公开(公告)号：US08749756B2

公开(公告)日：2014-06-10

申请号：US13361545

申请日：2012-01-30

申请人： Yuri Johannes Gabrial Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

发明人： Yuri Johannes Gabrial Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G03B27/52 ,  H05G2/00 ,  G03F7/20

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US08704199B2

公开(公告)日：2014-04-22

申请号：US13002544

申请日：2009-07-15

申请人： Michel Fransois Hubert Klaassen ,  Jan Bernard Plechelmus Van Schoot ,  Sylvain Dutartre

发明人： Michel Fransois Hubert Klaassen ,  Jan Bernard Plechelmus Van Schoot ,  Sylvain Dutartre

IPC分类号： H05G2/00 ,  G03B27/54 ,  G03F7/20

CPC分类号： G03F7/70033 ,  G03F7/70141 ,  G03F7/70175 ,  G03F7/70825 ,  G03F7/7085

摘要： A lithographic apparatus (2) can include a radiation source (SO) configured to provide radiation (200), a radiation collector (CO) configured to collect radiation (200) from the radiation source (SO), an illumination system (IL), and a detector (300). The detector (300) can be disposed in a fixed positional relationship with the illumination system (IL) relative to an alignment of the collector (CO). Further, a region (310) of the collector (CO) can be configured to direct a portion of radiation (200) emanating from the radiation source (SO) and traversing the region (310) towards the detector (300). The detector (300) can be configured to detect a change in a portion of the radiation (200). The change can be indicative of a change in position or orientation of the collector (CO) relative to the illumination system (IL) relative to an alignment of the collector (CO).

摘要翻译： 光刻设备（2）可以包括被配置为提供辐射（200）的辐射源（SO），被配置为从辐射源（SO）收集辐射（200）的辐射收集器（CO），照明系统（IL） 和检测器（300）。 检测器（300）可以相对于收集器（CO）的排列与照明系统（IL）以固定的位置关系设置。 此外，收集器（CO）的区域（310）可以被配置为引导从辐射源（SO）发出并且朝向检测器（300）横穿该区域（310）的一部分辐射（200）。 检测器（300）可以被配置为检测辐射（200）的一部分中的变化。 该变化可以指示相对于收集器（CO）的对准，收集器（CO）相对于照明系统（IL）的位置或取向的变化。

公开(公告)号：US08570489B2

公开(公告)日：2013-10-29

申请号：US12741960

申请日：2008-11-07

申请人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

发明人： Jan Bernard Plechelmus Van Schoot ,  Antonius Johannes Josephus Van Dijsseldonk ,  Hans Van Der Laan ,  Diederik Jan Maas

IPC分类号： G03B27/32 ,  G03B27/42 ,  G03B27/54

CPC分类号： G03F7/70291 ,  G03F7/70208 ,  G03F7/70941

摘要： A lithographic projection apparatus including a support structure configured to support a patterning device, the patterning device configured to impart a beam of radiation with a pattern in its cross-section; a substrate holder configured to hold a substrate; a projection system configured to expose the patterned beam of radiation on a target portion of the substrate; and a system configured to compensate one or more perturbation factors by providing an additional beam of radiation to be exposed on the target portion of the substrate, the additional beam of radiation being imparted in its cross-section with an additional pattern which is based on the pattern of the patterning device and on lithographic projection apparatus property data, the lithographic projection apparatus property data characterizing a level and nature of one or more systematic perturbation factors of different lithographic apparatus.

摘要翻译： 一种光刻投影设备，包括被配置为支撑图案形成装置的支撑结构，所述图案形成装置被配置为在其横截面中赋予图案的辐射束; 衬底保持器，其构造成保持衬底; 投影系统，被配置为将所述图案化的辐射束暴露在所述基板的目标部分上; 以及被配置为通过提供待暴露在所述基板的目标部分上的另外的辐射束来补偿一个或多个扰动因子的系统，所述附加辐射束在其横截面中被赋予附加图案，所述另外的图案基于 图案形成装置的图案和光刻投影装置的属性数据，光刻投影装置的属性数据表征不同光刻装置的一个或多个系统扰动因子的水平和性质。

公开(公告)号：US20120105818A1

公开(公告)日：2012-05-03

申请号：US13378913

申请日：2010-06-07

申请人： Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

发明人： Jan Bernard Plechelmus Van Schoot ,  Gosse Charles De Vries

IPC分类号： G03B27/54 ,  F21V7/04

CPC分类号： G03F7/702 ,  G03F7/70075 ,  G03F7/70116

摘要： An illumination system having a plurality of reflective elements, the reflective elements being movable between different orientations which direct radiation towards different locations in a pupil plane, thereby forming different illumination modes. Each reflective element is moveable to a first orientation in which it directs radiation to a location in an inner illumination location group, to a second orientation in which it directs radiation to a location in an intermediate illumination location group, and to a third orientation in which it directs radiation to a location in an outer illumination location group. The reflective elements are configured to be oriented to direct equal amounts of radiation towards the inner, intermediate and outer illumination location groups, and are configured to be oriented such that they can direct substantially no radiation into the outer illumination location group and direct substantially equal amounts of radiation towards the inner and intermediate illumination location groups.

摘要翻译： 一种具有多个反射元件的照明系统，所述反射元件可在不同取向之间移动，所述不同取向将辐射导向光瞳平面中的不同位置，从而形成不同的照明模式。 每个反射元件可移动到第一取向，其中它将辐射引导到内照明位置组中的位置，到第二方向，其中它将辐射引导到中间照明位置组中的位置，并且其中第三方向 它将辐射引导到外部照明位置组中的位置。 反射元件被配置为被定向成将等量的辐射引导到内部，中间和外部照明位置组，并且被配置为被定向成使得它们可以基本上不将辐射引导到外部照明位置组中并且引导基本相等的量 的辐射朝向内部和中间照明位置组。

公开(公告)号：US09414477B2

公开(公告)日：2016-08-09

申请号：US12540548

申请日：2009-08-13

申请人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： H05G2/001 ,  G03F7/70033 ,  G03F7/7085

摘要： A radiation source includes a beam generator configured to generate a radiation beam to be used to produce a radiation output of the radiation source, and a beam monitor, configured to monitor the radiation beam. A lithographic apparatus includes the radiation source. A device manufacturing method includes generating a first type of radiation by utilizing a beam of a second type of radiation, monitoring a quality of the second type of radiation, and projecting a patterned beam of the first type of radiation onto a substrate.

摘要翻译： 辐射源包括被配置为产生用于产生辐射源的辐射输出的辐射束的光束发生器，以及被配置为监视辐射束的光束监视器。 光刻设备包括辐射源。 一种器件制造方法包括通过利用第二类型的辐射束来产生第一类型的辐射，监测第二类型的辐射的质量，以及将第一类型的辐射的图案化的束投射到衬底上。

公开(公告)号：US08867021B2

公开(公告)日：2014-10-21

申请号：US13392022

申请日：2010-03-18

申请人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Marinus Johannes Maria Van Dam ,  Jan Bernard Plechelmus Van Schoot ,  Fidelus Adrianus Boon ,  Hermanus Johannes Maria Kreuwel

发明人： Gosse Charles De Vries ,  Edwin Johan Buis ,  Marinus Johannes Maria Van Dam ,  Jan Bernard Plechelmus Van Schoot ,  Fidelus Adrianus Boon ,  Hermanus Johannes Maria Kreuwel

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03F7/20

CPC分类号： G03F7/70116 ,  G03F7/70075

摘要： An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.

摘要翻译： 公开了一种照明系统，其具有多个可移动反射元件和相关联的致动器，其可被配置为形成照明模式。 一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件，第一和第二取向使得从可移动反射元件反射的辐射形成 照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。

公开(公告)号：US08797504B2

公开(公告)日：2014-08-05

申请号：US13408471

申请日：2012-02-29

申请人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

发明人： Han-Kwang Nienhuys ,  Martinus Agnes Willem Cuijpers ,  Leon Martin Levasier ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Oleg Viacheslavovich Voznyi ,  Franciscus Johannes Joseph Janssen ,  Danny Maria Hubertus Philips ,  Marcio Alexandre Cano Miranda ,  Oleksiy Galaktionov ,  Manish Ranjan ,  Albert Pieter Rijpma ,  Kursat Bal ,  Roger Wilhelmus Antonius Henricus Schmitz ,  Alain Louis Claude Leroux

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70933 ,  G03F7/70875 ,  G03F7/70891

摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.

公开(公告)号：US20130057840A1

公开(公告)日：2013-03-07

申请号：US13698171

申请日：2011-04-06

申请人： Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

发明人： Vadim Iourievich Timoshkov ,  Jan Bernard Plechelmus Van Schoot ,  Antonius Theodorus Wilhelmu Kempen ,  Andrei Mikhailovich Yakunin ,  Edgar Alberto Osorio Oliveros

IPC分类号： G02B1/10 ,  C23C14/14 ,  G03B27/70

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  C23C14/48 ,  C23C14/586 ,  G21K1/062

摘要： There is provided a multilayer mirror (80) comprising a layer of a first material (84) and a layer of silicon (82). The layer of the first material and the layer of silicon form a stack of layers. An exposed region of the layer of silicon comprises a modification that is arranged to improve the robustness of the exposed region of silicon.

摘要翻译： 提供了包括第一材料（84）和硅层（82）的层的多层反射镜（80）。 第一材料层和硅层形成一叠层。 硅层的暴露区域包括被设置为改善暴露的硅区域的鲁棒性的修改。

公开(公告)号：US20110223543A1

公开(公告)日：2011-09-15

申请号：US12994930

申请日：2009-05-05

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk ,  Erik Roelof Loopstra ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels

IPC分类号： G03F7/20

CPC分类号： G03F7/70191 ,  G03F7/70116 ,  G03F7/70575

摘要： A radiation system is configured to generate a radiation beam. The radiation system comprising a chamber that includes a radiation source configured to generate radiation, a radiation beam emission aperture, and a radiation collector configured to collect radiation generated by the source, and to transmit the collected radiation to the radiation beam emission aperture. The radiation collector includes a spectral purity filter configured to enhance a spectral purity of the radiation to be emitted via the aperture.

摘要翻译： 辐射系统被配置为产生辐射束。 所述辐射系统包括腔室，所述室包括被配置为产生辐射的辐射源，辐射束发射孔和被配置为收集由所述源产生的辐射的辐射收集器，并且将所收集的辐射传输到所述辐射束发射孔。 辐射收集器包括光谱纯度滤光器，其配置成增强经由孔径发射的辐射的光谱纯度。

公开(公告)号：US20110170078A1

公开(公告)日：2011-07-14

申请号：US13061792

申请日：2009-07-17

申请人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

发明人： Erik Roelof Loopstra ,  Wilhelmus Petrus De Boeij ,  Hans Butler ,  Robertus Johannes Marinus ,  Jan Bernard Plechelmus Van Schoot ,  Timotheus Franciscus Sengers ,  Maurice Willem Jozef Etiënne Wijckmans ,  Franciscus Johannes Joseph Janssen

IPC分类号： G03B27/54

CPC分类号： G03F7/70891 ,  G03F7/70258 ,  G03F7/70825

摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

摘要翻译： 提供了一种投影系统（PS），在一个实施例中包括两个帧。 投影系统的光学元件安装在第一框架（200）上。 使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。 第二测量系统（920）用于测量与第二帧的变形相关联的参数。 由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。 通常，框架的变形是由于共振振荡和热膨胀。 具有两个框架使得投影系统的光学元件能够以高精确度定位。 可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。