公开(公告)号：US20190189330A1

公开(公告)日：2019-06-20

申请号：US15848856

申请日：2017-12-20

Applicant: APPLIED MATERIALS, INC.

Inventor： RICHARD C. FOVELL ,  KARTIK RAMASWAMY ,  LARRY D. ELIZAGA

IPC: H01F27/08 ,  H01F27/28 ,  H01L21/67 ,  H01J37/32

CPC classification number: H01F27/08 ,  H01F27/28 ,  H01J37/321 ,  H01J37/3244 ,  H01J2237/334 ,  H01L21/67069

Abstract: A coil assembly for controlling a magnetic field in a plasma chamber is provided herein. In some embodiments, the coil assembly may include a mandrel including an annular body that includes at least one upper body coolant channel and at least one lower body coolant channel, and a plurality of cooling fins disposed circumferentially about an outer diameter of the body and radially outward from the outer diameter, an inner electromagnetic cosine-theta (cos θ) coil ring including a first set of inner coils wrapped around the plurality of cooling fins in the body and configured to generate a magnetic field in a first direction, an outer electromagnetic cosine-theta (cos θ) coil ring including a second set of outer coils wrapped around the plurality of cooling fins and configured to generate a magnetic field in a second direction orthogonal to the first direction.

公开(公告)号：US20140374024A1

公开(公告)日：2014-12-25

申请号：US13962575

申请日：2013-08-08

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  TOM K. CHO ,  KARTIK RAMASWAMY ,  YOGANANDA SARODE VISHWANATH

IPC: H01J37/32 ,  B08B7/00 ,  C23C16/48 ,  H01L21/67 ,  C23C16/455

Abstract: Embodiments of an apparatus for removing particles from a twin chamber processing system are provided herein. In some embodiments, an apparatus for removing particles from a twin chamber processing system includes a remote plasma system; and a plurality of conduits fluidly coupling the remote plasma system to each process chamber of a twin chamber processing system to provide a plasma to an exhaust volume of each process chamber, wherein each conduit of the plurality of conduits has an outlet disposed along a boundary of the respective exhaust volumes.

Abstract translation: 本文提供了用于从双室处理系统中去除颗粒的设备的实施例。 在一些实施例中，用于从双室处理系统中去除颗粒的装置包括远程等离子体系统; 以及多个导管将远程等离子体系统流体耦合到双室处理系统的每个处理室，以将等离子体提供给每个处理室的排气体积，其中多个管道中的每个导管具有沿着 各排气量。

公开(公告)号：US20140196849A1

公开(公告)日：2014-07-17

申请号：US13833220

申请日：2013-03-15

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE

IPC: B29C35/02

CPC classification number: H01J37/321 ,  H01J37/3211

Abstract: Embodiments of methods and apparatus for plasma processing are provided herein. In some embodiments, an inductively coupled plasma apparatus may include a bottom wall comprising a hub and a ring coupled to the hub by a capacitor, wherein the hub and the ring are each electrically conductive, and where the hub has a central opening aligned with a central axis of the inductively coupled plasma apparatus; a top wall spaced apart from and above the bottom wall, wherein the top wall has a central opening aligned with the central axis, and wherein the tope wall is electrically conductive; a sidewall electrically connecting the ring to the top wall; and a tube electrically connecting the hub to the top wall, the tube having a central opening aligned with the central axis.

Abstract translation: 本文提供了等离子体处理的方法和装置的实施例。 在一些实施例中，电感耦合等离子体装置可以包括底壁，其包括毂和通过电容器联接到毂的环，其中所述毂和环各自是导电的，并且其中所述毂具有与 感应耦合等离子体装置的中心轴; 与所述底壁间隔开的顶壁，其中所述顶壁具有与所述中心轴线对准的中心开口，并且其中所述顶壁是导电的; 将所述环电连接到所述顶壁的侧壁; 以及将轮毂电连接到顶壁的管，该管具有与中心轴对准的中心开口。

公开(公告)号：US20210134554A1

公开(公告)日：2021-05-06

申请号：US16674982

申请日：2019-11-05

Applicant: APPLIED MATERIALS, INC.

Inventor： HAMID NOORBAKHSH ,  KARTIK RAMASWAMY ,  ANWAR HUSAIN

IPC: H01J37/04 ,  H01L21/683 ,  H01J37/32

Abstract: Embodiments of process kits for use in substrate processing chambers are provided herein. In some embodiments, a process kit for use in a substrate processing chamber includes an annular electrode configured to surround an electrostatic chuck, wherein the annular electrode includes an upper portion bonded to a lower portion and an annular channel disposed at an interface between the upper portion and the lower portion; wherein the annular electrode includes a first channel extending from a lower surface of the lower portion to the annular channel and a second channel extending from the lower surface of the lower portion to the annular channel; wherein the annular electrode is configured to flow a coolant from the first channel to the second channel via the annular channel to cool the annular electrode; and wherein the annular electrode includes at least one of a dielectric coating or a ceramic cap to reduce or prevent arcing between the annular electrode and the electrostatic chuck.

公开(公告)号：US20160027616A1

公开(公告)日：2016-01-28

申请号：US14341492

申请日：2014-07-25

Applicant: APPLIED MATERIALS, INC.

Inventor： KARTIK RAMASWAMY ,  YANG YANG ,  STEVEN LANE ,  LAWRENCE WONG ,  JOSEPH F. AUBUCHON ,  TRAVIS KOH

IPC: H01J37/32 ,  H01L21/67 ,  H01J37/244

CPC classification number: H01J37/32165 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32174

Abstract: Spatial distribution of RF power delivered to plasma in a processing chamber is controlled using an arrangement of primary and secondary inductors, wherein the current through the secondary inductors affects the spatial distribution of the plasma. The secondary inductors are configured to resonate at respectively different frequencies. A first secondary inductor is selectively excited to resonance, during a first time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the first secondary inductor. A second secondary inductor is selectively excited to resonance, during a second time period within a duty cycle, by delivering power to a primary inductor at the resonant frequency of the second secondary inductor. The secondary inductors are isolated from one another and terminated such that substantially all current that passes through them and into the plasma results from mutual inductance with a primary inductor.

Abstract translation: 使用初级和次级电感器的布置来控制传送到处理室中的等离子体的RF功率的空间分布，其中通过次级电感器的电流影响等离子体的空间分布。 次级电感器被配置为分别在不同的频率下谐振。 通过在第一次级电感器的谐振频率处向初级电感器输送功率，在占空比的第一时间段期间，选择性地激励第一次级电感器进行谐振。 通过在第二次级电感器的谐振频率处向初级电感器输送功率，在占空比的第二时间周期期间，选择性地激励第二次级电感器进行谐振。 次级电感器彼此隔离并且端接，使得通过它们并进入等离子体的基本上所有的电流源于与初级电感器的互感。

公开(公告)号：US20140262032A1

公开(公告)日：2014-09-18

申请号：US14202472

申请日：2014-03-10

Applicant: APPLIED MATERIALS, INC

Inventor： KENNETH S. COLLINS ,  SATORU KOBAYASHI ,  KARTIK RAMASWAMY

IPC: H03L7/085

CPC classification number: H03L7/1075

Abstract: Methods and apparatus for generating a variable clock used to control a component of a substrate processing system are provided herein. In some embodiments, an apparatus for controlling a substrate processing system includes: a phase locked loop circuit for generating a relative clock that is phase locked to a variable frequency signal being used by a substrate processing chamber; and a controller, coupled to the phase locked loop circuit, for producing a control signal for a component of the substrate processing system, wherein the control signal is based upon the relative clock and an operating indicia of the substrate processing system.

Abstract translation: 本文提供了用于生成用于控制基板处理系统的部件的可变时钟的方法和装置。 在一些实施例中，一种用于控制衬底处理系统的装置包括：锁相环电路，用于产生相位锁定到由衬底处理室使用的可变频率信号的相对时钟; 以及耦合到所述锁相环电路的用于产生所述衬底处理系统的部件的控制信号的控制器，其中所述控制信号基于所述衬底处理系统的相对时钟和操作标记。

公开(公告)号：US20140020837A1

公开(公告)日：2014-01-23

申请号：US13666280

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： ANDREW NGUYEN ,  KENNETH S. COLLINS ,  KARTIK RAMASWAMY ,  SHAHID RAUF ,  JAMES D. CARDUCCI ,  DOUGLAS A. BUCHBERGER, JR. ,  ANKUR AGARWAL ,  JASON A. KENNEY ,  LEONID DORF ,  AJIT BALAKRISHNA ,  RICHARD FOVELL

IPC: B01J12/00

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor enclosure has a metallic portion and a dielectric portion of plural dielectric windows supported on the metallic portion, each of the dielectric windows extending around an axis of symmetry. Plural concentric coil antennas are disposed on an external side of the enclosure, respective ones of the coil antennas facing respective ones of the dielectric windows.

Abstract translation: 等离子体反应器外壳具有支撑在金属部分上的多个介电窗口的金属部分和电介质部分，每个电介质窗口围绕对称轴延伸。 多个同心线圈天线设置在外壳的外侧，相应的线圈天线面对相应的电介质窗口。

公开(公告)号：US20130320998A1

公开(公告)日：2013-12-05

申请号：US13944026

申请日：2013-07-17

Applicant: APPLIED MATERIALS, INC.

Inventor： HIROJI HANAWA ,  SATORU KOBAYASHI ,  KARTIK RAMASWAMY ,  SHAHID RAUF

IPC: G01R27/32

CPC classification number: G01R27/32 ,  G01R19/0061 ,  H05H1/0081

Abstract: An RF current probe is encapsulated in a conductive housing to permit its placement inside a plasma reactor chamber. An RF voltage probe is adapted to have a long coaxial cable to permit a measuring device to be connected remotely from the probe without distorting the voltage measurement.

Abstract translation: RF电流探针被封装在导电壳体中以允许其放置在等离子体反应器室内。 RF电压探头适于具有长同轴电缆，以允许测量设备远离探头连接，而不会使电压测量失真。