公开(公告)号：US20100230616A1

公开(公告)日：2010-09-16

申请号：US12312203

申请日：2007-10-30

申请人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshiro Seki

发明人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshiro Seki

IPC分类号： H01J37/305 ,  H01J37/302

CPC分类号： H01L21/3065 ,  H01J2237/0812 ,  H01J2237/202 ,  H01J2237/3151

摘要： Surface roughness having intervals of several tens of nanometers to about a hundred micrometers in a solid surface is reduced by directing a gas cluster ion beam to the surface. An angle formed between the normal to the solid surface and the gas cluster ion beam is referred to as an irradiation angle, and an irradiation angle at which the distance of interaction between the solid and the cluster colliding with the solid dramatically increases is referred to as a critical angle. A solid surface smoothing method includes an irradiation step of directing the gas cluster ion beam onto the solid surface at an irradiation angle not smaller than the critical angle. The critical angle is 70°.

摘要翻译： 通过将气体团簇离子束引导到表面，在固体表面中具有数十纳米至约百微米间隔的表面粗糙度被减小。 被称为固体表面和气体团簇离子束的法线之间的角度被称为照射角度，并且固体和团簇与固体之间的相互作用距离急剧增加的照射角度被称为 一个临界角。 固体表面平滑化方法包括将气体团簇离子束以不小于临界角的照射角度引导到固体表面的照射步骤。 临界角为70°。

公开(公告)号：US07563379B2

公开(公告)日：2009-07-21

申请号：US11008606

申请日：2004-12-08

申请人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki ,  Takaaki Aoki

发明人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki ,  Takaaki Aoki

IPC分类号： H01L21/302

CPC分类号： B82Y20/00 ,  B81C1/00531 ,  B81C1/00619 ,  G02B6/1225 ,  G02B6/136 ,  H01J2237/0812 ,  H01L21/3065

摘要： In a dry etching method in which clusters formed by agglomeration of atoms or molecules are ionized and accelerated as a cluster ion beam for irradiation of an object surface to etch away therefrom its constituent atoms, the clusters are mixed clusters 42 formed by agglomeration of two or more kinds of atoms or molecules, and the mixed clusters 42 contain atoms 43 of at least one of argon, neon, xenon and krypton, and a component 44 that is deposited on the object surface to form a thin film by reaction therewith. With this method, it is possible to provide an extremely reduced sidewall surface roughness and high vertical machining accuracy.

摘要翻译： 在干法蚀刻方法中，通过原子或分子的聚集形成的团簇被离子化并加速作为用于照射物体表面的簇离子束以从其中去除其组成原子，所述簇是通过两个或多个 更多种类的原子或分子，并且混合簇42包含氩，氖，氙和氪中的至少一种的原子43和沉积在物体表面上以通过与其反应形成薄膜的成分44。 通过这种方法，可以提供极小的侧壁表面粗糙度和高垂直加工精度。

公开(公告)号：US07375696B2

公开(公告)日：2008-05-20

申请号：US11155728

申请日：2005-06-16

申请人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle

发明人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle

IPC分类号： H01Q15/02 ,  H01Q19/06

CPC分类号： H01Q13/28 ,  H01Q21/28

摘要： A direction-change element for changing the direction of travel of an incident electromagnetic wave and electromagnetic wave transmitting/receiving elements are disposed on a substrate. The direction-change element has a periodic array of materials of different refractive indexes arranged in parallel to the substrate surface. The electromagnetic wave transmitting/receiving elements are positioned at opposite ends of the periodic array in the direction of its arrangement. The output ratio between the two electromagnetic wave transmitting/receiving elements can be used to detect the incidence angle of the electromagnetic wave with high accuracy. By changing the relative intensity of electromagnetic waves to be sent from the two electromagnetic wave transmitting/receiving elements, it is possible to achieve high-accuracy control of the angle of emittance of the electromagnetic wave to be sent from the device. Accordingly, the present invention offers a small, low-profile electromagnetic wave transmitting/receiving device capable of detecting and radiating electromagnetic waves with high accuracy of their incidence and emittance angles.

摘要翻译： 用于改变入射电磁波的行进方向的方向转换元件和电磁波发射/接收元件设置在基片上。 方向变化元件具有平行于衬底表面布置的不同折射率的材料的周期性阵列。 电磁波发射/接收元件沿其排列方向定位在周期性阵列的相对端。 两个电磁波发射/接收元件之间的输出比可用于高精度地检测电磁波的入射角。 通过改变从两个电磁波发射/接收元件发送的电磁波的相对强度，可以实现从装置发送的电磁波的发射角的高精度控制。 因此，本发明提供一种能够以其入射角和发射角度的高精度检测和辐射电磁波的小型低调电磁波发射/接收装置。

公开(公告)号：US07269310B2

公开(公告)日：2007-09-11

申请号：US11369356

申请日：2006-03-06

申请人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle

发明人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle

IPC分类号： G02B6/26

CPC分类号： G02B6/1225 ,  B82Y20/00 ,  G02B6/30

摘要： An optical connector used for inputting light to an optical element from an external optical system or outputting light from an optical element to an external optical system includes a photonic crystal having a periodic refractive index structure, and an optical waveguide to be optically coupled to the optical element and a region in which a plurality of defects are formed at intervals equal to or less than four times the refractive index period a of the photonic crystal are formed in the photonic crystal. The region has a size equal to or greater than the wavelength of the light input from the external optical system or the wavelength of the light output to the external optical system, and the external optical system and the optical waveguide are optically coupled to each other via the region. The optical connector has an improved optical coupling efficiency, can achieve optical coupling of a plurality of light components of different wavelengths, and can readily achieve alignment.

摘要翻译： 用于从外部光学系统向光学元件输入光或将光从光学元件输出到外部光学系统的光学连接器包括具有周期性折射率结构的光子晶体和光学耦合到光学 元素和在光子晶体中形成等于或小于光子晶体的折射率周期a的四倍的间隔形成多个缺陷的区域。 该区域具有等于或大于从外部光学系统输入的光的波长或输出到外部光学系统的光的波长的大小，并且外部光学系统和光学波导通过彼此经由 该区域。 光连接器具有改进的光耦合效率，可以实现多个不同波长的光分量的光耦合，并且可以容易地实现对准。

公开(公告)号：US07167623B2

公开(公告)日：2007-01-23

申请号：US10870784

申请日：2004-06-16

申请人： Akinobu Sato ,  Akiko Suzuki

发明人： Akinobu Sato ,  Akiko Suzuki

IPC分类号： G02B6/10

CPC分类号： G11B7/24 ,  B82Y20/00 ,  G02B6/1225 ,  G11B7/004 ,  G11B7/241 ,  G11B7/2531 ,  G11B7/2532 ,  G11B7/2534 ,  G11B7/26 ,  G11B2007/24312 ,  G11B2007/24314 ,  G11B2007/24316 ,  G11B2007/25706 ,  G11B2007/2571 ,  G11B2007/25715 ,  G11B2007/25716

摘要： An optical recording device includes: a light source for emitting light of plural wavelengths; an optical waveguide formed by a crystal defect in a photonic crystal, into which light emitted from the light source is launched; an information recording/erasing unit for changing the shape of the photonic crystal near the optical waveguide; and a light detecting unit for detecting the light emitted from the optical waveguide. A contact probe of the information recording/erasing unit applies pressure to one of a plurality of periodically arranged columnar holes of the photonic crystal to widen its diameter, thereby capturing light of a wavelength λk corresponding to the information to be recorded. Since the optical waveguide extends parallel to the crystal surface, the optical recording device can be integrated with an optical circuit.

摘要翻译： 光记录装置包括：用于发射多个波长的光的光源; 由光源发射的光发射的光子晶体中的晶体缺陷形成的光波导; 用于改变光波导附近的光子晶体的形状的信息记录/擦除单元; 以及光检测单元，用于检测从光波导发射的光。 信息记录/擦除单元的接触探针对光子晶体的多个周期性排列的柱状孔中的一个施加压力，以扩大其直径，从而捕获与信息对应的波长λλ的光 被记录。 由于光波导平行于晶体表面延伸，所以光记录装置可以与光电路集成。

公开(公告)号：US20140295107A2

公开(公告)日：2014-10-02

申请号：US14136329

申请日：2013-12-20

申请人： Akinobu SATO ,  Akiko SUZUKI ,  Emmanuel BOURELLE ,  Jiro MATSUO ,  Toshio SEKI

发明人： Akinobu SATO ,  Akiko SUZUKI ,  Emmanuel BOURELLE ,  Jiro MATSUO ,  Toshio SEKI

IPC分类号： H01J37/317

CPC分类号： C23F4/00 ,  H01J27/026 ,  H01J37/20 ,  H01J37/3053 ,  H01J37/317 ,  H01J2237/20207 ,  H01J2237/20214 ,  H01L21/3065

摘要： A scratch or similar surface roughness in a solid surface is reduced by gas cluster ion beam irradiation. A gas-cluster-ion-beam solid surface smoothing method includes an irradiation step in which the solid surface is irradiated with a gas cluster ion beam. The irradiation step includes a process of causing clusters from a plurality of directions to collide with at least an area (spot) irradiated with the gas cluster ion beam in the solid surface. Collision of clusters from a plurality of directions with the spot can be brought about by emitting a divergent gas cluster ion beam which releases clusters in diverging directions with respect to the beam center, for example.

摘要翻译： 通过气体簇离子束照射，固体表面的划痕或类似表面粗糙度降低。 气体 - 团簇 - 离子束固体表面平滑化方法包括其中固体表面被气体团簇离子束照射的照射步骤。 照射步骤包括使来自多个方向的簇的至少一部分与固体表面中的气体簇离子束照射的区域（点）发生碰撞的处理。 可以通过发射例如相对于光束中心发散发散簇的发散气体簇离子束来产生具有点的多个方向的簇的碰撞。

公开(公告)号：US08764952B2

公开(公告)日：2014-07-01

申请号：US10573942

申请日：2004-09-29

申请人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki ,  Takaaki Aoki

发明人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki ,  Takaaki Aoki

IPC分类号： C23C14/00 ,  C23C14/32 ,  C25B9/00 ,  C25B11/00 ,  C25B13/00 ,  B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  A61N5/00 ,  G21G5/00 ,  G21K5/10 ,  H01J37/08 ,  C23C14/02 ,  H01L21/302 ,  H01L21/461

CPC分类号： H01J37/3244 ,  C23F4/00 ,  H01J37/08 ,  H01J37/3053 ,  H01J2237/0812 ,  H01J2237/3151

摘要： In a method of irradiating a gas cluster ion beam on a solid surface and smoothing the solid surface, the angle formed between the solid surface and the gas cluster ion beam is chosen to be between 1° and an angle less than 30°. In case the solid surface is relatively rough, the processing efficiency is raised by first irradiating a beam at an irradiation angle θ chosen to be something like 90° as a first step, and subsequently at an irradiation angle θ chosen to be 1° to less than 30° as a second step. Alternatively, the set of the aforementioned first step and second step is repeated several times.

摘要翻译： 在固体表面上照射气体团簇离子束并平滑固体表面的方法中，将固体表面和气体团簇离子束之间形成的角度选择在1°和小于30°的角度之间。 在固体表面比较粗糙的情况下，通过首先以照射角照射光束来提高加工效率; 选择作为第一步的90°，随后在照射角度＆amp; 选择为1°至小于30°作为第二步。 或者，将上述第一步骤和第二步骤的组合重复多次。

公开(公告)号：US08268183B2

公开(公告)日：2012-09-18

申请号：US12312266

申请日：2007-10-30

申请人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki

发明人： Akiko Suzuki ,  Akinobu Sato ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki

IPC分类号： B44C1/22 ,  C23F1/00 ,  G21G5/00

CPC分类号： H01L21/3083 ,  H01J2237/0812 ,  H01L21/3065

摘要： A solid surface is processed while corner portions of a relief structure are protected from deformation. A method of processing a solid surface with a gas cluster ion beam includes a cluster protection layer formation step of forming, on the solid surface, a relief structure having protrusions with a cluster protection layer formed to cover an upper part thereof and recesses without the cluster protection layer; an irradiation step of emitting a gas cluster ion beam onto the solid surface having the relief structure formed in the cluster protection layer formation step; and a removal step of removing the cluster protection layer. A thickness T of the cluster protection layer satisfies T > nY + ( b 2 ⁢ Y 2 ⁢ n - nY 2 ⁡ ( b 4 - 16 ⁢ a 2 ) 1 2 2 ) 1 2 , where n is a dose of the gas cluster ion beam, and Y is an etching efficiency of the cluster protection layer, expressed as an etching volume per cluster (a and b are constants).

摘要翻译： 处理浮雕结构的角部以防止变形的实心表面。 用气体簇离子束处理固体表面的方法包括：簇保护层形成步骤，在固体表面上形成具有突起的浮雕结构，所述突起具有形成为覆盖其上部的簇保护层和没有簇的凹部 保护层; 在所述簇保护层形成工序中形成有具有所述浮雕结构的固体表面上的气体簇离子束的照射工序; 以及去除簇保护层的去除步骤。 簇保护层的厚度T满足T> nY +（b 2 Y 2 n-nY 2⁡（b 4 - 16 a 2）1 2 2）1 2，其中n是气体簇的剂量 离子束，Y是簇保护层的蚀刻效率，表示为每簇的蚀刻体积（a和b是常数）。

公开(公告)号：US08178857B2

公开(公告)日：2012-05-15

申请号：US11920362

申请日：2006-05-18

申请人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki

发明人： Akinobu Sato ,  Akiko Suzuki ,  Emmanuel Bourelle ,  Jiro Matsuo ,  Toshio Seki

IPC分类号： G21G5/00

CPC分类号： H01L21/32137 ,  C23F4/00 ,  H01J2237/057 ,  H01J2237/0812 ,  H01J2237/20207 ,  H01J2237/3151 ,  H01L21/3065 ,  H01L21/31116

摘要： A method for flattening a sample surface by irradiating the sample surface with a gas cluster ion beam, generates clusters of source gas in a cluster generating chamber, ionizes the generated clusters in an ionization chamber, accelerates the ionized cluster beam in an electric field of an accelerating electrode, selects a cluster size using a magnetic field of a sorting mechanism, and irradiates the surface of a sample. An irradiation angle between the sample surface and the gas cluster ion beam is less than 30° and an average cluster size of the gas cluster ion beam is 50 or above.

摘要翻译： 通过用气体簇离子束照射样品表面来平坦化样品表面的方法，在簇生成室中产生源气体簇，将电离室中产生的簇电离，在离子化的电场中加速离子化的簇束 加速电极，使用分选机构的磁场选择簇尺寸，并照射样品的表面。 样品表面和气体团簇离子束之间的照射角度小于30°，气体团簇离子束的平均簇尺寸为50以上。

公开(公告)号：US20110189439A1

公开(公告)日：2011-08-04

申请号：US13008639

申请日：2011-01-18

申请人： Akinobu Sato ,  Akiko Suzuki ,  Takeshi Kawano

发明人： Akinobu Sato ,  Akiko Suzuki ,  Takeshi Kawano

IPC分类号： B32B3/30 ,  C23F4/00

CPC分类号： H01J37/3056 ,  B21D37/18 ,  B32B3/30 ,  C23F4/00 ,  H01J37/317 ,  Y10T428/12389 ,  Y10T428/24355 ,  Y10T428/24446 ,  Y10T428/24479

摘要： A slide part has a surface structure in which there are at least two periodic structures among a first periodic structure with a period of 10 nm to 100 nm inclusive and a depth of 5 nm to 50 nm inclusive, a second periodic structure with a period of 100 nm to 1000 nm inclusive and a depth of 20 nm to 500 nm inclusive, and a third periodic structure with a period of 1000 nm to 10000 nm inclusive and a depth of 100 nm to 3000 nm inclusive, in which one of the at least two periodic structures is formed on the other periodic structure.

摘要翻译： 滑动部件具有表面结构，其中在具有10nm至100nm的周期和包括端点在内的5nm至50nm的深度的第一周期性结构中存在至少两个周期性结构，第二周期性结构具有周期为 100nm至1000nm，包括深度为20nm至500nm的第三周期结构，以及包括端值在内的1000nm至10000nm的周期和深度为100nm至3000nm的第三周期结构，其中至少 在另一个周期性结构上形成两个周期性结构。