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11.发明申请公开(公告)号：US20200040460A1
公开(公告)日：2020-02-06
申请号：US16471126
申请日：2017-12-15
Applicant: MEC COMPANY LTD.
Inventor： Daisaku AKIYAMA , Itsuro TOMATSU , Yasutaka AMITANI , Keisuke JOKO , Tokuya SATOMI
Abstract: The coating film-forming composition is a solution of pH 4 to 10 and includes an aromatic compound having an amino group and an aromatic ring in one molecule, a polybasic acid having two or more carboxy groups, and an oxidizing agent. As the oxidizing agent, hypochlorous acid, chlorous acid, chloric acid, perchloric acid, persulfuric acid, percarbonic acid, hydrogen peroxide, organic peroxides, or the like is used. The aromatic compound preferably contains a nitrogen-containing aromatic ring, and more preferably contains a primary amino group or a secondary amino group. The coating film-forming composition is used for, for example, forming a coating film on surface of a metal member.
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12.发明申请公开(公告)号：US20190127606A1
公开(公告)日：2019-05-02
申请号：US16096827
申请日：2017-03-13
Applicant: MEC COMPANY LTD.
Inventor： Daisaku AKIYAMA , Yoichi SENGOKU , Itsuro TOMATSU , Masao OKADA , Ryoko MITANI , Keisuke JOKO , Yasutaka AMITANI , Tokuya SATOMI , Masaru TAKAHASHI
IPC: C09D183/04 , B32B15/08 , C09J11/08 , C09D7/63 , C09J183/04
CPC classification number: C09D183/04 , B32B15/08 , B32B2255/06 , B32B2255/24 , C08K3/16 , C08K5/092 , C08K5/17 , C09D5/00 , C09D5/002 , C09D7/40 , C09D7/61 , C09D7/63 , C09D177/00 , C09J11/04 , C09J11/06 , C09J11/08 , C09J183/04 , C23C26/00 , H05K3/38
Abstract: The coating film-forming composition is a solution of pH 6 to 9 and includes an aromatic compound having an amino group and an aromatic ring in one molecule, a polybasic acid having two or more carboxy groups, and a halide ion. The content of polybasic acid in the coating film-forming composition is 0.05 to 10 times the content of aromatic compound, and the halide ion concentration is 5 to 600 mM. A coating film with excellent adhesion to a resin can be formed on a surface of a metal member by bringing the coating film-forming composition into contact with the surface of the metal member.
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公开(公告)号：US10174428B2
公开(公告)日：2019-01-08
申请号：US15124018
申请日：2016-05-31
Applicant: MEC COMPANY LTD.
Inventor： Hirofumi Kodera , Ikuyo Katayama , Shota Hishikawa
Abstract: An etchant for copper includes an acid and one or more compounds selected from the group consisting of an aliphatic noncyclic compound, an aliphatic heterocyclic compound and a heteroaromatic compound. The aliphatic noncyclic compound is a saturated aliphatic noncyclic compound (A) including only two or more nitrogen atoms as heteroatoms, and 2 to 10 carbon atoms. The aliphatic heterocyclic compound is a compound (B) including a five-, six-, or seven-membered ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring. The heteroaromatic compound is a compound (C) including a six-membered heteroaromatic ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring.
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公开(公告)号：US20170268112A1
公开(公告)日：2017-09-21
申请号：US15531764
申请日：2015-09-17
Applicant: MEC COMPANY LTD.
Inventor： Daisaku AKIYAMA , Mina RAIJO
CPC classification number: C23F1/22 , B29C45/02 , B29C45/14 , B29C45/14311 , B29K2705/00
Abstract: The etching agent is an aqueous solution including at least one acid selected from the group consisting of inorganic acids other than nitric acid, and organic acids; and an organic nitrogen compound having a molecular structure containing N—OH or N—O−. The acid concentration of the etching agent is 0.05 to 3% by weight, and the organic nitrogen compound concentration of the etching agent is 0.005 to 5% by weight. By bringing the etching agent into contact with a surface of a magnesium component, fine irregularities can be formed on the surface of the magnesium component even when etching depth is large.
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公开(公告)号：US20170260632A1
公开(公告)日：2017-09-14
申请号：US15124018
申请日：2016-05-31
Applicant: MEC COMPANY LTD.
Inventor： Hirofumi KODERA , Ikuyo KATAYAMA , Shota HISHIKAWA
CPC classification number: C23F1/18 , C09K13/06 , H05K3/067 , H05K2203/0789
Abstract: An etchant for copper includes an acid and one or more compounds selected from the group consisting of an aliphatic noncyclic compound, an aliphatic heterocyclic compound and a heteroaromatic compound. The aliphatic noncyclic compound is a saturated aliphatic noncyclic compound (A) including only two or more nitrogen atoms as heteroatoms, and 2 to 10 carbon atoms. The aliphatic heterocyclic compound is a compound (B) including a five-, six-, or seven-membered ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring. The heteroaromatic compound is a compound (C) including a six-membered heteroaromatic ring having one or more nitrogen atoms as one or more heteroatoms constituting the ring.
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Patent Agency Ranking
16.发明申请公开(公告)号：US20140326696A1
公开(公告)日：2014-11-06
申请号：US14360783
申请日：2013-06-25
Applicant: MEC COMPANY LTD.
Inventor： Masayo Kurii , Kiyoto Tai , Mami Nakamura , Yuki Ogino
CPC classification number: C23F1/18 , H05K3/067 , H05K3/383 , H05K2203/0307 , H05K2203/0789
Abstract: Disclosed is a microetching solution, a replenishment solution added to said microetching solution and a method for production of a wiring board using said microetching solution. The microetching solution for copper consists of an aqueous solution containing a cupric ion, an organic acid, a halide ion, a polymer and a nonionic surfactant. The polymer is a water-soluble polymer including a polyamine chain and/or a cationic group and having a weight average molecular weight of 1000 or more. In the microetching solution of the present invention, a value of AB is 2000 to 9000 and a value of A/D is 500 to 9000, where a concentration of the halide ion is A % by weight, a concentration of the polymer is B % by weight and a concentration of the nonionic surfactant is D % by weight. Using this microetching solution, adhesion to a resin or the like can be uniformly maintained even with a low etching amount.
Abstract translation: 公开了一种微蚀刻溶液，添加到所述微蚀刻溶液中的补充溶液和使用所述微蚀刻溶液生产布线板的方法。 用于铜的微蚀刻溶液由含有铜离子，有机酸，卤离子，聚合物和非离子表面活性剂的水溶液组成。 聚合物是包含多胺链和/或阳离子基团并且重均分子量为1000以上的水溶性聚合物。 在本发明的微蚀刻溶液中，AB的值为2000〜9000，A / D的值为500〜9000，卤化物离子的浓度为A％（重量），聚合物的浓度为B％ ，非离子表面活性剂的浓度为D重量％。 使用该微蚀刻溶液，即使在低蚀刻量下也能均匀地保持对树脂等的粘附。
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17.发明申请公开(公告)号：US20250069371A1
公开(公告)日：2025-02-27
申请号：US18722545
申请日：2022-11-29
Applicant: MEC COMPANY LTD.
Inventor： Masako AKAGI , Tristan HASCOET , Xuejiao DENG
IPC: G06V10/77 , G06V10/774 , G06V10/82 , G06V20/69
Abstract: The physical property value prediction method include: acquiring a prediction target image of a prediction target material; inputting the prediction target image into a prediction model machine-learned so as to receive an input of the image of the material as an explanatory variable and output the physical property value of the material, and outputting the physical property value of the material appearing in the prediction target image as a predicted value.
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公开(公告)号：US12144122B2
公开(公告)日：2024-11-12
申请号：US17998966
申请日：2021-11-16
Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD. , SUMITOMO ELECTRIC PRINTED CIRCUITS, INC. , MEC COMPANY LTD.
Inventor： Shoichiro Sakai , Ryuta Ohsuka , Koji Nitta , Yoshihito Yamaguchi , Masaharu Yasuda , Akira Tsuchiko , Koji Kasuya , Kenji Nishie , Yu Fukui
Abstract: In manufacturing a printed circuit board using a semi-additive method, a removal liquid that has been used in removing a nickel-chromium-containing layer (5) is regenerated by contacting the removal liquid with a chelate resin having a functional group represented by a following formula (1): where a plurality of Rs are identical divalent hydrocarbon groups having 1 to 5 carbons, and a portion of hydrogen atoms may be substituted with halogen atoms.
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公开(公告)号：US11937573B2
公开(公告)日：2024-03-26
申请号：US17260510
申请日：2019-06-27
Applicant: MEC COMPANY LTD.
Inventor： Kiyoto Tai , Yuji Adachi , Hideshi Hamaguchi
CPC classification number: A01K15/021 , A01K29/005 , G06F3/165 , G06V40/20 , H04R3/00 , H04R2420/07
Abstract: In order to achieve a music providing system capable of controlling the behavioral state of a non-human animal using music, this music providing system for a non-human animal is provided with: a state information acquisition unit for acquiring state information relating to the motion state of an animal of interest; a state estimation processing unit for estimating the current behavioral state of the animal of interest from the state information; a target state storage unit for storing information relating to a target behavioral state for the animal of interest; a sound source storage unit for storing multiple music information pieces; a music information selection unit for detecting the degree of divergence of the current behavioral state from the target behavioral state and selecting one specific music information piece on the basis of the multiple music information pieces stored in the sound source storage unit; and a music information output unit for outputting the specific music information by wireless communication or wired communication to a speaker provided within a region in which the animal of interest is present. The music information selection unit performs the processing for selecting a different specific music information piece until the degree of divergence becomes a first threshold value or less.
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公开(公告)号：US20230232540A1
公开(公告)日：2023-07-20
申请号：US17998966
申请日：2021-11-16
Applicant: SUMITOMO ELECTRIC INDUSTRIES, LTD. , SUMITOMO ELECTRIC PRINTED CIRCUITS, INC. , MEC COMPANY LTD.
Inventor： Shoichiro SAKAI , Ryuta OHSUKA , Koji NITTA , Yoshihito YAMAGUCHI , Masaharu YASUDA , Akira TSUCHIKO , Koji KASUYA , Kenji NISHIE , Yu FUKUI
CPC classification number: H05K3/103 , C22C19/05 , H05K1/0373 , H05K3/1258 , H05K2201/0212 , H05K2203/061 , H05K2203/176
Abstract: In manufacturing a printed circuit board using a semi-additive method, a removal liquid that has been used in removing a nickel-chromium-containing layer (5) is regenerated by contacting the removal liquid with a chelate resin having a functional group represented by a following formula (1) :
where a plurality of Rs are identical divalent hydrocarbon groups having 1 to 5 carbons, and a portion of hydrogen atoms may be substituted with halogen atoms.
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