PROCESS FOR FORMING SEMICONDUCTOR STRUCTURE
    11.
    发明申请
    PROCESS FOR FORMING SEMICONDUCTOR STRUCTURE 有权
    形成半导体结构的方法

    公开(公告)号:US20130210198A1

    公开(公告)日:2013-08-15

    申请号:US13370477

    申请日:2012-02-10

    申请人: Jing-Cheng LIN

    发明人: Jing-Cheng LIN

    IPC分类号: H01L21/56

    摘要: A method for forming a semiconductor structure. A semiconductor substrate including a plurality of dies mounted thereon is provided. The substrate includes a first portion proximate to the dies and a second portion distal to the dies. In some embodiments, the first portion may include front side metallization. The second portion of the substrate is thinned and a plurality of conductive through substrate vias (TSVs) is formed in the second portion of the substrate after the thinning operation. Prior to thinning, the second portion may not contain metallization. In one embodiment, the substrate may be a silicon interposer. Further back side metallization may be formed to electrically connect the TSVs to other packaging substrates or printed circuit boards.

    摘要翻译: 一种形成半导体结构的方法。 提供了包括安装在其上的多个管芯的半导体基板。 衬底包括靠近模具的第一部分和远离模具的第二部分。 在一些实施例中,第一部分可以包括前侧金属化。 衬底的第二部分变薄,并且在变薄操作之后,在衬底的第二部分中形成多个导电贯通衬底通孔(TSV)。 在变薄之前,第二部分可以不包含金属化。 在一个实施例中,衬底可以是硅插入器。 可以形成另外的背侧金属化以将TSV电连接到其他封装基板或印刷电路板。