公开(公告)号：US20090135385A1

公开(公告)日：2009-05-28

申请号：US12267074

申请日：2008-11-07

申请人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

发明人： Bernhard Gellrich ,  Jens Kugler ,  Thomas Ittner ,  Stefan Hembacher ,  Karl-Heinz Schimitzek ,  Payam Tayebati ,  Hubert Holderer

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/70891

摘要： An optical imaging device, in particular for use in microlithography, includes a mask device for receiving a mask having a projection pattern, a projection device with an optical element group, a substrate device for receiving a substrate and an immersion zone. The optical element group is adapted to project the projection pattern onto the substrate and includes a plurality of optical elements with an immersion element to which the substrate is at least temporarily located adjacent to during operation. During operation, the immersion zone is located between the immersion element and the substrate and is at least temporarily filled with an immersion medium. A thermal attenuation device is provided, the thermal attenuation device being adapted to reduce fluctuations within the temperature distribution of the immersion element induced by the immersion medium.

摘要翻译： 特别是用于微光刻的光学成像装置包括用于接收具有投影图案的掩模的掩模装置，具有光学元件组的投影装置，用于接收基板的基板装置和浸没区。 光学元件组适于将投影图案投影到基板上并且包括具有浸没元件的多个光学元件，基板在工作期间至少临时定位到该浸没元件。 在操作期间，浸没区域位于浸没元件和基底之间，并且至少暂时填充浸渍介质。 提供一种热衰减装置，该热衰减装置适于减少浸入式介质引起的浸没元件的温度分布内的波动。

公开(公告)号：US07457059B2

公开(公告)日：2008-11-25

申请号：US11533660

申请日：2006-09-20

申请人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

发明人： Klaus Beck ,  Bernhard Gellrich ,  Hubert Holderer ,  Thomas Petasch ,  Cornelia Roesch ,  Alexander Kohl

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/023 ,  G03F7/70825

摘要： A arrangement serves for the adjustment of an optical element (1), in particular of a lens in an optical system, in particular in a projection lens system for semiconductor lithography. The optical element (1) is mounted in a mount (3) by means of a number of bearing feet (2) distributed over the circumference of the optical element (1) and is selectively deformable by actuators (5). At least some of the bearing feet (2) are engaged by the actuators (5) in a region of the respective bearing foot (2) in such a way that the respective bearing foot (2) can be displaced in the direction of the optical axis (7).

摘要翻译： 一种布置用于调整光学元件（1），特别是光学系统中的透镜的调整，特别是用于半导体光刻的投影透镜系统中。 光学元件（1）通过分布在光学元件（1）的圆周上的多个轴承脚（2）安装在安装件（3）中，并且可由致动器（5）选择性地变形。 至少一些轴承脚（2）在相应的轴承座（2）的区域中被致动器（5）接合，使得相应的轴承座（2）可以沿着光学方向 轴（7）。

公开(公告)号：US20080239503A1

公开(公告)日：2008-10-02

申请号：US11971328

申请日：2008-01-09

申请人： Olaf Conradi ,  Sascha Bleidistel ,  Markus Hauf ,  Wolfgang Hummel ,  Arif Kazi ,  Baerbel Schwaer ,  Jochen Weber ,  Hubert Holderer ,  Payam Tayebati ,  Boris Bittner

发明人： Olaf Conradi ,  Sascha Bleidistel ,  Markus Hauf ,  Wolfgang Hummel ,  Arif Kazi ,  Baerbel Schwaer ,  Jochen Weber ,  Hubert Holderer ,  Payam Tayebati ,  Boris Bittner

IPC分类号： G02B3/12 ,  G03B27/52

CPC分类号： G02B27/0068 ,  G02B3/14 ,  G03F7/70266 ,  G03F7/70825

摘要： A projection objective of a microlithographic projection exposure apparatus comprises a manipulator for reducing rotationally asymmetric image errors. The manipulator in turn contains a lens, an optical element and an interspace formed between the lens and the optical element, which can be filled with a liquid. At least one actuator acting exclusively on the lens is furthermore provided, which can generate a rotationally asymmetric deformation of the lens.

摘要翻译： 微光刻投影曝光装置的投影物镜包括用于减小旋转非对称图像误差的操纵器。 操纵器又包含透镜，光学元件和形成在透镜和光学元件之间的间隙，其可以填充液体。 此外还提供至少一个致动器作用于透镜，这可以产生透镜的旋转非对称变形。

公开(公告)号：US07304717B2

公开(公告)日：2007-12-04

申请号：US10250495

申请日：2002-12-17

申请人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

发明人： Wolfgang Hummel ,  Juergen Fischer ,  Karl-Eugen Aubele ,  Erich Merz ,  Raoul Reiner ,  Klaus Rief ,  Stefan Schoengart ,  Markus Neumaier ,  Baerbel Trossbach ,  Ulrich Weber ,  Michael Muehlbeyer ,  Hubert Holderer ,  Alexander Kohl ,  Jochen Weber ,  Johannes Lippert ,  Thorsten Rassel

IPC分类号： G03B27/42 ,  G03B27/52 ,  G02B7/02 ,  G03B27/54

CPC分类号： G03F7/70258 ,  G03F7/70825

摘要： An imaging device in a projection exposure machine for microlithography has at least one optical element and at least one manipulator, having a linear drive, for manipulating the position of the optical element. The linear drive has a driven subregion and a nondriven subregion, which are movable relative to one another in the direction of a movement axis. The subregions are interconnected at least temporarily via functional elements with an active axis and via functional elements with an active direction at least approximately parallel to the movement axis.

摘要翻译： 用于微光刻的投影曝光机中的成像装置具有至少一个光学元件和至少一个具有线性驱动的操纵器，用于操纵光学元件的位置。 线性驱动器具有驱动区域和非驱动子区域，它们可以在运动轴线的方向上相对于彼此移动。 至少临时地通过具有主动轴的功能元件和通过至少大致平行于运动轴的有源方向的功能元件临时地互相连接。

公开(公告)号：US20060243779A1

公开(公告)日：2006-11-02

申请号：US11386236

申请日：2006-03-21

申请人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

发明人： Johannes Rau ,  Josef Distl ,  Armin Schoeppach ,  Hubert Holderer

IPC分类号： B23K31/02

CPC分类号： G03F7/70825 ,  C03C27/046 ,  C04B37/04 ,  C04B2237/12 ,  Y10T29/49144

摘要： The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.

公开(公告)号：US20060072217A1

公开(公告)日：2006-04-06

申请号：US11262360

申请日：2005-10-28

申请人： Ulrich Weber ,  Hubert Holderer ,  Dirk Rexhaeuser

发明人： Ulrich Weber ,  Hubert Holderer ,  Dirk Rexhaeuser

IPC分类号： G02B7/02

CPC分类号： G03F7/70258 ,  G02B7/003 ,  G03F7/70825

摘要： In an apparatus for positioning an optical element in a structure, particularly in an objective housing of a projection objective for microlithography, the optical element is connected to the structure via fastening elements. The position of the optical element is set by means of adjusting fasteners. The fastening elements are arranged in such a way and the adjusting fasteners can be actuated in such a way that the optical element can be tilted about three mutually independent axes and can additionally be displaced in a translatory fashion in one axial direction

公开(公告)号：US06259571B1

公开(公告)日：2001-07-10

申请号：US09503023

申请日：2000-02-14

申请人： Hubert Holderer ,  Peter Ruemmer ,  Michael Trunz ,  Bernhard Geuppert ,  Thomas Polzer ,  Johan Dries ,  Hugo Timmers ,  Albert Post

发明人： Hubert Holderer ,  Peter Ruemmer ,  Michael Trunz ,  Bernhard Geuppert ,  Thomas Polzer ,  Johan Dries ,  Hugo Timmers ,  Albert Post

IPC分类号： G02B702

CPC分类号： G12B5/00 ,  G02B7/023 ,  G02B7/026

摘要： An adjustable assembly comprises a base (mount ring 1), an adjustable part (inner ring 3), a lever (tilting lever 5) and a drive (drive element 6). The lever (tilting lever 5) is connected to the base (mount ring 1) and to the adjustable part (inner ring 3) via two elastic solid pivoting joints (7, 8) oriented in parallel. One of the two solid pivoting joints (7) is divided into two pivoting joint parts (7a, 7b), which are arranged such that along their pivoting axis (9) they are offset sideways on either side of the second solid pivoting joint (8).

摘要翻译： 可调组件包括基座（安装环1），可调部分（内环3），杠杆（倾斜杆5）和驱动（驱动元件6））。 杠杆（倾斜杆5）通过平行定向的两个弹性固体枢转接头（7,8）连接到基座（安装环1）和可调节部分（内环3）。 两个固定枢转接头（7）中的一个被分成两个枢转接头部分（7a，7b），它们被布置为使得沿着它们的枢转轴线（9），它们在第二固体枢转接头（8）的任一侧侧向偏移 ）。

公开(公告)号：US06229657B1

公开(公告)日：2001-05-08

申请号：US09328938

申请日：1999-06-09

申请人： Hubert Holderer ,  Peter Rümmer ,  Michael Trunz

发明人： Hubert Holderer ,  Peter Rümmer ,  Michael Trunz

IPC分类号： G02B702

CPC分类号： G03F7/70058 ,  G02B7/023 ,  G03F7/70241 ,  G03F7/70825

摘要： Assembly of an optical element and a mount, in which the optical element is coupled by means of numerous lugs to a rigid intermediate ring, which itself is coupled by adjusting members or passive decouplers to the mount for connection to a housing and/or to a further mount.

摘要翻译： 光学元件和安装件的组装，其中光学元件通过许多凸耳连接到刚性中间环，该刚性中间环本身通过调节构件或被动分离器耦合到安装件，以连接到壳体和/或 进一步安装。

公开(公告)号：US08342701B2

公开(公告)日：2013-01-01

申请号：US12851187

申请日：2010-08-05

申请人： Holger Kierey ,  Michel Le Maire ,  Willi Anderl ,  Hubert Holderer ,  Anton Lengel

发明人： Holger Kierey ,  Michel Le Maire ,  Willi Anderl ,  Hubert Holderer ,  Anton Lengel

IPC分类号： G02B5/08

CPC分类号： G02B5/0891 ,  G02B7/181 ,  G02B7/1815

摘要： A reflective optical element for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

摘要翻译： 公开了一种用于EUV系统的反射光学元件。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。

公开(公告)号：US20110051267A1

公开(公告)日：2011-03-03

申请号：US12851187

申请日：2010-08-05

申请人： Holger Kierey ,  Michel Le Maire ,  Willi Anderl ,  Hubert Holderer ,  Anton Lengel

发明人： Holger Kierey ,  Michel Le Maire ,  Willi Anderl ,  Hubert Holderer ,  Anton Lengel

IPC分类号： G02B5/08

CPC分类号： G02B5/0891 ,  G02B7/181 ,  G02B7/1815

摘要： A reflective optical element (10) for use in an EUV system is disclosed. The reflective optical element includes a base body, which is produced at least partly from a substrate material. At least one cooling channel through which a cooling medium can flow is arranged in the base body. A material having a thermal conductivity of greater than 50 W/mK is provided as substrate material. The reflective optical element also includes a polishing layer, which is applied on the substrate material. The polishing layer includes an amorphous material which can be processed via polishing.

摘要翻译： 公开了一种用于EUV系统的反射光学元件（10）。 反射型光学元件包括至少部分地由基底材料制成的基体。 冷却介质可以流过的至少一个冷却通道布置在基体中。 提供具有大于50W / mK的热导率的材料作为基材。 反射光学元件还包括施加在基板材料上的抛光层。 抛光层包括可通过研磨加工的非晶材料。