EUV光被发射，并且在室中的EUV收集器反射镜。 EUV收集器反射镜可以包括具有凹槽的多层反射表面并且将来自等离子体的EUV光收集到焦点。 凹槽可以以同心的方式布置，并且被配置为至少衍射与来自驱动器激光器的激光的波长相同的光。

公开(公告)号：US08492738B2

公开(公告)日：2013-07-23

申请号：US13465108

申请日：2012-05-07

申请人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

发明人： Yoshifumi Ueno ,  Osamu Wakabayashi ,  Tamotsu Abe ,  Akira Sumitani ,  Hideo Hoshino ,  Akira Endo ,  Georg Soumagne

IPC分类号： H01J1/50

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70916 ,  G03F7/70983 ,  G21K1/093 ,  G21K2201/00 ,  H05G2/005 ,  H05G2/008

摘要： An ion withdrawal apparatus that withdraws ions emitted from a plasma in an EUV light production apparatus in which a target at an EUV light production point is irradiated with laser light to be made in a plasma state and the target emits EUV light, the ion withdrawal apparatus which includes: a collector mirror that is disposed in a direction opposite to a laser light incidence direction to collect the EUV light and has a hole for the ions to pass therethrough; magnetic line of force production means that produces a magnetic line of force that is parallel or approximately parallel to the laser light incidence direction at or in the vicinity of the EUV light production point; and ion withdrawal means that is disposed on the opposite side of the collector mirror from the EUV light production point and withdraws the ions.

摘要翻译： 一种离子提取装置，其在EUV光产生装置中从在等离子体状态的激光照射EUV光产生点的靶，并且靶射出EUV光的EUV光产生装置中，从等离子体发射的离子， 其包括：收集器反射镜，其设置在与激光入射方向相反的方向上以收集EUV光，并具有用于离子通过的孔; 磁力线产生装置意味着产生在EUV光产生点处或附近平行或近似平行于激光入射方向的磁力线; 以及离开收集反射镜与EUV光产生点相反的一侧的离子提取装置，并且离子退出。

公开(公告)号：US20130126751A1

公开(公告)日：2013-05-23

申请号：US13809576

申请日：2011-11-23

申请人： Hakaru Mizoguchi ,  Osamu Wakabayashi

发明人： Hakaru Mizoguchi ,  Osamu Wakabayashi

IPC分类号： F21V5/04 ,  G01N21/55 ,  F21V11/02 ,  F21V7/00 ,  F21V7/06

CPC分类号： F21V5/04 ,  F21V7/00 ,  F21V7/06 ,  F21V11/02 ,  G01N21/55 ,  G02B5/001 ,  G02B19/0028 ,  G02B19/0052 ,  G02B19/0095 ,  G02B27/0927 ,  G02B27/0955 ,  H01S3/005 ,  H01S3/0071 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/008

摘要： An optical device may include: a first beam shaping unit configured to transform a first laser beam incident thereon into a second laser beam having an annular cross section; and a first focusing optical element for focusing the second laser beam in a first predetermined location so as to generate a Bessel beam.

摘要翻译： 光学装置可以包括：第一光束整形单元，被配置为将入射到其上的第一激光束变换成具有环形横截面的第二激光束; 以及第一聚焦光学元件，用于将第二激光束聚焦在第一预定位置以便产生贝塞尔光束。

公开(公告)号：US20130094529A1

公开(公告)日：2013-04-18

申请号：US13805264

申请日：2012-03-08

申请人： Osamu Wakabayashi

发明人： Osamu Wakabayashi

IPC分类号： H01S3/10

摘要： A laser apparatus for generating extreme ultraviolet (EUV) light at a wavelength of approximately 13 nm is provided. The laser apparatus may be combined with a reduced projection reflective optical system. Systems and methods for generating EUV light are also provided.

摘要翻译： 提供了用于产生波长约13nm的极紫外（EUV）光的激光装置。 激光装置可以与缩小投影反射光学系统组合。 还提供了用于产生EUV灯的系统和方法。

公开(公告)号：US08395133B2

公开(公告)日：2013-03-12

申请号：US12560864

申请日：2009-09-16

申请人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

发明人： Masato Moriya ,  Hideo Hoshino ,  Osamu Wakabayashi ,  Hakaru Mizoguchi

IPC分类号： G21K5/00

CPC分类号： H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

摘要翻译： EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。

公开(公告)号：US20130048886A1

公开(公告)日：2013-02-28

申请号：US13696517

申请日：2011-12-13

申请人： Masato Moriya ,  Osamu Wakabayashi

发明人： Masato Moriya ,  Osamu Wakabayashi

IPC分类号： G02B5/10 ,  G21K5/04 ,  G02B7/182

CPC分类号： G03F7/708 ,  G03F7/70008 ,  G03F7/70808 ,  G03F7/70833

摘要： A chamber apparatus used with a laser apparatus may include a chamber, a beam expanding optical system, and a focusing optical system. The chamber may be provided with at least one inlet, through which a laser beam outputted from the laser apparatus is introduced into the chamber. The beam expanding optical system is configured to expand the laser beam in diameter. The focusing optical system is configured to focus the laser beam that has been expanded in diameter.

摘要翻译： 与激光装置一起使用的室装置可以包括室，扩束光学系统和聚焦光学系统。 该室可以设置有至少一个入口，激光装置输出的激光束通过该入口被引入腔室。 扩束光学系统被配置为直径地扩大激光束。 聚焦光学系统被配置为聚焦已经扩大直径的激光束。