-
公开(公告)号：US20200013603A1
公开(公告)日：2020-01-09
申请号：US16576588
申请日：2019-09-19
Applicant: Applied Materials Israel Ltd.
Inventor： Irit Ruach-Nir , Michal Jacobon-Eilon , Guy Eytan , Magen Yaacov Schulman
Abstract: A cleanliness monitor for monitoring a cleanliness of a vacuum chamber. The cleanliness monitor may include a mass spectrometer, a molecule aggregation and release unit and an analyzer. The molecule aggregation and release unit is configured to (a) aggregate, during an aggregation period, organic molecules that are present in the vacuum chamber and (b) induce, during a release period, a release of a subset of the organic molecules towards the mass spectrometer. The mass spectrometer is configured to monitor an environment within the vacuum chamber and to generate detection signals indicative of a content of the environment; wherein a first subset of the detection signals is indicative of a presence of the subset of the organic molecules. The analyzer is configured to determine the cleanliness of the vacuum chamber based on the detection signals.
-
公开(公告)号：US11921063B2
公开(公告)日：2024-03-05
申请号：US17382280
申请日：2021-07-21
Applicant: Applied Materials Israel Ltd.
Inventor： Michael Chemama , Ron Meiry , Moshe Eliasof , Lior Yaron , Guy Eytan , Konstantin Chirko , Rafael Bistritzer
IPC: G01N23/2206 , G01N23/2251 , H01J37/22 , H01J37/28 , H01L21/66
CPC classification number: G01N23/2206 , G01N23/2251 , H01J37/222 , H01J37/28 , H01L22/20 , G01N2223/053 , G01N2223/303 , G01N2223/306 , G01N2223/401 , G01N2223/418 , G01N2223/501 , G01N2223/61 , G01N2223/6116 , G01N2223/66 , H01J2237/2802 , H01J2237/2806 , H01J2237/2815
Abstract: There is provided a system and method of measuring a lateral recess in a semiconductor specimen, comprising: obtaining a first image acquired by collecting SEs emitted from the surface of the specimen, and a second image acquired by collecting BSEs scattered from an interior region of the specimen between the surface and a target second layer, the specimen scanned using an electron beam with a landing energy selected to penetrate to a depth corresponding to the target second layer; generating a first GL waveform based on the first image, and a second GL waveform based on the second image; estimating a first width of the first layers based on the first GL waveform, and a second width with respect to at least the target second layer based on the second GL; and measuring a lateral recess based on the first width and the second width.
-
公开(公告)号：US11810765B2
公开(公告)日：2023-11-07
申请号：US17129747
申请日：2020-12-21
Applicant: Applied Materials Israel Ltd.
Inventor： Asaf Gutman , Irit Ruach-Nir , Kfir Luria , Sven Ruhle , Guy Eytan
CPC classification number: H01J37/32449 , C23C14/0042 , C23C14/0063 , C23C16/4405 , F16K3/04 , F16K3/085 , F16K3/32 , F16K3/34 , H01J37/3244 , H01J37/32513 , H01J37/32623 , H01J37/32862
Abstract: A reactive particles supply system that may include an adjustable gas supply unit that is arranged to supply gas and to set a gas condition, a reactive particles supply unit that may be arranged to receive the gas, and an adjustable reactive particles output unit that may include a reactive particles input, a second reactive particles output, and a reactive particles path. The second reactive particles output is configured to output reactive particles towards an opening of a vacuumed chamber. The adjustable reactive particles output unit is arranged to mechanically configure at least one element of the reactive particles path according to the reactive particles condition.
-
公开(公告)号：US11355309B2
公开(公告)日：2022-06-07
申请号：US17265187
申请日：2019-08-01
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Assulin , Jacob Levin , Guy Eytan
IPC: H01J37/244
Abstract: The present invention relates to a sensor for electron detection emitted from an object to be used with a charged particle beam column being operated at a certain column and wafer voltage. The sensor is configured and operable to at least reduce interaction of negative ions with the active area of the sensor while minimizing electrons energy loss. The sensor is also configured and operable to minimize both gradual degradation of a cathodoluminescence efficiency of the active area and dynamic change of cathodoluminescence generated during operation of the sensor and evolving throughout the scintillator's lifetime.
-
公开(公告)号：US11264202B2
公开(公告)日：2022-03-01
申请号：US16876637
申请日：2020-05-18
Applicant: Applied Materials Israel Ltd.
Inventor： Konstantin Chirko , Itamar Shani , Albert Karabekov , Guy Eytan , Lior Yaron , Alon Litman
IPC: H01J37/244 , H01J37/22 , H01J37/05 , H01J37/20
Abstract: A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.
-
Patent Agency Ranking
公开(公告)号：US20210358712A1
公开(公告)日：2021-11-18
申请号：US16876637
申请日：2020-05-18
Applicant: Applied Materials Israel Ltd.
Inventor： Konstantin Chirko , Itamar Shani , Albert Karabekov , Guy Eytan , Lior Yaron , Alon Litman
IPC: H01J37/244 , H01J37/22 , H01J37/05 , H01J37/20
Abstract: A method, a non-transitory computer readable medium and a three-dimensional evaluation system for providing three dimensional information regarding structural elements of a specimen. The method can include illuminating the structural elements with electron beams of different incidence angles, where the electron beams pass through the structural elements and the structural elements are of nanometric dimensions; detecting forward scattered electrons that are scattered from the structural elements to provide detected forward scattered electrons; and generating the three dimensional information regarding structural elements based at least on the detected forward scattered electrons.
-
公开(公告)号：US20210319976A1
公开(公告)日：2021-10-14
申请号：US17265187
申请日：2019-08-01
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Assulin , Jacob Levin , Guy Eytan
IPC: H01J37/244
Abstract: The present invention relates to a sensor for electron detection emitted from an object to be used with a charged particle beam column being operated at a certain column and wafer voltage. The sensor is configured and operable to at least reduce interaction of negative ions with the active area of the sensor while minimizing electrons energy loss. The sensor is also configured and operable to minimize both gradual degradation of a cathodoluminescence efficiency of the active area and dynamic change of cathodoluminescence generated during operation of the sensor and evolving throughout the scintillator's lifetime.
-
公开(公告)号：US10886092B2
公开(公告)日：2021-01-05
申请号：US16839986
申请日：2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
-
19.发明申请公开(公告)号：US20200234907A1
公开(公告)日：2020-07-23
申请号：US16839986
申请日：2020-04-03
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Itay Asulin , Ofer Yuli , Lavy Shavit , Yoram Uziel , Guy Eytan , Natan Schlimoff , Igor Krivts (Krayvitz) , Jacob Levin , Israel Avneri
Abstract: A charged particle beam source that may include an emitter that has a tip for emitting charged particles; a socket; electrodes; a filament that is connected to the electrodes and to the emitter; electrodes for providing electrical signals to the filament; a support element that is connected to the emitter; and a support structure that comprises one or more interfaces for contacting only a part of the support element while supporting the support element.
-
公开(公告)号：US10217621B2
公开(公告)日：2019-02-26
申请号：US15653299
申请日：2017-07-18
Applicant: APPLIED MATERIALS ISRAEL LTD.
Inventor： Irit Ruach-Nir , Michal Eilon , Guy Eytan , Magen Yaacov Schulman
Abstract: A cleanliness monitor for monitoring a cleanliness of a vacuum chamber. The cleanliness monitor may include a mass spectrometer, a molecule aggregation and release unit and an analyzer. The molecule aggregation and release unit is configured to (a) aggregate, during an aggregation period, organic molecules that are present in the vacuum chamber and (b) induce, during a release period, a release of a subset of the organic molecules towards the mass spectrometer. The mass spectrometer is configured to monitor an environment within the vacuum chamber and to generate detection signals indicative of a content of the environment; wherein a first subset of the detection signals is indicative of a presence of the subset of the organic molecules. The analyzer is configured to determine the cleanliness of the vacuum chamber based on the detection signals.
-
-
-
-
-
-
-
-
-
Search Results
20
records
(took 0.02 seconds)
