公开(公告)号：US20110143269A1

公开(公告)日：2011-06-16

申请号：US13058783

申请日：2009-07-29

申请人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

发明人： Andrei Mikhailovich Yakunin ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Leonid Aizikovitch Sjmaenok

IPC分类号： G03F7/20 ,  H05G2/00 ,  G03B27/54 ,  G03F1/00

CPC分类号： G03F7/70958 ,  B82Y10/00 ,  G02B5/208 ,  G03F7/70033 ,  G03F7/70191 ,  G03F7/70575 ,  G03F7/70941 ,  G21K1/062 ,  G21K1/10

摘要： A spectral purity filter is configured to transmit extreme ultraviolet (EUV) radiation and deflect or absorb non-EUV secondary radiation. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of material highly reflective of non-EUV secondary radiation located on a radiation incident side of the body. In an embodiment, the spectral purity filter includes a body of material highly transmissive of EUV radiation and a layer of high emissivity material on an end of the body.

摘要翻译： 光谱纯度滤光器被配置为透射极紫外（EUV）辐射并偏转或吸收非EUV次级辐射。 在一个实施例中，光谱纯度滤光器包括高度透射EUV辐射的材料体和高度反射位于身体辐射入射侧的非EUV次级辐射的材料层。 在一个实施例中，光谱纯度滤光器包括在EUV辐射高度透射的材料体和在身体端部上的高发射率材料层。

公开(公告)号：US20110043777A1

公开(公告)日：2011-02-24

申请号：US12933668

申请日：2009-03-20

申请人： Vladimir Mihailovitc Krivtsun ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Josephina Moors ,  Sergey Churilov ,  Denis Glushkov

发明人： Vladimir Mihailovitc Krivtsun ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Johannes Hubertus Josephina Moors ,  Sergey Churilov ,  Denis Glushkov

IPC分类号： G03B27/54 ,  G03F7/20 ,  C22C28/00

CPC分类号： H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A target material is configured to be used in a source constructed and arranged to generate a radiation beam having a wavelength in an extreme ultraviolet range. The target material includes a Gd-based composition configured to modify a melting temperature of Gd.

摘要翻译： 目标材料被配置为用于构造和布置成产生具有极紫外范围波长的辐射束的源。 目标材料包括配置成改变Gd的熔融温度的Gd基组合物。

公开(公告)号：US20110019174A1

公开(公告)日：2011-01-27

申请号：US12919741

申请日：2009-02-24

申请人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

发明人： Wouter Anthon Soer ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  G02B5/22 ,  G02B5/26 ,  G03B27/72

CPC分类号： G02B5/208 ,  B82Y10/00 ,  G02B5/0891 ,  G02B5/22 ,  G02B5/26 ,  G03F7/70191 ,  G03F7/702 ,  G03F7/70575 ,  G03F7/70958 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/064 ,  G21K2201/065 ,  G21K2201/067

摘要： An optical element includes a first layer that includes a first material, and is configured to be substantially reflective for radiation of a first wavelength and substantially transparent for radiation of a second wavelength. The optical element includes a second layer that includes a second material, and is configured to be substantially absorptive or transparent for the radiation of the second wavelength. The optical element includes a third layer that includes a third material between the first layer and the second layer, and is substantially transparent for the radiation of the second wavelength and configured to reduce reflection of the radiation of the second wavelength from a top surface of the second layer facing the first layer. The first layer is located upstream in the optical path of incoming radiation with respect to the second layer in order to improve spectral purity of the radiation of the first wavelength.

摘要翻译： 光学元件包括第一层，其包括第一材料，并且被配置为对于第一波长的辐射基本上是反射的，并且对于第二波长的辐射基本上是透明的。 光学元件包括第二层，其包括第二材料，并且被配置为对于第二波长的辐射是基本吸收或透明的。 光学元件包括第三层，其包括在第一层和第二层之间的第三材料，并且对于第二波长的辐射基本上是透明的，并且被配置为减少第二波长的辐射的反射从第二层的顶表面 第二层面向第一层。 为了提高第一波长的辐射的光谱纯度，第一层相对于第二层位于入射辐射的光路中的上游。

公开(公告)号：US07868304B2

公开(公告)日：2011-01-11

申请号：US11051477

申请日：2005-02-07

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Carolus Ida Maria Antonius Spee ,  Johannes Christiaan Leonardus Franken ,  Arnoud Cornelis Wassink ,  Paul Peter Anna Antonius Brom

IPC分类号： A61N5/00

CPC分类号： G03F7/70175 ,  G03F7/70916

摘要： A method for removal of deposition on a radiation collector of a lithographic apparatus includes providing a gas barrier to an end of a radiation collector, thereby providing a radiation collector enclosure volume; providing a gas to the enclosure volume, the gas selected from a halogen containing gas and a hydrogen containing gas; and removing at least part of the deposition from the radiation collector. A lithographic apparatus includes a radiation collector; a circumferential hull enclosing the radiation collector; a gas barrier at an end of the radiation collector, thereby providing a radiation collector enclosure volume. The radiation collector is enclosed by the circumferential hull and the gas barrier. An inlet provides a gas to the radiation collector enclosure volume and an outlet removes a gas from the radiation collector enclosure volume.

摘要翻译： 用于去除光刻设备的辐射收集器上的沉积的方法包括向辐射收集器的端部提供气体阻挡层，从而提供辐射收集器外壳体积; 向封闭体积提供气体，所述气体选自含卤素气体和含氢气体; 以及从所述辐射收集器去除所述沉积物的至少一部分。 光刻设备包括辐射收集器; 围绕辐射收集器的周向船体; 在辐射收集器的端部处的气体屏障，从而提供辐射收集器外壳体积。 辐射收集器被周向壳体和气体屏障包围。 入口为辐射收集器外壳体积提供气体，出口从辐射收集器外壳体积中除去气体。

公开(公告)号：US20100151394A1

公开(公告)日：2010-06-17

申请号：US12567383

申请日：2009-09-25

申请人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

发明人： Luigi Scaccabarozzi ,  Vadim Yevgenyevich Banine ,  Norbertus Benedictus Koster ,  Johannes Hubertus Josephina Moors ,  Maarten Van Kampen ,  Ramasamy Raju ,  Wayne Mathew Lytle ,  David Neil Ruzic ,  Martin John Neumann

IPC分类号： G03F7/20 ,  G03B27/52 ,  B08B13/00

CPC分类号： G03F7/70925

摘要： Embodiments of the invention relate to a system for contactless cleaning of an object surface, a lithographic apparatus including the system, and a method of manufacturing a device. The system may include a He plasma source contained in a chamber and a control unit constructed to modify plasma parameters in use, such as the electron energy distribution of the plasma for causing an increase in formation of He metastables without modifying operational parameters of the plasma source. The control unit may include an electrical biasing unit constructed to apply a positive bias voltage to the object, for attracting free electrons from the plasma. The system may include a supplementary gas source, which may be either pre-mixed with He or be supplied from a further gas source. The supplementary gas may be selected based on a pre-knowledge on a type of particles to be expected on the surface of the object.

摘要翻译： 本发明的实施例涉及一种用于物体表面的非接触式清洁的系统，包括该系统的光刻设备以及一种制造设备的方法。 该系统可以包括包含在腔室中的He等离子体源和构造为修改使用中的等离子体参数的控制单元，例如等离子体的电子能量分布，以引起He亚稳态的形成增加而不改变等离子体源的操作参数 。 控制单元可以包括电偏置单元，其构造成向对象施加正偏置电压，用于从等离子体吸引自由电子。 该系统可以包括辅助气体源，其可以与He预先混合或者从另外的气体源供应。 可以基于对物体表面上预期的颗粒类型的预先知识来选择补充气体。

公开(公告)号：US07598503B2

公开(公告)日：2009-10-06

申请号：US11451601

申请日：2006-06-13

申请人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

发明人： Maarten Marinus Johannes Wilhelmus Van Herpen ,  Vadim Yevgenyevich Banine ,  Derk Jan Wilfred Klunder ,  Johannes Hubertus Josephina Moors

IPC分类号： G01J3/10 ,  G21K5/10 ,  H05G2/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70166 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a source for supplying hydrogen radicals, a guide for use in conjunction with the source, for directing hydrogen radicals to an application surface to be targeted by the hydrogen radicals. The guide is provided with a coating having a hydrogen radical recombination constant of less than 0.2. In this way, the radicals can be transported with reduced losses and are able to better interact with remaining contaminants on application surfaces, such as mirror surfaces.

摘要翻译： 公开了一种光刻设备。 该装置包括用于供应氢自由基的源，与源结合使用的引导件，用于将氢自由基引导到由氢自由基靶向的施加表面。 引导件具有氢自由基复合常数小于0.2的涂层。 以这种方式，可以以较少的损失运输自由基，并且能够更好地与应用表面（例如镜面）上的剩余污染物相互作用。

公开(公告)号：US07405417B2

公开(公告)日：2008-07-29

申请号：US11311624

申请日：2005-12-20

申请人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

发明人： Lucas Henricus Johannes Stevens ,  Vadim Yevgenyevich Banine ,  Johannes Hubertus Josephina Moors ,  Bastiaan Theodoor Wolschrijn

IPC分类号： G01J3/10 ,  G01N21/88 ,  G03B27/72

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G03F7/70916

摘要： A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a first radiation beam onto a target portion of a substrate, and at least one monitoring device for detecting contamination in a interior space. The monitoring device includes at least one dummy element having at least one contamination receiving surface. In an aspect of the invention, there is provided at least one dummy element which does not take part in transferring a radiation beam onto a target portion of a substrate, wherein it is monitored whether a contamination receiving surface of the dummy element has been contaminated.

摘要翻译： 公开了一种光刻设备。 该装置包括被配置为将第一辐射束投射到基板的目标部分上的投影系统，以及用于检测内部空间中的污染的至少一个监视装置。 监测装置包括至少一个具有至少一个污染物接收表面的虚拟元件。 在本发明的一个方面中，提供了至少一个虚拟元件，其不参与将辐射束传送到基板的目标部分上，其中监视虚设元件的污染物接收表面是否已被污染。

公开(公告)号：US20060138350A1

公开(公告)日：2006-06-29

申请号：US11022943

申请日：2004-12-28

申请人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

发明人： Vadim Yevgenyevich Banine ,  Levinus Pieter Bakker ,  Aleksey Kolesnychenko ,  Johannes Hubertus Josephina Moors ,  Frank Jeroen Pieter Schuurmans

IPC分类号： G03F7/20

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a source for generating radiation, an illumination system for conditioning the radiation, a patterning device for patterning the conditioned radiation, and a projection system for projecting the patterned radiation onto a target portion of a substrate. The illumination system includes a debris mitigating system for mitigating debris particles that are released with the generation of radiation, and an optical system for collecting the radiation. The debris mitigation system is arranged to directly evaporate the debris particles, or to directly charge the debris particles, or to directly produce a plasma out of the debris particles, or any combination thereof, in a path along which the radiation propagates from the source to the optical system.

摘要翻译： 光刻设备包括用于产生辐射的源，用于调节辐射的照明系统，用于对经调节的辐射进行图案化的图案形成装置，以及用于将图案化的辐射投影到基板的目标部分上的投影系统。 照明系统包括用于减轻随着辐射产生而释放的碎片颗粒的碎片减轻系统和用于收集辐射的光学系统。 碎片减缓系统被设置为直接蒸发碎片颗粒，或直接对碎屑颗粒进行充填，或直接从碎片颗粒或其任何组合产生等离子体，辐射沿着该路径从源传播到 光学系统。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US20140253894A1

公开(公告)日：2014-09-11

申请号：US14346530

申请日：2012-08-23

申请人： Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

发明人： Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

摘要翻译： 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴指向燃料流。