Touch panel video display system for vehicles
    11.
    发明申请
    Touch panel video display system for vehicles 审中-公开
    汽车触摸屏视频显示系统

    公开(公告)号:US20060044214A1

    公开(公告)日:2006-03-02

    申请号:US10924842

    申请日:2004-08-25

    申请人: Suk Hong

    发明人: Suk Hong

    IPC分类号: G09G5/00

    摘要: A touch panel video display system includes: a touch panel video display screen positioned in a rear surface of the portion of the seat such that a passenger behind the seat can view the touch panel video display screen; and an audio video junction controller connected to the touch panel video display screen for connecting one of a plurality of audio video devices to the video display screen in response to a device control input from the touch panel video display screen and for controlling audio from the plurality of audio video devices in response to an audio control input from the touch panel video display screen, wherein one of the plurality of audio video devices is a media player connected to the audio video junction controller such that playback operations of the media player are controlled by an operation input from the touch panel video display screen.

    摘要翻译: 一种触摸面板视频显示系统,包括:位于所述座椅的所述部分的后表面中的触摸面板视频显示屏幕,使得所述座椅后面的乘客可以观看所述触摸面板视频显示屏幕; 以及音频视频接口控制器,其连接到触摸面板视频显示屏幕,用于响应于来自触摸面板视频显示屏幕的设备控制输入而将多个音频视频设备中的一个连接到视频显示屏幕并且用于控制来自多个 响应于来自触摸面板视频显示屏幕的音频控制输入的多个音频视频设备,其中多个音频视频设备之一是连接到音频视频接口控制器的媒体播放器,使得媒体播放器的播放操作由 来自触摸屏视频显示屏的操作输入。

    System for analyzing mask topography and method of forming image using the system
    14.
    发明授权
    System for analyzing mask topography and method of forming image using the system 失效
    用于分析掩模地形的系统和使用该系统形成图像的方法

    公开(公告)号:US08045787B2

    公开(公告)日:2011-10-25

    申请号:US12006877

    申请日:2008-01-07

    IPC分类号: G06K9/00

    摘要: Provided are a system for analyzing a mask topography, which can reduce calculation time and increase calculation accuracy in consideration of a mask topography effect, and a method of forming an image using the system. The system and method simultaneously obtains a first electric field using a Kirchhoff method without considering a pitch formed on a mask and obtains a second electric field using an electromagnetic field analysis method considering the pitch, and then determines a third electric field on a pupil surface of a projection lens by combining the first electric field and the second electric field of forming an image, so as to calculate the image of an optical lithography system which includes an illumination system and a projection optical system and to which the projection lens belongs.

    摘要翻译: 提供了一种用于分析掩模形貌的系统,其可以减少考虑到掩模形貌效应的计算时间和增加计算精度,以及使用该系统形成图像的方法。 该系统和方法同时使用基尔霍夫方法获得第一电场,而不考虑在掩模上形成的间距,并且使用考虑到间距的电磁场分析方法获得第二电场,然后确定瞳孔表面上的第三电场 通过组合形成图像的第一电场和第二电场的投影透镜,以计算包括照明系统和投影光学系统并且投影透镜所属的光学系统的图像。

    CONTINUOUS CASTING MACHINE USING MOLTEN MOLD FLUX
    15.
    发明申请
    CONTINUOUS CASTING MACHINE USING MOLTEN MOLD FLUX 有权
    连续铸造机使用MOLT模具

    公开(公告)号:US20090277600A1

    公开(公告)日:2009-11-12

    申请号:US12306158

    申请日:2007-06-22

    IPC分类号: B22D11/108 B22D11/00

    CPC分类号: B22D11/108

    摘要: A continuous casting machine injecting molten mold flux into a mold includes: melt-surface covers covering the upper side of the mold; gas aspirators provided below the melt-surface covers for inhaling the gas in an upper space of the mold; and purge gas injectors provided below the melt-surface covers for injecting purge gas into the upper space of the mold.

    摘要翻译: 将熔融的熔渣注入模具中的连续铸造机包括:覆盖模具上侧的熔融表面盖; 设置在熔体表面盖下面的气体吸收器,用于在模具的上部空间吸入气体; 以及设置在熔体表面盖下方的吹扫气体喷射器,用于将吹扫气体注入模具的上部空间。

    Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask
    16.
    发明授权
    Photo mask and method of manufacturing the same, and method of forming photosensitive film pattern of using the photo mask 有权
    光掩模及其制造方法以及使用光掩模形成感光膜图案的方法

    公开(公告)号:US07432043B2

    公开(公告)日:2008-10-07

    申请号:US11372202

    申请日:2006-03-10

    申请人: Ji Suk Hong

    发明人: Ji Suk Hong

    IPC分类号: G03C5/00

    CPC分类号: G03F1/32 G03F1/36

    摘要: The present invention relates to a photo mask and a method of manufacturing the same, and a method of forming a photosensitive film pattern using the photo mask. A photo mask pattern having an exposure region, a phase-inverse region and a photosensitive region is provided. The predetermined size and shape of the patterns on the photo mask are formed. Through this manner, distortions of the photosensitive film pattern upon development are compensated and a target photosensitive film pattern can be more accurately acquired. Furthermore, the depth of focus of a photolithography process can be increased.

    摘要翻译: 光掩模及其制造方法技术领域本发明涉及一种光掩模及其制造方法,以及使用该光掩模形成感光膜图案的方法。 提供具有曝光区域,相位反转区域和感光区域的光掩模图案。 形成光掩模上的图案的预定尺寸和形状。 通过这种方式,补偿了显影时感光膜图案的变形,并且可以更精确地获得目标感光膜图案。 此外,可以增加光刻工艺的焦深。

    System for analyzing mask topography and method of forming image using the system
    17.
    发明申请
    System for analyzing mask topography and method of forming image using the system 失效
    用于分析掩模地形的系统和使用该系统形成图像的方法

    公开(公告)号:US20080175432A1

    公开(公告)日:2008-07-24

    申请号:US12006877

    申请日:2008-01-07

    IPC分类号: G06K9/00

    摘要: Provided are a system for analyzing a mask topography, which can reduce calculation time and increase calculation accuracy in consideration of a mask topography effect, and a method of forming an image using the system. The system and method simultaneously obtains a first electric field using a Kirchhoff method without considering a pitch formed on a mask and obtains a second electric field using an electromagnetic field analysis method considering the pitch, and then determines a third electric field on a pupil surface of a projection lens by combining the first electric field and the second electric field of forming an image, so as to calculate the image of an optical lithography system which includes an illumination system and a projection optical system and to which the projection lens belongs.

    摘要翻译: 提供了一种用于分析掩模形貌的系统,其可以减少考虑到掩模形貌效应的计算时间和增加计算精度,以及使用该系统形成图像的方法。 该系统和方法同时使用基尔霍夫方法获得第一电场,而不考虑在掩模上形成的间距,并且使用考虑到间距的电磁场分析方法获得第二电场,然后确定瞳孔表面上的第三电场 通过组合形成图像的第一电场和第二电场的投影透镜,以计算包括照明系统和投影光学系统并且投影透镜所属的光学系统的图像。

    METHOD OF CORRECTING A DESIGNED PATTERN OF A MASK
    18.
    发明申请
    METHOD OF CORRECTING A DESIGNED PATTERN OF A MASK 审中-公开
    校正设计图案的方法

    公开(公告)号:US20080052660A1

    公开(公告)日:2008-02-28

    申请号:US11830265

    申请日:2007-07-30

    IPC分类号: G03F1/00 G06F17/50

    CPC分类号: G03F1/36

    摘要: A method of correcting a design pattern of a mask takes into account the overlay margin between adjacent one of actual patterns that are stacked on a substrate. First, a pattern of a photomask for forming a first one of the actual patterns on a substrate is conceived. Also, information representing the image of a second one of the actual patterns is produced. Then, optical proximity correction (OPC) is performed on the first pattern based on the information. The information may be obtained by simulating the transcription of a photomask having a second pattern designed to form the second actual pattern, or by forming the second actual pattern and then capturing the image of the second actual pattern. Accordingly, a sufficient margin is provided between the second actual pattern and the first pattern on which the optical proximity correction has been performed.

    摘要翻译: 校正掩模的设计图案的方法考虑了堆叠在基板上的相邻的一个实际图案之间的覆盖边缘。 首先,设想用于在基板上形成第一种实际图案的光掩模图案。 此外,产生表示第二实际图案的图像的信息。 然后,基于该信息对第一图案执行光学邻近校正(OPC)。 可以通过模拟具有被设计为形成第二实际图案的第二图案的光掩模的转录或通过形成第二实际图案然后捕获第二实际图案的图像来获得信息。 因此,在第二实际图案和已进行光学邻近校正的第一图案之间提供足够的余量。

    Micro optical communication device package
    19.
    发明申请
    Micro optical communication device package 审中-公开
    微光通讯器件封装

    公开(公告)号:US20050078920A1

    公开(公告)日:2005-04-14

    申请号:US10734146

    申请日:2003-12-15

    摘要: The present invention relates to a micro optical communication device package. The package of the invention comprises a Micro-Electro-Mechanical System (MEMS) chip for executing an optical communication function. The MEMS chip is mounted on a base. An upper housing having an opened bottom is placed on the base to form an internal space together with the base. The upper housing is sealed with the base to hermetically seal the MEMS chip within the internal space. The MEMS chip is connected an optical fiber, which is extended through the upper housing to form a light path. A boot is fit around the optical fiber and fixed to the upper housing to seal a portion of the upper housing for allowing passage of the optical fiber.

    摘要翻译: 本发明涉及一种微型光通信设备封装。 本发明的封装包括用于执行光通信功能的微机电系统(MEMS)芯片。 MEMS芯片安装在基座上。 具有开口底部的上壳体被放置在基座上以与基部一起形成内部空间。 上壳体与基座密封,以将MEMS芯片密封在内部空间内。 MEMS芯片连接有光纤,该光纤通过上壳体延伸以形成光路。 导光罩装在光纤周围并固定在上壳体上,以密封上壳体的一部分,以允许光纤通过。