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29 条记录 (耗时 0.019 秒)

    Polymers and positive resist compositions
    11.
    发明授权
    Polymers and positive resist compositions 失效
    聚合物和正性抗蚀剂组合物

    公开(公告)号：US06221989B1

    公开(公告)日：2001-04-24

    申请号：US09310756

    申请日：1999-05-13

    申请人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

    发明人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

    IPC分类号： C08F12606

    CPC分类号： C08G8/24 ,  C08G8/28

    摘要： A novel polymer is provided in the form of a novolac resin in which some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, triazinyl groups and optionally, substituted carbonyl or sulfonyl groups. A positive resist composition comprising the polymer has improved sensitivity, resolution and developability in microfabrication as well as improved heat resistance and low-temperature curability in forming interlayer insulating film.

    摘要翻译： 提供了一种酚醛清漆树脂形式的新型聚合物，其中羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基，三嗪基和任选取代的羰基或磺酰基代替。 包含该聚合物的正型抗蚀剂组合物在形成层间绝缘膜时具有提高的微细加工中的敏感性，分辨率和显影性，以及改善的耐热性和低温固化性。

    SILICONE RUBBER COMPOSITION FOR OPTICAL SHEET, AND OPTICAL SHEET
    14.
    发明申请
    SILICONE RUBBER COMPOSITION FOR OPTICAL SHEET, AND OPTICAL SHEET 失效
    硅胶硅橡胶组合物和光学片

    公开(公告)号：US20120165451A1

    公开(公告)日：2012-06-28

    申请号：US13338396

    申请日：2011-12-28

    申请人： Minoru Igarashi ,  Tsutomu Nakamura ,  Atsuo Ito ,  Tomoyoshi Furihata ,  Hyung-Bae Kim

    发明人： Minoru Igarashi ,  Tsutomu Nakamura ,  Atsuo Ito ,  Tomoyoshi Furihata ,  Hyung-Bae Kim

    IPC分类号： C08K5/54 ,  C08K3/36

    CPC分类号： C08K3/36 ,  C08K5/5419 ,  C08K9/06 ,  Y02E10/52 ,  Y10T428/31663 ,  C08L83/04

    摘要： Disclosed is a minable type silicone rubber composition including as an essential components:(A) 100 parts by weight of an organopolysiloxane represented by the following average compositional formula (I) and having a polymerization degree of at least 100; R1aSiO(4-a)/2   (I) wherein R1 are, identical or different, unsubstituted or substituted monovalent hydrocarbon groups, and a is a positive number of 1.95 to 2.05;(B) 70 to 150 parts by weight of fumed silica having a specific surface area of more than 200 m2/g;(C) 0.1 to 30 parts by weight of an organohydrogenpolysiloxane having at least two hydrogen atoms bonded to silicon atoms in one molecule; and(D) 0.1 to 10 parts by weight of a hydrosilylation reaction catalyst.

    摘要翻译： 公开了一种包含作为必要成分的微型硅橡胶组合物：（A）100重量份由以下平均组成式（I）表示的聚合度为至少100的有机聚硅氧烷; R1aSiO（4-a）/ 2（I）其中R1是相同或不同的未取代或取代的一价烃基，a是1.95〜2.05的正数; （B）70〜150重量份比表面积大于200m 2 / g的热解法二氧化硅; （C）0.1〜30重量份在1分子中具有与硅原子键合的氢原子中的至少2个氢原子的有机氢聚硅氧烷; 和（D）0.1〜10重量份的氢化硅烷化反应催化剂。

    Positive resist composition and patterning process
    15.
    发明申请
    Positive resist composition and patterning process 有权
    正抗蚀剂组成和图案化工艺

    公开(公告)号：US20050058937A1

    公开(公告)日：2005-03-17

    申请号：US10936621

    申请日：2004-09-09

    申请人： Tomoyoshi Furihata ,  Hideto Kato

    发明人： Tomoyoshi Furihata ,  Hideto Kato

    IPC分类号： G03F7/004 ,  C08G8/28 ,  G03C1/76 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027

    CPC分类号： G03F7/0236 ,  G03F7/022

    摘要： A positive resist composition comprising a mixture of an alkali-soluble novolak resin prepared using m-cresol, p-cresol and 2,5-xylenol as starting reactants and a phenolic compound, wherein the hydrogen atoms of all hydroxyl groups are substituted in a proportion of 0.03-0.05 mol per hydrogen atom with 1,2-naphthoquinonediazidosulfonyl ester groups, has lo uniformity, high sensitivity and high resolution, and is improved in heat resistance, film retention, substrate adhesion, and storage stability.

    摘要翻译： 一种正性抗蚀剂组合物，其包含使用间甲酚，对甲酚和2,5-二甲苯酚作为起始反应物制备的碱溶性酚醛清漆树脂和酚类化合物的混合物，其中所有羟基的氢原子以一定比例被取代 每个氢原子为0.03-0.05mol，与1,2-萘醌二叠氮磺酰酯基具有均匀性，高灵敏度和高分辨率，并且耐热性，膜保留性，基材粘合性和储存稳定性得到改善。

    Metal pattern forming method
    16.
    发明授权
    Metal pattern forming method 失效
    金属图案形成方法

    公开(公告)号：US06582767B1

    公开(公告)日：2003-06-24

    申请号：US09702852

    申请日：2000-11-01

    申请人： Motoo Fukushima ,  Eiichi Tabei ,  Tomoyoshi Furihata ,  Masaya Arakawa

    发明人： Motoo Fukushima ,  Eiichi Tabei ,  Tomoyoshi Furihata ,  Masaya Arakawa

    IPC分类号： B05D310

    CPC分类号： B82Y30/00 ,  C23C18/1605 ,  H01L21/288 ,  H01L21/32051 ,  H01L21/76838 ,  H05K3/182

    摘要： A method for forming a metal pattern by the micro-stamping process involves the steps of treating a substrate bearing a thin film of a reducing silicon polymer with a solution containing a salt of a metal having a standard oxidation-reduction potential of at least 0.54 volt, allowing metal colloid to deposit on the substrate surface, stamping a pattern of an alkane thiol to the substrate surface for transferring the pattern to the metal colloid-bearing silicon polymer thin film, and effecting electroless metal plating for forming a metal pattern only on the region of the silicon polymer thin film which is not covered with the alkane thiol pattern. The finely defined metal pattern can be formed on any type of substrate though inexpensive simple steps and has good adhesion to the substrate.

    摘要翻译： 通过微冲压法形成金属图案的方法包括以下步骤：用含有至少0.54伏特的标准氧化还原电位的金属盐的溶液处理含有还原硅聚合物薄膜的基片 ，允许金属胶体沉积在基材表面上，将烷烃硫醇的图案压印到基材表面上，以将图案转移到含金属胶体的硅聚合物薄膜上，并进行化学镀金以仅形成金属图案 未被烷烃硫醇图案覆盖的硅聚合物薄膜的区域。 精细限定的金属图案可以通过廉价的简单步骤形成在任何类型的基底上，并且对基底具有良好的粘合性。

    Lift-off resist compositions
    17.
    发明授权
    Lift-off resist compositions 有权
    剥离抗蚀剂组合物

    公开(公告)号：US06558867B2

    公开(公告)日：2003-05-06

    申请号：US09789837

    申请日：2001-02-22

    申请人： Kazumi Noda ,  Tomoyoshi Furihata ,  Hideto Kato

    发明人： Kazumi Noda ,  Tomoyoshi Furihata ,  Hideto Kato

    IPC分类号： G03F7023

    CPC分类号： G03F7/0226

    摘要： A single layer lift-off resist composition comprising a novolac resin, a quinonediazidosulfonate photosensitive agent, and an aromatic hydroxy compound having at least one phenolic hydroxyl group in which the phenolic hydroxyl group is partially acylated is improved in adhesion to a substrate.

    摘要翻译： 包含酚醛清漆树脂，醌二叠氮基磺酸盐感光剂和具有酚羟基被部分酰化的至少一个酚羟基的芳族羟基化合物的单层剥离抗蚀剂组合物在与基材的粘附性方面提高。

    Polymers, resist compositions and patterning method
    18.
    发明授权
    Polymers, resist compositions and patterning method 有权
    聚合物，抗蚀剂组合物和图案化方法

    公开(公告)号：US06242151B1

    公开(公告)日：2001-06-05

    申请号：US09372035

    申请日：1999-08-11

    申请人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

    发明人： Tomoyoshi Furihata ,  Hideto Kato ,  Satoshi Okazaki

    IPC分类号： G03F7023

    CPC分类号： C08L61/14 ,  C08G8/28 ,  C08G8/32 ,  G03F7/023

    摘要： The invention provides a novel polymer in the form of a novolac resin in which some of the hydrogen atoms of the hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted carbonyl or sulfonyl groups. The polymer has a weight average molecular weight calculated as polystyrene of 1,000-30,000. The polymer is formulated into a resist composition having improved uniformity, sensitivity, resolution and pattern geometry in microfabrication.

    摘要翻译： 本发明提供一种酚醛清漆树脂形式的新型聚合物，其中羟基的一些氢原子被1,2-萘醌二叠氮磺酰酯基团取代，其余羟基的一些氢原子被取代的羰基 或磺酰基。 该聚合物的重均分子量为聚苯乙烯计算为1000-3,000。 将聚合物配制成具有改进的微细加工中的均匀性，灵敏度，分辨率和图案几何形状的抗蚀剂组合物。

    Photosensitive resin composition and making process
    19.
    发明授权
    Photosensitive resin composition and making process 有权
    感光树脂组合物和制备方法

    公开(公告)号：US06218069B1

    公开(公告)日：2001-04-17

    申请号：US09480627

    申请日：2000-01-10

    申请人： Hideto Kato ,  Tomoyoshi Furihata ,  Satoshi Okazaki

    发明人： Hideto Kato ,  Tomoyoshi Furihata ,  Satoshi Okazaki

    IPC分类号： G03F7023

    CPC分类号： G03F7/023

    摘要： A photosensitive resin composition contains a photosensitive resin comprising recurring units of formula (1) and having a Mw of 1,300-11,000 and 20-5,000 ppm of a tertiary amine compound of formula (2). R is hydrogen or a 1,2-naphthoquinonediazido-5-sulfonic acid residue, the content of 1,2-naphthoquinonediazido-5-sulfonic acid residue in R is 3-27 mol %, and m is a number from 0 to 3, X is a C6-20 alkyl, aryl or aralkyl group, Y and Z each are a C1-20 alkyl group. The composition is improved in sensitivity stability and adhesion to substrates and eliminates the risk of causing corrosion of metal substrates.

    摘要翻译： 感光性树脂组合物含有包含式（1）的重复单元，Mw为1,300〜11,000和20〜500ppm的式（2）的叔胺化合物的感光性树脂，R为氢或1,2-萘醌二叠氮 -5-磺酸残基，R中1,2-萘醌二叠氮基-5-磺酸残基的含量为3-27mol％，m为0-3的数，X为C6-20烷基，芳基或 芳烷基，Y和Z各自为C 1-20烷基。 该组合物的灵敏度稳定性和与基材的粘附性得到改善，并且消除了引起金属基材腐蚀的风险。