公开(公告)号：US07457059B2

公开(公告)日：2008-11-25

申请号：US11533660

申请日：2006-09-20

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US07656595B2

公开(公告)日：2010-02-02

申请号：US12211978

申请日：2008-09-17

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是调整光学系统中的透镜，特别是在用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US07193794B2

公开(公告)日：2007-03-20

申请号：US10779392

申请日：2004-02-13

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： An arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是调整光学系统中的透镜，特别是在用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US20070014038A1

公开(公告)日：2007-01-18

申请号：US11533660

申请日：2006-09-20

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US07570343B2

公开(公告)日：2009-08-04

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Heinz Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

摘要翻译： 微光投影曝光装置包括用于产生投影光的照明系统和投影透镜，能够将能够布置在投影透镜的物平面中的光罩成像到能够布置的感光层上的投影透镜 在投影透镜的图像平面中。 投影透镜被设计用于浸没模式，其中在图像侧的投影透镜的最终透镜元件浸入浸没液体中。 相对于突起而言透明的端接元件紧固在图像侧的最终透镜元件与感光层之间。

公开(公告)号：US07400460B2

公开(公告)日：2008-07-15

申请号：US10599784

申请日：2005-04-16

申请人： Hubert Holderer ,  Bernhard Gellrich ,  Dirk Rexhaeuser

发明人： Hubert Holderer ,  Bernhard Gellrich ,  Dirk Rexhaeuser

IPC分类号： G02B7/02

CPC分类号： G02B7/021 ,  G02B13/143 ,  G03F7/70341 ,  G03F7/70808 ,  G03F7/70825

摘要： The invention relates to a method for connection of an optical element to a mount structure, whereby in a first step the optical element is connected to the mount structure and in a second step the optical element is welded to the mount structure in the region of the connection.

摘要翻译： 本发明涉及一种用于将光学元件连接到安装结构的方法，由此在第一步骤中，光学元件连接到安装结构，并且在第二步骤中，光学元件在该区域中被焊接到安装结构 连接。

公开(公告)号：US20060187430A1

公开(公告)日：2006-08-24

申请号：US11285283

申请日：2005-11-23

申请人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

发明人： Aurelian Dodoc ,  Karl Schuster ,  Joerg Mallmann ,  Wilhelm Ulrich ,  Hans-Juergen Rostalski ,  Hubert Holderer ,  Bernhard Gellrich ,  Juergen Fischer ,  Susanne Beder ,  Andreas Wurmbrand ,  Ulrich Loering ,  Albrecht Ranck

IPC分类号： G03B27/54 ,  G03B27/42

CPC分类号： G03F7/7015 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70833 ,  G03F7/70916 ,  G03F7/70975 ,  G03F7/70983

摘要： A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

公开(公告)号：US06842294B2

公开(公告)日：2005-01-11

申请号：US10118479

申请日：2002-04-08

申请人： Hubert Holderer ,  Ulrich Weber ,  Alexander Kohl ,  Toralf Gruner ,  Christoph Zaczek ,  Jens Ullmann ,  Martin Weiser ,  Bernhard Gellrich ,  Hartmut Muenker

发明人： Hubert Holderer ,  Ulrich Weber ,  Alexander Kohl ,  Toralf Gruner ,  Christoph Zaczek ,  Jens Ullmann ,  Martin Weiser ,  Bernhard Gellrich ,  Hartmut Muenker

IPC分类号： G02B17/08 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B17/00

CPC分类号： G02B17/0892 ,  G02B17/08 ,  G03F7/70225

摘要： A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.

摘要翻译： 反射折射物镜包括多个透镜和至少两个偏转镜，其具有彼此具有特定角度，特别是90°的反射表面。 两个偏转镜被布置成其反射表面位于可以设置物镜中的位置的公共基座构件上。

公开(公告)号：US20050264786A1

公开(公告)日：2005-12-01

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jurgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G02B7/02 ,  G02B1/02 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G03B27/54

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

公开(公告)号：US07170585B2

公开(公告)日：2007-01-30

申请号：US11101235

申请日：2005-04-07

申请人： Martin Brunotte ,  Jürgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

发明人： Martin Brunotte ,  Jürgen Hartmaier ,  Hubert Holderer ,  Winfried Kaiser ,  Alexander Kohl ,  Jens Kugler ,  Manfred Maul ,  Christian Wagner

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G02B1/08 ,  G02B1/02 ,  G02B5/3083 ,  G03F7/70241 ,  G03F7/70825 ,  G03F7/70966

摘要： A projection exposure apparatus for microlithography has a light source, an illumination system, a mask-positioning system and a projection lens. The latter has a system aperture plane and an image plane and contains at least one lens that is made of a material which has a birefringence dependent on the transmission angle. The exposure apparatus further has an optical element, which has a position-dependent polarization-rotating effect or a position-dependent birefringence. This element, which is provided close to a pupil plane of the projection exposure apparatus, compensates at least partially for the birefringent effects produced in the image plane by the at least one lens.

摘要翻译： 用于微光刻的投影曝光装置具有光源，照明系统，掩模定位系统和投影透镜。 后者具有系统孔径平面和图像平面，并且包含由具有取决于透射角的双折射材料制成的至少一个透镜。 曝光装置还具有光学元件，其具有位置相关的偏振旋转效果或位置相关的双折射。 靠近投影曝光装置的光瞳平面设置的该元件至少部分补偿由至少一个透镜在图像平面中产生的双折射效应。