公开(公告)号：US20180195857A1

公开(公告)日：2018-07-12

申请号：US15913253

申请日：2018-03-06

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/20

CPC classification number: G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

公开(公告)号：US09357626B2

公开(公告)日：2016-05-31

申请号：US14548734

申请日：2014-11-20

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Pavel Stanislavovich Antsiferov ,  Vladimir Mihailovitch Krivtsun ,  Johannes Matheus Marie De Wit ,  Ralph Jozef Johannes Gerardus Anna Maria Smeets ,  Gerbrand Van Der Zouw

IPC: G21K5/04 ,  H01J65/04 ,  H05H1/24 ,  G03F7/20 ,  G01N21/956 ,  H05G2/00 ,  H01J61/54 ,  H01J61/02 ,  H05B41/38

CPC classification number: H05H1/24 ,  G01N21/956 ,  G01N2201/061 ,  G03F7/20 ,  G03F7/70033 ,  G03F7/70483 ,  G03F7/70616 ,  G03F7/70641 ,  H01J61/02 ,  H01J61/54 ,  H01J61/545 ,  H01J65/04 ,  H05B41/38 ,  H05G2/003 ,  H05G2/008

Abstract: A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma.

Abstract translation: 激光驱动光源包括激光和聚焦光学元件。 这些产生聚焦在容纳气体（例如Xe）的容器内的等离子体形成区域上的辐射束。 收集光学器件收集由激光辐射维持的等离子体发射的光子以形成输出辐射束。 等离子体具有细长形式（L> d），并且收集光学器件被配置为收集从等离子体沿纵向出现的光子。 与收集从等离子体横向辐射的辐射的源相比，等离子体的亮度增加。 使用光源的计量装置可以由于亮度的增加而获得更高的精度和/或吞吐量。 可以提供背反射器。 可以使用微波辐射代替激光辐射以形成等离子体。

公开(公告)号：US09158194B2

公开(公告)日：2015-10-13

申请号：US13628697

申请日：2012-09-27

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert Koolen ,  Henricus Petrus Maria Pellemans ,  Maurits Van Der Schaar ,  Peter Clement Paul Vanoppen ,  Michael Kubis

IPC: G01B11/00 ,  G01B11/14 ,  G03B27/32 ,  G03B27/54 ,  G03B27/72 ,  G03B27/74 ,  G03C5/00 ,  G03F1/42 ,  G03F7/20 ,  G03F9/00 ,  G01N21/47 ,  G01B9/04

CPC classification number: G03F1/42 ,  G01B9/04 ,  G01N21/47 ,  G03F7/70616 ,  G03F7/70633 ,  G03F9/70 ,  G03F9/7069 ,  G03F9/7088

Abstract: An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.

Abstract translation: 一种方法用于估计和校正覆盖变化作为每个测量的偏移函数。 形成在衬底上的靶包括周期性光栅。 在衬底上用圆形点照射衬底，其尺寸大于每个光栅。 在暗场散射仪中检测由每个光栅散射的辐射，以获得测量信号。 测量信号用于计算叠加。 确定覆盖层与照明点中位置的函数关系（斜率）。 可以计算在诸如照明点中心的标称位置处的覆盖物的估计值，以根据目标在照明点中的位置的函数来校正覆盖物的变化。 这补偿了晶片台移动中的位置误差的影响，以及目标在照明点中产生的非居中位置。

公开(公告)号：US20130100427A1

公开(公告)日：2013-04-25

申请号：US13628697

申请日：2012-09-27

Applicant: ASML Netherlands B.V.

Inventor： Armand Eugene Albert KOOLEN ,  Henricus Petrus Maria Pellemans ,  Maurits Van Der Schaar ,  Peter Clement Paul Vanoppen ,  Michael Kubis

IPC: G03B27/54 ,  G01N21/47

CPC classification number: G03F1/42 ,  G01B9/04 ,  G01N21/47 ,  G03F7/70616 ,  G03F7/70633 ,  G03F9/70 ,  G03F9/7069 ,  G03F9/7088

Abstract: An approach is used to estimate and correct the overlay variation as function of offset for each measurement. A target formed on a substrate includes periodic gratings. The substrate is illuminated with a circular spot on the substrate with a size larger than each grating. Radiation scattered by each grating is detected in a dark-field scatterometer to obtain measurement signals. The measurement signals are used to calculate overlay. The dependence (slope) of the overlay as a function of position in the illumination spot is determined. An estimated value of the overlay at a nominal position such as the illumination spot's center can be calculated, correcting for variation in the overlay as a function of the target's position in the illumination spot. This compensates for the effect of the position error in the wafer stage movement, and the resulting non-centered position of the target in the illumination spot.

Abstract translation: 一种方法用于估计和校正覆盖变化作为每个测量的偏移函数。 形成在衬底上的靶包括周期性光栅。 在衬底上用圆形点照射衬底，其尺寸大于每个光栅。 在暗场散射仪中检测由每个光栅散射的辐射，以获得测量信号。 测量信号用于计算叠加。 确定覆盖层与照明点中位置的函数关系（斜率）。 可以计算在诸如照明点中心的标称位置处的覆盖物的估计值，以根据目标在照明点中的位置的函数来校正覆盖物的变化。 这补偿了晶片台移动中的位置误差的影响，以及目标在照明点中产生的非居中位置。

公开(公告)号：US12025925B2

公开(公告)日：2024-07-02

申请号：US17773384

申请日：2020-10-19

Applicant: ASML Netherlands B.V.

Inventor： Filippo Alpeggiani ,  Henricus Petrus Maria Pellemans ,  Sebastianus Adrianus Goorden ,  Simon Reinald Huisman

IPC: G03F7/20 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F9/7046 ,  G03F7/70091 ,  G03F7/70133 ,  G03F7/70516

Abstract: Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.

公开(公告)号：US11372343B2

公开(公告)日：2022-06-28

申请号：US17435115

申请日：2020-02-14

Applicant: ASML NETHERLANDS B.V.

Inventor： Henricus Martinus Johannes Van De Groes ,  Johannes Hubertus Antonius Van De Rijdt ,  Marcel Pieter Jacobus Peeters ,  Chien-Hung Tseng ,  Henricus Petrus Maria Pellemans

IPC: G03F9/00

Abstract: A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.

公开(公告)号：US11360399B2

公开(公告)日：2022-06-14

申请号：US17277353

申请日：2019-08-27

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Simon Reinald Huisman ,  Simon Gijsbert Josephus Mathijssen ,  Henricus Petrus Maria Pellemans

IPC: G03F7/20

Abstract: Disclosed is a metrology device (1600) configured to produce measurement illumination comprising a plurality of illumination beams, each of said illumination beams being spatially incoherent or pseudo-spatially incoherent and comprising multiple pupil points in an illumination pupil of the metrology device. Each pupil point in each one of said plurality of illumination beams has a corresponding pupil point in at least one of the other illumination beams of said plurality of illumination beams thereby defining multiple sets of corresponding pupil points, and the pupil points of each set of corresponding pupil points are spatially coherent with respect to each other.

公开(公告)号：US10209061B2

公开(公告)日：2019-02-19

申请号：US15913253

申请日：2018-03-06

Applicant: ASML Netherlands B.V.

Inventor： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

IPC: G01B11/24 ,  G03F7/20

Abstract: A device manufacturing method is disclosed. A radiated spot is directed onto a target pattern formed on a substrate. The radiated spot is moved along the target pattern in a series of discrete steps, each discrete step corresponding to respective positions of the radiated spot on the target pattern. Measurement signals are generated that correspond to respective ones of the positions of the radiated spot on the target pattern. A single value is determined that is based on the measurement signals and that is representative of the property of the substrate.

公开(公告)号：US09128065B2

公开(公告)日：2015-09-08

申请号：US14242225

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Henricus Petrus Maria Pellemans

IPC: G01B11/00 ,  G01N21/86 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54 ,  G03B27/74 ,  G01N21/956 ,  G03F9/00 ,  G01J3/18 ,  G01J3/28 ,  G01J3/44 ,  G01N21/47 ,  G01N21/95 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/4412 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70191 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract translation: 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。

公开(公告)号：US20140211185A1

公开(公告)日：2014-07-31

申请号：US14242225

申请日：2014-04-01

Applicant: ASML Netherlands B.V.

Inventor： Hugo Augustinus Joseph Cramer ,  Antoine Gaston Marie Kiers ,  Henricus Petrus Maria Pellemans

IPC: G01N21/956 ,  G03F7/20

CPC classification number: G01N21/956 ,  G01J3/18 ,  G01J3/2803 ,  G01J3/4412 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70191 ,  G03F7/70633 ,  G03F9/7049 ,  G03F9/7065 ,  G03F9/7088 ,  G03F9/7092

Abstract: For angular resolved spectrometry a radiation beam is used having an illumination profile having four quadrants is used. The first and third quadrants are illuminated whereas the second and fourth quadrants aren't illuminated. The resulting pupil plane is thus also divided into four quadrants with only the zeroth order diffraction pattern appearing in the first and third quadrants and only the first order diffraction pattern appearing in the second and third quadrants.

Abstract translation: 对于角度分辨光谱法，使用具有具有四个象限的照明轮廓的辐射束。 第一和第三象限被照亮，而第二和第四象限不被照亮。 因此，所得到的光瞳面也被分成四个象限，仅在第一和第三象限中出现零级衍射图案，并且仅在第二和第三象限中出现一级衍射图案。