Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that have sugar substitution. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Abstract:
A method for reducing a number of input terminals of an APC circuit is provided, where the APC circuit is arranged to control an optical pickup unit (OPU) within an optical storage device. The method includes: utilizing at least one switching module to ground one of a first and a second input terminals of the APC circuit at a time; and utilizing the switching module to electrically connect an APC front end within the APC circuit to a non-grounded input terminal of the first and the second input terminals, in order to receive a detection signal of a photo diode of the OPU through the non-grounded input terminal at the time. An associated APC circuit is also provided.
Abstract:
New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
Abstract:
Cyanurate compositions are provided that are particularly useful as a reagent to form a resin component of a coating composition underlying an overcoated photoresist. Preferred isocyanurates compound comprise substitution of multiple cyanurate nitrogen ring atoms by at least two distinct carboxy and/or carboxy ester groups.
Abstract:
A protective cover assembly is mounted within a portable electronic device. The portable electronic device defines a through hole. The protective cover assembly includes a resisting portion including a first positioning portion and a second positioning portion, a shielding cover and an elastic member offering an elastic force to make the resisting portion abut against the shielding cover. When the shielding cover resisting the first positioning portion, the shielding cover shields the through hole. When the shielding cover resisting the second positioning portion, the shielding cover exposes the through hole.
Abstract:
A portable electronic device includes a first housing, a keypad module, and a decorative bar assembled in the first housing and resisting the keypad module. The first housing includes a first sidewall having a protruding portion; and a second sidewall opposite to the first sidewall, and defining a receiving slot. The keypad module includes a first end defining at least one sliding slot, and a second end opposite to the first end, and having a rib positioned thereon. The protruding portion is slidably latched in the sliding slot, the rib is slidably assembled in the receiving slot.
Abstract:
Synthesizing a message sequence chart (MSC) from a communicating finite-state machine (CFSM), by transforming the CFSM to a Petri net model, generating a labeled finite digraph with each path representing a linearization of an occurrence net segment of the Petri net, decomposing the diagraph into segments, and mapping where each segment to a compositional MSC.
Abstract:
New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.
Abstract:
New bis(sulfonyl)imide and tri(sulfonyl)methide photoacid generator compounds (“PAGs”) are provided as well as photoresist compositions that comprise such PAG compounds.
Abstract:
A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, or C3-20 heterocycloalkyl, wherein each Rc is separate or at least one Rc is attached to an adjacent Rc.