公开(公告)号：US09425026B2

公开(公告)日：2016-08-23

申请号：US14815947

申请日：2015-07-31

Applicant: Applied Materials, Inc.

Inventor： Suhail Anwar ,  Carl A. Sorensen ,  Jozef Kudela

IPC: H01J7/24 ,  H05B31/26 ,  H01J37/32 ,  H03H7/40

CPC classification number: H01J37/32183 ,  H01J37/32137 ,  H01J2237/002 ,  H01J2237/332 ,  H01J2237/334 ,  H03H7/40

Abstract: Systems and methods are provided for matching the impedance of a load to an impedance of a power generator. Embodiments include a matching network with a dynamically configurable component assembly array couplable to the variable impedance load and the RF power generator, wherein the component assembly array includes one or more tune and load electrical components. The component assembly array is adapted to be configured for each recipe step, and at least one of the electrical components is a variable impedance component adjustable to reduce RF energy reflected from the variable impedance load for each recipe step. Numerous other aspects are provided.

Abstract translation: 提供了用于将负载的阻抗与发电机的阻抗进行匹配的系统和方法。 实施例包括具有可耦合到可变阻抗负载和RF功率发生器的可动态配置的组件组件阵列的匹配网络，其中组件组件阵列包括一个或多个调谐和负载电气部件。 组件组件阵列适于配置用于每个配方步骤，并且电组件中的至少一个是可调节的可变阻抗分量，以减少针对每个配方步骤从可变阻抗负载反射的RF能量。 提供了许多其他方面。

公开(公告)号：US20160049917A1

公开(公告)日：2016-02-18

申请号：US14815947

申请日：2015-07-31

Applicant: Applied Materials, Inc.

Inventor： Suhail Anwar ,  Carl A. Sorensen ,  Jozef Kudela

IPC: H03H7/40 ,  H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32137 ,  H01J2237/002 ,  H01J2237/332 ,  H01J2237/334 ,  H03H7/40

Abstract: Systems and methods are provided for matching the impedance of a load to an impedance of a power generator. Embodiments include a matching network with a dynamically configurable component assembly array couplable to the variable impedance load and the RF power generator, wherein the component assembly array includes one or more tune and load electrical components. The component assembly array is adapted to be configured for each recipe step, and at least one of the electrical components is a variable impedance component adjustable to reduce RF energy reflected from the variable impedance load for each recipe step. Numerous other aspects are provided.

Abstract translation: 提供了用于将负载的阻抗与发电机的阻抗进行匹配的系统和方法。 实施例包括具有可耦合到可变阻抗负载和RF功率发生器的可动态配置的组件组件阵列的匹配网络，其中组件组件阵列包括一个或多个调谐和负载电气部件。 组件组件阵列适于配置用于每个配方步骤，并且电组件中的至少一个是可调节的可变阻抗分量，以减少针对每个配方步骤从可变阻抗负载反射的RF能量。 提供了许多其他方面。

公开(公告)号：US20160049280A1

公开(公告)日：2016-02-18

申请号：US14815945

申请日：2015-07-31

Applicant: Applied Materials, Inc.

Inventor： Jozef Kudela ,  Ranjit I. Shinde ,  Suhail Anwar

IPC: H01J37/32

CPC classification number: H01J37/32183 ,  H01J37/32137 ,  H01J2237/002 ,  H01J2237/332 ,  H01J2237/334 ,  H03H7/40

Abstract: A compact configurable radio frequency (RF) matching network for matching RF energy output from an RF generator to a variable impedance load is disclosed. The matching network includes an input connector; an output connector; and a component assembly array including one or more tune and load electrical components. At least one of the electrical components is coupled to the input connector, at least one of the electrical components is coupled to the output connector, the component assembly array is adapted to be arranged in a selected topology, and the selected topology is adapted to reduce RF energy reflected from the variable impedance load. Numerous other aspects are provided.

Abstract translation: 公开了一种紧凑的可配置射频（RF）匹配网络，用于将RF发射器的RF能量输出匹配到可变阻抗负载。 匹配网络包括输入连接器; 输出连接器; 以及包括一个或多个调谐和负载电气部件的部件组件阵列。 电气部件中的至少一个耦合到输入连接器，电气部件中的至少一个耦合到输出连接器，部件组件阵列适于被布置在选定的拓扑中，并且所选择的拓扑适于减少 从可变阻抗负载反射的RF能量。 提供了许多其他方面。

公开(公告)号：US20150340204A1

公开(公告)日：2015-11-26

申请号：US14727857

申请日：2015-06-01

Applicant: Applied Materials, Inc.

Inventor： Jozef Kudela ,  Tsutomu Tanaka ,  Carl A. Sorensen ,  Suhail Anwar ,  John M. White ,  Ranjit Indrajit Shinde ,  Seon-Mee Cho ,  Douglas D. Truong

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/3222 ,  H01J37/32577 ,  H01P3/00 ,  H01P3/06 ,  H01P3/085 ,  H01P11/003 ,  H01Q13/22 ,  H05H1/24 ,  H05H1/46 ,  H05H2001/463 ,  Y10T29/49169

Abstract: A transmission line RF applicator apparatus and method for coupling RF power to a plasma in a plasma chamber. The apparatus comprises two conductors, one of which has a plurality of apertures. In one aspect, apertures in different portions of the conductor have different sizes, spacing or orientations. In another aspect, adjacent apertures at successive longitudinal positions are offset along the transverse dimension. In another aspect, the apparatus comprises an inner conductor and one or two outer conductors. The main portion of each of the one or two outer conductors includes a plurality of apertures that extend between an inner surface and an outer surface of the outer conductor.

Abstract translation: 用于将RF功率耦合到等离子体室中的等离子体的传输线RF施加装置和方法。 该装置包括两个导体，其中一个具有多个孔。 在一个方面，导体的不同部分中的孔具有不同的尺寸，间距或取向。 在另一方面，连续纵向位置处的相邻孔沿横向尺寸偏移。 在另一方面，该装置包括内部导体和一个或两个外部导体。 一个或两个外部导体中的每一个的主要部分包括在外部导体的内表面和外表面之间延伸的多个孔。

公开(公告)号：US09187827B2

公开(公告)日：2015-11-17

申请号：US13773579

申请日：2013-02-21

Applicant: APPLIED MATERIALS, Inc.

Inventor： Gaku Furuta ,  John M. White ,  Shinichi Kurita ,  Soo Young Choi ,  Suhail Anwar ,  Robin L. Tiner

IPC: C23C16/458 ,  H01J37/32

CPC classification number: C23C16/458 ,  C23C16/4585 ,  H01J37/32559 ,  H01J37/32577 ,  H01J37/32715

Abstract: Embodiments of the present invention generally relates to substrate supports for use in a plasma processing chamber. The substrate supports, which are metallic, have ceramic inserts to prevent arcing between the substrate support and the shadow frame used to protect the edges of the substrate support during processing. In large area substrate processing chambers, the shadow frame may comprise multiple pieces. The individual pieces may be coupled together, but spaced slightly apart by a gap to permit thermal expansion. Ceramic inserts are positioned on the substrate support so that when a shadow frame is positioned adjacent thereto, the ceramic inserts are located adjacent the gaps in the shadow frame. The ceramic inserts adjacent the gap prevent and/or reduce the arcing because the gaps are located over electrically insulating material rather than electrically conductive material.

Abstract translation: 本发明的实施例一般涉及用于等离子体处理室的基板支撑件。 金属的基板支撑件具有陶瓷插入件，以防止在处理期间用于保护基板支撑件的边缘的基板支撑件和阴影框架之间的电弧。 在大面积基板处理室中，阴影框架可以包括多个部件。 单独的部件可以联接在一起，但间隔开间隔开以允许热膨胀。 陶瓷插入件定位在基板支撑件上，使得当阴影框架相邻定位时，陶瓷插入件位于阴影框架中的间隙附近。 邻近间隙的陶瓷插件防止和/或减少电弧，因为间隙位于电绝缘材料上而不是导电材料上。

公开(公告)号：USD717113S1

公开(公告)日：2014-11-11

申请号：US29448550

申请日：2013-03-13

Applicant: Applied Materials, Inc.

Designer： Gaku Furuta ,  John M. White ,  Robin L. Tiner ,  Suhail Anwar ,  Soo Young Choi

公开(公告)号：US10043638B2

公开(公告)日：2018-08-07

申请号：US14815945

申请日：2015-07-31

Applicant: Applied Materials, Inc.

Inventor： Jozef Kudela ,  Ranjit I. Shinde ,  Suhail Anwar

IPC: H01J37/32 ,  H03H7/40

CPC classification number: H01J37/32183 ,  H01J37/32137 ,  H01J2237/002 ,  H01J2237/332 ,  H01J2237/334 ,  H03H7/40

Abstract: A compact configurable radio frequency (RF) matching network for matching RF energy output from an RF generator to a variable impedance load is disclosed. The matching network includes an input connector; an output connector; and a component assembly array including one or more tune and load electrical components. At least one of the electrical components is coupled to the input connector, at least one of the electrical components is coupled to the output connector, the component assembly array is adapted to be arranged in a selected topology, and the selected topology is adapted to reduce RF energy reflected from the variable impedance load. Numerous other aspects are provided.

公开(公告)号：USD716098S1

公开(公告)日：2014-10-28

申请号：US29494693

申请日：2014-06-23

Applicant: Applied Materials, Inc.

Designer： Gaku Furuta ,  John M. White ,  Robin L. Tiner ,  Suhail Anwar ,  Soo Young Choi ,  Shinichi Kurita