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    METHOD AND APPARATUS FOR SPECIMEN FABRICATION
    12.
    发明申请
    METHOD AND APPARATUS FOR SPECIMEN FABRICATION 有权
    方法和装置用于样本制造

    公开(公告)号：US20080296497A1

    公开(公告)日：2008-12-04

    申请号：US12168232

    申请日：2008-07-07

    申请人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi TOMIMATSU ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： G01N23/00

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A system for analyzing a semiconductor device, including: a first ion beam apparatus including: a sample stage to mount a sample substrate; a vacuum chamber in which the sample stage is placed; an ion beam irradiating optical system to irradiate the sample substrate; a specimen holder that accommodates a plurality of specimens separated from the sample substrate by the irradiation of the ion beam; and a probe to extract the separated specimen from the sample substrate, and to transfer the separated specimen to the specimen holder; a second ion beam apparatus that carries out a finishing process to the specimen; and an analyzer to analyze the finished specimen, wherein the first ion beam apparatus separates the specimen and the probe in a vacuum condition.

    摘要翻译： 一种用于分析半导体器件的系统，包括：第一离子束装置，包括：样品台，用于安装样品基板; 其中放置样品台的真空室; 离子束照射光学系统照射样品基板; 样本保持器，其容纳通过离子束的照射与样品基板分离的多个样本; 以及从所述样品基材中提取分离出的试样并将分离的试样转移到所述试样保持器的探针。 对样品进行精加工的第二离子束装置; 以及用于分析成品样品的分析器，其中所述第一离子束装置在真空条件下分离所述样品和所述探针。

    Method and apparatus for specimen fabrication
    14.
    发明授权
    Method and apparatus for specimen fabrication 有权
    用于样品制造的方法和装置

    公开(公告)号：US06828566B2

    公开(公告)日：2004-12-07

    申请号：US10395237

    申请日：2003-03-25

    申请人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    发明人： Satoshi Tomimatsu ,  Kaoru Umemura ,  Yuichi Madokoro ,  Yoshimi Kawanami ,  Yasunori Doi

    IPC分类号： H01J3720

    CPC分类号： G01N1/32 ,  G01N1/28 ,  G01N2001/028 ,  G01N2001/045 ,  G01N2001/282 ,  H01J37/20 ,  H01J37/302 ,  H01J37/3056 ,  H01J2237/2007 ,  H01J2237/201 ,  H01J2237/202 ,  H01J2237/31732 ,  H01J2237/31745 ,  H01J2237/31749

    摘要： A specimen fabrication apparatus including a movable sample stage on which a specimen substrate is mounted, a probe connector for firmly joining a tip of a probe to a portion of the specimen substrate in a vicinity of an area on the specimen substrate to be observed in an observation apparatus, a micro-specimen separator for separating from the specimen substrate a micro-specimen to which the tip of the probe is firmly joined, the micro-specimen including the area on the specimen substrate to be observed and the portion of the specimen substrate to which the tip of the probe is firmly joined, a micro-specimen fixer for fixing the micro-specimen separated from the specimen substrate to a specimen holder of the observation apparatus, and a probe separator for separating the tip of the probe from the micro-specimen fixed to the specimen holder.

    摘要翻译： 一种试样制造装置，包括：安装有试样基板的可动试样台;探针连接器，用于将探针的前端牢固地接合到试样基板的一部分附近，以在待观察的样品基板上的区域 观察装置，用于从试样基板分离与探针的前端牢固接合的微型试样的微量试样分离体，包括待观察的试样基板上的区域的微量试样和试样基板的一部分 探针的尖端牢固地接合到其上的微型试样固定器，用于将从试样基板分离的微量样品固定到观察装置的试样支架上的探针分离器和用于将探针的尖端从微型 固定在样品架上。

    Radiation-sensitive positive resist composition
    15.
    发明授权
    Radiation-sensitive positive resist composition 失效
    辐射敏感正光刻胶组合物

    公开(公告)号：US5792585A

    公开(公告)日：1998-08-11

    申请号：US217892

    申请日：1994-03-25

    申请人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    发明人： Ayako Ida ,  Haruyoshi Osaki ,  Takeshi Hioki ,  Yasunori Doi ,  Yasunori Uetani ,  Ryotaro Hanawa

    IPC分类号： C07C39/15 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/022 ,  C07C39/15 ,  G03F7/0226 ,  G03F7/0236

    摘要： A positive resist composition comprising 1,2-quinonediazide compound and, as an alkali-soluble resin, an alkali-soluble resin (A) which comprises a resin (I) obtainable through a condensation reaction of a mixture of m-cresol, 2,3,5-trimethylphenol and optionally p-cresol with an aldehyde and a low molecular weight novolak (II) having a weight average molecular weight of 200 to 2000 as converted to polystyrene, an alkali-soluble resin (B) which comprises a resin (I) and a compound of the general formula (III): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 are respectively a C.sub.1 -C.sub.5 alkyl group or a C.sub.1 -C.sub.5 alkoxy group, 1, m and n are respectively a number of 0 to 3, R' is a hydrogen atom or a C.sub.1 -C.sub.3 alkyl group, or an alkali-soluble resin (C) which comprises a resin (IV) obtainable through a condensation reaction of a mixture of m-methoxyphenol and 2,3,5-trimethylphenol in a molar ratio of 80:20 to 30:70 with an aldehyde, which has good sensitivity, improved resolution and heat resistance.

    摘要翻译： 包含1,2-醌二叠氮化合物的正性抗蚀剂组合物和作为碱溶性树脂的碱溶性树脂（A），其包含可通过间甲酚，2,5-二氯苯的混合物的缩合反应获得的树脂（I） 3,5-二甲基苯酚和任选的具有醛和低分子量酚醛清漆（II）的对甲酚，其重均分子量为200至2000，转化为聚苯乙烯，碱溶性树脂（B）包含树脂（ I）和通式（III）的化合物：其中R 1，R 2和R 3分别是C 1 -C 5烷基或C 1 -C 5烷氧基，m和n分别为0〜 3，R'是氢原子或C1-C3烷基，或碱溶性树脂（C），其包含可通过间 - 甲氧基苯酚和2,3,5-三羟基苯酚的混合物的缩合反应获得的树脂（IV） - 三甲基苯酚与摩尔比为80:20至30:70的醛，其具有良好的灵敏度，改进的分辨率和耐热性。

    Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative
    16.
    发明授权
    Positive resist composition comprising an alkali-soluble resin and a quinone diazide sulfonic acid ester of a hydroxy flavan derivative 失效
    包含碱溶性树脂和羟基黄烷衍生物的醌二叠氮磺酸酯的正型抗蚀剂组合物

    公开(公告)号：US5283155A

    公开(公告)日：1994-02-01

    申请号：US688514

    申请日：1991-06-11

    申请人： Yasunori Uetani ,  Hirotoshi Nakanishi ,  Yasunori Doi

    发明人： Yasunori Uetani ,  Hirotoshi Nakanishi ,  Yasunori Doi

    IPC分类号： G03F7/022 ,  G03F7/023 ,  G03F7/32

    CPC分类号： G03F7/022

    摘要： A positive resist composition which comprises an alkali-soluble resin and, as a sensitizer, a quinone diazide sulfonic acid ester of a phenol compound of the formula: ##STR1## wherein Y.sub.1, Y.sub.2, Z.sub.1, Z.sub.2, Z.sub.3, Z.sub.4, Z.sub.5, Z.sub.6 and Z.sub.7 are independently a hydrogen atom, a hydroxyl group, a C.sub.1 -C.sub.4 alkyl group which may be substituted with a halogen atom, provided that at least one of Y.sub.1 and Y.sub.2 is a hydroxyl group, and at least two of Z.sub.1 to Z.sub.7 are hydroxyl groups, and R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5 and R.sub.6 are independently a hydrogen atom, a C.sub.1 -C.sub.10 alkyl group, a C.sub.1 -C.sub.4 alkenyl group, a cycloalkyl group or an aryl group, which composition has a high .gamma.-value.

    摘要翻译： PCT No.PCT / JP91 / 00013 Sec。 371日期1991年6月11日 102（e）1991年6月11日PCT 1991年1月11日PCT PCT。 公开号WO92 / 12205 日本1992年7月23日。一种正型抗蚀剂组合物，其包含碱溶性树脂和作为敏化剂的下式的酚化合物的醌二叠氮磺酸酯：（* CHEMICAL STRUCTURE *）（I）其中Y1， Y2，Z1，Z2，Z3，Z4，Z5，Z6和Z7独立地为氢原子，羟基，可被卤素原子取代的C1-C4烷基，条件是Y 1和Y 2中的至少一个为 羟基，Z1至Z7中的至少两个为羟基，R1，R2，R3，R4，R5和R6独立地为氢原子，C1-C10烷基，C1-C4烯基，环烷基 基团或芳基，该组成具有高（γ）值。