公开(公告)号：US07842930B2

公开(公告)日：2010-11-30

申请号：US11923421

申请日：2007-10-24

申请人： Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

发明人： Gilad Almogy ,  Dror Shemesh ,  Pavel Adamec

IPC分类号： H01J37/28

CPC分类号： H01J37/244 ,  H01J2237/2443 ,  H01J2237/24455 ,  H01J2237/2446 ,  H01J2237/24465 ,  H01J2237/2802 ,  H01J2237/2804

摘要： A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.

摘要翻译： 带电粒子检测器组件包括粒子检测器，该粒子检测器具有至少一个用于检测带电粒子的空间分布的至少一部分的粒子敏感区域，并用于产生与检测到的空间分布相关的二维光信号。 此外，图像导管具有耦合到粒子检测器的粒子敏感区域的输入端，用于将二维光信号传输到至少一个光学检测器。 此外，选择装置适于选择二维光信号的至少一部分。

公开(公告)号：US20090053395A1

公开(公告)日：2009-02-26

申请号：US12103458

申请日：2008-04-15

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： B05D5/12 ,  C23F1/00 ,  B05C11/00

CPC分类号： G01N1/32

摘要： A method and a system for obtaining an image of a cross section of a specimen, the method includes: milling the specimen so as to expose a cross section of the specimen, whereas the cross section comprises at least one first portions made of a first material and at least one second portion made of a second material; smoothing the cross section; performing gas assisted etching of the cross section so as generate a topography difference between the at least one first portion and the at least one second portion of the cross section; coating the cross section with a thin layer of conductive material; and obtaining an image of the cross section; wherein the milling, smoothing, performing, coating and obtaining are preformed while the specimen is placed in a vacuumed chamber.

摘要翻译： 一种用于获得样本横截面图像的方法和系统，所述方法包括：铣削样本以暴露样本的横截面，而横截面包括由第一材料制成的至少一个第一部分 和由第二材料制成的至少一个第二部分; 平滑横截面; 执行所述横截面的气体辅助蚀刻，以便在所述截面的所述至少一个第一部分和所述至少一个第二部分之间产生形貌差异; 用导电材料薄层涂覆横截面; 并获得横截面的图像; 其中在将样品放置在真空室中时进行研磨，平滑化，涂覆和获得。

公开(公告)号：US07473911B2

公开(公告)日：2009-01-06

申请号：US10695620

申请日：2003-10-27

申请人： Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

发明人： Alexander Kadyshevitch ,  Dror Shemesh ,  Yaniv Brami ,  Dmitry Shur

IPC分类号： H01J49/44

CPC分类号： H01L22/34 ,  H01J37/32935 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L2924/3011

摘要： A method for process monitoring includes receiving a sample having a first layer that is at least partly conductive and a second layer formed over the first layer, following production of contact openings in the second layer. A beam of charged particles is directed along a beam axis that deviates substantially in angle from a normal to a surface of the sample, so as to irradiate one or more of the contact openings in each of a plurality of locations distributed over at least a region of the sample. A specimen current flowing through the first layer is measured in response to irradiation of the one or more of the contact openings at each of the plurality of locations. A map of at least the region of the sample is created, indicating the specimen current measured in response to the irradiation at the plurality of the locations.

摘要翻译： 一种用于过程监测的方法包括在第二层中产生接触开口之后，接收具有至少部分导电的第一层的样品和在第一层上形成的第二层。 带电粒子束沿着光束轴线被引导，所述光束轴线基本上偏离于与样品表面的法线的角度，以便照射分布在至少一个区域上的多个位置中的每一个中的一个或多个接触开口 的样品。 响应于多个位置中的每一个处的一个或多个接触开口的照射来测量流过第一层的样本电流。 产生至少样品区域的图，指示响应于多个位置处的照射测量的样本电流。

公开(公告)号：US20080234962A1

公开(公告)日：2008-09-25

申请号：US11877125

申请日：2007-10-23

申请人： Dror Shemesh ,  Yuri Shirman

发明人： Dror Shemesh ,  Yuri Shirman

IPC分类号： G06F19/00

CPC分类号： G01N23/2276

摘要： A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter; and an interface to a electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.

摘要翻译： 一种用于提供经补偿的俄歇频谱的系统，所述系统包括：处理器，适于响应于未补偿的俄歇频谱并响应于电位相关参数产生经补偿的俄歇频谱; 以及与适于检测从第一区域发射的电子的电子检测器的接口，其中该接口连接到该处理器，并且其中该电位相关参数反映由该第一区域照射的该物体的第一区域的状态 在产生非补偿俄歇光谱期间的带电粒子束。

公开(公告)号：US20050012050A1

公开(公告)日：2005-01-20

申请号：US10492574

申请日：2002-10-04

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： H01J37/21 ,  A61N5/00 ,  G01N21/00 ,  G21G5/00 ,  H01J3/26 ,  H01J37/08 ,  H01J37/153 ,  H01J37/22 ,  H01J37/26

CPC分类号： H01J37/1471 ,  H01J37/153 ,  H01J37/22 ,  H01J37/263 ,  H01J37/265 ,  H01J37/304 ,  H01J2237/045 ,  H01J2237/1501 ,  H01J2237/1532 ,  H01J2237/216 ,  H01J2237/221

摘要： The invention provides a method for automatically aligning a beam of charged particles with an aperture. Thereby, the beam is defelcted to two edges of the aperture. From the signals required to obtain an extinction, a correction deflection field is calculated. Furter, a method for automatically aligning a beam of charged particles with an optical axis is provided. Thereby a defocusing is introduced and a signal calculated based on an introduced image shift is applied to a deflection unit. Further, a method for correction of the astigmatism is provided. Thereby the sharpness is evaluated for a sequence of frames measured whilst varying the signals to a stigmator.

摘要翻译： 本发明提供一种用于将带电粒子束自动对准孔的方法。 由此，光束被消除到光圈的两个边缘。 根据获得消光所需的信号，计算校正偏转场。 Furter提供了一种用于将带电粒子束自动对准光轴的方法。 从而引入散焦，并将基于引入的图像偏移计算的信号应用于偏转单元。 此外，提供了用于校正像散的方法。 因此，对于在将信号改变为瞄准器的同时测量的帧序列来评估锐度。

公开(公告)号：US20120241605A1

公开(公告)日：2012-09-27

申请号：US13460470

申请日：2012-04-30

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： H01J37/26

CPC分类号： H01J37/28 ,  H01J2237/057 ,  H01J2237/2814

摘要： A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.

摘要翻译： 一种用于提高扫描电子显微镜的分辨率的方法，所述方法包括：响应于对象中二次电子的预期穿透深度来定义能带; 用一次电子束照射物体; 以及从能量到达具有能带内的光谱仪的电子产生图像。 一种扫描电子显微镜，包括：用于支撑物体的台; 控制器，适于响应于物体中二次电子的预期穿透深度而接收或限定能带的能带; 适于用一次电子束照射物体的照明光学器件; 光谱仪 由控制器控制，以响应于限定的能带选择性地拒绝电子; 以及适于根据由该光谱仪提供的检测信号产生图像的处理器。

公开(公告)号：US07312446B2

公开(公告)日：2007-12-25

申请号：US10530159

申请日：2003-10-08

申请人： Dror Shemesh

发明人： Dror Shemesh

IPC分类号： G01N23/00

CPC分类号： G01N23/2252

摘要： Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.

摘要翻译： 基于由诸如电子或离子的带电粒子束引起的X射线发射的过程监测的系统和方法。 概念如本文所述。

公开(公告)号：US07233008B1

公开(公告)日：2007-06-19

申请号：US11080036

申请日：2005-03-14

申请人： Igor Petrov ,  Dror Shemesh

发明人： Igor Petrov ,  Dror Shemesh

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03B27/42 ,  G03B27/54

摘要： A inspection system includes: a lens arrangement adapted to generate a substantially symmetrical electrostatic field about an optical axis and to direct a primary electron beam towards an object that is oriented in relation to the optical axis at a non-normal angle; and at least on additional electrode, positioned outside the lens arrangement such as to increase symmetry of an electromagnetic field in the vicinity of an interaction point between the primary electron beam and the object. A method for inspecting an object includes: passing a primary electron beam, along an optical axis, through a substantially symmetrical electrostatic field defined within an electron lens arrangement; and propagating the primary electron beam from the lens arrangement towards an interaction point with an object that is oriented in relation to the optical axis at a non-normal angle, while maintaining, by at least one additional electrode positioned outside the lens arrangement, a substantially symmetrical electrical field in a vicinity of the interaction point.

摘要翻译： 检查系统包括：透镜装置，其适于产生围绕光轴的基本上对称的静电场，并且将一次电子束引向朝向相对于光轴以非正常角度取向的物体; 并且至少在位于透镜装置外部的另外的电极上，以增加电子束在一次电子束和物体之间的相互作用点附近的对称性。 用于检查物体的方法包括：使沿着光轴的一次电子束通过限定在电子透镜装置内的基本上对称的静电场; 并且将来自透镜装置的一次电子束传播到与以非正常角度相对于光轴定向的物体的相互作用点，同时通过位于透镜装置外部的至少一个附加电极基本上 在相互作用点附近的对称电场。

公开(公告)号：US06900065B2

公开(公告)日：2005-05-31

申请号：US10327398

申请日：2002-12-19

申请人： Vicky Rashkovan ,  Dror Shemesh

发明人： Vicky Rashkovan ,  Dror Shemesh

IPC分类号： G01R31/311 ,  H01L23/544 ,  H01L21/66 ,  G01R31/08 ,  G01R31/26

CPC分类号： H01L22/34 ,  G01R31/311

摘要： An apparatus and a method for electrically testing a semiconductor wafer, the method including: (i) depositing electrical charges at certain points of a test pattern; (ii) scanning at least a portion of the test pattern such as to enhance charge differences resulting from defects; and (iii) collecting charged particles emitted from the at least scanned portion as a result of the scanning, thus providing an indication about an electrical state of the respective test structure.

摘要翻译： 一种用于电测试半导体晶片的装置和方法，所述方法包括：（i）在测试图案的某些点放置电荷; （ii）扫描至少一部分测试图案，以增强由缺陷导致的电荷差异; 和（iii）作为扫描的结果收集从至少扫描的部分发射的带电粒子，从而提供关于各个测试结构的电状态的指示。

公开(公告)号：US06670610B2

公开(公告)日：2003-12-30

申请号：US10005190

申请日：2001-11-26

申请人： Dror Shemesh ,  Ariel Ben-Porath ,  Dubi Shachal ,  Alexey Stepanov

发明人： Dror Shemesh ,  Ariel Ben-Porath ,  Dubi Shachal ,  Alexey Stepanov

IPC分类号： H01J3726

CPC分类号： H01J37/3056 ,  H01J37/304 ,  H01J2237/28

摘要： A system and method for directing the object, such as a semiconductor die. The system includes a first images such as a scanning electron microscope, a stage for moving the object and a second imager and miller such as a focused ion beam generator. The object is images to locate a desired location in which the object is to be milled and a landmark that is utilized for directing the miller. The system can include additional steps of milling, analyzing and movement of the object.