Optical subassembly of optical transceiver
    6.
    发明授权
    Optical subassembly of optical transceiver 有权
    光收发器光组件

    公开(公告)号:US07203426B2

    公开(公告)日:2007-04-10

    申请号:US11144720

    申请日:2005-06-04

    IPC分类号: H04B10/00

    摘要: A transceiver module comprised of a multiplexing/demultiplexing optical subassembly is provided. The optical subassembly includes either a transmitter module or a receiver module or both. The transmitter module has laser diodes emitting optical signals, which are reflected by reflectors, and coupled together by thin film filter. The receiver module includes thin film filters that decouple a received optical signal into constituent components. These components are reflected by reflectors to photo detectors by which the optical signals are converted into electrical signals. The reflector are capable of dual axis adjustment for adjustment of inclination thereof to effect active alignment. Further, the transmitter module and the receiver module define positioning recesses to position the laser diodes and photo detectors. The recesses are sized in accordance with the wavelengths associated with the laser diodes and photo detectors to effect passive alignment.

    摘要翻译: 提供了由复用/解复用光学子组件组成的收发器模块。 光学子组件包括发射器模块或接收器模块或两者。 发射器模块具有发射光信号的激光二极管,其被反射器反射并通过薄膜滤波器耦合在一起。 接收器模块包括将接收的光信号分离成组成部件的薄膜滤波器。 这些部件被反射器反射到光电检测器,光信号将被转换成电信号。 反射器能够进行双轴调节,以调整其倾斜度以实现主动对准。 此外,发射器模块和接收器模块限定定位凹槽以定位激光二极管和光电检测器。 根据与激光二极管和光电检测器相关联的波长来调整凹槽的大小,以实现被动对准。

    Optical subassembly of optical transceiver
    7.
    发明申请
    Optical subassembly of optical transceiver 有权
    光收发器光组件

    公开(公告)号:US20060274999A1

    公开(公告)日:2006-12-07

    申请号:US11144720

    申请日:2005-06-04

    IPC分类号: G02B6/42

    摘要: A transceiver module comprised of a multiplexing/demultiplexing optical subassembly is provided. The optical subassembly includes either a transmitter module or a receiver module or both. The transmitter module has laser diodes emitting optical signals, which are reflected by reflectors, and coupled together by thin film filter. The receiver module includes thin film filters that decouple a received optical signal into constituent components. These components are reflected by reflectors to photo detectors by which the optical signals are converted into electrical signals. The reflector are capable of dual axis adjustment for adjustment of inclination thereof to effect active alignment. Further, the transmitter module and the receiver module define positioning recesses to position the laser diodes and photo detectors. The recesses are sized in accordance with the wavelengths associated with the laser diodes and photo detectors to effect passive alignment.

    摘要翻译: 提供了由复用/解复用光学子组件组成的收发器模块。 光学子组件包括发射器模块或接收器模块或两者。 发射器模块具有发射光信号的激光二极管,其被反射器反射并通过薄膜滤波器耦合在一起。 接收器模块包括将接收的光信号分离成组成部件的薄膜滤波器。 这些部件被反射器反射到光电检测器,光信号将被转换成电信号。 反射器能够进行双轴调节,以调整其倾斜度以实现主动对准。 此外,发射器模块和接收器模块限定定位凹槽以定位激光二极管和光电检测器。 根据与激光二极管和光电检测器相关联的波长来调整凹槽的大小,以实现被动对准。

    Flux residue cleaning system and method
    8.
    发明授权
    Flux residue cleaning system and method 有权
    助焊剂残渣清洗系统及方法

    公开(公告)号:US09406500B2

    公开(公告)日:2016-08-02

    申请号:US13369138

    申请日:2012-02-08

    摘要: A flux residue cleaning system includes first and second immersion chambers, first and second spray chambers, and a drying chamber. The first immersion chamber softens an outer region of a flux residue formed around microbumps interposed between a wafer and a die when the wafer is immersed in a first chemical. The first spray chamber removes the outer region of the flux residue when the wafer is impinged upon by a first chemical spray in order to expose an inner region of the flux residue. The second immersion chamber softens the inner region of the flux residue when the wafer is immersed in a second chemical. The second spray chamber removes the inner region of the flux residue when the wafer is impinged upon by a second chemical spray in order to clean the wafer to a predetermined standard. The drying chamber dries the wafer.

    摘要翻译: 助焊剂残渣清洁系统包括第一和第二浸没室,第一和第二喷雾室以及干燥室。 当晶片浸入第一化学品中时,第一浸入室软化在介于晶片和管芯之间的微胶片周围形成的焊剂残余物的外部区域。 当晶片通过第一化学喷雾撞击以暴露焊剂残留物的内部区域时,第一喷雾室除去焊剂残余物的外部区域。 当晶片浸入第二种化学品中时,第二浸入室软化助焊剂残余物的内部区域。 当晶片被第二化学喷雾冲击时,第二喷雾室去除焊剂残余物的内部区域,以便将晶​​片清洁至预定的标准。 干燥室干燥晶片。